JP2009283923A - 光電変換装置の作製方法 - Google Patents
光電変換装置の作製方法 Download PDFInfo
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- JP2009283923A JP2009283923A JP2009101599A JP2009101599A JP2009283923A JP 2009283923 A JP2009283923 A JP 2009283923A JP 2009101599 A JP2009101599 A JP 2009101599A JP 2009101599 A JP2009101599 A JP 2009101599A JP 2009283923 A JP2009283923 A JP 2009283923A
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- semiconductor layer
- single crystal
- layer
- crystal semiconductor
- electrode
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic System
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/02002—Arrangements for conducting electric current to or from the device in operations
- H01L31/02005—Arrangements for conducting electric current to or from the device in operations for device characterised by at least one potential jump barrier or surface barrier
- H01L31/02008—Arrangements for conducting electric current to or from the device in operations for device characterised by at least one potential jump barrier or surface barrier for solar cells or solar cell modules
- H01L31/0201—Arrangements for conducting electric current to or from the device in operations for device characterised by at least one potential jump barrier or surface barrier for solar cells or solar cell modules comprising specially adapted module bus-bar structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN heterojunction type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PIN type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
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Abstract
【解決手段】単結晶半導体基板中に脆化層を形成し、且つ単結晶半導体基板の一表面上に第1の不純物半導体層、第1の電極、及び絶縁層を形成し、絶縁層と支持基板を密着させて単結晶半導体基板と支持基板を貼り合わせた後、脆化層において単結晶半導体基板を分離させて第1の単結晶半導体層を有する積層体を形成し、第1の単結晶半導体層上に第1の半導体層及び第2の半導体層を形成し、固相成長により、第1の半導体層及び第2の半導体層の結晶性を向上させて、第2の単結晶半導体層を形成し、第2の単結晶半導体層上に、第1の不純物半導体層とは逆の導電型の第2の不純物半導体層を形成し、第2の不純物半導体層上に第2の電極を形成する。
【選択図】図1
Description
図1に、本実施の形態に係る光電変換装置100の断面の模式図を示す。また、図2に、本実施の形態に係る光電変換装置100の上面の模式図(平面図)を示す。なお、図1は、図2中のO−P切断線に対応する断面図の一例である。
本実施の形態では、先の実施の形態と異なる光電変換装置の製造方法の例について説明する。具体的には、先の実施の形態では、脆化層105、第1の不純物半導体層108、第1の電極106、絶縁層104の形成順序について、(1)を例に説明したが、本実施の形態では、(2)、(3)、(4)の例について説明する。なお、脆化層105、第1の不純物半導体層108、第1の電極106、絶縁層104の形成順序以外については先の実施の形態と同様であるため、説明は省略する。
本実施の形態では、光電変換装置の作製方法の別の例について説明する。
本実施の形態では、光電変換装置の作製方法の別の例について説明する。
本実施の形態では、ユニットセルを複数積層した、いわゆるタンデム型の光電変換装置の例について説明する。なお、本実施の形態では、ユニットセルを2層積層する場合について説明する。
本実施の形態では、ユニットセルを複数積層した光電変換装置の一例について説明する。具体的には、ユニットセルを3層積層した、いわゆるスタック型の光電変換装置300について説明する。
実施の形態1乃至6などにより得られる光電変換装置を用いて、太陽光発電モジュールを製造することができる。本実施の形態では、実施の形態1に示す光電変換装置を用いた太陽光発電モジュールの例を図23(A)に示す。太陽光発電モジュール1028は、支持基板102上に設けられたユニットセル120により構成されている。支持基板102とユニットセル120の間には、支持基板102側から絶縁層104、第1の電極106が設けられている。また、第1の電極106は補助電極116と接続している。
図24に、実施の形態7で示した太陽光発電モジュール1028を用いた太陽光発電システムの例を示す。充電制御回路1029は、一又は複数の太陽光発電モジュール1028から供給される電力を用いて、蓄電池1030を充電する。また、蓄電池1030が十分に充電されている場合には、太陽光発電モジュール1028から供給される電力を負荷1031に直接出力する。
・成膜法:プラズマCVD
・原料ガス:シラン(4sccm)+水素(400sccm)
・電力(周波数):15W(60MHz)
・圧力:100Pa
・電極間隔:20mm
・ガラス基板温度:280℃
・膜厚:20nm
・成膜法:プラズマCVD
・原料ガス:シラン(25sccm)+水素(150sccm)
・電力(周波数):30W(27MHz)
・圧力:66.6Pa
・電極間隔:25mm
・ガラス基板温度:280℃
・膜厚:480nm
比較のため、単結晶シリコン層に結晶性が低いシリコン層を直接形成して固相成長のための加熱処理を行った。なお、本比較例では、結晶性が高いシリコン層と結晶性が低いシリコン層の積層構造に代えて、結晶性が低いシリコン層(膜厚:500nm)を用いているが、それ以外の条件については、上記実施例と同じ条件を採用した。
101 単結晶半導体基板
102 支持基板
103 単結晶半導体基板
103a 単結晶半導体基板
103b 単結晶半導体基板
104 絶縁層
105 脆化層
106 電極
107 保護層
108 不純物半導体層
109 分離基板
110 単結晶半導体層
111A 半導体層
111B 半導体層
112 単結晶半導体層
112A 下層領域
112B 上層領域
114 不純物半導体層
116 補助電極
118 電極
119 パッシベーション層
120 ユニットセル
200 光電変換装置
217 補助電極
219 補助電極
222 不純物半導体層
224 非単結晶半導体層
226 不純物半導体層
230 ユニットセル
232 電極
300 光電変換装置
340 ユニットセル
342 不純物半導体層
344 非単結晶半導体層
346 不純物半導体層
352 電極
353 補助電極
354 補助電極
1026 裏面電極
1027 裏面電極
1028 太陽光発電モジュール
1029 充電制御回路
1030 蓄電池
1031 負荷
2000 イオン源
2001 フィラメント
2002 フィラメント電源
2003 電源制御部
2004 ガス供給部
2005 電極
2006 基板支持部
2007 質量分析管
2008 質量分析計
2017 イオンビーム
Claims (10)
- 単結晶半導体基板にイオンを照射して、前記単結晶半導体基板中に脆化層を形成し、
前記単結晶半導体基板の一表面上に第1の不純物半導体層、第1の電極、及び絶縁層を形成し、
前記絶縁層と支持基板を密着させて前記単結晶半導体基板と前記支持基板を貼り合わせ、
前記脆化層において前記単結晶半導体基板を分離させることにより、前記支持基板上に前記絶縁層、前記第1の電極、前記第1の不純物半導体層及び第1の単結晶半導体層を有する積層体を形成し、
前記第1の単結晶半導体層上に第1の半導体層を形成し、
前記第1の半導体層上に、前記第1の半導体層とは異なる条件による第2の半導体層を形成し、
固相成長により、前記第1の半導体層及び第2の半導体層の結晶性を向上させて、第2の単結晶半導体層を形成し、
前記第2の単結晶半導体層上に、前記第1の不純物半導体層とは逆の導電型の第2の不純物半導体層を形成し、
前記第2の不純物半導体層上に第2の電極を形成することを特徴とする光電変換装置の作製方法。 - 請求項1において、
前記第2の半導体層の結晶性より前記第1の半導体層の結晶性が高くなるように、前記第1の半導体層及び前記第2の半導体層を形成することを特徴とする光電変換装置の作製方法。 - 請求項1又は2において、
前記第2の半導体層の水素濃度より前記第1の半導体層の水素濃度が低くなるように、前記第1の半導体層及び前記第2の半導体層を形成することを特徴とする光電変換装置の作製方法。 - 請求項1乃至3のいずれか一において、
前記第1の半導体層の厚さが10nm以上50nm以下となるように前記第1の半導体層を形成することを特徴とする光電変換装置の作製方法。 - 請求項1乃至4のいずれか一において、
前記イオンとして、水素を含む原料ガスにより生成されるイオンを用いることを特徴とする光電変換装置の作製方法。 - 請求項1乃至5のいずれか一において、
前記第1の単結晶半導体層と前記第2の単結晶半導体層の厚さの合計が800nm以上となるように前記第1の単結晶半導体層と前記第2の単結晶半導体層を形成することを特徴とする光電変換装置の作製方法。 - 請求項1乃至6のいずれか一において、
前記第1の不純物半導体層をp型不純物半導体層とし、
前記第2の不純物半導体層をn型不純物半導体層とすることを特徴とする光電変換装置の作製方法。 - 請求項1乃至7のいずれか一において、
前記第1の半導体層の形成は、シラン系ガスに対する水素ガスの流量比を50倍以上とするプラズマ化学気相成長法により行われることを特徴とする光電変換装置の作製方法。 - 請求項8において、
前記シラン系ガスは、シラン又はジシランであることを特徴とする光電変換装置の作製方法。 - 請求項8又は9において、
前記プラズマ化学気相成長法は、1Pa以上103Pa以下の圧力下で行われることを特徴とする光電変換装置の作製方法。
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JP2012023344A (ja) * | 2010-06-18 | 2012-02-02 | Semiconductor Energy Lab Co Ltd | 光電変換装置及びその作製方法 |
JP2012074675A (ja) * | 2010-08-31 | 2012-04-12 | Univ Of Ryukyus | 半導体装置の製造方法、半導体装置 |
WO2014171146A1 (ja) * | 2013-04-18 | 2014-10-23 | 株式会社 東芝 | 太陽光発電モジュール |
JPWO2014171146A1 (ja) * | 2013-04-18 | 2017-02-16 | 株式会社東芝 | 太陽光発電モジュール |
JP7347350B2 (ja) | 2020-07-10 | 2023-09-20 | 信越半導体株式会社 | エピタキシャル成長条件の設定方法及びエピタキシャルウェーハの製造方法 |
Also Published As
Publication number | Publication date |
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JP5286146B2 (ja) | 2013-09-11 |
KR101512785B1 (ko) | 2015-04-16 |
KR20090113227A (ko) | 2009-10-29 |
CN101567408B (zh) | 2013-08-14 |
CN101567408A (zh) | 2009-10-28 |
TWI478360B (zh) | 2015-03-21 |
TW201003940A (en) | 2010-01-16 |
US7947523B2 (en) | 2011-05-24 |
US20090269875A1 (en) | 2009-10-29 |
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