JP2009142864A - レーザ加工装置、レーザ加工装置の設定方法及びレーザ加工装置の設定プログラム並びにコンピュータで読取可能な記録媒体 - Google Patents
レーザ加工装置、レーザ加工装置の設定方法及びレーザ加工装置の設定プログラム並びにコンピュータで読取可能な記録媒体 Download PDFInfo
- Publication number
- JP2009142864A JP2009142864A JP2007323685A JP2007323685A JP2009142864A JP 2009142864 A JP2009142864 A JP 2009142864A JP 2007323685 A JP2007323685 A JP 2007323685A JP 2007323685 A JP2007323685 A JP 2007323685A JP 2009142864 A JP2009142864 A JP 2009142864A
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- laser
- wavelength conversion
- conversion element
- processing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000012545 processing Methods 0.000 title claims description 126
- 238000000034 method Methods 0.000 title claims description 58
- 238000006243 chemical reaction Methods 0.000 claims abstract description 151
- 238000009529 body temperature measurement Methods 0.000 claims abstract description 15
- 238000012544 monitoring process Methods 0.000 claims abstract description 7
- 230000007613 environmental effect Effects 0.000 claims description 55
- 230000003287 optical effect Effects 0.000 claims description 15
- 238000003860 storage Methods 0.000 claims description 13
- 230000001678 irradiating effect Effects 0.000 claims description 6
- 238000003754 machining Methods 0.000 claims description 3
- 238000005070 sampling Methods 0.000 claims description 3
- 230000005284 excitation Effects 0.000 description 50
- 230000010355 oscillation Effects 0.000 description 20
- 238000004364 calculation method Methods 0.000 description 15
- 230000006870 function Effects 0.000 description 15
- 239000013078 crystal Substances 0.000 description 12
- 238000007639 printing Methods 0.000 description 10
- 238000000605 extraction Methods 0.000 description 8
- 239000013307 optical fiber Substances 0.000 description 8
- 238000007689 inspection Methods 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 238000005259 measurement Methods 0.000 description 5
- 238000012937 correction Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000005086 pumping Methods 0.000 description 4
- 238000004904 shortening Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 239000003550 marker Substances 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 229910052761 rare earth metal Inorganic materials 0.000 description 2
- 150000002910 rare earth metals Chemical class 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 238000009966 trimming Methods 0.000 description 2
- 238000010146 3D printing Methods 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- 229910013641 LiNbO 3 Inorganic materials 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 241000849798 Nita Species 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 230000002457 bidirectional effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000010330 laser marking Methods 0.000 description 1
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- 238000010408 sweeping Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
- B23K26/034—Observing the temperature of the workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/082—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
- B23K26/354—Working by laser beam, e.g. welding, cutting or boring for surface treatment by melting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
- H01S3/109—Frequency multiplication, e.g. harmonic generation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/0401—Arrangements for thermal management of optical elements being part of laser resonator, e.g. windows, mirrors, lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
- H01S3/094049—Guiding of the pump light
- H01S3/094053—Fibre coupled pump, e.g. delivering pump light using a fibre or a fibre bundle
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
- H01S3/0941—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
- H01S3/09415—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode the pumping beam being parallel to the lasing mode of the pumped medium, e.g. end-pumping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1123—Q-switching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/1305—Feedback control systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
- H01S3/1317—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the temperature
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Electromagnetism (AREA)
- Nonlinear Science (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
- Laser Beam Processing (AREA)
- Lasers (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007323685A JP2009142864A (ja) | 2007-12-14 | 2007-12-14 | レーザ加工装置、レーザ加工装置の設定方法及びレーザ加工装置の設定プログラム並びにコンピュータで読取可能な記録媒体 |
| US12/270,152 US7778292B2 (en) | 2007-12-14 | 2008-11-13 | Laser processing apparatus, method for making settings for the laser processing apparatus, program for making settings for the laser processing apparatus, and computer-readable recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007323685A JP2009142864A (ja) | 2007-12-14 | 2007-12-14 | レーザ加工装置、レーザ加工装置の設定方法及びレーザ加工装置の設定プログラム並びにコンピュータで読取可能な記録媒体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009142864A true JP2009142864A (ja) | 2009-07-02 |
| JP2009142864A5 JP2009142864A5 (https=) | 2011-01-06 |
Family
ID=40753189
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007323685A Pending JP2009142864A (ja) | 2007-12-14 | 2007-12-14 | レーザ加工装置、レーザ加工装置の設定方法及びレーザ加工装置の設定プログラム並びにコンピュータで読取可能な記録媒体 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7778292B2 (https=) |
| JP (1) | JP2009142864A (https=) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013065753A (ja) * | 2011-09-20 | 2013-04-11 | Shimadzu Corp | 固体レーザ装置 |
| JP2013065750A (ja) * | 2011-09-20 | 2013-04-11 | Shimadzu Corp | 固体パルスレーザ装置 |
| JP2013074155A (ja) * | 2011-09-28 | 2013-04-22 | Mitsutoyo Corp | 光出力信号の安定化判定方法、及びレーザ周波数安定化装置 |
| JP2019106511A (ja) * | 2017-12-14 | 2019-06-27 | 株式会社キーエンス | レーザ加工装置及びレーザ発振器 |
| JP2019106512A (ja) * | 2017-12-14 | 2019-06-27 | 株式会社キーエンス | レーザ加工装置及びレーザ発振器 |
| JP2019104046A (ja) * | 2017-12-14 | 2019-06-27 | 株式会社キーエンス | レーザ加工装置及びレーザ加工方法 |
| JP2019106513A (ja) * | 2017-12-14 | 2019-06-27 | 株式会社キーエンス | レーザ加工装置 |
| JP6912025B1 (ja) * | 2020-08-26 | 2021-07-28 | 三菱電機株式会社 | 波長変換装置、レーザ発振器及びレーザ加工装置 |
| WO2023105722A1 (ja) * | 2021-12-09 | 2023-06-15 | 日本電信電話株式会社 | 波長変換装置 |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2008114492A1 (ja) * | 2007-03-19 | 2010-07-01 | パナソニック株式会社 | 光出力制御装置及びその制御方法 |
| US8050302B2 (en) * | 2007-12-07 | 2011-11-01 | Panasonic Corporation | Wavelength conversion laser light source, laser light source device and two-dimensional image display device adopting the same, and method of setting temperature of wavelength conversion element |
| DE102010032800A1 (de) * | 2010-07-30 | 2012-02-02 | Isedo Ag | Verfahren und Vorrichtung zum Kalibrieren einer Laserbearbeitungsmaschine |
| JP2013045054A (ja) * | 2011-08-26 | 2013-03-04 | Ushio Inc | レーザ光源装置、及び、レーザ光源装置における波長変換素子の温度制御方法 |
| US9019499B2 (en) * | 2011-09-30 | 2015-04-28 | Corning Incorporated | Tunable light source system and method having wavelength reference capability |
| RU2529053C1 (ru) * | 2013-03-07 | 2014-09-27 | Закрытое акционерное общество "Полупроводниковые приборы" | Драйвер полупроводникового лазера |
| US9048616B1 (en) * | 2013-11-21 | 2015-06-02 | Christie Digital Systems Usa, Inc. | Method, system and apparatus for automatically determining operating conditions of a periodically poled lithium niobate crystal in a laser system |
| US20170014945A1 (en) * | 2015-07-17 | 2017-01-19 | Laserax Inc. | Methods and systems for laser marking an identifier on an industrial product |
| WO2017060967A1 (ja) * | 2015-10-06 | 2017-04-13 | 株式会社島津製作所 | 波長変換装置 |
| US20170242424A1 (en) * | 2016-02-19 | 2017-08-24 | General Electric Company | Laser power monitoring in additive manufacturing |
| JP6840581B2 (ja) * | 2017-03-15 | 2021-03-10 | 株式会社東芝 | 積層造形装置、処理装置、及び積層造形方法 |
| JP6616368B2 (ja) * | 2017-09-14 | 2019-12-04 | ファナック株式会社 | レーザ加工前に光学系の汚染レベルに応じて加工条件を補正するレーザ加工装置 |
| TWI763995B (zh) * | 2019-05-16 | 2022-05-11 | 承賢科技股份有限公司 | 高功率多波長可見光之拉曼雷射 |
| CN115377777B (zh) * | 2021-05-20 | 2025-10-21 | 上海名古屋精密工具股份有限公司 | 激光器控温方法和机加工设备 |
| CN114226957B (zh) * | 2021-11-29 | 2023-05-12 | 北京信息科技大学 | 一种基于多色激光测距的激光骨头精密加工方法及装置 |
| CN115502568B (zh) * | 2022-11-21 | 2023-08-01 | 深圳市创想三维科技股份有限公司 | 激光器的工作方法、装置、计算机存储介质及电子设备 |
| CN116787009B (zh) * | 2023-01-04 | 2026-04-14 | 安庆师范大学 | 一种激光焊接机器人 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1020351A (ja) * | 1996-07-01 | 1998-01-23 | Sony Corp | レーザ光源装置および当該装置の制御方法 |
| JPH1041589A (ja) * | 1996-05-22 | 1998-02-13 | Matsushita Electric Ind Co Ltd | 光源の発振波長安定化装置及び光源の高調波出力安定化装置とそれらを使用した光ディスクシステム |
| JP2001042371A (ja) * | 1999-07-27 | 2001-02-16 | Ushio Sogo Gijutsu Kenkyusho:Kk | 加工用レーザ装置 |
| JP2002158383A (ja) * | 2000-11-17 | 2002-05-31 | Fuji Photo Film Co Ltd | レーザ光源の適正駆動温度を決定するための方法および装置 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW267961B (https=) * | 1993-12-03 | 1996-01-11 | Gins Kk | |
| JP2596639Y2 (ja) * | 1993-12-08 | 1999-06-21 | 株式会社キーエンス | レーザマーキング装置 |
| DE19610717B4 (de) * | 1996-03-19 | 2008-02-21 | Eads Deutschland Gmbh | Verfahren zur Minderung des Amplitudenrauschens von Festkörperlasern mit resonatorinterner Frequenzverdopplung sowie Anordnung zur Durchführung des Verfahrens |
| JP2000202655A (ja) | 1999-01-08 | 2000-07-25 | Toray Eng Co Ltd | レ―ザ―マ―キング装置 |
| JP5132900B2 (ja) * | 2006-06-28 | 2013-01-30 | 株式会社キーエンス | レーザ加工条件設定装置、レーザ加工装置、レーザ加工条件設定方法、レーザ加工条件設定プログラム |
| JP4958489B2 (ja) * | 2006-06-30 | 2012-06-20 | 株式会社キーエンス | レーザ加工装置、レーザ加工条件設定装置、レーザ加工条件設定方法、レーザ加工条件設定プログラム |
| JP4795886B2 (ja) * | 2006-07-27 | 2011-10-19 | 株式会社キーエンス | レーザ加工装置、レーザ加工条件設定装置、レーザ加工条件設定方法、レーザ加工条件設定プログラム |
| JP4956107B2 (ja) * | 2006-09-15 | 2012-06-20 | 株式会社キーエンス | レーザ加工データ生成装置、レーザ加工データ生成方法、コンピュータプログラム及びレーザマーキングシステム |
| US7813404B2 (en) * | 2007-03-15 | 2010-10-12 | Keyence Corporation | Laser processing apparatus and solid laser resonator |
-
2007
- 2007-12-14 JP JP2007323685A patent/JP2009142864A/ja active Pending
-
2008
- 2008-11-13 US US12/270,152 patent/US7778292B2/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1041589A (ja) * | 1996-05-22 | 1998-02-13 | Matsushita Electric Ind Co Ltd | 光源の発振波長安定化装置及び光源の高調波出力安定化装置とそれらを使用した光ディスクシステム |
| JPH1020351A (ja) * | 1996-07-01 | 1998-01-23 | Sony Corp | レーザ光源装置および当該装置の制御方法 |
| JP2001042371A (ja) * | 1999-07-27 | 2001-02-16 | Ushio Sogo Gijutsu Kenkyusho:Kk | 加工用レーザ装置 |
| JP2002158383A (ja) * | 2000-11-17 | 2002-05-31 | Fuji Photo Film Co Ltd | レーザ光源の適正駆動温度を決定するための方法および装置 |
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013065753A (ja) * | 2011-09-20 | 2013-04-11 | Shimadzu Corp | 固体レーザ装置 |
| JP2013065750A (ja) * | 2011-09-20 | 2013-04-11 | Shimadzu Corp | 固体パルスレーザ装置 |
| JP2013074155A (ja) * | 2011-09-28 | 2013-04-22 | Mitsutoyo Corp | 光出力信号の安定化判定方法、及びレーザ周波数安定化装置 |
| JP7169062B2 (ja) | 2017-12-14 | 2022-11-10 | 株式会社キーエンス | レーザ加工装置及びレーザ発振器 |
| JP2019106512A (ja) * | 2017-12-14 | 2019-06-27 | 株式会社キーエンス | レーザ加工装置及びレーザ発振器 |
| JP2019104046A (ja) * | 2017-12-14 | 2019-06-27 | 株式会社キーエンス | レーザ加工装置及びレーザ加工方法 |
| JP2019106513A (ja) * | 2017-12-14 | 2019-06-27 | 株式会社キーエンス | レーザ加工装置 |
| CN109967884A (zh) * | 2017-12-14 | 2019-07-05 | 株式会社基恩士 | 激光加工装置和激光加工方法 |
| CN109967884B (zh) * | 2017-12-14 | 2022-06-14 | 株式会社基恩士 | 激光加工装置和激光加工方法 |
| JP7169063B2 (ja) | 2017-12-14 | 2022-11-10 | 株式会社キーエンス | レーザ加工装置及びレーザ発振器 |
| JP2019106511A (ja) * | 2017-12-14 | 2019-06-27 | 株式会社キーエンス | レーザ加工装置及びレーザ発振器 |
| JP6912025B1 (ja) * | 2020-08-26 | 2021-07-28 | 三菱電機株式会社 | 波長変換装置、レーザ発振器及びレーザ加工装置 |
| WO2022044144A1 (ja) * | 2020-08-26 | 2022-03-03 | 三菱電機株式会社 | 波長変換装置、レーザ発振器及びレーザ加工装置 |
| WO2023105722A1 (ja) * | 2021-12-09 | 2023-06-15 | 日本電信電話株式会社 | 波長変換装置 |
| JPWO2023105722A1 (https=) * | 2021-12-09 | 2023-06-15 | ||
| JP7758968B2 (ja) | 2021-12-09 | 2025-10-23 | Ntt株式会社 | 波長変換装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20090154509A1 (en) | 2009-06-18 |
| US7778292B2 (en) | 2010-08-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2009142864A (ja) | レーザ加工装置、レーザ加工装置の設定方法及びレーザ加工装置の設定プログラム並びにコンピュータで読取可能な記録媒体 | |
| JP5314275B2 (ja) | レーザ加工装置、レーザ加工装置の異常検知方法 | |
| JP5203573B2 (ja) | レーザ加工装置 | |
| JP2007019361A (ja) | 周波数安定化レーザ | |
| US10505336B2 (en) | Laser adjustment method and laser source device | |
| US6002696A (en) | Laser apparatus and method of controlling the same | |
| JP2011137898A (ja) | レーザの制御方法及びレーザ制御装置 | |
| US20090251766A1 (en) | Wavelength converter | |
| JP3744959B2 (ja) | 第2高調波発生方法 | |
| JP4976892B2 (ja) | レーザマーカ | |
| JP2002158383A (ja) | レーザ光源の適正駆動温度を決定するための方法および装置 | |
| JPH1020351A (ja) | レーザ光源装置および当該装置の制御方法 | |
| JP5036355B2 (ja) | レーザマーカ | |
| JP5621739B2 (ja) | 固体レーザ装置 | |
| JP6273716B2 (ja) | 固体レーザ装置 | |
| JP2002158382A (ja) | レーザ光源の適正駆動温度を決定するための方法および装置 | |
| JP2011118012A (ja) | レーザ光源装置 | |
| JP4178188B2 (ja) | 固体レーザ装置 | |
| JP5875251B2 (ja) | 半導体レーザ励起固体レーザ装置の製造方法 | |
| JP5087919B2 (ja) | 半導体レーザ励起固体レーザを用いたレーザポインタ | |
| JP2000228552A (ja) | 固体レーザ装置 | |
| JP3119810U (ja) | 半導体レーザ励起固体レーザ装置 | |
| JP3670397B2 (ja) | レーザ測量装置 | |
| JP2008130848A (ja) | レーザ周波数安定化装置、及びレーザ周波数安定化方法 | |
| JP2016181184A (ja) | 制御装置、光学装置、制御方法及びプログラム |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20101112 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20101112 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120515 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20120517 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20120918 |