JP2009094183A5 - - Google Patents

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Publication number
JP2009094183A5
JP2009094183A5 JP2007261620A JP2007261620A JP2009094183A5 JP 2009094183 A5 JP2009094183 A5 JP 2009094183A5 JP 2007261620 A JP2007261620 A JP 2007261620A JP 2007261620 A JP2007261620 A JP 2007261620A JP 2009094183 A5 JP2009094183 A5 JP 2009094183A5
Authority
JP
Japan
Prior art keywords
porous membrane
gas
substrate
hydrophobic porous
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007261620A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009094183A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2007261620A priority Critical patent/JP2009094183A/ja
Priority claimed from JP2007261620A external-priority patent/JP2009094183A/ja
Priority to US12/680,275 priority patent/US8273410B2/en
Priority to PCT/JP2008/002714 priority patent/WO2009044529A1/ja
Priority to EP08836263A priority patent/EP2197024A4/en
Priority to CN200880110373A priority patent/CN101821838A/zh
Priority to KR1020107005825A priority patent/KR101125171B1/ko
Priority to TW097137911A priority patent/TW200929359A/zh
Publication of JP2009094183A publication Critical patent/JP2009094183A/ja
Publication of JP2009094183A5 publication Critical patent/JP2009094183A5/ja
Pending legal-status Critical Current

Links

JP2007261620A 2007-10-05 2007-10-05 疎水化多孔質膜の製造方法 Pending JP2009094183A (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2007261620A JP2009094183A (ja) 2007-10-05 2007-10-05 疎水化多孔質膜の製造方法
US12/680,275 US8273410B2 (en) 2007-10-05 2008-09-29 Process for manufacturing hydrophobized microporous film
PCT/JP2008/002714 WO2009044529A1 (ja) 2007-10-05 2008-09-29 疎水化多孔質膜の製造方法
EP08836263A EP2197024A4 (en) 2007-10-05 2008-09-29 METHOD FOR PRODUCING A WATER-RESISTANT POROUS FILM
CN200880110373A CN101821838A (zh) 2007-10-05 2008-09-29 制造疏水化多孔膜的方法
KR1020107005825A KR101125171B1 (ko) 2007-10-05 2008-09-29 소수화 다공질막의 제조방법
TW097137911A TW200929359A (en) 2007-10-05 2008-10-02 Method for manufacturing hydrophobized porous membrane

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007261620A JP2009094183A (ja) 2007-10-05 2007-10-05 疎水化多孔質膜の製造方法

Publications (2)

Publication Number Publication Date
JP2009094183A JP2009094183A (ja) 2009-04-30
JP2009094183A5 true JP2009094183A5 (enExample) 2010-07-08

Family

ID=40525961

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007261620A Pending JP2009094183A (ja) 2007-10-05 2007-10-05 疎水化多孔質膜の製造方法

Country Status (7)

Country Link
US (1) US8273410B2 (enExample)
EP (1) EP2197024A4 (enExample)
JP (1) JP2009094183A (enExample)
KR (1) KR101125171B1 (enExample)
CN (1) CN101821838A (enExample)
TW (1) TW200929359A (enExample)
WO (1) WO2009044529A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5582710B2 (ja) * 2009-03-24 2014-09-03 ルネサスエレクトロニクス株式会社 半導体装置の製造方法
US8617993B2 (en) * 2010-02-01 2013-12-31 Lam Research Corporation Method of reducing pattern collapse in high aspect ratio nanostructures
TWI461302B (zh) * 2012-09-14 2014-11-21 Univ Nat Taiwan Normal A hydrophobic layer, a method of making the same, a method for producing a hydrophobic layer, and a mold
CN109962026B (zh) * 2017-12-26 2022-04-19 无锡华润上华科技有限公司 一种晶圆的预处理方法及光刻方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0261620A (ja) 1988-08-29 1990-03-01 Hitachi Ltd 液晶表示装置
JPH027A (ja) 1989-01-04 1990-01-05 Fuji Photo Film Co Ltd カメラの測距装置
US6448331B1 (en) * 1997-07-15 2002-09-10 Asahi Kasei Kabushiki Kaisha Alkoxysilane/organic polymer composition for thin insulating film production and use thereof
KR100334150B1 (ko) * 1997-07-15 2002-04-25 야마모토 카즈모토 절연 박막 제조용 알콕시실란/유기 중합체 조성물 및 이의용도
US6395651B1 (en) * 1998-07-07 2002-05-28 Alliedsignal Simplified process for producing nanoporous silica
EP1124252A2 (en) * 2000-02-10 2001-08-16 Applied Materials, Inc. Apparatus and process for processing substrates
TWI273090B (en) * 2002-09-09 2007-02-11 Mitsui Chemicals Inc Method for modifying porous film, modified porous film and use of same
US20040096586A1 (en) * 2002-11-15 2004-05-20 Schulberg Michelle T. System for deposition of mesoporous materials
WO2005008762A1 (ja) * 2003-07-17 2005-01-27 Rorze Corporation 低誘電率膜、及びその製造方法、並びにそれを用いた電子部品
WO2005034194A2 (en) 2003-10-08 2005-04-14 Honeywell International Inc. Repairing damage to low-k dielectric materials using silylating agents
JP3666751B2 (ja) * 2003-11-28 2005-06-29 東京エレクトロン株式会社 絶縁膜の形成方法及び絶縁膜形成システム
US7088003B2 (en) * 2004-02-19 2006-08-08 International Business Machines Corporation Structures and methods for integration of ultralow-k dielectrics with improved reliability
JP2005272188A (ja) * 2004-03-23 2005-10-06 Mitsui Chemicals Inc 疎水化多孔質シリカの製造方法、疎水化多孔質シリカおよび疎水化多孔質シリカ薄膜
JP4412244B2 (ja) * 2005-06-27 2010-02-10 株式会社デンソー エンジン始動制御装置
JP4623520B2 (ja) * 2006-04-10 2011-02-02 株式会社神戸製鋼所 多孔質膜の製造方法及びその方法によって製造された多孔質膜
JP5303954B2 (ja) * 2008-02-15 2013-10-02 東京エレクトロン株式会社 疎水化処理方法、疎水化処理装置、塗布、現像装置及び記憶媒体

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