JP2009082936A - 微細加工用超硬材料工具 - Google Patents
微細加工用超硬材料工具 Download PDFInfo
- Publication number
- JP2009082936A JP2009082936A JP2007253825A JP2007253825A JP2009082936A JP 2009082936 A JP2009082936 A JP 2009082936A JP 2007253825 A JP2007253825 A JP 2007253825A JP 2007253825 A JP2007253825 A JP 2007253825A JP 2009082936 A JP2009082936 A JP 2009082936A
- Authority
- JP
- Japan
- Prior art keywords
- tool
- tungsten oxide
- cemented carbide
- thin film
- carbide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000003754 machining Methods 0.000 title claims abstract description 15
- 239000000463 material Substances 0.000 claims abstract description 30
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910001930 tungsten oxide Inorganic materials 0.000 claims abstract description 16
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 claims abstract description 11
- 230000003647 oxidation Effects 0.000 claims abstract description 10
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 10
- 239000010409 thin film Substances 0.000 claims abstract description 9
- 239000003054 catalyst Substances 0.000 claims abstract description 7
- 238000004080 punching Methods 0.000 claims abstract description 7
- 239000013078 crystal Substances 0.000 claims abstract description 6
- 238000005452 bending Methods 0.000 claims abstract description 5
- 230000000694 effects Effects 0.000 claims abstract description 4
- 238000005459 micromachining Methods 0.000 claims description 10
- 229910001111 Fine metal Inorganic materials 0.000 claims 1
- 239000002923 metal particle Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 8
- 239000002105 nanoparticle Substances 0.000 abstract description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract description 5
- 239000010931 gold Substances 0.000 abstract description 5
- 229910052737 gold Inorganic materials 0.000 abstract description 5
- VVRQVWSVLMGPRN-UHFFFAOYSA-N oxotungsten Chemical group [W]=O VVRQVWSVLMGPRN-UHFFFAOYSA-N 0.000 description 13
- 238000000034 method Methods 0.000 description 8
- 239000002245 particle Substances 0.000 description 5
- 229910017052 cobalt Inorganic materials 0.000 description 4
- 239000010941 cobalt Substances 0.000 description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000005468 ion implantation Methods 0.000 description 3
- 238000007733 ion plating Methods 0.000 description 3
- 239000002159 nanocrystal Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000000443 aerosol Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005121 nitriding Methods 0.000 description 2
- 238000010301 surface-oxidation reaction Methods 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000005255 carburizing Methods 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000007723 die pressing method Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21D—WORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS OR PROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21D37/00—Tools as parts of machines covered by this subclass
- B21D37/01—Selection of materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/38—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
- B01J23/48—Silver or gold
- B01J23/52—Gold
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/76—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
- B01J23/84—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36 with arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J23/85—Chromium, molybdenum or tungsten
- B01J23/888—Tungsten
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J27/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
- B01J27/20—Carbon compounds
- B01J27/22—Carbides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/34—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
- B01J37/341—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation
- B01J37/347—Ionic or cathodic spraying; Electric discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Plasma & Fusion (AREA)
- Toxicology (AREA)
- Metallurgy (AREA)
- Mounting, Exchange, And Manufacturing Of Dies (AREA)
- Catalysts (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Perforating, Stamping-Out Or Severing By Means Other Than Cutting (AREA)
Abstract
【解決手段】微細加工用超硬材料工具は、加工工具部の材料が炭化タングステンを主材料とした超硬材料からなり、その表面に20nm以上200nm以下の厚さを持つ酸化タングステン5を主材料とした薄膜構造2を持たせ、酸化タングステン5を主材料とした薄膜構造2は、単結晶、多結晶構造及びアモルファス構造6のいずれか1つ、又は単結晶、多結晶構造及びアモルファス構造6の混合状態からなり、酸化タングステンを主材料とした薄膜構造は、酸化触媒効果を持つ金ナノ粒子7を含有し、打ち抜き用金型工具、絞り用金型工具、曲げ用金型工具のいずれかとして使用される。
【選択図】図2
Description
上記酸化タングステン構造2を超硬合金工具1の表面に形成し、直径0.15mmの丸穴打ち抜き用パンチに形成してなる本発明の微細加工用超硬材料工具を用意した。また、比較例として、超硬合金工具1の表面に酸化タングステン構造2を表面に形成されていないが、直径0.15mmの丸穴打ち抜き用パンチに形成してなる微細加工用超硬材料工具を用意した。
2 酸化タングステン構造
3 炭化タングステンの粒子
4 バインダーとしてのコバルト
5 酸化タングステンナノ結晶の領域
6 アモルファス状の領域
7 金ナノ粒子
Claims (4)
- 加工工具部の材料が炭化タングステンを主材料とした超硬材料からなり、その表面に20nm以上200nm以下の厚さを持つ酸化タングステンを主材料とした薄膜構造を持たせたことを特徴とする微細加工用超硬材料工具。
- 打ち抜き用金型工具、絞り用金型工具、曲げ用金型工具のいずれかとして使用され、その最小加工形状寸法が0.2mm以下であることを特徴とする請求項1に記載の微細加工用超硬材料工具。
- 前記酸化タングステンを主材料とした薄膜構造は、単結晶、多結晶構造及びアモルファス構造のいずれか1つ、又は単結晶、多結晶構造及びアモルファス構造の混合状態からなることを特徴とする請求項1又は2に記載の微細加工用超硬材料工具。
- 前記酸化タングステンを主材料とした薄膜構造は、酸化触媒効果を持つ金属微粒子を含有することを特徴とする請求項1、2又は3に記載の微細加工用超硬材料工具。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007253825A JP4941987B2 (ja) | 2007-09-28 | 2007-09-28 | 微細加工用超硬材料工具 |
PCT/JP2008/067148 WO2009041412A1 (ja) | 2007-09-28 | 2008-09-24 | 微細加工用超硬材料工具 |
KR1020107007143A KR20100050571A (ko) | 2007-09-28 | 2008-09-24 | 미세 가공용 초경 재료 공구 |
DE112008002629T DE112008002629T5 (de) | 2007-09-28 | 2008-09-24 | Hartmetallwerkzeug für die Mikrobearbeitung |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007253825A JP4941987B2 (ja) | 2007-09-28 | 2007-09-28 | 微細加工用超硬材料工具 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009082936A true JP2009082936A (ja) | 2009-04-23 |
JP4941987B2 JP4941987B2 (ja) | 2012-05-30 |
Family
ID=40511296
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007253825A Expired - Fee Related JP4941987B2 (ja) | 2007-09-28 | 2007-09-28 | 微細加工用超硬材料工具 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4941987B2 (ja) |
KR (1) | KR20100050571A (ja) |
DE (1) | DE112008002629T5 (ja) |
WO (1) | WO2009041412A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011224692A (ja) * | 2010-04-17 | 2011-11-10 | Mitsubishi Materials Corp | 表面被覆切削工具 |
KR20190127701A (ko) * | 2017-03-13 | 2019-11-13 | 미쓰비시 마테리알 가부시키가이샤 | 경질 소결체 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0419016A (ja) * | 1990-05-09 | 1992-01-23 | Takahisa Masuzawa | パルス電流による電解加工法及びその装置 |
JP2004230314A (ja) * | 2003-01-31 | 2004-08-19 | Japan Atom Energy Res Inst | 貴金属被覆光触媒 |
JP2005212002A (ja) * | 2004-01-28 | 2005-08-11 | National Institute Of Advanced Industrial & Technology | 加工物品の製造方法 |
WO2006019128A1 (ja) * | 2004-08-19 | 2006-02-23 | Japan Science And Technology Agency | 金属酸化物電極触媒 |
JP2007041259A (ja) * | 2005-08-03 | 2007-02-15 | Fujifilm Holdings Corp | エレクトロクロミック表示素子 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5189841A (ja) | 1975-02-04 | 1976-08-06 | Chokogokinnoionchitsukashorihoho | |
JP4215317B2 (ja) | 1998-11-12 | 2009-01-28 | 住友電工ハードメタル株式会社 | Icリードフレーム用切断刃およびその製造方法 |
JP2002201033A (ja) * | 2000-12-28 | 2002-07-16 | Canon Inc | 光学素子成形用型 |
JP3994161B2 (ja) | 2003-08-28 | 2007-10-17 | 独立行政法人物質・材料研究機構 | 単結晶酸化タングステンナノチューブとその製造方法 |
JP4430509B2 (ja) | 2004-10-20 | 2010-03-10 | 住友金属鉱山伸銅株式会社 | 圧延銅箔 |
JP2007039401A (ja) | 2005-08-04 | 2007-02-15 | Biosums:Kk | 遺体の表情の修復方法 |
JP4435098B2 (ja) | 2006-02-08 | 2010-03-17 | 日本電信電話株式会社 | 無線通信装置および無線通信方法 |
-
2007
- 2007-09-28 JP JP2007253825A patent/JP4941987B2/ja not_active Expired - Fee Related
-
2008
- 2008-09-24 WO PCT/JP2008/067148 patent/WO2009041412A1/ja active Application Filing
- 2008-09-24 KR KR1020107007143A patent/KR20100050571A/ko not_active Application Discontinuation
- 2008-09-24 DE DE112008002629T patent/DE112008002629T5/de not_active Ceased
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0419016A (ja) * | 1990-05-09 | 1992-01-23 | Takahisa Masuzawa | パルス電流による電解加工法及びその装置 |
JP2004230314A (ja) * | 2003-01-31 | 2004-08-19 | Japan Atom Energy Res Inst | 貴金属被覆光触媒 |
JP2005212002A (ja) * | 2004-01-28 | 2005-08-11 | National Institute Of Advanced Industrial & Technology | 加工物品の製造方法 |
WO2006019128A1 (ja) * | 2004-08-19 | 2006-02-23 | Japan Science And Technology Agency | 金属酸化物電極触媒 |
JP2007041259A (ja) * | 2005-08-03 | 2007-02-15 | Fujifilm Holdings Corp | エレクトロクロミック表示素子 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011224692A (ja) * | 2010-04-17 | 2011-11-10 | Mitsubishi Materials Corp | 表面被覆切削工具 |
KR20190127701A (ko) * | 2017-03-13 | 2019-11-13 | 미쓰비시 마테리알 가부시키가이샤 | 경질 소결체 |
US11313017B2 (en) * | 2017-03-13 | 2022-04-26 | Mitsubishi Materials Corporation | Hard sintered body |
KR102419945B1 (ko) | 2017-03-13 | 2022-07-11 | 미쓰비시 마테리알 가부시키가이샤 | 경질 소결체 |
Also Published As
Publication number | Publication date |
---|---|
JP4941987B2 (ja) | 2012-05-30 |
KR20100050571A (ko) | 2010-05-13 |
DE112008002629T5 (de) | 2010-11-04 |
WO2009041412A1 (ja) | 2009-04-02 |
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