JP2009076497A5 - - Google Patents

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Publication number
JP2009076497A5
JP2009076497A5 JP2007241375A JP2007241375A JP2009076497A5 JP 2009076497 A5 JP2009076497 A5 JP 2009076497A5 JP 2007241375 A JP2007241375 A JP 2007241375A JP 2007241375 A JP2007241375 A JP 2007241375A JP 2009076497 A5 JP2009076497 A5 JP 2009076497A5
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JP
Japan
Prior art keywords
wiring pattern
metal layer
semiconductor
forming
support plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007241375A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009076497A (ja
JP5064158B2 (ja
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Publication date
Application filed filed Critical
Priority claimed from JP2007241375A external-priority patent/JP5064158B2/ja
Priority to JP2007241375A priority Critical patent/JP5064158B2/ja
Priority to KR1020080089605A priority patent/KR20090029646A/ko
Priority to TW097135581A priority patent/TW200917365A/zh
Priority to US12/212,171 priority patent/US7615408B2/en
Priority to EP08164619.2A priority patent/EP2040294B1/en
Priority to CNA2008101612052A priority patent/CN101393877A/zh
Publication of JP2009076497A publication Critical patent/JP2009076497A/ja
Publication of JP2009076497A5 publication Critical patent/JP2009076497A5/ja
Publication of JP5064158B2 publication Critical patent/JP5064158B2/ja
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2007241375A 2007-09-18 2007-09-18 半導体装置とその製造方法 Expired - Fee Related JP5064158B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2007241375A JP5064158B2 (ja) 2007-09-18 2007-09-18 半導体装置とその製造方法
KR1020080089605A KR20090029646A (ko) 2007-09-18 2008-09-11 반도체 장치의 제조 방법
TW097135581A TW200917365A (en) 2007-09-18 2008-09-17 Method of manufacturing semiconductor device
US12/212,171 US7615408B2 (en) 2007-09-18 2008-09-17 Method of manufacturing semiconductor device
EP08164619.2A EP2040294B1 (en) 2007-09-18 2008-09-18 Method of manufacturing a semiconductor device
CNA2008101612052A CN101393877A (zh) 2007-09-18 2008-09-18 制造半导体器件的方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007241375A JP5064158B2 (ja) 2007-09-18 2007-09-18 半導体装置とその製造方法

Publications (3)

Publication Number Publication Date
JP2009076497A JP2009076497A (ja) 2009-04-09
JP2009076497A5 true JP2009076497A5 (enrdf_load_stackoverflow) 2010-09-02
JP5064158B2 JP5064158B2 (ja) 2012-10-31

Family

ID=40227776

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007241375A Expired - Fee Related JP5064158B2 (ja) 2007-09-18 2007-09-18 半導体装置とその製造方法

Country Status (6)

Country Link
US (1) US7615408B2 (enrdf_load_stackoverflow)
EP (1) EP2040294B1 (enrdf_load_stackoverflow)
JP (1) JP5064158B2 (enrdf_load_stackoverflow)
KR (1) KR20090029646A (enrdf_load_stackoverflow)
CN (1) CN101393877A (enrdf_load_stackoverflow)
TW (1) TW200917365A (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102246605B (zh) * 2008-12-16 2013-08-07 株式会社村田制作所 电路模块
JP5160498B2 (ja) * 2009-05-20 2013-03-13 ルネサスエレクトロニクス株式会社 半導体装置
JP2011258867A (ja) * 2010-06-11 2011-12-22 Casio Comput Co Ltd 半導体装置及びその製造方法
CN103205701A (zh) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 蒸镀掩模板及其制作方法
US9235674B2 (en) * 2013-03-05 2016-01-12 Oracle International Corporation Mitigating electromigration effects using parallel pillars
WO2016179023A1 (en) * 2015-05-01 2016-11-10 Adarza Biosystems, Inc. Methods and devices for the high-volume production of silicon chips with uniform anti-reflective coatings
US11056410B2 (en) * 2017-03-31 2021-07-06 National Institute Of Advanced Industrial Science And Technology Method of manufacturing semiconductor package using alignment mark on wafer
CN116504645A (zh) * 2023-05-04 2023-07-28 无锡广芯封装基板有限公司 一种封装基板及其制作方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0734059B1 (en) 1995-03-24 2005-11-09 Shinko Electric Industries Co., Ltd. Chip sized semiconductor device and a process for making it
JP2843315B1 (ja) * 1997-07-11 1999-01-06 株式会社日立製作所 半導体装置およびその製造方法
US20040061220A1 (en) * 1996-03-22 2004-04-01 Chuichi Miyazaki Semiconductor device and manufacturing method thereof
JPH10256306A (ja) 1997-03-12 1998-09-25 Hitachi Chem Co Ltd 回路板の製造法
US20030001286A1 (en) * 2000-01-28 2003-01-02 Ryoichi Kajiwara Semiconductor package and flip chip bonding method therein
JP3732378B2 (ja) * 2000-03-03 2006-01-05 新光電気工業株式会社 半導体装置の製造方法
JP3638250B2 (ja) * 2000-10-11 2005-04-13 シャープ株式会社 アライメントマークおよび半導体装置の製造方法
JP3614828B2 (ja) * 2002-04-05 2005-01-26 沖電気工業株式会社 チップサイズパッケージの製造方法
JP2004193497A (ja) * 2002-12-13 2004-07-08 Nec Electronics Corp チップサイズパッケージおよびその製造方法
TWI221330B (en) * 2003-08-28 2004-09-21 Phoenix Prec Technology Corp Method for fabricating thermally enhanced semiconductor device
US8067823B2 (en) 2004-11-15 2011-11-29 Stats Chippac, Ltd. Chip scale package having flip chip interconnect on die paddle
JP2006013533A (ja) * 2005-07-28 2006-01-12 Oki Electric Ind Co Ltd 半導体装置
JP2008108849A (ja) 2006-10-24 2008-05-08 Shinko Electric Ind Co Ltd 半導体装置および半導体装置の製造方法
JP2008235555A (ja) 2007-03-20 2008-10-02 Shinko Electric Ind Co Ltd 電子装置の製造方法及び基板及び半導体装置

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