JP2009028679A - Pを含有する処理液の廃液濃度制御方法 - Google Patents
Pを含有する処理液の廃液濃度制御方法 Download PDFInfo
- Publication number
- JP2009028679A JP2009028679A JP2007197268A JP2007197268A JP2009028679A JP 2009028679 A JP2009028679 A JP 2009028679A JP 2007197268 A JP2007197268 A JP 2007197268A JP 2007197268 A JP2007197268 A JP 2007197268A JP 2009028679 A JP2009028679 A JP 2009028679A
- Authority
- JP
- Japan
- Prior art keywords
- concentration
- waste liquid
- liquid
- waste
- buffer tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/26—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/008—Control or steering systems not provided for elsewhere in subclass C02F
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/10—Inorganic compounds
- C02F2101/105—Phosphorus compounds
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/16—Nature of the water, waste water, sewage or sludge to be treated from metallurgical processes, i.e. from the production, refining or treatment of metals, e.g. galvanic wastes
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B7/00—Working up raw materials other than ores, e.g. scrap, to produce non-ferrous metals and compounds thereof; Methods of a general interest or applied to the winning of more than two metals
- C22B7/006—Wet processes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Removal Of Specific Substances (AREA)
- Coating With Molten Metal (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
【解決手段】Pを含有する処理液の廃液を受け入れた後廃水処理場への送液又は廃液の貯留が可能な廃液バッファータンクを備えて、Pを含有する処理液の濃度を目標濃度範囲内にして被処理物を処理し、廃液バッファータンクでPを含有する処理液の廃液のP濃度を測定し、P濃度の測定値が許容上限未満のときは、Pを含有する処理液の廃液を廃液バッファータンクから廃水処理場に送液し、P濃度の測定値が許容上限以上のときは、Pを含有する処理液の廃液を廃水処理場に送液するのを停止して廃液バッファータンクに貯留し、かつPを含有する処理液の濃度を目標濃度範囲内の値に低下させて被処理物を処理する。
【選択図】図2
Description
(1)表面調整装置
表面調整液P濃度:10massppm(目標濃度中央値)±5massppm(目標範囲)
目標下限値CL:5massppm
表面調整液流量:5m3/Hr
(2)水洗装置
純水流量:5m3/Hr
(3)廃液バッファータンク
容量:100m3
タンク容量100m3は、表面調整処理必要材と不要材の処理を考慮した約10時間の操業が可能となる容量である。
2 表面調整装置
3 水洗装置
4 ドライヤー
5 廃水ピット
6 廃液バッファータンク
7 表調タンク
11 表調原液補給タンク
12、15 純水供給管
13、16 スプレー装置
14、17 P濃度計
18 ドレン管
21〜24 ポンプ
25 リンガーロール
Claims (3)
- 廃水処理場に送液するPを含有する処理液の廃液のP濃度を制御する方法において、Pを含有する処理液の廃液を受け入れた後廃水処理場への送液又は廃液の貯留が可能な廃液バッファータンクを備えて、Pを含有する処理液の濃度を目標濃度範囲内にして被処理物を処理し、廃液バッファータンクでPを含有する処理液の廃液のP濃度を測定し、P濃度の測定値が許容上限未満のときは、Pを含有する処理液の廃液を廃液バッファータンクから廃水処理場に送液し、P濃度の測定値が許容上限以上のときは、Pを含有する処理液の廃液を廃水処理場に送液するのを停止して廃液バッファータンクに貯留し、かつPを含有する処理液の濃度を目標濃度範囲内の値に低下させて被処理物を処理することを特徴とするPを含有する処理液の廃液濃度制御方法。
- 請求項1において、廃液バッファータンクに貯留されるPを含有する処理液の廃液のP濃度の測定値が許容上限未満になったら、廃液バッファータンクから廃水処理場へのPを含有する処理液の廃液の送液を行うことを特徴とする請求項1に記載のPを含有する処理液の廃液濃度制御方法。
- 廃液バッファータンクから廃水処理場へのPを含有する処理液の廃液の送液を開始したらPを含有する処理液のP濃度を目標範囲内の値に上昇させることを特徴とする請求項2に記載のPを含有する処理液の廃液濃度制御方法。
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007197268A JP5186826B2 (ja) | 2007-07-30 | 2007-07-30 | Pを含有する処理液の廃液濃度制御方法 |
PCT/JP2008/063711 WO2009017178A1 (ja) | 2007-07-30 | 2008-07-24 | Pを含有する処理液の廃液濃度制御方法 |
KR1020127027710A KR101342177B1 (ko) | 2007-07-30 | 2008-07-24 | P를 함유하는 처리액의 폐액농도 제어방법 |
US12/667,270 US8435413B2 (en) | 2007-07-30 | 2008-07-24 | Method for controlling a waste water concentration of cleaning solution containing phosphorus |
EP20080791941 EP2179970B1 (en) | 2007-07-30 | 2008-07-24 | Method of controlling concentration of p-containing treatment liquid waste |
CN2008800229210A CN101687667B (zh) | 2007-07-30 | 2008-07-24 | 含有p的处理液的废液浓度控制方法 |
KR20097023764A KR101311063B1 (ko) | 2007-07-30 | 2008-07-24 | P를 함유하는 처리액의 폐액농도 제어방법 |
TW97128387A TWI409225B (zh) | 2007-07-30 | 2008-07-25 | 含磷處理液之廢液濃度控制方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007197268A JP5186826B2 (ja) | 2007-07-30 | 2007-07-30 | Pを含有する処理液の廃液濃度制御方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009028679A true JP2009028679A (ja) | 2009-02-12 |
JP5186826B2 JP5186826B2 (ja) | 2013-04-24 |
Family
ID=40304408
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007197268A Expired - Fee Related JP5186826B2 (ja) | 2007-07-30 | 2007-07-30 | Pを含有する処理液の廃液濃度制御方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8435413B2 (ja) |
EP (1) | EP2179970B1 (ja) |
JP (1) | JP5186826B2 (ja) |
KR (2) | KR101342177B1 (ja) |
CN (1) | CN101687667B (ja) |
TW (1) | TWI409225B (ja) |
WO (1) | WO2009017178A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8931682B2 (en) | 2007-06-04 | 2015-01-13 | Ethicon Endo-Surgery, Inc. | Robotically-controlled shaft based rotary drive systems for surgical instruments |
CN104458824A (zh) * | 2014-12-23 | 2015-03-25 | 冠礼控制科技(上海)有限公司 | 高精度浓度计及其测量方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS5033132A (ja) * | 1973-07-28 | 1975-03-31 | ||
JP2000176434A (ja) * | 1998-12-11 | 2000-06-27 | Tokyo Electron Ltd | 排水処理装置および方法 |
JP2001049413A (ja) * | 1999-08-02 | 2001-02-20 | Nippon Steel Corp | 溶融亜鉛めっき鋼板及びその製造方法 |
JP2003033771A (ja) * | 2001-07-24 | 2003-02-04 | Ebara Corp | 異常検知機構を有する排水消毒装置 |
JP2006169572A (ja) * | 2004-12-14 | 2006-06-29 | Nippon Steel Corp | 鋼板のボンデ処理装置及びボンデ処理装置における水洗廃水の再利用方法 |
Family Cites Families (14)
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DK167891D0 (da) | 1991-10-01 | 1991-10-01 | Krueger I Systems As | Fremgangsmaade til styring af spildevandsrensningsanlaeg under anvendelse af mutible styringsfunktioner |
JP2682433B2 (ja) | 1994-04-01 | 1997-11-26 | 日本軽金属株式会社 | アルミニウム材の表面処理における廃液処理方法 |
JP3679942B2 (ja) | 1999-02-26 | 2005-08-03 | 株式会社東芝 | 処理水質制御装置 |
DE19921135A1 (de) * | 1999-05-07 | 2000-11-09 | Henkel Kgaa | Verfahren zur nickelarmen Zinkphoshatierung mit anschließender Wasserbehandlung |
JP3491023B2 (ja) | 2000-12-28 | 2004-01-26 | 独立行政法人産業技術総合研究所 | 亜鉛及び鉄を含む酸廃液の処理方法及び処理剤 |
TWI298712B (en) * | 2002-05-22 | 2008-07-11 | Ebara Corp | Method and apparatus for treating organic wastewater capable of recovering phosphorus |
KR100537049B1 (ko) * | 2003-03-07 | 2005-12-16 | 윤선숙 | 내·외장 2단 침전지형 활성슬러지법에 의한 하수 및 오·폐수처리장치 및 방법 |
KR101259907B1 (ko) * | 2003-04-11 | 2013-05-02 | 홍상헌 | 다중 원판형 슬러지 농축장치 |
TWI292170B (en) * | 2003-04-29 | 2008-01-01 | Kaijo Kk | Concentration control device for semiconductor processing apparatus |
US7563748B2 (en) | 2003-06-23 | 2009-07-21 | Cognis Ip Management Gmbh | Alcohol alkoxylate carriers for pesticide active ingredients |
DE10354563B4 (de) * | 2003-11-21 | 2006-05-04 | Henkel Kgaa | Abwasserreduziertes Phosphatierverfahren durch Aufarbeitung von Entfettungslösung und/oder Spülwasser |
KR20050043855A (ko) * | 2005-04-19 | 2005-05-11 | 강성환 | 자동제어 수처리공정 |
TW200644111A (en) * | 2005-06-03 | 2006-12-16 | Shine World Optronics Technology Inc | Monitor method for the concentration of etching liquid |
JP5124928B2 (ja) | 2005-09-27 | 2013-01-23 | Jfeスチール株式会社 | 合金化溶融亜鉛めっき鋼板およびその製造方法 |
-
2007
- 2007-07-30 JP JP2007197268A patent/JP5186826B2/ja not_active Expired - Fee Related
-
2008
- 2008-07-24 KR KR1020127027710A patent/KR101342177B1/ko active IP Right Grant
- 2008-07-24 WO PCT/JP2008/063711 patent/WO2009017178A1/ja active Application Filing
- 2008-07-24 EP EP20080791941 patent/EP2179970B1/en not_active Not-in-force
- 2008-07-24 US US12/667,270 patent/US8435413B2/en not_active Expired - Fee Related
- 2008-07-24 KR KR20097023764A patent/KR101311063B1/ko active IP Right Grant
- 2008-07-24 CN CN2008800229210A patent/CN101687667B/zh not_active Expired - Fee Related
- 2008-07-25 TW TW97128387A patent/TWI409225B/zh not_active IP Right Cessation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5033132A (ja) * | 1973-07-28 | 1975-03-31 | ||
JP2000176434A (ja) * | 1998-12-11 | 2000-06-27 | Tokyo Electron Ltd | 排水処理装置および方法 |
JP2001049413A (ja) * | 1999-08-02 | 2001-02-20 | Nippon Steel Corp | 溶融亜鉛めっき鋼板及びその製造方法 |
JP2003033771A (ja) * | 2001-07-24 | 2003-02-04 | Ebara Corp | 異常検知機構を有する排水消毒装置 |
JP2006169572A (ja) * | 2004-12-14 | 2006-06-29 | Nippon Steel Corp | 鋼板のボンデ処理装置及びボンデ処理装置における水洗廃水の再利用方法 |
Also Published As
Publication number | Publication date |
---|---|
US20100181259A1 (en) | 2010-07-22 |
TWI409225B (zh) | 2013-09-21 |
US8435413B2 (en) | 2013-05-07 |
KR101311063B1 (ko) | 2013-09-24 |
CN101687667A (zh) | 2010-03-31 |
KR20120124499A (ko) | 2012-11-13 |
CN101687667B (zh) | 2013-05-15 |
WO2009017178A1 (ja) | 2009-02-05 |
TW200916416A (en) | 2009-04-16 |
EP2179970A4 (en) | 2011-08-31 |
KR20100002281A (ko) | 2010-01-06 |
EP2179970A1 (en) | 2010-04-28 |
JP5186826B2 (ja) | 2013-04-24 |
KR101342177B1 (ko) | 2013-12-16 |
EP2179970B1 (en) | 2014-10-01 |
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