TW200831719A - Apparatus and method for non-contact liquid sealing - Google Patents

Apparatus and method for non-contact liquid sealing Download PDF

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Publication number
TW200831719A
TW200831719A TW096136922A TW96136922A TW200831719A TW 200831719 A TW200831719 A TW 200831719A TW 096136922 A TW096136922 A TW 096136922A TW 96136922 A TW96136922 A TW 96136922A TW 200831719 A TW200831719 A TW 200831719A
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TW
Taiwan
Prior art keywords
workpiece
jet
contact
liquid
liquid sealing
Prior art date
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TW096136922A
Other languages
Chinese (zh)
Inventor
Kazuo Ohara
Kenichiro Arai
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Nichiyo Engineering Corp
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Publication of TW200831719A publication Critical patent/TW200831719A/en

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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/004Sealing devices
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0085Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/10Agitating of electrolytes; Moving of racks
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08Electroplating with moving electrolyte e.g. jet electroplating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0628In vertical cells
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/18Processes for applying liquids or other fluent materials performed by dipping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2252/00Sheets
    • B05D2252/02Sheets of indefinite length
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0736Methods for applying liquids, e.g. spraying
    • H05K2203/0746Local treatment using a fluid jet, e.g. for removing or cleaning material; Providing mechanical pressure using a fluid jet
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/15Position of the PCB during processing
    • H05K2203/1509Horizontally held PCB

Abstract

This invention provides an apparatus (22) for non-contact liquid sealing. The apparatus (22) comprises an immersion tank (10) filled with a treating liquid, and a pair of liquid jetting parts (24). The immersion tank (10) has in its side wall (18) a slit (20) through which a sheet-like or belt-like workpiece (12) is passed in such a state that the widthwise direction of the workpiece (12) is substantially vertical. The pair of jetting parts (24) are provided respectively on both sides of the slit (20) and spout a jet of the treating liquid from both sides of the workpiece (12) toward the workpiece (12) being passed through the slit (20).

Description

200831719 九、發明說明: 【發明所屬之技術領域】 本發明係關於濕式處理裝置之液封裝置及方法,該濕式 處理裳置係對印刷基板之基材等對象物施以電锻等濕式處 理者。 _ ‘【先前技術】 w c卡專所使用之印刷基板需施以電鍍,以便電性連接所 搭載之元件。對印刷基板施以電鍍之方法,通常採用的是 鲁 將P刷基板之基材以切斷狀態浸潰於電鑛液中的單片式方 法,或者將冑狀可撓性印刷基板本身連續浸潰力電錢液中 的連續式方法。 如此般,在對被處理物(亦稱作工件)施以電鏡等處理之 濕式處理中,根據工件之態樣,而採用單片式或連續式之 於採用單片式方法之情形下,卫件係藉由搬送機構搬送 處理液之浸潰槽的上方’繼而沈降入浸潰槽内,浸 2處理液中:處理結束後之工件,升出浸潰槽後被搬送 帶狀工件。 ^早片工件,但無法用於連續之 相對於此’於採用連續式方法之情形下 對向之側壁上設置狹縫形狀的出入口, 、、、s 以你入挪山、夺、主撝 ’使工件通過該狹縫 以搬入搬出^貝槽。該方法不僅適 於帶狀工件。然而,於該方法中,、、“:工’,亦可用 縫流出的量較大,無法提高浸潰二=槽内之處理液自狹 、曰内處理液之液面。若減 125312.doc 200831719 小狹縫寬度則可減少處理液之流出量,但僅減小狹缝寬度 會導致工件接觸到狹縫之内面。因此,狹縫須要有i〇 左右之寬度。如此般,由於無法提高浸潰槽内之液面,故 而難以處理寬幅工件,因此能夠處理之工件寬度最大只有 200 mm左右。此外,為了維持浸潰槽内處理液之液面高 度,類似流出液回送泵須要具有較大能力等等,流體設備 所需能量亦較大。[Technical Field] The present invention relates to a liquid sealing apparatus and method for a wet processing apparatus which applies electric forging or the like to an object such as a substrate of a printed substrate. Processor. _ ‘[Prior Art] The printed circuit board used in the w c card is electroplated to electrically connect the components mounted. The method of applying electroplating to the printed substrate is generally a one-piece method in which the substrate of the P-brush substrate is immersed in the electro-mineral liquid in a cut state, or the continuous flexible printed circuit board itself is continuously dipped. A continuous method in the collapse of electricity money. In this manner, in the wet processing in which the object to be processed (also referred to as a workpiece) is subjected to an electron microscope or the like, depending on the state of the workpiece, a monolithic or continuous method is employed in the case of using the monolithic method. The keeper is placed above the immersion tank of the processing liquid by the transport mechanism and then settles into the immersion tank. The immersed 2 treatment liquid: the workpiece after the treatment is completed, and the strip-shaped workpiece is transported after being lifted out of the immersion tank. ^ Early piece workpiece, but can not be used for continuous relative to this. In the case of continuous method, the slit shape is set on the opposite side wall, and, s The workpiece is passed through the slit to carry in and out of the bay. This method is not only suitable for strip workpieces. However, in this method, the ":" can also use the slit to flow out a large amount, and it is impossible to increase the liquid level of the treatment liquid in the immersion two tanks from the narrow and sputum treatment liquid. If the reduction is 125312.doc 200831719 The small slit width can reduce the outflow of the treatment liquid, but only reducing the width of the slit will cause the workpiece to contact the inner surface of the slit. Therefore, the slit needs to have a width of about 〇. Thus, the dip cannot be improved. The liquid level in the groove is so difficult to handle the wide workpiece, so the width of the workpiece that can be processed is only about 200 mm. In addition, in order to maintain the liquid level of the treatment liquid in the impregnation tank, a similar effluent return pump needs to have a larger Capacity, etc., the energy required for fluid equipment is also large.

進而,於該方法中,通過狹縫之工件的位置容易變得不 穩定。當卫件自狹縫間隙之中央位置偏向其中―侧之狹缝 内面犄,工件會因由狹縫流出之處理液的慣性力而向離中 ^更退之方向移動。其結果是,工件最終以接觸到其中一 側之狹縫内面的狀態穩定下來。若變成如此狀態,則會因 與狹縫内面之接觸,而造成卫件面產生擦傷,由此成為品 質劣化等的原因m吏工件不易接觸狹縫内面,必須擴 大狹縫間隙之寬度,但卻難以使處理液之流出量減少。藉 由曰,加狹縫厚度,或將狹縫内面製成波形等流體摩擦較大 :可某種耘度上減少處理液自狹縫的流出量。然 而’卻難以完全防止工件與狹縫内面之接觸。 抑又’關於抑制或者減少處理液自狹缝之流出的方法 ♦所周知有於狹縫部八十 或橡膠製等之片狀°海心件之方式設置類似樹脂製 , 狀、海4狀或者刮刀狀去液機構的方法 (例如,參照專利文獻 j万去 機構之摩…: 依然存在工件與此等去液 楫之摩擦所導致之工件面受損的問題。 眾所周知有如下方法:於設置於浸潰槽之相對向 125312.doc 200831719 之側壁上> # μ 八 狹縫的附近,設置2根夾持與狹縫相對應之部 、+向之可旋轉的滾筒(密封滾筒),使工件行進於2根密 告十 p gFurther, in this method, the position of the workpiece passing through the slit is liable to become unstable. When the guard member is biased from the center position of the slit gap toward the inner surface of the slit in the side, the workpiece moves in the direction of retreating from the center due to the inertial force of the treatment liquid flowing out of the slit. As a result, the workpiece is finally stabilized in a state of contacting the inner surface of the slit on one of the sides. If it is in such a state, the surface of the slit will be scratched by the contact with the inner surface of the slit, which may cause deterioration of quality, etc. m. The workpiece does not easily contact the inner surface of the slit, and the width of the slit gap must be enlarged. It is difficult to reduce the outflow amount of the treatment liquid. By 曰, the thickness of the slit is added, or the fluid in the inner surface of the slit is made to have a large frictional friction: the flow rate of the treatment liquid from the slit can be reduced by a certain degree of twist. However, it is difficult to completely prevent the workpiece from coming into contact with the inner surface of the slit. Further, the method for suppressing or reducing the outflow of the treatment liquid from the slit is known to be similar to a resin, a shape, a sea shape, or a scraper in the form of a sheet-shaped sea core member such as a slit portion or a rubber system. The method of the liquid-removing mechanism (for example, refer to the patent document j 10,000 to the mechanism of the friction...: There is still a problem of damage to the workpiece surface caused by the friction between the workpiece and the liquid-repellent crucible. It is known that there is the following method: On the side wall of the 125312.doc 200831719 ># μ eight slits, two clamps corresponding to the slits and a +-rotating roller (sealing roller) are provided to advance the workpiece In 2 secrets, ten pg

Be S以搬入搬出處理槽(例如,參照專利文獻 2〜4)° ^方法亦為可用於帶狀卫件之方法。#使工件行進 根孩封滾筒之間時,可藉由密封滾筒之旋轉增加工件 η 、穿同之名著性,從而有效地抑制或者減少處理液自 處=槽的流出。因&,可提高浸潰槽内處理液之液面,從 月6夠進行l幅工件之處理。於該方法中,可處理寬度最 大為600 mm左右的工件。此外,該方法具有如泵等流體設 備所而此里亦較少之優點。又,於該方法中,因工件與密 封滾筒不會產生滑動,故可抑制由密封滾筒所引起之工件 擦傷的產生,且因工件由滾筒定位,故可使工件穩定地行 進心而’與工件接觸之密封滾筒的表面會隨著時間逐漸 劣化’因此必須進行滾筒之維修管理。 專利文獻1:曰本專利實開昭59_17765號公報 專利文獻2:日本專利特開平2-182895號公報 專利文獻3 :曰本專利特開2002-275681號公報 專利文獻4:曰本專利特開2〇〇3_147582號公報 專利文獻5:日本專利實開昭61·155371號公報 【發明内容】 發明所欲解決之問題 如上所述,將印刷線路板以及其等所用基材等單片或帶 狀工件’經由設置於側壁之狹缝而搬入搬出裝滿有處理液 之浸潰槽時,為了抑制或者減少處理液自浸潰槽之流出, 125312.doc 200831719 通系要進行密封處理。 ^ 右能夠以與工件非接總+ 液自芦、、主M 接觸之形式抑制或者減少處理 又?::之流出’則能可靠地防止工件缺陷之產生。 則可提2夠充分抑制或者減少處理液自浸潰槽之流出’ 幅工件二Γ浸潰槽之處理液的液面,故而亦能夠對寬 f 件進仃處理液處理。 本發明之目的在於提供一種非 此你 禋非接觸液封裝置及方法,其 月匕乂與工件非接觸 ^式充刀抑制或者減少經由裝滿處 /之之次 >貝槽的側壁之狹峻 I狄縫將早片或帶狀工件以寬度方 σ 、Α直之狀態搬入搬出浸潰# 、衣山 m次/貝槽時的處理液自浸潰槽之 流出。 解決問題之技術手段 申月案發明人等’為了達成上述目的而潛心研究,結 果發現,單片或帶狀工# 宫 、口 仵乂見度方向大致鉛直之狀態通過 裝=液體之浸潰槽的開口部時’於浸潰槽之開口部所對應 之範圍内,朝向通過開σ邱 ° 件自工件兩側喷出流體之 喷流,藉此可使工件位置穩定,並以非接觸之形式將工件 搬入搬出浸潰槽’1’可充分抑制或者減少減少液體自浸 潰槽的流出,由此完成本發明。 再者例如不疋對工件之兩面實施處理而僅對工件之單 面施以處理的情形時’並不總是須要自工件兩側噴出流體 之喷流,可行的是’配置如下液封機構:該液封機構係朝 向通過開口部之工件,自工件之處理面側噴出流體之噴 流,另一方面,於工件之非處理面側,接觸工件之非處理 125312.doc 200831719 面而進行液封。The Be S is carried in and out of the treatment tank (for example, refer to Patent Documents 2 to 4). The method is also applicable to a belt-shaped guard. #When the workpiece travels between the rollers and the roller, the workpiece η can be increased by the rotation of the sealing roller, so that the flow of the treatment liquid from the groove can be effectively suppressed or reduced. Due to &, the liquid level of the treatment liquid in the impregnation tank can be increased, and one workpiece can be processed from month 6. In this method, workpieces with a width of up to 600 mm can be processed. In addition, the method has the advantage of having less fluid equipment such as pumps. Moreover, in this method, since the workpiece and the sealing roller do not slip, the occurrence of the workpiece scratch caused by the sealing roller can be suppressed, and since the workpiece is positioned by the roller, the workpiece can be stably traveled to the workpiece. The surface of the sealing drum that is in contact will gradually deteriorate over time', so maintenance management of the drum must be performed. Patent Document 1: Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. SUMMARY OF THE INVENTION PROBLEMS TO BE SOLVED BY THE INVENTION As described above, a single piece or a belt-shaped workpiece such as a printed wiring board and a substrate used therefor. 'When the impregnation tank filled with the treatment liquid is carried in and out through the slit provided in the side wall, in order to suppress or reduce the outflow of the treatment liquid from the immersion tank, the sealing process is performed in a manner of 125312.doc 200831719. ^ Can the right suppress or reduce the treatment in the form of contact with the workpiece + the liquid and the main M? The 'flow out' can reliably prevent the occurrence of workpiece defects. Then, it can be sufficiently 2 to suppress or reduce the liquid level of the treatment liquid flowing out of the immersion tank of the workpiece from the immersion tank, and therefore it is also possible to treat the processing liquid with a wide f piece. It is an object of the present invention to provide a non-contact liquid sealing device and method which is not suitable for the non-contact liquid filling of the moon and the workpiece, and which suppresses or reduces the narrowness of the side wall of the filling tank. In the case of the front piece or the strip-shaped workpiece, the processing liquid in the state of the width σ and the straight state is carried in and out of the dipping tank. The technical means of solving the problem, the inventor of the Shenyue case, etc., studied intensively to achieve the above-mentioned purpose, and found that the monolithic or banded work # 宫, 仵乂 仵乂 方向 大致 大致 大致 通过 液体 液体 液体 液体 液体 液体 液体In the opening portion, in the range corresponding to the opening portion of the dipping groove, the flow of the fluid is ejected from both sides of the workpiece by the opening, thereby making the position of the workpiece stable and in a non-contact manner. The carrying of the workpiece into and out of the dipping tank '1' can sufficiently suppress or reduce the flow of the liquid from the dipping tank, thereby completing the present invention. Furthermore, for example, when the processing is performed on both sides of the workpiece and only one side of the workpiece is treated, it is not always necessary to eject a jet of fluid from both sides of the workpiece. It is feasible to configure the following liquid sealing mechanism: The liquid sealing mechanism discharges a fluid jet from the processing surface side of the workpiece toward the workpiece passing through the opening, and liquid-sealed on the non-treated surface side of the workpiece to contact the non-processed surface of the workpiece 125312.doc 200831719.

上述目的係藉由—種非接觸液封裝置而得以實現 =液^置之特徵在於:其係於㈣設置有單片或帶狀 方向大致錯直之狀態通過的開口部且裝滿液體 ^貝槽的非接觸液封裝置,該非接觸液封裝置包括 =出口 Γ其配置於上述開口部其中之—側,朝向通過I /彳之上述工件,自上述其中之一側噴出流體之噴 及液封部’其配置於上述開口部之另-側,以封住上 述液體自上述開口部之上述另一側的流出。 又,於上述非接觸液封裝置中,上述液封部亦可為配置 於上述開口部之上述另一側,朝向通過上述開口部之上述 工件自上述另-側噴出流體之喷流的喷流噴出部。 又,於上述非接觸液封裝置中,配置於上述開口部其中 之一側之上述喷流噴出部與配置於上述開σ部另—侧之上 述喷流噴出部之間的間隙,亦可為越向下方則寬度越窄。 又',於上述非接觸液封裝置中,上述液封部亦可為配置 於上述開口部之另一側’且與上述工件之上述另一侧表面 接觸的圓柱狀部件。 又’於上述非接觸液封裝置中,亦可使上述噴流喷出部 具有供給有上述流體之噴流體管路,及設於上述噴流體管 路之上述工件側並噴出上述噴流的喷流嘴。 e 又,於上述非接觸液封裝置中,亦可使上 相對於上心件移動方向之垂直方向_上述浸潰== 1253I2.doc 200831719 又’於上述非接觸液封裝置中,亦可使上述噴流嘴朝向 上述工件移動方向之垂直方向。 又,於上述非接觸液封裝置中,亦可使上述噴流喷出部 具有排列於上下方向的複數個上述喷流嘴。 於上述非接觸液封裝置中,上述複數個喷流嘴之噴 孔各自亦可為圓形。 、 、The above object is achieved by a non-contact liquid sealing device, which is characterized in that it is provided with (4) an opening through which a single piece or a strip-shaped direction is substantially staggered and filled with a liquid cavity. a non-contact liquid sealing device, comprising: an outlet, disposed on a side of the opening, facing the workpiece passing through the I/彳, and ejecting a fluid from the one side and a liquid sealing portion 'It is disposed on the other side of the opening to seal the outflow of the liquid from the other side of the opening. Further, in the non-contact liquid sealing device, the liquid sealing portion may be a jet that is disposed on the other side of the opening and that ejects a fluid from the other side toward the workpiece passing through the opening. Spraying section. Further, in the non-contact liquid sealing device, the gap between the jet ejecting portion disposed on one of the openings and the jet ejecting portion disposed on the other side of the opening σ portion may be The narrower the width, the narrower the width. Further, in the non-contact liquid sealing device, the liquid sealing portion may be a cylindrical member disposed on the other side of the opening and in contact with the other side surface of the workpiece. Further, in the non-contact liquid sealing device, the jet ejecting unit may have a jet fluid line to which the fluid is supplied, and a jet nozzle provided on the workpiece side of the jet fluid line to eject the jet stream. . e, in the non-contact liquid sealing device, the vertical direction of the upper direction relative to the direction of movement of the upper core member may also be made - the impregnation == 1253I2.doc 200831719 and in the non-contact liquid sealing device The nozzle is oriented in a direction perpendicular to the moving direction of the workpiece. Further, in the non-contact liquid sealing device, the jet ejecting portion may have a plurality of the nozzles arranged in the vertical direction. In the above non-contact liquid sealing device, the plurality of nozzles of the plurality of nozzles may each have a circular shape. , ,

又’於上述非接觸液封裝置中,上述複數個喷流嘴之喷 孔亦可為,越是處於下方之上述噴流嘴的噴孔則孔徑越 又’於上述非接觸液封裝置中,排列於上下方向之上述 複數個噴流嘴之噴孔間距,亦可越向下方越密。 又,於上述非接觸液封裝置中,上述開口部亦可為,越 向下方則寬度越窄。 又’上述目的係藉由—插业 種非接觸液封方法而得以實現, 該非接觸液封方法之特徵在 寸1或社於·其係於侧壁設置有單片或 帶狀工件以寬度方向大 乱直之狀悲通過的開口部,且裝 滿液體之浸潰槽的非接觸液 蜩履封方法,當上述工件通過裝滿 上述液體之上述浸潰;μ、+、日日 义又/貝槽的上述開口部時,朝向通過上述開 口》ρ之上述卫件’自上述卫件兩側噴出流體之喷流,且利 用上述噴流以非接觸之形式封住上述開口部。 又,上述目的係藉由一種北垃 種非接觸液封方法而得以實現, 該非接觸液封方法之特徵在於. 在於·其係於側壁設置有單片或 帶狀工件以寬度方向大致 、 、°直之狀恕通過的開口部,且裝 滿液體之浸潰槽的非接觸液封 対万去,於上述開口部其中之 125312.doc 200831719 -側配置液封部,該液封部與上述工件之上述其中之一側 表接觸以封住上述液體自上述開口部之上述其中之一 側的抓出’當上述工件通過裝滿上述液體之上述浸潰槽的 上述開口部時,朝向通過上述開口部之上述工件,自:述 開口。p另-側噴出流體之噴流,且利用上述喷流,以非接 觸之形式封住上述液體自上述開口部之上述另_側的流 出。 發明之效果 J艮據本發明,單片或帶狀工件以寬度方向大致鉛直之狀 悲,通過震滿液體之浸潰槽的開口部時,朝向通過開口部 之工件自工件兩側噴出流體之喷流’故而可以與工件非接 觸之开/式充分抑制或者減少液體自浸潰槽的流出。因此, 根ί本發明,可防止周邊部件、零件與工件之接觸,從而 可罪地防止損傷、變形、變色等工件缺陷之產生。又,根 據本叙明,可提高裝滿浸潰 、主 又頃檜之液體的液面,從而使用裝 滿心貝槽之液體亦可對寬幅工件進行處理。 又’根據本發明,噴出流體之噴流無須使用活動零件, 因此可易於進行維修管理。 又,根據本發明,西?罢、产u & *、主 置液封部,該液封部係於裝滿液體 之浸、/貝槽的開口部J:中之 匕、干之一側,與工件其令之一 觸了住液體自開口部其t之一侧的流出,當單;= 狀工件以寬度方向大致錯直之狀態通過開向通 過開口部之工件自開口部 J朝向通 可靠地地防止工件另一側…机體之贺流,故而能 卞力 側表面產生參Λ^Λ - 展王又^、變色等工件缺 125312.doc -12- 200831719 陷,並且可進一步充分地抑制或者減少液體自浸潰槽的流 出。 【實施方式】 [第1實施形態] 使用圖1〜圖5,說明本發明第1實施形態之非接觸液封事 置及方法。圖1〜圖3係表示具備本實施形態之非接觸液封 裝置的濕式處理裝置之構造的概略圖,圖4及圖5係表示本 實施形態之非接觸液封裝置之構造的概略圖。In the above non-contact liquid sealing device, the plurality of nozzles of the nozzles may be such that the lower the diameter of the nozzles of the nozzles, the more the apertures are in the non-contact liquid sealing device. The pitch of the orifices of the plurality of nozzles in the up and down direction may be denser toward the bottom. Further, in the non-contact liquid sealing device, the opening may have a narrower width as it goes downward. Moreover, the above object is achieved by a non-contact liquid sealing method, which is characterized in that a single piece or a strip-shaped workpiece is provided in the width direction in the side wall or in the side wall. a non-contact liquid squeezing method in which a large chaotic straight passage passes through and is filled with a liquid impregnation groove, when the workpiece passes through the above-mentioned impregnation filled with the liquid; μ, +, Japanese, and/or In the above-described opening portion, a jet of fluid is ejected from both sides of the guard member through the guard member ρ passing through the opening ρ, and the opening portion is sealed in a non-contact manner by the jet flow. Moreover, the above object is achieved by a non-contact liquid sealing method of a northern type, which is characterized in that it is provided with a single piece or a strip-shaped workpiece on the side wall in a width direction, substantially, ° a non-contact liquid seal filled with a liquid-impregnated groove, and a liquid seal portion disposed on the side of the opening portion, the liquid seal portion and the workpiece One of the side surfaces is in contact with the liquid to seal the one of the openings from the one of the openings; when the workpiece passes through the opening of the dipping tank filled with the liquid, the opening is directed toward the opening. The above workpiece is from the opening. The other side discharges a jet of the fluid, and the jet is used to seal the outflow of the liquid from the other side of the opening in a non-contact manner. Advantageous Effects of Invention According to the present invention, a single piece or a strip-shaped workpiece is substantially straight in the width direction, and when the opening portion of the liquid immersion groove is shaken, the fluid is ejected from both sides of the workpiece toward the workpiece passing through the opening portion. The jet stream 'causes the non-contact opening/type of the workpiece to sufficiently suppress or reduce the outflow of the liquid from the dipping tank. Therefore, according to the present invention, it is possible to prevent the peripheral members and the parts from coming into contact with the workpiece, thereby sin preventing the occurrence of workpiece defects such as damage, deformation, and discoloration. Further, according to the present description, the liquid level filled with the impregnated, main and liquid can be increased, and the wide workpiece can be processed by using the liquid filled with the heart chamber. Further, according to the present invention, the jet of the ejected fluid does not require the use of movable parts, so that maintenance management can be easily performed. Also, according to the present invention, West? Stop, produce u & *, main liquid seal part, the liquid seal part is filled with the liquid immersion, / the opening of the shell groove J: one of the sides of the dry, one side of the workpiece The liquid flows out from one side of the opening portion of the opening portion, and the workpiece is reliably prevented from the other side of the workpiece from the opening portion J toward the opening by the workpiece in the state of being substantially straight in the width direction. The flow of the body, so the surface of the force can produce the surface of the Λ Λ 展 展 展 展 展 展 展 、 、 、 、 、 、 、 、 、 、 、 、 312 312 312 312 312 312 312 312 312 312 312 312 312 312 312 312 312 312 312 312 312 312 312 312 312 312 Flow out. [Embodiment] [First Embodiment] A non-contact liquid sealing device and method according to a first embodiment of the present invention will be described with reference to Figs. 1 to 5 . 1 to 3 are schematic views showing the structure of a wet processing apparatus including the non-contact liquid sealing apparatus of the present embodiment, and Figs. 4 and 5 are schematic views showing the structure of the non-contact liquid sealing apparatus of the present embodiment.

首先,利用圖1〜圖3說明具備本實施形態之非接觸液封 裝置的濕式處理裝置。圖1係表示具備本實施形態之非接 觸液封裝置的濕式處理裝置之構造的平面圖,圖2係圖1之 A-A’剖面圖,圖3係圖1之Β·Β,箭頭方向視圖。 浸潰槽ίο中裝滿著處理液,以對單片之工件12進行特定 處理。處理液係經由泵16 _營接女老抑、— ^ 阳水α目畜積有處理液之處理液儲存槽 1 4供給至浸潰槽1 〇中。 於裝滿處理液之浸潰槽1 〇的士祖 又/貝〜ιυ的相對向之側壁18上,於大致 錯直方向上設置用以使單片之τ Α^ 早月之工件12搬入搬出的狹縫2〇。 工件12係自其中之一側辟〗 1貝J 土 18的狹縫2〇以寬度方向大致鉛直 之形式搬入浸潰槽10内。搬 澉八久 >貝槽1〇内之工件12係保持 寬度方向大致鉛直狀態不變而 I ~自另一侧壁1 8的狹縫20搬出 浸潰槽10外。 於汉有狹縫20的浸潰槽1〇 ^ ^ ^ “ 之相對向之側壁18上,設置本 實施形態之非接觸液封梦 對喷流喷出部24,此對噴心出f接觸液封裝置22具有一 、” ▼出#24朝向工件12自工件12 125312.doc -13- 200831719 兩側均勻地噴出處理液之噴流。 一對喷流噴出部24以介隔通過狹縫20之工件12而對向之 方式,配置於狹缝20兩側之侧壁18端部的外表面。一對噴 流喷出部24所喷出之處理液係經由泵16、流量調整閥%、 /瓜里 I日數控制斋(FIC : Flow Indicator and Controller)28, 自處理液儲存槽14中供給而來。First, a wet processing apparatus including the non-contact liquid sealing apparatus of the present embodiment will be described with reference to Figs. 1 to 3 . Fig. 1 is a plan view showing a structure of a wet processing apparatus including the non-contact liquid sealing apparatus of the embodiment, Fig. 2 is a cross-sectional view taken along line A-A' of Fig. 1, and Fig. 3 is a view of arrow direction of Fig. 1. . The dipping tank ίο is filled with a treatment liquid to specifically treat the single piece of the workpiece 12. The treatment liquid is supplied to the immersion tank 1 through the pump 16 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ On the opposite side wall 18 of the impregnation tank 1 〇 又 又 贝 贝 υ υ υ υ υ υ υ υ υ υ 的 的 的 的 的 的 工件 工件 工件 工件 工件 工件 工件 工件 工件 工件 工件 工件 工件 工件 工件 工件 工件 工件 工件 工件 工件 工件 工件 工件 工件 工件Slit 2〇. The workpiece 12 is lifted into the dipping tank 10 in a substantially vertical direction in the width direction from one of the sides. Moving the workpiece for a long time > The workpiece 12 in the 1st slot is kept in a substantially vertical direction in the width direction, and I is carried out from the slit 20 of the other side wall 18 out of the dipping groove 10. The non-contact liquid seal dream spray nozzle 24 of the present embodiment is provided on the opposite side wall 18 of the immersion tank 1 〇 ^ ^ ^ of the slit 20 of the present embodiment, and the pair of spray nozzles f contact liquid The sealing device 22 has a ", ▼ out #24 toward the workpiece 12 from the workpiece 12 125312.doc -13- 200831719 on both sides of the spray jet of the treatment liquid uniformly. The pair of jet ejecting portions 24 are disposed on the outer surfaces of the end portions of the side walls 18 on both sides of the slit 20 so as to face each other with the workpiece 12 passing through the slits 20 interposed therebetween. The processing liquid discharged from the pair of jet ejecting units 24 is supplied from the processing liquid storage tank 14 via the pump 16, the flow rate adjusting valve %, and the FIC (Flow Indicator and Controller) 28 . Come.

於浸潰槽10之搬入侧及搬出側的側壁18下方,設有用以 回收自狹縫20流出之處理液、及自非接觸液封裝置22所噴 出之處理液的接收盤3〇。積存於接收盤3〇中之處理液,將 回收至處理液儲存槽14中。 藉此,構成具備非接觸液封裝置22之濕式處理裝置。 工件12,例如為印刷線路板、用於印刷線路板之基材 等。工件12之厚度,例如為3〜200 μιη範圍内,具體而言, 主/爪的疋38 μιη,其次較多的是25 μιη,用於特殊用途的是 5〇 μΠ1、1〇0 4"""等。再者,工件12之形狀,並非限定為單 片,亦可為如自滾筒展開來之連續條材之帶狀。 /又貝槽10例如為裝滿電鍍液作為處理液之電鍍槽。再 者/又/貝槽1 0,並非限定為電鑛槽,亦可為預處理槽、後 處理槽、清洗槽等。浸潰槽附所進行之處理,除電鍍處 理之外,村輕職理、除脂相、_㈣、清洗户 理等,且可根據處理而選擇處理液。 处 /又/貝槽1G中’工件12之搬人側及搬出侧的侧壁u上 置之狹縫20的寬度,例如 口又 %上下方向上為大致固定。 對工件12進行處理液處理期 地里功間,經由泵I6自處理液儲存 1253I2.doc -14- 200831719 槽14適當供給處理液至浸潰槽1〇中,以使浸潰槽ι〇中之反 應液之液面高度保持大致固定。 本實施形態之非接觸液封装置22的主要特徵為具有一對 喷流噴出部24,此對噴流噴出部24係朝向工件12自工件12 兩侧均勻地喷出處理液之噴流。此處,利用圖i〜圖5,詳 - 細敍述本實施形態之非接觸液封裝置22。圖4係圖2及圖3 • 之C-C’剖面圖,圖5(a)係噴流噴出部24之平面圖,圖5(b) 係喷流喷出部24之工件側的侧視圖。再者,圖4中,表示 • ㈣置於浸潰槽1G之工件12搬出侧的側壁18上之非接觸液 封裝置22之構造,設置於浸潰槽1〇之工件12搬入侧的側壁 18上之非揍觸液封裝置22亦具有相同構造。 如圖4所不,於狹縫20兩側之側壁18端部的外表面,配 置有介隔通過狹缝20之工件12而對向的一對噴流噴出部 24。一對喷流噴出部24,分別由噴流體管路32與喷流噴嘴 板34所組成,噴流體管路32係作為喷流而喷出之處理液的 流道,噴流喷嘴板34上設有噴出噴流體管路32内之處理液 _ 作為喷流的複數個喷流嘴3 6。 喷流體管路32例如為方管狀。與裝滿浸潰槽1()之處理液 - 相同的處理液’經由配管自處理液儲存槽14供給至噴流體 管路32中。既可由1個部位(參照圖5(b)),亦可由複數個部 位,對喷流體管路32供給處理液。由複數個部位供給處理 液之情形時,亦可將噴流體管路32劃分為例如上下2段、 上中下3段等複數個區室,並對每個劃分後的區室供給處 理液。 125312.doc 15- 200831719 供給至喷流體管路32之處理液的流量,係由^1(:28檢 測。FIC28依據流量檢測結果,控制流量調整閥26,以使 介隔工件12而對向之一對噴流喷出部24所喷出的處理液之 流量均勻。 喷流喷嘴板34設於噴流體管路32之工件12側。噴流喷嘴 ‘ 板34上具有沿著喷流體管路32之上下方向而突出於工件12 . 側的突出部38。突出部38之對向於工件12的面,為大致平 行於工件12移動方向之平坦面。突出部38於浸潰槽1〇側之 , 側面’為大致平行於浸潰槽1〇之侧壁18的面。突出部“之 與浸潰槽ίο相反一側的側面為傾斜面。喷流喷嘴板34之突 出部38兩侧的面,為大致平行於工件12移動方向之面。 複數個噴流嘴36,於浸潰槽1〇之狹縫2〇所對應的範圍 内,於上下方向排列設置於喷流噴嘴板34之突出部“上, 且與噴流體管路32相連。 如圖5(b)所示,複數個噴流嘴36之喷孔,例如以於上下 方向上大致固定之間距,在突出部38之對向於工件12之平 面上排列成一行。又,複數個喷流嘴36之纽,例如為直 徑相同之圓形。喷流嘴36之喷孔的直徑,例如為G.5〜3 mm • 左右’具體而言,例如為2 mm左右。 圖4所示,各噴流嘴3 6係朝向相對於工件丨2移動方向 之垂直方向而朝浸潰槽1〇側傾斜之方向。朝向如此傾斜方 向之各噴流嘴36係朝向工件12,將喷流體管㈣所供 處理液作為噴流,向相對於工件12移動方向之垂直方 朝浸潰槽10側傾斜的方向大致水平地噴出。 ° 125312.doc -16 - 200831719 於介隔工件12而對向配置之一對噴流喷出部以的喷流噴 嘴板34之間,構成有受到突出部38之對向於工件12之面所 夾持的喷流狹缝40。噴流狹縫4〇之寬度,比浸潰槽1〇之狹 縫20的寬度窄,且於上下方向上為大致固定,例如為丨〜3 mm左右。噴流狹縫40之厚度,亦即突出部之對向於工 件12之面於工件12移動方向上的長度,例如為3 mm左右。 進而,在一對噴流噴出部24之噴流喷嘴板34之間,於噴 流狹縫40之浸潰槽10側,構成有寬度較喷流狹縫4〇寬之喉 部42。又,於喷流狹縫40之與浸潰槽1〇相反一側,構成有 寬度較噴流狹缝40寬之喉部44。 浸潰槽10側之喉部42,具有大致固定之寬度,該寬度比 浸潰槽10之狹缝20的寬度要窄。與浸潰槽1〇相反一侧之喉 4 4 ’其見度卩返者逆離f流狹縫4 〇侧而逐漸擴大,中途開 始寬度變得幾乎與浸潰槽1 0側之喉部42相同。關於在工件 12移動方向上之長度,較之浸潰槽1〇側之喉部42,與浸潰 槽1 〇相反一側之喉部44 一方較長。 藉此,於工件12將通過的一對噴流喷嘴板34之間,於沿 著浸潰槽10之狹缝20且對應於狹縫20的範圍内,構成有喉 部42、噴流狹縫40、及喉部44。於喷流狹缝40中,由工件 12兩側之複數個喷流嘴36,朝向工件12自工件12兩侧均句 地噴出處理液之喷流。 其次,利用圖1〜圖5,說明使用有本實施形態之非接觸 液封裝置22的液封方法。 於裝滿處理液之浸潰槽10中,工件12以寬度方向大致錯 125312.doc -17- 200831719 直之形式自搬入侧之侧壁18的狹縫20搬入,並保持寬度方 向大致鉛直之狀態不變而自搬出側之側壁〗8的狹縫2〇搬 出。工件12之移動速度,例如處於〇1 m〜3〇 m/分鐘左右之 範圍内,為相對較慢之速度,通常為〇1〜2 m/分鐘。 工件12搬入搬出期間,處理液供給至喷流體管路32,由 - 噴流噴嘴板34之複數個噴流嘴36噴出處理液之喷流。供給 ^ 至喷流體管路32之處理液的流量,由FIC28控制,以使由 介隔工件12而對向之一對喷流噴嘴板34的喷流嘴%所噴出 • 之處理液的流量均勻。藉此,由介隔工件12而對向之一對 喷流喷嘴板34的喷流嘴36,朝向工件12自工件12兩側將均 勻地喷出處理液之噴流。 相對於工件12大致垂直方向之喷流的速度成分,作為噴 流之慣性力作用於工件12的表面,將工件12推回至一對噴 流喷嘴板34之間隙中央。對於該噴流所產生之推回工件12 之力而言,係噴流嘴36與工件12之間隙越窄則上述力越 大。因此,工件12將穩定於噴流狹縫4〇之中央位置,從而 _ 維持與喷流噴嘴板34之非接觸狀態。 藉此,藉由自一對噴流喷嘴板34之噴流嘴36,朝向工件 . 12自工件12兩側均勻噴出的處理液之噴流,工件12並不與 浸潰槽10之狹縫20内面以及噴流噴嘴板34接觸,而穩定地 被搬入搬出浸潰槽1 〇。 因此,根據本實施形態之非接觸液封裝置22,可防止浸 潰槽10之狹缝20内面及噴流喷嘴板34等周邊部件、零件與 工件12的接觸,從而可靠地防止損傷、變形、變色等工件 125312.doc -18- 200831719 12缺陷之產生。 如此般工件12以非接觸形式搬入搬出浸潰槽1〇期間,浸 潰槽10内之處理液經由浸潰槽1 〇之狹縫2 0,流入浸潰槽1 〇 側之喉部42。然而,於噴流狹缝40内,喷流喷嘴板34之表 面會存在流體摩擦。因此,藉由喷流嘴3 6所喷出之噴流, 喷流狹縫40内之壓力將變高。此種噴流狹縫4〇内之較高壓 力,與具有朝向浸潰槽1 〇侧方向之速度成分的喷流之慣性 力相互作用,從而充分地抑制或者減少處理液自浸潰槽1〇 側之喉部42向與浸潰槽10相反一側之喉部料的流出。 藉此,根據本實施形態之非接觸液封裝置22,可藉由在 喷流狹縫40中朝向卫件12自卫件12兩側均勻噴出的^理液 之嘴流,而以非接觸之形式封住噴流狹縫4〇,由此充分地 抑制或者減少處理液自浸潰槽1〇的流出。因此,可提高裝 滿浸潰㈣之處理液的液面,從而亦可對寬幅之工件二進 行處理液處理。根據本實施形態,亦可於浸潰槽ι〇中 =有例如则匪左右寬度之寬幅工㈣進行處理液處 又’本實施形態之非接觸液封裝置22,無須 液之噴流的噴流噴出部24上使用 、出處理 因此可易於進行維修管理。轴承等活動零件, 進而,根據本實施形態之非接觸液封 抑制或者減少虛採饬自、夺、主i 、 ’可充分地 量 '二;…1〇的流出,可節省能 再者,如上述濕式處理裝置般’將印刷基板、可撓性印 1253l2.doc -19- 200831719 龜板等單片或帶狀工件,以其剖面大致錯直之方式,沿 著水平方向搬入搬出電鍍槽等浸潰槽的處理方法中,工件 之移動速度較慢。如上所述,工件之移動速度,例如處於 〇·1 m〜30 m/分鐘左右的範圍内,通常為〇ι〜2 ^分鐘。如 此敖工件之移動速度較慢的情形時,與例如以—分鐘 尚速地移動工件的情形不同的是,無法過高期望因工件之 移動速度所引起的流體潤滑。因此,於本發明中,藉由對 工件喷出處理液之噴流,而利用該流體作用使工件之位置 穩定,從而實現非接觸形式的工件之搬入搬出。 於本明中,於次潰槽之設有狹縫的側壁上設置非 接觸液封裝置,以噴出噴流,藉此實現工件位置穩定化之 非接觸形式的工件之搬入搬出,並且抑制或者減少處理液 自浸潰槽的流出。相對於此,已知有如下結構,即,以防 止流出液之飛散、或者防止附著於工件之處理液被帶到下 一個浸潰槽中為目的,而自遠離浸潰槽之狹縫的位置,對 來自狹缝之流出液、及工件噴出流體。但是,採用此種結 構,無法使工件位置穩定,或抑制處理液自浸潰槽的流 出’因此與本發明之結構完全不同。 再者,對於非接觸液封裝置22之形狀及尺寸而言,較為 理想的是藉由依據流體工學對噴流狹縫4〇周圍流體之慣性 力及黏性力的解析、利用有限要素法所作的液壓分布解 析、及流線模擬等而作適當設定。非接觸液封裝置22之形 狀及尺寸的具體例為如下,即,介隔工件12而對向之一對 噴流噴嘴板34間的間隔、噴流狹缝4〇之厚度、喉部42及料 125312.doc -20- 200831719 之長度及形狀、噴流嘴36之形狀、孔徑、個數等。其原因 是以下條件會相互影響,即,基於工件12之材質等的機械 物性’工件12之尺寸、浸潰槽1〇内之處理液之密度及黏度 等的物性,浸潰槽1〇内之處理液之液面高度、噴流嘴36所 喷出之噴流體之密度及黏度等的物性,以及喷流嘴36所噴 出之噴流體之流速及液壓等。藉由利用流體工學進行解析 等之方法,找出噴流條件之最佳解,該喷流條件係用以使 工件12之位置在噴流狹縫4〇附近整個區域内穩定於噴流狹A receiving tray 3 for collecting the processing liquid flowing out of the slit 20 and the processing liquid discharged from the non-contact liquid sealing device 22 is provided below the side wall 18 of the loading and unloading side of the dipping tank 10. The treatment liquid accumulated in the receiving tray 3 is recovered into the treatment liquid storage tank 14. Thereby, a wet processing apparatus including the non-contact liquid sealing device 22 is constructed. The workpiece 12 is, for example, a printed wiring board, a substrate for a printed wiring board, or the like. The thickness of the workpiece 12 is, for example, in the range of 3 to 200 μm, specifically, the main/claw 疋38 μm, and the second is 25 μm, and the special purpose is 5〇μΠ1,1〇0 4"&quot ;"etc. Further, the shape of the workpiece 12 is not limited to a single piece, and may be a strip shape such as a continuous strip which is unrolled from the drum. The bellows 10 is, for example, a plating tank filled with a plating solution as a treatment liquid. Further, it is not limited to an electric ore tank, and may be a pretreatment tank, a post-treatment tank, a washing tank, or the like. The treatment by the dipping tank attachment, in addition to the electroplating treatment, the village light occupation, degreasing phase, _ (four), cleaning households, etc., and the treatment liquid can be selected according to the treatment. The width of the slit 20 placed on the side of the moving side of the workpiece 12 and the side wall u of the carrying-out side in the position/and/before groove 1G is, for example, substantially constant in the vertical direction of the mouth. The workpiece 12 is subjected to a treatment liquid treatment period, and the treatment liquid is appropriately supplied from the treatment liquid storage 1253I2.doc -14-200831719 tank 14 through the pump I6 to the impregnation tank 1〇 so as to be in the impregnation tank The liquid level of the reaction liquid is kept substantially constant. The main feature of the non-contact liquid sealing device 22 of the present embodiment is that it has a pair of jet ejecting portions 24 that uniformly eject a jet of the processing liquid from the both sides of the workpiece 12 toward the workpiece 12. Here, the non-contact liquid sealing device 22 of the present embodiment will be described in detail with reference to Figs. Fig. 4 is a cross-sectional view taken along line C-C' of Fig. 2 and Fig. 3, Fig. 5(a) is a plan view of the jet ejecting portion 24, and Fig. 5(b) is a side view of the workpiece side of the jet ejecting portion 24. Further, in Fig. 4, (4) the structure of the non-contact liquid sealing device 22 placed on the side wall 18 of the workpiece 12 on the carrying-out side of the dipping tank 1G, and the side wall 18 provided on the loading side of the workpiece 12 of the dipping tank 1 The upper non-tantalum seal device 22 also has the same construction. As shown in Fig. 4, on the outer surface of the end portion of the side wall 18 on both sides of the slit 20, a pair of jet ejecting portions 24 opposed to each other through the workpiece 12 passing through the slit 20 are disposed. The pair of jet discharge portions 24 are respectively composed of a spray fluid line 32 and a jet nozzle plate 34. The spray fluid line 32 is a flow passage for the treatment liquid sprayed as a jet flow, and the spray nozzle plate 34 is provided. The treatment liquid in the spray fluid line 32 is ejected as a plurality of spray nozzles 36 of the jet flow. The spray fluid line 32 is, for example, a square tube. The same treatment liquid as the treatment liquid filled with the immersion tank 1 () is supplied from the treatment liquid storage tank 14 to the spray fluid line 32 via a pipe. The treatment liquid can be supplied to the spray fluid line 32 by one portion (see Fig. 5 (b)) or by a plurality of portions. When the treatment liquid is supplied from a plurality of parts, the spray fluid line 32 may be divided into a plurality of compartments such as upper and lower sections, upper and lower sections, and the like, and the treatment liquid is supplied to each of the divided compartments. 125312.doc 15- 200831719 The flow rate of the treatment liquid supplied to the spray fluid line 32 is detected by ^1 (: 28). The FIC 28 controls the flow adjustment valve 26 according to the flow detection result so as to be opposed to the workpiece 12. The flow rate of the treatment liquid discharged from the pair of jet discharge portions 24 is uniform. The jet nozzle plate 34 is provided on the workpiece 12 side of the spray fluid line 32. The spray nozzle 'plate 34 has a top and bottom along the spray fluid line 32. The direction protrudes from the side protrusion 38. The surface of the protrusion 38 opposite to the workpiece 12 is a flat surface substantially parallel to the moving direction of the workpiece 12. The protrusion 38 is on the side of the dip tank 1 side ' is a surface substantially parallel to the side wall 18 of the immersion groove 1 。. The side surface of the protrusion "on the side opposite to the immersion groove ί is an inclined surface. The faces on both sides of the protruding portion 38 of the jet nozzle plate 34 are The plurality of nozzles 36 are arranged in the vertical direction of the slits of the jet nozzle plate 34 in the range corresponding to the slit 2〇 of the dipping groove 1〇. And connected to the spray fluid line 32. As shown in Figure 5 (b), a plurality of spray nozzles 36 spray The holes are arranged in a row on the plane of the projections 38 opposite to the workpiece 12, for example, in a substantially fixed distance in the up-and-down direction. Further, the plurality of nozzles 36 are, for example, circular in the same diameter. The diameter of the orifice of the nozzle 36 is, for example, G.5 to 3 mm. • The left and right 'specifically, for example, about 2 mm. As shown in Fig. 4, each of the nozzles 63 is oriented in a direction of movement relative to the workpiece 丨2. The direction perpendicular to the direction of the wetting groove 1 is inclined. The nozzles 36 facing the oblique direction are directed toward the workpiece 12, and the processing liquid supplied from the nozzle (4) is used as a jet flow to the vertical direction of the moving direction with respect to the workpiece 12. The direction perpendicular to the direction of the dipping groove 10 is substantially horizontally ejected. ° 125312.doc -16 - 200831719 Between the jet nozzle plates 34 disposed opposite to the workpiece 12 and opposite to the jet ejecting portion The jet slit 40 is sandwiched by the protrusion 38 opposite to the surface of the workpiece 12. The width of the jet slit 4 is narrower than the width of the slit 20 of the dipping groove 1 and is in the up and down direction. It is roughly fixed, for example, about 33 mm. The thickness of the jet slit 40 is also That is, the length of the protrusion facing the workpiece 12 in the moving direction of the workpiece 12 is, for example, about 3 mm. Further, between the jet nozzle plates 34 of the pair of jet ejecting portions 24, the dip in the jet slit 40 On the side of the sluice 10, a throat portion 42 having a width wider than that of the jet slit 4 is formed. Further, on the opposite side of the jet slit 40 from the immersion groove 1 ,, the width is wider than the jet slit 40. Throat portion 44. The throat portion 42 on the side of the dipping tank 10 has a substantially fixed width which is narrower than the width of the slit 20 of the dipping groove 10. The throat 4 4 ' opposite to the dipping groove 1〇 The visibility is gradually enlarged from the side of the f-flow slit 4, and the width at the beginning becomes almost the same as the throat 42 on the side of the dipping groove 10. Regarding the length in the moving direction of the workpiece 12, the throat portion 44 on the side opposite to the dipping groove 1 is longer than the throat portion 42 on the side of the dipping groove 1 . Thereby, between the pair of jet nozzle plates 34 through which the workpiece 12 passes, the throat portion 42 and the jet slit 40 are formed along the slit 20 of the dipping groove 10 and corresponding to the slit 20. And throat 44. In the jet slit 40, a plurality of nozzles 36 on both sides of the workpiece 12 eject the jet of the treatment liquid from both sides of the workpiece 12 toward the workpiece 12. Next, a liquid sealing method using the non-contact liquid sealing device 22 of the present embodiment will be described with reference to Figs. 1 to 5 . In the immersion tank 10 filled with the treatment liquid, the workpiece 12 is carried in a straight shape from the slit 20 of the side wall 18 of the loading side in the form of a substantially irregular width of 125312.doc -17-200831719, and the width direction is substantially vertical. The slit 2 of the side wall of the side of the unloading side is moved out. The moving speed of the workpiece 12 is, for example, in the range of 〇1 m to 3 〇 m/min, which is a relatively slow speed, usually 〇1 to 2 m/min. During the loading and unloading of the workpiece 12, the processing liquid is supplied to the jet fluid line 32, and the jets of the processing liquid are ejected by the plurality of nozzles 36 of the jet nozzle plate 34. The flow rate of the treatment liquid supplied to the spray fluid line 32 is controlled by the FIC 28 so that the flow rate of the treatment liquid which is discharged from the nozzle nozzles of the pair of nozzle nozzle plates 34 by the workpiece 12 is uniform. Thereby, the jet nozzles 36 opposed to the pair of jet nozzle plates 34 are separated from each other by the workpiece 12, and the jets of the processing liquid are uniformly discharged from the sides of the workpiece 12 toward the workpiece 12. The velocity component of the jet flow in the substantially vertical direction with respect to the workpiece 12 acts on the surface of the workpiece 12 as the inertial force of the jet flow, and pushes the workpiece 12 back to the center of the gap between the pair of jet nozzle plates 34. For the force generated by the jet to push back the workpiece 12, the narrower the gap between the nozzle 36 and the workpiece 12, the greater the force. Therefore, the workpiece 12 will be stabilized at the center position of the jet slit 4〇, thereby maintaining a non-contact state with the jet nozzle plate 34. Thereby, the workpiece 12 is not sprayed with the jet of the processing liquid uniformly sprayed from both sides of the workpiece 12 from the nozzles 36 of the pair of jet nozzle plates 34, and the workpiece 12 is not in contact with the inner surface of the slit 20 of the impregnation tank 10 and the jet flow. The nozzle plate 34 is in contact with it, and is stably carried into and out of the dipping tank 1 〇. Therefore, according to the non-contact liquid sealing device 22 of the present embodiment, it is possible to prevent contact between the inner surface of the slit 20 of the impregnation groove 10 and the peripheral member such as the jet nozzle plate 34 and the workpiece 12, thereby reliably preventing damage, deformation, and discoloration. Wait for the workpiece 125312.doc -18- 200831719 12 defects. When the workpiece 12 is carried into and out of the immersion tank 1 in a non-contact manner, the treatment liquid in the immersion tank 10 flows into the throat portion 42 on the 浸 side of the immersion tank 1 through the slit 20 of the immersion tank 1 . However, within the jet slit 40, there is fluid friction on the surface of the jet nozzle plate 34. Therefore, the pressure in the jet slit 40 becomes higher by the jet flow jetted from the nozzle 36. The higher pressure in the jet slit 4 相互作用 interacts with the inertial force of the jet having a velocity component toward the 〇 side of the immersion tank 1 to sufficiently suppress or reduce the treatment liquid from the immersion tank 1 The throat portion 42 flows out of the throat material on the side opposite to the impregnation tank 10. Thereby, the non-contact liquid sealing device 22 according to the present embodiment can be in a non-contact form by flowing the nozzle of the liquid in the jet slit 40 uniformly toward both sides of the self-defense member 12 of the guard 12 in a non-contact manner. The jet slit 4 is sealed, thereby sufficiently suppressing or reducing the outflow of the treatment liquid from the dipping tank 1〇. Therefore, the liquid level of the treatment liquid filled with the impregnation (4) can be increased, and the treatment liquid can be processed for the wide workpiece. According to the present embodiment, it is also possible to carry out the non-contact liquid sealing device 22 of the present embodiment in the dipping groove =, for example, the width of the width of the crucible (4), and the jet ejecting without the liquid jet. The use and disposal of the unit 24 makes it easy to perform maintenance management. Further, according to the non-contact liquid seal of the present embodiment, the non-contact liquid seal according to the present embodiment can suppress or reduce the vain, the main i, the 'sufficient amount', and the flow of the ... 1 〇 can save energy, such as In the above-described wet processing apparatus, a single-piece or strip-shaped workpiece such as a printed circuit board or a flexible printed sheet of 1253l2.doc -19-200831719 turtle shell is pulled in a horizontal direction so as to be vertically staggered. In the processing method of the groove, the moving speed of the workpiece is slow. As described above, the moving speed of the workpiece is, for example, in the range of 〇·1 m to 30 m/min, and is usually 〇ι 2 2 minutes. In the case where the moving speed of the workpiece is slow, for example, unlike the case where the workpiece is moved at a speed of -minute, the fluid lubrication due to the moving speed of the workpiece cannot be excessively high. Therefore, in the present invention, by jetting the jet of the processing liquid to the workpiece, the position of the workpiece is stabilized by the action of the fluid, thereby realizing the loading and unloading of the workpiece in a non-contact manner. In the present invention, a non-contact liquid sealing device is disposed on the side wall of the slit having the slit to discharge the jet flow, thereby realizing the position of the workpiece in which the workpiece position is stabilized, and the workpiece is moved in and out, and the processing is suppressed or reduced. The liquid flows out of the immersion tank. On the other hand, there is known a structure for preventing the scattering of the effluent or preventing the treatment liquid adhering to the workpiece from being carried to the next immersion tank, and from the position of the slit away from the immersion groove. The fluid is ejected from the effluent from the slit and the workpiece. However, with such a structure, the position of the workpiece cannot be stabilized, or the flow of the treatment liquid from the immersion tank can be suppressed, and thus it is completely different from the structure of the present invention. Furthermore, it is preferable for the shape and size of the non-contact liquid sealing device 22 to be analyzed by the finite element method by analyzing the inertial force and the viscous force of the fluid around the jet slit 4 according to fluid engineering. The hydraulic distribution analysis, streamline simulation, etc. are appropriately set. A specific example of the shape and size of the non-contact liquid sealing device 22 is such that the interval between the pair of jet nozzle plates 34, the thickness of the jet slit 4, the throat 42 and the material 125312 are opposed to each other by the workpiece 12 interposed therebetween. .doc -20- 200831719 The length and shape, the shape of the nozzle 36, the aperture, the number, and the like. The reason for this is that the following conditions affect each other, that is, the mechanical properties such as the material of the workpiece 12, the size of the workpiece 12, the density of the treatment liquid in the immersion tank 1 及, and the physical properties of the viscosity, etc., are immersed in the groove 1 The liquid level of the treatment liquid, the physical properties such as the density and viscosity of the spray fluid sprayed from the nozzle 36, the flow velocity of the spray fluid sprayed from the nozzle 36, and the hydraulic pressure. The best solution of the jet flow condition is obtained by means of analysis by fluid engineering, etc., and the jet flow condition is used to stabilize the position of the workpiece 12 in the entire region near the jet slit 4〇.

縫40之間隙中央,且,使通過喷流狹縫4〇後自浸潰槽1〇流 出之液量最小’藉此可實用性設定非接觸液封裝置22之形 狀及尺寸。 如此般,根據本實施形態,經由裝滿處 一π”… 的狹縫20,將單片或帶狀之工件12以寬度方向大致鉛直之 狀態搬入搬出浸潰槽1〇時,於喷流狹縫4〇内,由工件^兩 側之複數個喷流嘴36,朝向工件12自工件12兩側均勻地噴 出處理液之喷流,因此能以與工件12非接觸之形式充分抑 制或者減少處理液自浸潰槽1〇的流出。 [第2實施形態] 使用圖6,說明本發明第2實施形態之非接觸液封裝置。 圖6⑷係本實施形態之非接觸液封裝置中噴流噴出部的平 面圖,圖6(b)係噴流噴出部於工件側之側視圖。再者 與第1實施形態之非接觸液封裝置相同之構成要素,使用 同一符號’且省略或簡略說明。 本實施形態之非接觸液封裝置的基本結構,係與糾實 1253l2.doc -21 - 200831719 施形態之非接觸液封裝置相同。本實施形態之非接觸液封 裝置的主要特徵為,於上下方向上排列設置於噴流嘴嘴板 34之突出部38上的複數個喷流嘴36中,越是向下方配置之 喷流嘴36的噴孔,則形狀為上下方向上越長之長圓形。 裝滿於浸潰槽10内之處理液的液壓,係自液面開始越向 下方越高。因此,欲自浸潰槽10流出之處理液的液壓,越 向浸潰槽10之下方則越高。因此,較好的是,越向浸潰槽 10下方,越要加強抑制處理液自浸潰槽1〇流出的作用。 故而,如圖6(b)所示,於本實施形態中,於上下方向排 列設置在噴流噴嘴板34之突出部38上的複數個喷流嘴中, 越是向下方配置之喷流嘴36的噴孔,則形狀為上下方向上 越長之長圓形。 =此般,因複數個噴流嘴36之噴孔形狀在上下方向上產 =變化’故越是向下方配置之噴流嘴36,越能增大作為喷 流而=出之處理液的流量。因此,根據本實施形態,越是 处於/又/貝槽10之下方越能増強抑制處理液自浸潰槽之流 出的作用,I而可進_步充分地抑制或者減少處理液自浸 潰槽10的流出。 + 越向下方配置之噴流嘴36,越將增大作為噴流而 贺出之處理液之流量的結構,並不限定於上述結構。例 如 亦可疋越向下方配晉夕疮、衣此 配置之賀流嘴36則孔徑越大。又,亦 可是排列於上下古A u 、 ^ 同上之複數個噴流嘴36的喷孔間距越向 越* x ’亦可根據高度改變排列在上下方向上之喷 "L 36的育孔行數,越向下方則噴流嘴36之喷孔的行數越 125312.doc -22- 200831719 多。又,亦可於上下方向將噴流體管路32劃分為複數個區 室,並對複數個區室之每一個供給喷流嘴36所噴出之處理 液,越是處於下方的區室越是要增大所供給之處理液的流 量 ° [第3實施形態] • 使用圖7,說明本發明第3實施形態之非接觸液封裝置。 ' 圖7(a)係本實施形態之非接觸液封裝置中喷流噴出部的平 面圖,圖7(b)係噴流噴出部於工件側的侧視圖。再者,對 • 與第1及第2實施形態之非接觸液封裝置相同之構成要素, 使用同一符號,且省略或簡略說明。 本實施形態之非接觸液封裝置的基本結構,係與第ι實 施形態之非接觸液封裝置相同。本實施形態之非接觸液二 裝置的主要特徵$ ’於噴流噴嘴板34上設置有狹縫狀喷流 嘴46,取代喷孔為圓形之複數個噴流嘴%。 、 如圖7(a)及圖7(b)所示,喷流噴嘴板34上設有上下方向 上呈狹缝狀之噴流嘴46。狹縫狀噴流嘴46之寬度,例如越 攀肖下方越寬。再者,狹縫狀喷流嘴46之寬度,亦可於上下 方向上大致固定。狹縫狀噴流嘴46之寬度,例如為 _ mm左右。狹縫狀噴流嘴46係與噴流體管路32相連。. • 介隔王件12而對向之―對噴流噴嘴板34的狹縫狀噴流嘴 46’與複數個噴流嘴36同樣,朝向工㈣自工件12兩侧均 勻地噴出處理液的喷流。 如此般’亦可設置狹縫狀噴流嘴46,取代噴孔為圓形之 複數個喷流嘴36。 125312.doc -23- 200831719 [第4實施形態] 使用圖8 ’說明本發明第4實施形態之非接觸液封裝置。 圖8係表示本實施形態之非接觸液封裝置之構造的剖面 圖。再者’對與第1〜第3實施形態之非接觸液封裝置相同 之構成要素,使用同一符號,且省略或簡略說明。 本實施形態之非接觸液封裝置的基本結構,係與第^實 施形態之非接觸液封裝置相同。本實施形態之非接觸液封 裝置的主要特徵為,於噴流噴嘴板34上設置有複數個噴流 嘴48,取代複數個喷流嘴36,複數個喷流嘴48係朝向工件 12移動方向之大致垂直方向,複數個喷流嘴36係朝向相對 於工件12移動方向之垂直方向而朝浸潰槽1〇側傾斜的方 向0 如圖8所示,於非接觸液封裝置22中,設置於噴流體管 路32之工件12侧的喷流喷嘴板34,具有對向於工件12之面 大致平行於工件12移動方向的平坦部5〇。喷流喷嘴板34之 平坦部50兩側的面為傾斜面。 複數個喷流嘴48係於浸潰槽1 〇之狹缝2〇所對應的範圍 内,於上下方向排列設置在平坦部5〇之浸潰槽1 〇側,且與 喷流體管路32相連。 複數個喷流嘴48之喷孔,例如以於上下方向上大致固定 之間距,在平坦部50之對向於工件12的平面上排列成一 行。複數個喷流嘴48之喷孔,例如為直徑相同之圓形。 各喷流嘴48係朝向工件12移動方向之大致垂直方向。各 噴流嘴48係朝向工件12,將噴流體管路32所供給之處理液 125312.doc -24- 200831719 作為噴流,向工件12移動方向之大致垂直方向大致水平地 噴出。 在介隔工件12而對向配置之一對噴流噴出部24的噴流噴 嘴板34之間,構成有受到平坦部50之對向於工件12之面失 持的喷流狹縫40。 進而,在一對噴流噴出部24之喷流噴嘴板34之間,於喷 流狹縫40之浸潰槽1〇側,構成有寬度朝向浸潰槽1〇側擴大 的喉部42。又,於喷流狹縫40之與浸潰槽1〇相反一侧,構 成有見度朝向與浸潰槽1 〇相反一側擴大的喉部44。關於在 工件12移動方向上之長度,較之與浸潰槽1〇相反一側之喉 部44,浸潰槽1 〇侧之喉部42較長。 藉此,於工件12將通過的一對喷流喷嘴板34之間,在沿 著浸潰槽10之狹縫20且對應於狹缝2〇的範圍内,構成有喉 部42、喷流狹缝40、及喉部44。在喷流狹縫40内,由工件 12兩侧之複數個喷流嘴48,朝向工件自工件丨2兩侧均勻地 噴出處理液之噴流。 如此般’亦可於喷流噴嘴板34上設置朝向工件12移動方 向之大致垂直方向的複數個噴流嘴48,取代朝向相對於工 件12移動方向之垂直方向而朝浸潰槽1〇侧傾斜之方向的複 數個喷流嘴36。 再者,關於喷流嘴48,亦可與第2實施形態之情形同 樣,改變噴孔之形狀、間距、行數,或將喷流體管路32劃 分為複數個區室而對複數個區室之每一個供給喷流嘴判所 噴出之處理液。 125312.doc -25 - 200831719 [第5實施形態] 使用圖9,說明本發明篦s每 t / 月弟5灵施形恶之非接觸液封裝置。 圖9係表示本實施形態 / - I#接觸液封裝置之構造的剖面 圖。再者’對與第1〜第4實絲带能夕 、 乐4貰她形恶之非接觸液封裝置相同 之構成要素,使用同一傳跋,Q★ μ 付疏且螭略或簡略說明。The center of the gap of the slit 40 is minimized by the amount of liquid flowing out of the dipping groove 1 through the jet slit 4, whereby the shape and size of the non-contact liquid sealing device 22 can be practically set. As described above, according to the present embodiment, when the single-piece or strip-shaped workpiece 12 is carried into the ejecting tank 1〇 in a state of being substantially vertical in the width direction, the slit 20 of the π" is filled in the slit In the slit 4, a plurality of nozzles 36 on both sides of the workpiece are uniformly sprayed from the sides of the workpiece 12 toward the workpiece 12, so that the nozzle can be sufficiently suppressed or reduced in a form not in contact with the workpiece 12. [Liquid 2] The non-contact liquid sealing device according to the second embodiment of the present invention will be described with reference to Fig. 6. Fig. 6 (4) is a jet flow discharging portion of the non-contact liquid sealing device of the present embodiment. Fig. 6(b) is a side view of the jet ejecting portion on the workpiece side. The same components as those of the non-contact liquid sealing device according to the first embodiment are denoted by the same reference numerals, and are omitted or simplified. The basic structure of the non-contact liquid sealing device is the same as that of the non-contact liquid sealing device of the embodiment of the invention. The main feature of the non-contact liquid sealing device of the present embodiment is that it is arranged in the vertical direction. Set on Among the plurality of nozzles 36 on the projecting portion 38 of the nozzle plate 34, the more the nozzle holes of the nozzles 36 disposed downward, the longer the shape is in the vertical direction in the vertical direction. The hydraulic pressure of the treatment liquid in the tank 10 is higher toward the lower side from the liquid surface. Therefore, the hydraulic pressure of the treatment liquid to be discharged from the immersion tank 10 is higher toward the lower side of the immersion tank 10. It is preferable that the action of suppressing the outflow of the treatment liquid from the immersion tank 1 is enhanced as it goes below the immersion tank 10. Therefore, as shown in Fig. 6(b), in the present embodiment, the arrangement is arranged in the vertical direction. In the plurality of nozzles on the protruding portion 38 of the jet nozzle plate 34, the more the nozzle hole of the nozzle 36 disposed downward, the longer the shape is in the vertical direction in the vertical direction. The shape of the orifice of the nozzle 36 is changed in the vertical direction. Therefore, the more the nozzle 36 is disposed downward, the more the flow rate of the treatment liquid that is discharged as the jet flow is increased. Therefore, according to the present embodiment, The more it is under / and / below the bay 10, the more it can suppress the outflow of the treatment liquid from the immersion tank. I can sufficiently suppress or reduce the outflow of the treatment liquid from the immersion tank 10. The more the nozzle 36 disposed downward, the more the flow rate of the treatment liquid that is ejected as the jet flow is increased, and It is limited to the above-mentioned structure. For example, it is also possible to arrange the flow nozzle 36 to the lower side, and the flow nozzle 36 has a larger aperture. Further, it may be arranged in a plurality of nozzles 36 arranged in the upper and lower ancient A u , ^ as above. The more the spacing of the nozzle holes is, the more the number of rows of the nozzles arranged in the vertical direction is changed according to the height. The number of rows of the orifices of the nozzles 36 is 125312.doc -22 - 200831719. Further, the spray fluid line 32 can be divided into a plurality of compartments in the up and down direction, and the treatment liquid sprayed from the nozzles 36 is supplied to each of the plurality of compartments, and the lower the zone The flow rate of the supplied treatment liquid is increased. [Third Embodiment] A non-contact liquid sealing apparatus according to a third embodiment of the present invention will be described with reference to Fig. 7 . Fig. 7 (a) is a plan view of the jet ejecting portion in the non-contact liquid sealing device of the embodiment, and Fig. 7 (b) is a side view of the jet ejecting portion on the workpiece side. The same components as those of the non-contact liquid sealing devices of the first and second embodiments are denoted by the same reference numerals and will not be described or simply described. The basic configuration of the non-contact liquid sealing device of the present embodiment is the same as that of the non-contact liquid sealing device of the first embodiment. The main feature of the non-contact liquid two apparatus of the present embodiment is that a slit-shaped nozzle 46 is provided on the jet nozzle plate 34, instead of a plurality of nozzles having a circular orifice. As shown in Fig. 7 (a) and Fig. 7 (b), the jet nozzle plate 34 is provided with a nozzle 46 having a slit shape in the vertical direction. The width of the slit-like nozzle 46 is, for example, wider as it is below. Further, the width of the slit-shaped nozzle 46 may be substantially fixed in the up and down direction. The width of the slit-like nozzle 46 is, for example, about _ mm. The slit-like nozzle 46 is connected to the spray fluid line 32. • The slit-shaped nozzle 46' opposed to the jet nozzle plate 34, which is opposed to the king member 12, is uniformly sprayed with the jet of the treatment liquid from both sides of the workpiece 12 toward the workpiece (four) in the same manner as the plurality of nozzles 36. Thus, a slit-like nozzle 46 may be provided instead of a plurality of nozzles 36 having a circular orifice. [Fourth Embodiment] A non-contact liquid sealing device according to a fourth embodiment of the present invention will be described with reference to Fig. 8'. Fig. 8 is a cross-sectional view showing the structure of the non-contact liquid sealing device of the embodiment. The same components as those of the non-contact liquid sealing devices of the first to third embodiments are denoted by the same reference numerals and will not be described or simply described. The basic configuration of the non-contact liquid sealing device of the present embodiment is the same as that of the non-contact liquid sealing device of the first embodiment. The main feature of the non-contact liquid sealing device of the present embodiment is that a plurality of nozzles 48 are provided on the jet nozzle plate 34. Instead of the plurality of nozzles 36, the plurality of nozzles 48 are oriented toward the direction in which the workpiece 12 moves. In the vertical direction, the plurality of nozzles 36 are oriented in a direction oblique to the direction perpendicular to the moving direction of the workpiece 12 toward the side of the dipping groove 1 as shown in FIG. 8. In the non-contact liquid sealing device 22, the jet is disposed in the jet flow. The jet nozzle plate 34 on the workpiece 12 side of the body line 32 has a flat portion 5 that faces the workpiece 12 in a direction substantially parallel to the direction in which the workpiece 12 moves. The faces on both sides of the flat portion 50 of the jet nozzle plate 34 are inclined faces. A plurality of nozzles 48 are arranged in the range corresponding to the slits 2〇 of the immersion tank 1 ,, and are arranged in the vertical direction on the raking groove 1 平坦 side of the flat portion 5〇, and are connected to the spray fluid line 32. . The orifices of the plurality of nozzles 48 are arranged in a row on the plane of the flat portion 50 facing the workpiece 12, for example, at a substantially constant distance in the up-and-down direction. The orifices of the plurality of nozzles 48 are, for example, circular in the same diameter. Each of the nozzles 48 is oriented in a substantially vertical direction in the direction in which the workpiece 12 moves. Each of the nozzles 48 is directed toward the workpiece 12, and the processing liquid 125312.doc - 24 - 200831719 supplied from the jet fluid line 32 is sprayed as a jet flow, and is ejected substantially horizontally in a substantially vertical direction in the moving direction of the workpiece 12. Between the jet nozzle plates 34, which are disposed opposite to the workpiece 12 and opposed to the jet ejecting portion 24, a jet slit 40 which is opposed to the surface of the flat portion 50 facing the workpiece 12 is formed. Further, between the jet nozzle plates 34 of the pair of jet discharge portions 24, a throat portion 42 whose width is enlarged toward the side of the impregnation groove 1 is formed on the side of the impregnation groove 1 of the jet slit 40. Further, on the side opposite to the impregnation groove 1〇 of the jet slit 40, the throat portion 44 whose visibility is enlarged toward the side opposite to the dipping groove 1 is formed. Regarding the length in the moving direction of the workpiece 12, the throat portion 42 on the side of the immersion groove 1 is longer than the throat portion 44 on the side opposite to the immersion groove 1''. Thereby, between the pair of jet nozzle plates 34 through which the workpiece 12 passes, the throat 42 and the jet flow are formed in the range along the slit 20 of the dipping tank 10 and corresponding to the slit 2〇. The slit 40 and the throat 44. In the jet slit 40, a plurality of nozzles 48 on both sides of the workpiece 12 uniformly eject the jet of the treatment liquid from both sides of the workpiece 朝向2 toward the workpiece. Thus, a plurality of nozzles 48 may be provided on the jet nozzle plate 34 in a substantially vertical direction toward the moving direction of the workpiece 12, instead of being inclined toward the side of the dipping groove 1 in a direction perpendicular to the moving direction of the workpiece 12. A plurality of nozzles 36 in the direction. Further, in the nozzle 48, the shape, the pitch, and the number of rows of the nozzle holes may be changed as in the case of the second embodiment, or the jet fluid conduit 32 may be divided into a plurality of compartments for a plurality of compartments. Each of the supply nozzles determines the discharge of the treatment liquid. 125312.doc -25 - 200831719 [Fifth Embodiment] A non-contact liquid sealing device of the present invention is described with reference to Fig. 9 for each t/month. Fig. 9 is a cross-sectional view showing the structure of the /I# contact liquid sealing device of the embodiment. Furthermore, the same components as those of the non-contact liquid sealing devices of the first to fourth real ribbons, and the music of the first and fourth parties are used, and the same code is used, and Q★μ is omitted and briefly described.

本實施形態之非接觸液封裝置的基本結構,係與第】· 施形態之非接觸液封裝置相同。本實施形態之非接觸液封 裝置的主要特徵為’除朝向相對於工件⑽動方向之垂直 方向而朝浸潰槽10側傾斜之方向的複數個噴流嘴36之外, 與第4實施形態之非接觸液封裝置同樣,在喷流喷嘴板34 上设置朝向工件12移動方向之大致垂直方向的複數個喷流 嘴48 〇 如圖9所示,於非接觸液封裝置22中,設置於喷流體管 路32之工件12侧的噴流喷嘴板34,具有對向於工件12之面 大致平行於工件12移動方向的平坦部5〇。平坦部5〇之浸潰 槽10側的噴流噴嘴板34之面,比平坦部50之對向於工件12 的面離工件12之位置遠,且與工件12之移動方向大致平 行。平坦部50之與浸潰槽1〇相反一側的噴流噴嘴板34之面 為傾斜面。 喷流噴嘴板34具有複數個喷流嘴36及複數個噴流嘴48, 複數個噴流嘴36係設置在平坦部50之浸潰槽1〇側,複數個 噴流嘴48係設置在平坦部50之較喷流嘴36離浸潰槽10遠的 位置處。 複數個噴流嘴36係,在浸潰槽1〇之狹缝20所對應的範圍 125312.doc -26- 200831719 内,於上下方向排列設置在噴流喷嘴板34之平坦部50的浸 潰槽10側,且與喷流體管路32相連。 複數個喷流嘴36之喷孔,係例如以上下方向上大致固定 之間距’在平坦部50之對向於工件12的角部上排列成一 行。複數個噴流嘴36之喷孔,例如為直徑相同之圓形。 各喷流嘴3 6係朝向相對於工件丨2移動方向之垂直方向而 朝浸潰槽10侧傾斜的方向。各噴流嘴36係朝向工件12,將 喷流體管路32所供給之處理液作為喷流,向相對於工件12 移動方向之垂直方向而朝浸潰槽1〇側傾斜的方向大致水平 地噴出。 另一方面,複數個喷流嘴48係,在浸潰槽10之狹縫20所 對應的範圍内,於上下方向排列設置在平坦部5〇之較喷流 嘴36離浸潰槽10遠的位置處,且與噴流體管路32相連。 複數個噴流嘴48之喷孔,係例如以於上下方向上大致固 定之間距,於平坦部50之對向於工件12的平面上排列成一 行。複數個喷流嘴48之喷孔,例如為直徑相同之圓形。 各喷流嘴48係朝向工件12移動方向之大致垂直方向。各 噴流嘴48係朝向工件12,將噴流體管路如供給之處理液 作為喷流’向工件12移動方向之大致垂直方向大致水平地 噴出。 在介隔向配置之—對噴流噴出部㈣喷流喷 嘴板34之間,構成有受到平坦㈣之對向於工件12之面夾 持的噴流狹縫40。 進而’於-對噴流噴出部24之噴流喷嘴板μ之間,於喷 125312.doc • 27 - 200831719 流狹縫40之浸潰槽1 〇側’構成有寬度大致固定之喉部42。 又,於喷流狹縫4 0之與浸潰槽1 〇相反一側,構成有寬度朝 向與浸潰槽10相反一側擴大之喉部44。 藉此,於工件12將通過的一對噴流噴嘴板34之間,在沿 著浸潰槽1〇之狹縫20且對應於狹縫20的範圍内,構成有喉 部42、喷流狹縫40、及喉部44 〇 於喷流狹縫40内,由工件12兩側之朝向傾斜方向的複數 個喷流嘴36,朝向工件12自工件12兩側均勻地喷出處理液 之噴流’並且由工件12兩侧之朝向大致垂直方向的複數個 噴流嘴48,朝向工件12自工件12兩側均勻地喷出處理液之 喷流。 如此般,亦可於喷流噴嘴板34上設置有複數個噴流嘴36 的同時設置複數個喷流嘴48,複數個喷流嘴36係朝向相對 於工件12移動方向之垂直方向而朝浸潰槽10側傾斜的方 向’而複數個噴流嘴48係朝向工件12移動方向之大致垂直 方向。 再者,關於噴流嘴36、48,亦可與第2實施形態之情形 同樣改變噴孔之形狀、間距、行數,或將喷流體管路32 剑分為複數個區室並對複數個區室之每一個供給噴流嘴 36、48所噴出之處理液。 、71 [弟6實施形態] 、使用圖1〇及圖11,說明本發明第6實施形態之非接觸液 令裝置及方法。圖1〇係表示本實施形態之非接觸液封裝置 I的°】面圖,圖11係表示本實施形態之非接觸液封裝 1253l2.doc -28- 200831719 置中密封滾筒之其他例的概略圖。再者,對與幻〜第5實 施形恶之非接觸液封裝置相同之構成要素,使用同一符 號’且省略或簡略說明。 ’ 於上述第1〜第5實施形態之非接觸液封裝置中,在狹縫 兩侧之侧壁18端部之外表面,以介隔通過狹縫2()之工件 12而對向之方式配置有—對噴流噴出部。藉由自—對喷 流^出部24朝向工件12自工件12兩侧均勻噴出的處理液之 喷流,工件12之兩面並不與浸潰槽1〇之狹縫2()内面以及喷 流喷嘴板34接觸,而穩定地搬入搬出浸潰槽1〇。 相對於f列如,J1件i 2其中—個面為須施以電鑛處理 等處理的處理面,而另—個面為無須實施處理或未進行處 理之非處理面的情形下,狹縫2〇兩侧則並非必須配置一對 噴流噴出部24。亦即,可行的是,於狹縫2〇之工件12的處 根據可如此般防止卫件12之兩面與周邊部件、零件之接 觸的上述第1〜第5實施形態之非接觸液封裝置,可於工件 12之兩面係須施以電錄處理等處理的處理面之情形下可 靠地防止兩個處理面中任何一面產生受損、變色等缺陷。The basic configuration of the non-contact liquid sealing device of the present embodiment is the same as that of the non-contact liquid sealing device of the first embodiment. The main feature of the non-contact liquid sealing device according to the present embodiment is that, in addition to the plurality of nozzles 36 that are inclined toward the direction of the dipping groove 10 in the direction perpendicular to the moving direction of the workpiece (10), the fourth embodiment is In the non-contact liquid sealing device, a plurality of nozzles 48 are provided on the jet nozzle plate 34 in a substantially vertical direction toward the moving direction of the workpiece 12, as shown in Fig. 9, in the non-contact liquid sealing device 22, and are disposed in the spray. The jet nozzle plate 34 on the workpiece 12 side of the fluid line 32 has a flat portion 5 that faces the workpiece 12 in a direction substantially parallel to the direction in which the workpiece 12 moves. The surface of the jet nozzle plate 34 on the side of the dipping groove 10 of the flat portion 5 is farther than the position of the flat portion 50 facing the workpiece 12 from the workpiece 12, and is substantially parallel to the moving direction of the workpiece 12. The surface of the jet nozzle plate 34 on the side opposite to the dipping groove 1 of the flat portion 50 is an inclined surface. The jet nozzle plate 34 has a plurality of nozzles 36 and a plurality of nozzles 48. The plurality of nozzles 36 are disposed on the side of the dipping groove 1 of the flat portion 50, and the plurality of nozzles 48 are disposed in the flat portion 50. It is at a position farther from the immersion tank 10 than the nozzle 36. A plurality of nozzles 36 are arranged in the range of 125312.doc -26-200831719 corresponding to the slit 20 of the immersion tank 1 in the vertical direction on the side of the immersion tank 10 of the flat portion 50 of the jet nozzle plate 34. And connected to the spray fluid line 32. The orifices of the plurality of nozzles 36 are arranged in a row on the corners of the flat portion 50 facing the workpiece 12, for example, in the upper and lower directions. The orifices of the plurality of nozzles 36 are, for example, circular in the same diameter. Each of the nozzles 63 is oriented in a direction inclined toward the direction of the dipping groove 10 with respect to the vertical direction of the moving direction of the workpiece 丨2. Each of the nozzles 36 is directed toward the workpiece 12, and the processing liquid supplied from the jet fluid line 32 is sprayed as a jet flow, and is ejected substantially horizontally in a direction oblique to the side of the dipping groove 1 in the direction perpendicular to the moving direction of the workpiece 12. On the other hand, the plurality of nozzles 48 are arranged in the vertical direction in the range corresponding to the slits 20 of the immersion tank 10, and the nozzles 36 are arranged farther from the immersion tank 10 in the vertical direction. The position is connected to the spray fluid line 32. The orifices of the plurality of nozzles 48 are arranged in a row on the plane of the flat portion 50 facing the workpiece 12, for example, in a substantially fixed distance in the up-and-down direction. The orifices of the plurality of nozzles 48 are, for example, circular in the same diameter. Each of the nozzles 48 is oriented in a substantially vertical direction in the direction in which the workpiece 12 moves. Each of the nozzles 48 is directed toward the workpiece 12, and the spray fluid line, such as the supplied treatment liquid, is ejected substantially horizontally in a substantially vertical direction in the direction in which the workpiece 12 moves. Between the jet-discharging portions (four) of the jet-flow nozzle plates 34, which are arranged in the opposing direction, a jet slit 40 which is opposed to the surface of the workpiece 12 by the flat (four) is formed. Further, between the jet nozzle plates μ of the jet flow ejecting portion 24, a throat portion 42 having a substantially constant width is formed on the side of the impregnation groove 1 of the flow slits 125312.doc • 27 - 200831719. Further, on the side opposite to the dipping groove 1 喷 of the jet slit 40, a throat portion 44 whose width is enlarged toward the side opposite to the dipping groove 10 is formed. Thereby, between the pair of jet nozzle plates 34 through which the workpiece 12 passes, a throat 42 and a jet slit are formed in a range along the slit 20 of the dipping groove 1 and corresponding to the slit 20. 40, and the throat 44 is in the jet slit 40, and a plurality of nozzles 36 in the oblique direction from both sides of the workpiece 12 are uniformly sprayed toward the workpiece 12 from the sides of the workpiece 12 and A plurality of nozzles 48, which are oriented in a substantially vertical direction from both sides of the workpiece 12, uniformly discharge a jet of the treatment liquid from both sides of the workpiece 12 toward the workpiece 12. In this manner, a plurality of nozzles 48 may be provided on the jet nozzle plate 34 while a plurality of nozzles 36 are provided, and the plurality of nozzles 36 are oriented toward the vertical direction with respect to the moving direction of the workpiece 12. The groove 10 is inclined in the direction 'and the plurality of nozzles 48 are oriented substantially perpendicular to the direction in which the workpiece 12 moves. Further, with respect to the nozzles 36, 48, the shape, the pitch, the number of rows of the orifices may be changed as in the case of the second embodiment, or the jet fluid pipe 32 may be divided into a plurality of compartments and a plurality of zones. Each of the chambers supplies the treatment liquid sprayed from the nozzles 36, 48. [71] The second embodiment of the present invention will be described with reference to Figs. 1 and 11 to illustrate a non-contact liquid discharge apparatus and method according to a sixth embodiment of the present invention. Fig. 1 is a plan view showing the non-contact liquid sealing device 1 of the present embodiment, and Fig. 11 is a schematic view showing another example of the sealing roller in the non-contact liquid sealing package 12532.1.doc -28-200831719 of the present embodiment. . Further, the same components as those of the non-contact liquid sealing device of the illusion to the fifth embodiment are denoted by the same reference numerals and are omitted or simplified. In the non-contact liquid sealing device according to the first to fifth embodiments, the outer surface of the side wall 18 on both sides of the slit is opposed to the workpiece 12 passing through the slit 2 (). It is equipped with a pair of jet ejecting sections. By the jet of the treatment liquid uniformly ejected from the jet flow portion 24 toward the workpiece 12 from both sides of the workpiece 12, the both sides of the workpiece 12 are not in contact with the inner surface of the slit 2 () of the impregnation groove 1 and the jet flow. The nozzle plate 34 is in contact with each other, and is stably carried in and out of the dipping tank 1〇. For example, in the case of the f-column, the J1 piece i 2 is a processing surface to which a treatment such as electro-mine treatment is required, and the other surface is a non-treated surface which is not required to be treated or not processed, and the slit is It is not necessary to arrange a pair of jet ejecting portions 24 on both sides of the crucible. In other words, it is possible to use the non-contact liquid sealing device of the first to fifth embodiments in which the workpiece 12 of the slit 2 is prevented from being in contact with the peripheral member and the member on both sides of the guard 12, It is possible to reliably prevent defects such as damage, discoloration, and the like on either side of the two processing surfaces in the case where the processing surface of the workpiece 12 is subjected to a treatment such as an electric recording process.

而在狹縫20之工件12的非處理 理面侧配置喷流喷出部24 面侧配置與工件12之非處理面接觸的液封機構。 上述第1〜第5實施形態之非接觸液封裝置係,實現工件 12之兩面為非接觸狀態而進行液封的兩面非接觸型,與此 相對’本實施形態之非接觸液封裝置係,實現工件12之單 面為非接觸狀態而進行液封的單面非接觸型。具體而言, 本實施形態之非接觸液封裝置係,在工件12其中一個面為 125312.doc -29- 200831719 處理面12a、另一個面為非處理面12b的情形下,於狹缝20 之工件12的處理面12a侧,配置喷流喷出部24以實現與處 理面12a之非接觸,另一方面,於狹縫2〇之工件12的非處 理面12b侧,配置接觸工件12之非處理面的密封滾筒82作 為液封機構。 圖10表示設置於浸潰槽10之工件12搬入侧之側壁1 8上的 本實施形態之非接觸液封裝置78的構造。再者,設置於浸 潰槽10之工件12搬出側之侧壁丨8上的非接觸液封裝置78亦 具有相同構造。 如圖所示,於狹縫20之工件12的處理面12a侧,配置有 /、第1只%形恶之非接觸液封裝置相同之喷流噴出部24。 噴流喷出部24由噴流體管路32與喷流喷嘴板34所組成,喷 流體管路32係作為喷流被喷出之處理液的流道,喷流喷嘴 板34係設有朝向工件12噴出噴流體管路^内之處理液作為 噴流的複數個噴流嘴36。再者,噴流噴出部24亦可與第2〜 第5實施形態之非接觸液封裝置中的相同。又,圖ι〇中, 表示的是噴流噴出部24於浸潰槽10侧之側壁兼作浸潰槽10 之側壁的情形,亦可例如與圖4所示情形相同,分開設置 噴流喷出部24之侧壁及浸潰槽1〇之侧壁。 另方面於狹縫20之工件12非處理面12b側的側壁18 之外表面’設有向工件】^彳丨 千2側開口之密封槽8〇。密封槽⑽内 收容有以中心軸為旋轉站 ^ 疋轉釉而自由旋轉的圓柱狀或圓筒狀密 封滾筒82。 欲封滾筒82,例如你率* ’、Λ氣乙烯或鐵氟龍(註冊商標)等樹 125312.doc -30- 200831719 脂製中空的管狀剛性體。密封滾筒82之外周面既可為平滑 面,亦可在整個外周設置沿著密封滚筒82之轴方向的 複數條溝槽。又,密封滾筒82亦可具有段結構,即,其上 端及下端附近具有直徑變大之粗徑部。於密封滾筒82内部 之底部,設有錘(未圖示),以使密封滾筒82之姿勢穩定。 密封滾筒82之下端及上端的中央部分設有凹部。下端之 凹部嵌合於設置在密封槽80底部的凸部。又,上端之凹部 嵌合於設置在密封槽80之上部的凸部。此等凹部與凸部之 嵌合處設有適當的間隙作為餘量。藉此,可防止密封滾筒 82在密封槽8〇内翻倒,而旋轉中心軸可於水平方向上移 動。再者,亦可不設置此種凹部及凸部,而以設置適當間 隙作為餘量之方式將密封滾筒82收容在密封槽8〇内,從而 防止密封滾筒82翻倒,並且使密封滾筒82旋轉自如。 如此般,本實施形態之非接觸液封裝置78的主要特徵 為,具有配置於狹縫20之工件12之處理面i2a侧的喷流喷 出部24,及配置於狹縫20之工件12之非處理面12b侧的密 封滾筒82。 工件12搬入搬出浸潰槽1〇期間,在配置於狹縫2〇之工件 12之處理面12a側的喷流噴出部24中,與第1實施形態之情 形同樣,處理液供給至喷流體管路32,由喷流喷嘴板34之 複數個喷流嘴36喷出處理液之噴流。藉此,於噴流噴出部 24中,由喷流喷嘴板34之噴流嘴3 6,朝向工件12之處理面 12a喷出處理液之喷流。 如此般,在狹缝20之工件12之處理面i2a側,由噴流喷 125312.doc -31- 200831719 出部24噴出喷流,藉此處理液自狹縫2〇的流出被抑制或者 減少。 另一方面,經由狹縫20,浸潰槽1 〇内之處理液裝滿密封 槽8〇,密封槽80收容有配置於狹縫20之工件12的非處理面 12b側之密封滾筒82。密封滾筒82係藉由處理液之液壓自 動按壓於工件12之非處理面12b,並且按壓於對向於浸潰 槽1 〇之側壁1 8的密封槽8 0之侧壁。 藉此,密封滾筒82與工件12之非處理面i2b密著,並且 與畨封槽80之侧壁密著。密著於工件12之非處理面12匕的 密封滾筒82,伴隨工件12之移動而旋轉。 如此般,於狹縫20之工件12之非處理面12b側,藉由密 著於工件12之非處理面12b的密封滾筒82,處理液自狹縫 20的流出被減少或者抑制。 此處,以使密封滾筒82按壓於工件12上之力,與藉由噴 流噴出部24所噴出之處理液而按壓工件12之力均衡的方 式,控制由噴流噴出部24喷出之處理液的流量,以使工件 12之處理面12a不與噴流喷嘴板“等周邊部件、零件相 觸。 又對於噴流噴出部24之各噴流嘴36而言,較理想的 疋,適當设定其朝向,以使處理液向密封滚筒82與工件12 ,接觸#喷出。例如,與第1實施形態之情形同樣,在各 喷l嘴6朝向相對於工件。移動方向之垂直方向而朝浸 槽1〇側傾斜的方向之情形下,設定各喷流嘴36之方向朝’向 浸潰槽10側傾斜 、 . 、 一 以使處理液自各噴流嘴3 6朝向密封滾筒 125312.doc •32· 200831719 82與工件12之接觸部噴出。藉由處理液朝向密封滾筒η與 工件12之接觸部噴出,可進一步使於噴流噴出部24與密封 滾筒82之間移動的工件12之位置穩定。 如此般,於本實施形態之非接觸液封裝置78中,在狹縫 20之工件12之處理面12a侧,由噴流喷出部以喷出噴流, - 藉此維持工件12之處理面12a與喷流噴嘴板34等周邊部 • #、零件的非接觸狀態,並且抑制或者減少處理液自狹縫 20的",L出。另-方面,於狹縫20之工件12之非處理面m 釀債i ’藉由與丄件12之非處理面12b接觸的密封滾筒82,減 少或者抑制處理液自狹縫20的流出。 於工件12之非處理面12b側,利用與工件12之非處理面 12b接觸的密封滾筒82進行液封,故而相比較於使用有一 對噴流喷出部24的第丨〜第5實施形態之非接觸液封裝置, 可進v抑制或者減少處理液自浸潰槽1 〇之狹縫20的流 出。另一方面,於工件12之處理面12a側,利用噴流喷出 部24進行液封,故而能可靠地地防止工件n之處理面 產生受損、變色等缺陷。 如此般,根據本實施形態,在處理其中一個面為處理面 l2a、另一個面為非處理面12b之工件12的情形時,能可靠 防止工件12之處理面12a產生受損、變色等缺陷,並 可進步抑制或者減少處理液浸潰槽1 〇之狹縫2〇的流 再者,以上,已說明密著於工件12之非處理面12b的密 封滾筒82伴隨工件12之移動進行旋轉之情形,亦可利用齒 125312.doc -33- 200831719 輪馬達等馬達使密封滾筒82旋轉,以使密封滚㈣不僅作 為液封機構,亦作為搬送工件12之搬送機構而發揮作用。 圖11表示湘齒輪馬達84使密封滾_旋轉之結構。 如圖所示,密封滚筒82係受到設置於其上侧及下侧之轴 承86a、86b軸支撐且旋轉自如。 齒輪馬達84之輸出軸的旋轉係經由聯軸器88傳遞至密封 滾筒82 #此’藉由齒輪馬達84,使得密封滾筒a旋轉以 搬送工件12。On the non-processing side of the workpiece 12 of the slit 20, a liquid sealing mechanism in which the non-processing surface of the workpiece 12 is placed on the surface side of the jet ejecting portion 24 is disposed. In the non-contact liquid sealing device of the first to fifth embodiments, the two-surface non-contact type in which both surfaces of the workpiece 12 are in a non-contact state and liquid-sealed is performed, and the non-contact liquid sealing device of the present embodiment is A single-sided non-contact type in which one side of the workpiece 12 is in a non-contact state and liquid-sealed is performed. Specifically, in the non-contact liquid sealing device of the present embodiment, in the case where one surface of the workpiece 12 is 125312.doc -29-200831719 processing surface 12a and the other surface is the non-processing surface 12b, the slit 20 is On the processing surface 12a side of the workpiece 12, the jet ejecting portion 24 is disposed so as not to be in contact with the processing surface 12a, and on the non-processing surface 12b side of the workpiece 12 of the slit 2, the non-contact workpiece 12 is disposed. The sealing drum 82 of the processing surface serves as a liquid sealing mechanism. Fig. 10 shows the structure of the non-contact liquid sealing device 78 of the present embodiment which is provided on the side wall 18 of the workpiece 12 on the loading side of the dipping tank 10. Further, the non-contact liquid sealing device 78 provided on the side wall 丨 8 of the workpiece 12 on the unloading side of the immersion tank 10 has the same structure. As shown in the figure, on the processing surface 12a side of the workpiece 12 of the slit 20, a jet discharge portion 24 of the same type as the first non-contact liquid sealing device of the first %-shaped smear is disposed. The jet ejecting portion 24 is composed of a jet fluid line 32 and a jet nozzle plate 34. The jet fluid line 32 serves as a flow path for the processing liquid from which the jet is ejected, and the jet nozzle plate 34 is provided with the workpiece 12 facing the workpiece 12. The treatment liquid in the spray fluid line is sprayed as a plurality of spray nozzles 36 of the jet flow. Further, the jet discharge portion 24 may be the same as that of the non-contact liquid sealing device of the second to fifth embodiments. Further, in the figure, the side wall of the jet ejecting portion 24 on the side of the dipping groove 10 also serves as the side wall of the dipping groove 10. For example, as in the case shown in Fig. 4, the jet ejecting portion 24 may be separately provided. The side wall and the side wall of the dipping groove 1〇. On the other hand, the outer surface of the side wall 18 on the side of the non-treated surface 12b of the workpiece 12 of the slit 20 is provided with a seal groove 8 which is open to the side of the workpiece. A cylindrical or cylindrical sealing drum 82 that is freely rotatable with the central axis as a rotating station is housed in the sealing groove (10). To seal the drum 82, for example, a tree of rigid metal tubular rigid bodies such as a *', Xenon ethylene or Teflon (registered trademark) 125,123.doc -30-200831719. The outer circumferential surface of the sealing drum 82 may be a smooth surface, or a plurality of grooves may be provided along the axial direction of the sealing drum 82 over the entire outer circumference. Further, the seal roller 82 may have a segment structure in which a large diameter portion having a large diameter is formed in the vicinity of the upper end and the lower end. A hammer (not shown) is provided at the bottom of the inside of the sealing drum 82 to stabilize the posture of the sealing drum 82. A central portion of the lower end and the upper end of the seal roller 82 is provided with a recess. The concave portion at the lower end is fitted to the convex portion provided at the bottom of the seal groove 80. Further, the concave portion at the upper end is fitted to the convex portion provided at the upper portion of the seal groove 80. A suitable gap is provided as a margin between the recesses and the projections. Thereby, the seal cylinder 82 can be prevented from falling over in the seal groove 8, and the rotation center shaft can be moved in the horizontal direction. Further, the recessed portion and the convex portion may not be provided, and the sealing roller 82 may be housed in the sealing groove 8 by providing an appropriate gap as a margin, thereby preventing the sealing roller 82 from falling over and rotating the sealing roller 82 freely. . As described above, the main feature of the non-contact liquid sealing device 78 of the present embodiment is that the jet ejecting portion 24 disposed on the processing surface i2a side of the workpiece 12 of the slit 20 and the workpiece 12 disposed in the slit 20 are provided. The sealing roller 82 on the non-processing surface 12b side. During the loading and unloading of the workpiece 12 into the immersion tank 1 , the processing liquid is supplied to the nozzle tube in the jet venting portion 24 disposed on the processing surface 12 a side of the workpiece 12 of the slit 2 同样 in the same manner as in the first embodiment. In the path 32, a jet of the treatment liquid is ejected from a plurality of nozzles 36 of the jet nozzle plate 34. Thereby, in the jet flow ejecting portion 24, the jet flow of the processing liquid is ejected toward the processing surface 12a of the workpiece 12 by the nozzles 63 of the jet nozzle plate 34. In this manner, on the processing surface i2a side of the workpiece 12 of the slit 20, the jet flow is ejected from the outlet portion 24 of the jet flow 125312.doc - 31 - 200831719, whereby the outflow of the treatment liquid from the slit 2 is suppressed or reduced. On the other hand, the processing liquid in the immersion tank 1 is filled with the sealing groove 8 through the slit 20, and the sealing groove 80 accommodates the sealing roller 82 disposed on the non-treated surface 12b side of the workpiece 12 of the slit 20. The seal roller 82 is automatically pressed against the non-treated surface 12b of the workpiece 12 by the hydraulic pressure of the treatment liquid, and is pressed against the side wall of the seal groove 80 facing the side wall 18 of the immersion tank 1 。. Thereby, the seal roller 82 is adhered to the non-treated surface i2b of the workpiece 12, and is adhered to the side wall of the seal groove 80. The seal roller 82, which is adhered to the non-treatment surface 12 of the workpiece 12, rotates in accordance with the movement of the workpiece 12. In this manner, on the non-treated surface 12b side of the workpiece 12 of the slit 20, the flow of the treatment liquid from the slit 20 is reduced or suppressed by the seal roller 82 adhering to the non-treated surface 12b of the workpiece 12. Here, the force of pressing the workpiece 12 by the processing liquid discharged from the jet ejecting unit 24 is equalized with the force of pressing the sealing roller 82 against the workpiece 12, and the processing liquid discharged from the jet ejecting unit 24 is controlled. The flow rate is such that the processing surface 12a of the workpiece 12 does not come into contact with the peripheral nozzle member or the like of the jet nozzle plate. Further, it is preferable for the respective nozzles 36 of the jet discharge portion 24 to appropriately set the orientation thereof. The processing liquid is ejected to the sealing drum 82 and the workpiece 12 and the contact #. For example, in the same manner as in the first embodiment, each of the nozzles 6 faces the vertical direction of the moving direction of the workpiece toward the dip tank 1 side. In the case of the inclined direction, the direction of each of the nozzles 36 is set to be inclined toward the side of the dipping tank 10, so that the processing liquid is directed from the respective nozzles 63 toward the sealing drum 125312.doc •32·200831719 82 and the workpiece The contact portion of 12 is ejected, and the position of the workpiece 12 moving between the jet ejecting portion 24 and the sealing roller 82 is further stabilized by the discharge of the processing liquid toward the contact portion of the sealing drum η and the workpiece 12. Thus, in the present embodiment, Form In the contact liquid sealing device 78, the jet flow is ejected from the jet ejecting portion on the processing surface 12a side of the workpiece 12 of the slit 20, thereby maintaining the peripheral portion such as the processing surface 12a of the workpiece 12 and the jet nozzle plate 34. #, the non-contact state of the part, and suppress or reduce the treatment liquid from the slit 20, "L out. On the other hand, in the non-processing surface m of the workpiece 12 of the slit 20, the debt is made by the ' The sealing roller 82 that is in contact with the non-processing surface 12b of 12 reduces or suppresses the outflow of the processing liquid from the slit 20. On the non-treated surface 12b side of the workpiece 12, the liquid is sealed by the sealing roller 82 that is in contact with the non-processing surface 12b of the workpiece 12. Since it is sealed, it is possible to suppress or reduce the outflow of the treatment liquid from the slit 20 of the dipping tank 1 in comparison with the non-contact liquid sealing device of the second to fifth embodiments in which the pair of jet ejecting portions 24 are used. On the other hand, since the liquid ejecting portion 24 is liquid-sealed on the processing surface 12a side of the workpiece 12, it is possible to reliably prevent defects such as damage and discoloration on the processing surface of the workpiece n. Thus, according to the present embodiment, Processing one of the faces as the processing surface l2a, the other side In the case of the workpiece 12 of the non-treatment surface 12b, it is possible to reliably prevent defects such as damage and discoloration of the processing surface 12a of the workpiece 12, and it is possible to improve or suppress the flow of the slit 2〇 of the treatment liquid immersing tank 1 As described above, the sealing roller 82 adhered to the non-processing surface 12b of the workpiece 12 has been rotated in accordance with the movement of the workpiece 12. The sealing roller 82 can also be rotated by a motor such as a wheel motor of 125312.doc -33-200831719. The sealing roller (four) functions not only as a liquid sealing mechanism but also as a conveying mechanism for conveying the workpiece 12. Fig. 11 shows a configuration in which the Xiang gear motor 84 rotates the sealing roller. As shown in the figure, the seal roller 82 is rotatably supported by the bearings 86a, 86b provided on the upper and lower sides thereof. The rotation of the output shaft of the gear motor 84 is transmitted to the seal roller 82 via the coupling 88. This is caused by the gear motor 84, so that the seal roller a is rotated to convey the workpiece 12.

如此般,亦可構成為利用齒輪馬達84使密㈣筒82旋 轉’則密封滾㈣不僅作為液封機構,亦作為搬送機構而 發揮作用。 一又,以上,已說明工件12其中一個面為處理面i2a、另 -個面為非處理面12b的情形…亦可針對兩個面為處理 面之工件,使用本實施形態之非接觸液封裝置。 [第7實施形態] 使用圖12’說明本發明第7實施形態之連續濕式處理裝 置。圖12係表示本實施形態之連續濕式處理裝置之構造的 平面圖。再者’對與第1〜第6實施形態之非接觸液封裝置 相同之構成要素,使用同—符號’且省略或簡略說明。 於上述第1〜第6實施形態中,已說明對具備丨個浸潰槽1〇 之濕式處理裝置使用非接觸液封裝置22、78的情形,^本 I月之非接觸液封裝置的適用範圍並非限定於此。本發明 之非接觸液封裝置,例如’如本中請人所中請之專利讀 4中所揭示的連續濕式處理裝置等’亦可用作使用複數個 125312.doc -34 - 200831719 /又視槽連、貝對讀卫件施以濕式處理之連續濕式處理裝置 中的液封裝置。 本貝^ ^怨之連續濕式處理裝置係,使用本發明之非接 觸液封衣置例如第1實施形態之非接觸液封裝置,作為 液封裝置。 β 囷2所示,連續濕式處理裝置係由電鍍處理部52、工 件展開^ 54、及卫件捲繞部56所組成,電鑛處理部52係進 行電鍍處理,工件展開部54係連續將須施以電鑛之帶狀工 件I2送至電鍍處理部52,而工件捲繞部$6係用於連續回收 已在電鑛處理部52中施以電鍍之工件〗2。 工件展開部54上設有開捲機58,開捲機58係將捲成卷狀 之帶狀工件12,以其寬度方向大致鉛直之形式,沿著長度 方向送出,且導入電鍍處理部52中。開捲機58與電鍍處理 部52之間,設有將自開捲機58送出之工件12的張力保持固 疋之積蓄裝置60。積蓄裝置60係自工件側邊調節工件12 之位置,又,具備用以使工件12折返之滾子6〇a、60b、 60c、及60d。 電鍍處理部52具有裝滿電鍍液之複數個電鍍槽62a、 62b、62c、及 62d。於各電鍍槽 62a、62b、62c ' 62d 中, 分別於對向之側壁上設有例如第1實施形態之非接觸液封 裝置22,工件12以寬度方向大致鉛直之形式,經由其中之 一側壁的非接觸液封裝置22而搬入電鍍槽62a、62b、 62c、62d内。搬入電鍍槽62a、62b、62c、62d中之工件 12,保持狀態不變地經由另一侧壁之非接觸液封裝置22而 125312.doc -35- 200831719 搬出電鍍槽62a、62b、62c、62d外。於電鍍槽62b之工件 搬出侧與電鍍槽62c之工件搬入侧的附近,設有us轉彎部 64 ’ U型轉彎部64係用以使由電鍍槽62b之非接觸液封裝置 22搬出的工件12轉換方向,並經由非接觸液封裝置22而搬 入電鍍槽62c。U型轉彎部64具備用以轉換工件12方向的滾 子 64a、64b 〇 於各電鍍槽62a、62b、62c、62d的工件搬入侧與工件搬In this manner, the gear (four) cylinder 82 can be rotated by the gear motor 84. The seal roller (four) functions not only as a liquid sealing mechanism but also as a conveying mechanism. Further, in the above, the case where one surface of the workpiece 12 is the processing surface i2a and the other surface is the non-processing surface 12b has been described. The non-contact liquid sealing of the present embodiment can also be used for the workpiece having the two surfaces as the processing surface. Device. [Seventh embodiment] A continuous wet processing apparatus according to a seventh embodiment of the present invention will be described with reference to Fig. 12'. Fig. 12 is a plan view showing the structure of the continuous wet processing apparatus of the embodiment. The same components as those of the non-contact liquid sealing devices of the first to sixth embodiments are denoted by the same reference numerals, and the description thereof will be omitted or simplified. In the above-described first to sixth embodiments, the case where the non-contact liquid sealing devices 22 and 78 are used for the wet processing apparatus including the one dipping tank 1〇 has been described, and the non-contact liquid sealing device of the present invention is used. The scope of application is not limited to this. The non-contact liquid sealing device of the present invention can be used, for example, as a continuous wet processing device as disclosed in Patent Application No. 4 of the present application, which can also be used as a plurality of 125312.doc -34 - 200831719 / The liquid sealing device in the continuous wet processing device which applies the wet treatment to the groove and the guard. In the continuous wet processing apparatus of the present invention, the non-contact liquid sealing apparatus of the first embodiment is used as the liquid sealing apparatus. As shown by β 囷 2, the continuous wet processing apparatus is composed of a plating processing unit 52, a workpiece development unit 54, and a guard winding unit 56, and the electric ore processing unit 52 performs plating processing, and the workpiece development unit 54 is continuously The strip-shaped workpiece I2 to which the electric ore is applied is sent to the plating treatment portion 52, and the workpiece winding portion $6 is used for continuously recovering the workpiece 2 which has been plated in the electric ore processing unit 52. The workpiece unwinding unit 54 is provided with a uncoiler 58 that winds up the strip-shaped workpiece 12 in a roll shape, which is fed in the longitudinal direction in a substantially vertical direction, and is introduced into the plating processing unit 52. . Between the uncoiler 58 and the plating processing unit 52, an accumulating device 60 for holding the tension of the workpiece 12 sent from the uncoiler 58 is fixed. The accumulating device 60 adjusts the position of the workpiece 12 from the side of the workpiece, and further includes rollers 6A, 60b, 60c, and 60d for folding the workpiece 12. The plating treatment unit 52 has a plurality of plating tanks 62a, 62b, 62c, and 62d filled with a plating solution. In each of the plating tanks 62a, 62b, 62c' 62d, for example, the non-contact liquid sealing device 22 of the first embodiment is provided on the opposite side wall, and the workpiece 12 is substantially vertical in the width direction, and one of the side walls is passed through The non-contact liquid sealing device 22 is carried into the plating tanks 62a, 62b, 62c, and 62d. The workpiece 12 carried into the plating tanks 62a, 62b, 62c, 62d is moved out of the plating tanks 62a, 62b, 62c, 62d via the non-contact liquid sealing device 22 of the other side wall while maintaining the state unchanged 125312.doc -35 - 200831719 outer. The workpiece turning side of the plating tank 62b and the workpiece loading side of the plating tank 62c are provided with a us turning portion 64'. The U-turn portion 64 is a workpiece 12 for carrying out the non-contact liquid sealing device 22 of the plating tank 62b. The direction of the transition is transferred to the plating tank 62c via the non-contact liquid sealing device 22. The U-turn portion 64 is provided with rollers 64a and 64b for switching the direction of the workpiece 12, and the workpiece carrying side and the workpiece are moved to the respective plating tanks 62a, 62b, 62c, and 62d.

出側之非接觸液封裝置22附近,設有用以對工件丨2供電之 供電滾筒部66。供電滾筒部66係以夾持工件12之方式配 置,且具備與工件12接觸而對其供電之供電滾筒66a、 66b、及 66c 〇 於電鍍槽62a之工件搬入側與工件展開部54之間,設有 預處理槽68,預處理槽68係用於除去由工件展開部54送出 之工件12上的污垢。針對裝滿處理液之預處理槽68,亦可 與電鍍槽62a、62b、62c、62d同樣,設置例如第i實施形 態之非接觸液封裝置22。 於電鍍槽62d之工件搬出侧的非接觸液封裝置22附近, 設有喷淋清洗已施mm件12的清洗請。於清洗室 7〇附近,$有熱風乾燥已在清洗室内㈣清洗之m的 乾燥室72。 室72内經過 於乾燥室72附近,配置有捲繞回收已在乾燥 乾燥之工件12的工件捲繞部56。 於工件捲繞部56中 鍍處理部52施以電鍍 "又有重捲機74,重捲機74係將經電 且以寬度方向A致鉛I之形式送出 125312.doc -36· 200831719 的工件12捲繞回收。於重捲機74與電鍍處理部52之乾燥室 72之間’没有用以將工件12以特定速度送至重捲機74的驅 動裝置76 °驅動裝置76具備用以使工件12折返、或改變工 件12移動方向的滾子76a、76b、及76c。 藉此,以其寬度方向大致鉛直之形式,自工件展開部54 向長度方向送出的工件12,順次通過電鍍處理部52之預處 理槽68 ’電鑛槽62a、62b、62c、62d,清洗室7〇,及乾燥 室72後,由工件捲繞部56回收。 如本實施形態般,亦可對連續濕式處理裝置中之電鍍槽 62a、62b、62c、62d,及預處理槽68,設置例如第i實施 形態之非接觸液封裝置22。 再者,以上,已說明設置第丨實施形態之非接觸液封裝 置22作為連續濕式處理裝置中之液封裝置的情形,亦可設 置第2〜第6實施形態之非接觸液封裝置22、78中之任一 個,取代第1實施形態之非接觸液封裝置22。 [第8實施形態] 使用圖13,說明本發明第8實施形態之連續濕式處理裝 置。圖13係表示本實施形態之連續濕式處理裝置之構造的 平面圖。再者,對與第丨〜第6實施形態之非接觸液封^置 以及第7實施形態之連續濕式處理裝置相同之構成要素, 使用同一符號,且省略或簡略說明。 本實施形態之連續濕式處理裝置係,將其中一個面為處 理面12a、另一個面為非處理面12b之工件12作為處理對$ 者。本實施形態之連續濕式處理裝置的基本結構,與第7 125312.doc •37- 200831719 實施形態之連續濕式處理裝置的結構幾乎相同,而與第7 實施形態之連續濕式處理裝置不同之處在於:使用第6實 施形態之非接觸液封裝置78作為液封裝置,以及以儘量避 免與工件12之處理面12a接觸的方式配置有各部件。 如圖13所不,工件12係以處理面丨2a為内側呈卷狀捲在 開捲機58上。In the vicinity of the non-contact liquid sealing device 22 on the exit side, a power supply roller portion 66 for supplying power to the workpiece 2 is provided. The power supply roller unit 66 is disposed so as to sandwich the workpiece 12, and includes power supply rollers 66a, 66b, and 66c that are in contact with the workpiece 12 and supply power thereto between the workpiece loading side of the plating tank 62a and the workpiece development portion 54. A pretreatment tank 68 is provided for removing dirt on the workpiece 12 sent from the workpiece development portion 54. For the pretreatment tank 68 filled with the treatment liquid, a non-contact liquid sealing device 22 of the i-th embodiment may be provided in the same manner as the plating tanks 62a, 62b, 62c, and 62d. In the vicinity of the non-contact liquid sealing device 22 on the workpiece carrying-out side of the plating tank 62d, cleaning of the sprayed mm member 12 is provided. Near the cleaning chamber 7〇, there is a drying chamber 72 that has been hot-air dried in the cleaning chamber (4). In the chamber 72, in the vicinity of the drying chamber 72, a workpiece winding portion 56 for winding and recovering the workpiece 12 which has been dried and dried is disposed. In the workpiece winding portion 56, the plating treatment portion 52 is plated with a rewinding machine 74, and the rewinding machine 74 is supplied with electricity and delivered in the width direction A to lead I. 125312.doc -36·200831719 The workpiece 12 is wound up and recovered. Between the rewinding machine 74 and the drying chamber 72 of the plating processing unit 52, there is no driving device 76 for driving the workpiece 12 to the rewinding machine 74 at a specific speed. The driving device 76 is provided to cause the workpiece 12 to be folded back or changed. The rollers 12a, 76b, and 76c in the direction in which the workpiece 12 moves. Thereby, the workpiece 12 fed from the workpiece development portion 54 in the longitudinal direction in the form of a substantially vertical direction is sequentially passed through the pretreatment tank 68' of the plating treatment portion 52, the electric ore tanks 62a, 62b, 62c, 62d, and the cleaning chamber. After 7 〇 and the drying chamber 72, it is recovered by the workpiece winding portion 56. As in the present embodiment, the non-contact liquid sealing device 22 of the first embodiment can be provided, for example, in the plating tanks 62a, 62b, 62c, and 62d and the pretreatment tank 68 in the continuous wet processing apparatus. In the above, the non-contact liquid sealing device 22 of the second embodiment is provided as the liquid sealing device in the continuous wet processing device, and the non-contact liquid sealing device 22 of the second to sixth embodiments may be provided. One of 78 is substituted for the non-contact liquid sealing device 22 of the first embodiment. [Eighth Embodiment] A continuous wet processing apparatus according to an eighth embodiment of the present invention will be described with reference to Fig. 13 . Fig. 13 is a plan view showing the structure of the continuous wet processing apparatus of the embodiment. The same components as those of the non-contact liquid sealing device of the sixth to sixth embodiments and the continuous wet processing device of the seventh embodiment are denoted by the same reference numerals and will not be described or simply described. In the continuous wet processing apparatus of the present embodiment, the workpiece 12 having one surface as the processing surface 12a and the other surface being the non-processing surface 12b is treated as a processing pair. The basic configuration of the continuous wet processing apparatus of the present embodiment is almost the same as that of the continuous wet processing apparatus of the seventh embodiment of the present invention, and is different from the continuous wet processing apparatus of the seventh embodiment. The non-contact liquid sealing device 78 of the sixth embodiment is used as the liquid sealing device, and each member is disposed so as to avoid contact with the processing surface 12a of the workpiece 12 as much as possible. As shown in Fig. 13, the workpiece 12 is wound onto the uncoiler 58 in a roll shape with the processing surface 2a being inside.

於積蓄裝置60中,用以自工件12侧邊調節工件12位置之 滾子60a、60d,以及用以使工件12折返之滾子6〇b、6(^之 中,僅有滾子60b接觸工件12之處理面12a,其他滚子 6〇a、60c、60d接觸工件12之非處理面ub。 於各供電滾筒部66中,藉由配置於工件12之處理面ua 側的-個供電滾筒66a ’與配置於工件12之非處理面⑶側 的兩個供電滾筒66b、66c ’而夾持工件12。於各供電滚筒 部66中,一個供電滾筒66a接觸工件12之處理面,與此 相對,兩個供電滾筒66b、66c接觸工件12之非處理面 12b 〇 ;各電鑛槽62a、62b、62C、62d中,分別於相對向之側 壁上設置有第6實施形態之非接觸液封裝置78,工件以 =方向大致鉛直之形式’經由其中之—側壁之非接觸液 封衣置78而搬入電鍍槽62a、62b、62c、62d内。搬入電鍍 槽:a、62b' 62e、62d内之工件12 ’保持狀態不變地經由 另一側壁之非接觸液封裝置78而搬出電鍍槽“a、、 62c、 62d外。 與圖ι〇所示情形相同,在各非接觸液封裝置78中,於工 125312.doc -38- 200831719 於工件12之非 件12之處理面i2a侧配置有喷流噴出部μ 處理面12b側配置有密封滾筒a。 再者,針對預處理槽68,亦可與電鍍槽62&、6几 62c、62d同樣,設置第6實施形態之非接觸液封裝置π。 於U型轉彎部64中,用以轉換 仵12方向之滾子64a 64b均接觸工件12之非處理面12b。 於驅動裝置76中,用以使工件12折返之滾子、、鳩以In the accumulating device 60, the rollers 60a, 60d for adjusting the position of the workpiece 12 from the side of the workpiece 12, and the rollers 6〇b, 6 for reversing the workpiece 12 (only the roller 60b is in contact) The processing surface 12a of the workpiece 12, the other rollers 6A, 60c, 60d contact the non-processing surface ub of the workpiece 12. In each of the power supply roller portions 66, a power supply roller disposed on the processing surface ua side of the workpiece 12 66a' and the two power supply rollers 66b, 66c' disposed on the non-processing surface (3) side of the workpiece 12 sandwich the workpiece 12. In each of the power supply roller portions 66, one power supply roller 66a contacts the processing surface of the workpiece 12, as opposed thereto. The two power supply rollers 66b and 66c are in contact with the non-processing surface 12b of the workpiece 12; and the non-contact liquid sealing devices of the sixth embodiment are respectively disposed on the opposite side walls of the electric ore grooves 62a, 62b, 62C, and 62d. 78. The workpiece is carried into the plating tanks 62a, 62b, 62c, 62d via the non-contact liquid sealing device 78 of the side wall in the form of a substantially vertical direction in the = direction. It is carried into the plating tank: a, 62b' 62e, 62d. The workpiece 12' remains in the same state via the non-contact liquid sealing device 78 of the other side wall. Out of the plating baths "a, 62c, 62d. As in the case shown in Figure ι, in each non-contact liquid sealing device 78, in the work 125312.doc -38-200831719 on the workpiece 12 of the non-piece 12 processing surface The sealing drum a is disposed on the side of the processing jet surface of the i2a side, and the sealing drum a is disposed on the side of the processing surface 12b. Further, the pretreatment tank 68 may be provided in the same manner as the plating tanks 62 & 6 and 62 c and 62 d. The liquid sealing device π is contacted. In the U-turn portion 64, the rollers 64a to 64b for switching the direction of the crucible 12 are in contact with the non-processing surface 12b of the workpiece 12. In the driving device 76, the roller for reciprocating the workpiece 12鸠

及用以改變工件12之移動方向的滾子76e之中僅有滾子 、接觸工件12之處理面m,而其他滾子7补、π。接觸工 件12之非處理面12b。 於重捲機74中 工件12以處理面12a為内側被捲繞回 如此般,於本實施形態之連續濕式處理裝置中,對其中 一個面為處理面12a、另一個面為非處理面12b的工件12, 使用第6實施形態之非接觸液封裝置78作為液封裝置,進 而’以儘量避免與工件12之處理面i2a接觸的方式配置有 各部件。 亦即’於積蓄裝置60中,接觸工件12之非處理面12b的 滾子數比接觸工件12之處理面12a的滾子數多。又,於各 供電滾筒部66中,接觸工件12之非處理面12b的供電滾筒 數比接觸工件12之處理面12a的供電滾筒66a之個數多。於 u型轉彎部64中,滾子並不接觸工件12之處理面12a。於驅 動裝置76中,接觸工件12之非處理面12b的滾子數亦比接 觸工件12之處理面12a的滾子數多。 1253l2.doc -39- 200831719 因此,根據本實施形態,在對其中一個面為處理面 12a、另一個面為非處理面12b之工件12進行處理的情形 下此可罪地地防止工件12之處理面i2a與連續濕式處理 裝置中之部件的接觸所產生之受損、變色等缺陷,並且可 進一步抑制或者減少處理液自浸潰槽1〇之狹縫2〇的流出。 [變形實施形態] 本發明並不限於上述實施形態,能夠進行各種各樣的變 形。 +例如’於上述實施形態中,已說明由噴流嘴%、46、48 喷出與裝滿浸潰槽1〇之處理液相同的處理液之喷流的情 $,但由噴流嘴36、46、48喷出作為喷流之流體,並非限 疋於與裝滿浸潰槽10之處理液相同的處理液。亦可由噴流 鳴36 46、48,噴出與裝滿浸潰槽1〇之相異的處理液、水 等液體。又’由噴流嘴36、46、48噴出之流體,並非限定 於液體,亦可由喷流嘴36、46、48噴出空氣等氣體。又, 亦可贺出不使工件及工件上所施電錢變質的t氣等氣體。 又,亦可由噴流嘴36、46、48噴出氣體與液體混合後之氣 液混合流體。由噴流嘴36、46、48噴出氣體之情形,相比 於噴出液體之情形,可減少液體流出量。 又,於上述實施形態中,已說明噴流狹縫4〇之寬度於上 下方向上為大致固定的情形,而即便噴流狹缝4〇之寬度並 非大致固定亦可。例如,亦可使噴流狹縫4〇之寬度越向下 方越窄。越是在處理液之液壓增高的下方而使喷流狹縫4〇 之寬度越窄,藉此可進一步抑制或者減少處理液自浸潰槽 125312.doc -40· 200831719 ίο的流出。 又,於上述實施形態中,已說明噴流體管路32為方管狀 之情形,但噴流體管路32並非限定於方管狀。例如,噴流 體官路32亦可為圓管狀者。於此情形下,如圖14所示,亦 可將複數個噴流嘴36直接設置於圓管狀喷流體管路32上。 又,於上述實施形態中,已說明朝向相對於工件12移動 方向之垂直方向而朝浸潰槽1〇側傾斜的方向之喷流嘴%, 以及朝向工件12移動方向之大致垂直方向的噴流嘴料中任 何一者或兩者設在喷流噴嘴板34上的情形,但喷流嘴之朝 向並非限定於此等。例如,亦可於噴流噴嘴板34上設置朝 向相對於工件12移動方向之垂直方向而朝與浸潰槽ι〇相反 一側傾斜之方向的喷流嘴。又,亦可將此等朝向相異之喷 流嘴適當組合後設置於噴流噴嘴板34上。 又,於上述實施形態中,已說明浸潰槽1〇之狹縫2〇之寬 度於上下方向上為大致固定的情形,而即便狹縫2〇之寬度Among the rollers 76e for changing the moving direction of the workpiece 12, only the roller, the processing surface m contacting the workpiece 12, and the other rollers 7 complement, π. The non-treated surface 12b of the workpiece 12 is contacted. In the rewinding machine 74, the workpiece 12 is wound back inside the processing surface 12a. In the continuous wet processing apparatus of the present embodiment, one of the surfaces is the processing surface 12a and the other surface is the non-processing surface 12b. The workpiece 12 is a liquid sealing device using the non-contact liquid sealing device 78 of the sixth embodiment, and further, each member is disposed so as to avoid contact with the processing surface i2a of the workpiece 12 as much as possible. That is, in the accumulating device 60, the number of rollers contacting the non-treated surface 12b of the workpiece 12 is larger than the number of rollers contacting the processing surface 12a of the workpiece 12. Further, in each of the power supply roller portions 66, the number of power supply rollers contacting the non-processing surface 12b of the workpiece 12 is larger than the number of power supply rollers 66a contacting the processing surface 12a of the workpiece 12. In the u-turn portion 64, the roller does not contact the processing surface 12a of the workpiece 12. In the driving device 76, the number of rollers contacting the non-processing surface 12b of the workpiece 12 is also larger than the number of rollers contacting the processing surface 12a of the workpiece 12. 1253l2.doc -39- 200831719 Therefore, according to the present embodiment, in the case where the workpiece 12 in which one surface is the processing surface 12a and the other surface is the non-processing surface 12b is treated, it is sinly prevented from being processed by the workpiece 12. The surface i2a has defects such as damage and discoloration caused by contact with the components in the continuous wet processing apparatus, and can further suppress or reduce the outflow of the treatment liquid from the slit 2 of the immersion tank 1〇. [Modifications] The present invention is not limited to the above embodiments, and various modifications are possible. + For example, in the above embodiment, the jet flow of the same treatment liquid as the treatment liquid filled with the impregnation tank 1 is discharged from the nozzles %, 46, 48, but by the nozzles 36, 46 The fluid discharged as a jet stream is not limited to the same treatment liquid as the treatment liquid filled in the impregnation tank 10. It is also possible to eject a liquid such as a treatment liquid or water which is different from the impregnation tank by the jets 36 46 and 48. Further, the fluid ejected from the nozzles 36, 46, 48 is not limited to a liquid, and a gas such as air may be ejected from the nozzles 36, 46, 48. In addition, it is also possible to express a gas such as t gas that does not deteriorate the electricity applied to the workpiece and the workpiece. Further, the gas-liquid mixed fluid obtained by mixing the gas and the liquid may be ejected from the nozzles 36, 46, and 48. When the gas is ejected from the nozzles 36, 46, 48, the amount of liquid outflow can be reduced as compared with the case of ejecting the liquid. Further, in the above embodiment, the width of the jet slit 4 is substantially fixed in the upper and lower directions, and the width of the jet slit 4 is not substantially fixed. For example, it is also possible to make the width of the jet slit 4 越 narrower toward the lower side. The narrower the width of the jet slit 4〇 is, the lower the hydraulic pressure of the treatment liquid is, whereby the flow of the treatment liquid from the immersion tank 125312.doc -40·200831719 ίο can be further suppressed or reduced. Further, in the above embodiment, the case where the spray fluid line 32 is a square tubular shape has been described, but the spray fluid line 32 is not limited to the square tubular shape. For example, the jet body path 32 can also be a circular tube. In this case, as shown in Fig. 14, a plurality of nozzles 36 may be directly disposed on the circular tubular spray fluid line 32. Further, in the above-described embodiment, the nozzle % in the direction inclined toward the side of the dipping groove 1 in the direction perpendicular to the moving direction of the workpiece 12, and the nozzle in the substantially vertical direction in the moving direction of the workpiece 12 have been described. Any one or both of the materials are provided on the jet nozzle plate 34, but the orientation of the nozzle is not limited thereto. For example, the jet nozzle plate 34 may be provided with a nozzle which is inclined in a direction perpendicular to the moving direction of the workpiece 12 toward the side opposite to the dipping groove. Further, these nozzles may be appropriately combined and disposed on the jet nozzle plate 34. Further, in the above embodiment, the width of the slit 2〇 of the dipping groove 1 is substantially fixed in the vertical direction, and even the width of the slit 2〇 is described.

並非大致固定亦可。例如,亦可使狹縫2〇之寬度越向下方 越窄。越是在處理液之液壓增高的下方而使狹縫2〇之寬度 越窄’藉此可進-步充分地抑制或者減少處理液自浸潰槽 1 〇的流出。 U巩明分別於浸潰槽10之 入,於上述實施形 搬入側及卫件搬出側各設置有—個非接觸液封裝置22、78 的情形,亦可接連設置複數段非接觸液封裝置22、78。藉 由接連設置複數段非接觸液封裝置22m步充分 地抑制或者減少處理液自浸潰槽1〇的流出。 125312.doc -41- 200831719 又,於上述實施形態中,已說明於工件12之非處理面 12b側配置密封滾筒82的情形,但用於封住處理液自狹縫 20之工件12的非處理面12b側之流出的液封機構,並非限 定於此。就液封機構而言,例如,亦可於狹縫2〇侧邊沿著 狹缝20,以接觸工件12之非處理面12b的方式,設置包含 • 海綿或橡膠等例如板狀、棒狀等之部件,以取代密封滾筒 82。又,亦可設置被固定而不會旋轉的密封滾筒。 產業上之可利用性 • 本發明之非接觸液封裝置及方法,在將單片或帶狀工件 以寬度方向大致鉛直之狀態,經由裝滿處理液之浸潰槽之 側壁狹縫而搬入搬出浸潰槽時,對防止工件產生缺陷並且 減少處理液自浸潰槽的流出方面極為有用。 【圖式簡單說明】 圖1係表示具備本發明第1實施形態之非接觸液封裝置的 濕式處理裝置之構造的概略圖(其一)。 圖2係表示具備本發明第1實施形態之非接觸液封裴置的 _ 濕式處理裝置之構造的概略圖(其二)。 、 圖3係表示具備本發明第1實施形態之非接觸液封裝置的 濕式處理裝置之構造的概略圖(其三)。 、 圖4係表示本發明第i實施形態之非接觸液封裝 、 的概略圖(其一)。 冓仏 圖5(a)、(b)係表示本發明第i實施形態之非接觸液封裝 置之構造的概略圖(其二)。 圖6(a)、(b)係表示本發明第2實施形態之非接觸液封裝 125312.doc -42- 200831719 置之構造的概略圖。 圖7(a)、(b)係表示本發明第3實施形態之非接觸液封事 置之構造的概略圖。 又 圖8係表示本發明第4實施形態之非接觸液封裝置之皮 的剖面圖。 圖9係表示本發明第5實施形態之非接觸液封農置之構造 的剖面圖。 σIt is not roughly fixed. For example, the width of the slit 2〇 may be made narrower as it goes downward. The narrower the width of the slit 2 is, the lower the hydraulic pressure of the treatment liquid is, and the flow of the treatment liquid from the immersion tank 1 充分 can be sufficiently suppressed or reduced. U Gongming is respectively inserted into the dipping tank 10, and a non-contact liquid sealing device 22, 78 is disposed on each of the above-mentioned embodiment loading side and the guard carrying side, and a plurality of non-contact liquid sealing devices may be successively disposed. 22, 78. The flow of the treatment liquid from the immersion tank 1 充分 is sufficiently suppressed or reduced by sequentially setting a plurality of non-contact liquid sealing devices 22 m in succession. Further, in the above embodiment, the case where the seal roller 82 is disposed on the non-treated surface 12b side of the workpiece 12 has been described, but the non-treatment for sealing the workpiece 12 of the treatment liquid from the slit 20 has been described. The liquid sealing mechanism that flows out on the surface 12b side is not limited thereto. In the liquid sealing mechanism, for example, a slit, a rubber, or the like may be provided along the slit 2, along with the slit 20 so as to contact the non-treated surface 12b of the workpiece 12. A component to replace the sealing drum 82. Further, a sealing drum that is fixed without rotating may be provided. INDUSTRIAL APPLICABILITY The non-contact liquid sealing device and method of the present invention are carried out by loading and unloading a single piece or a strip-shaped workpiece in a substantially vertical direction in the width direction through a side wall slit of a dipping tank filled with a processing liquid. When the tank is immersed, it is extremely useful for preventing defects in the workpiece and reducing the outflow of the treatment liquid from the immersion tank. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view (No. 1) showing a structure of a wet processing apparatus including a non-contact liquid sealing apparatus according to a first embodiment of the present invention. Fig. 2 is a schematic view (No. 2) showing a structure of a wet processing apparatus including a non-contact liquid sealing device according to a first embodiment of the present invention. Fig. 3 is a schematic view (No. 3) showing the structure of a wet processing apparatus including the non-contact liquid sealing apparatus according to the first embodiment of the present invention. Fig. 4 is a schematic view (No. 1) showing a non-contact liquid package according to an i-th embodiment of the present invention. 5(a) and 5(b) are schematic diagrams (No. 2) showing the structure of the non-contact liquid package according to the i-th embodiment of the present invention. Fig. 6 (a) and (b) are schematic views showing the structure of the non-contact liquid package 125312.doc-42-200831719 according to the second embodiment of the present invention. Fig. 7 (a) and (b) are schematic views showing the structure of the non-contact liquid sealing device according to the third embodiment of the present invention. Fig. 8 is a cross-sectional view showing the skin of the non-contact liquid sealing device according to the fourth embodiment of the present invention. Fig. 9 is a cross-sectional view showing the structure of a non-contact liquid seal agricultural plant according to a fifth embodiment of the present invention. σ

圖10係表示本發明第6實施形態之非接觸液封裝置之 造的剖面圖。 圖11係表示本發明第6實施形態之非接觸液封裝置中密 封滾筒之其他例的概略圖。 圖12係表示本發明第7實施形態之連續濕式處 構造的平面圖。 、 圖13係表示本發明第8實施形態之連續濕式處理 構造的平面圖。 、Fig. 10 is a cross-sectional view showing the manufacture of the non-contact liquid sealing device according to the sixth embodiment of the present invention. Fig. 11 is a schematic view showing another example of the sealing drum in the non-contact liquid sealing device according to the sixth embodiment of the present invention. Fig. 12 is a plan view showing the structure of a continuous wet type according to a seventh embodiment of the present invention. Fig. 13 is a plan view showing the continuous wet processing structure of the eighth embodiment of the present invention. ,

圖14係表示本發明之非接觸液封裝 剖面圖。 置之構造的其他例的 【主要元件符號說明】 10 浸潰槽 12 工件 12a 處理面 12b 非處理面 14 處理液儲存槽 16 泵 125312.doc 43· 200831719 18 側壁 20 狹縫 22 非接觸液封裝置 24 喷流喷出部 26 流量調整閥 28 FIC(流量指數控制器) 30 接收盤 32 喷流體管路 34 噴流噴嘴板 36 喷流嘴 38 突出部 40 喷流狹缝 42 喉部 44 喉部 46 噴流嘴 48 喷流嘴 50 平坦部 52 電鍍處理部 54 工件展開部 56 工件捲繞部 58 開捲機 60 積蓄裝置 60a、60b、60b、60c 滾子 62a、62b、62c、62d 電鍍槽 125312.doc -44 - 200831719 64 U型轉彎部 66 供電滾筒部 66a、 66b 、 66c 供電滾筒 68 預處理槽 70 清洗室 72 乾燥室 74 重捲機 76 驅動裝置 76a、 76b 、 76c 滾子 78 非接觸液封裝置 80 密封槽 82 密封滾筒 84 齒輪馬達 86a、 86b 軸承 125312.doc -45-Figure 14 is a cross-sectional view showing the non-contact liquid package of the present invention. [Main component symbol description] of other examples of construction 10 Infusion tank 12 Workpiece 12a Processing surface 12b Non-processing surface 14 Processing liquid storage tank 16 Pump 125312.doc 43· 200831719 18 Side wall 20 Slit 22 Non-contact liquid sealing device 24 Jet spout 26 Flow regulating valve 28 FIC (Flow Index Controller) 30 Receiving tray 32 Spray fluid line 34 Jet nozzle plate 36 Spray nozzle 38 Projection 40 Spray slit 42 Throat 44 Throat 46 Jet Mouth 48 nozzle 50 flat portion 52 plating processing portion 54 workpiece developing portion 56 workpiece winding portion 58 uncoiler 60 accumulating devices 60a, 60b, 60b, 60c rollers 62a, 62b, 62c, 62d plating tank 125312.doc - 44 - 200831719 64 U-turn part 66 Power supply roller part 66a, 66b, 66c Power supply roller 68 Pretreatment tank 70 Cleaning chamber 72 Drying chamber 74 Rewinding machine 76 Drive unit 76a, 76b, 76c Roller 78 Non-contact liquid sealing device 80 Sealing groove 82 sealing roller 84 gear motor 86a, 86b bearing 125312.doc -45-

Claims (1)

200831719 十、申請專利範圍·· 一種非接觸液封裝置,其特徵在於: 直設置有單片或帶狀工件以寬度方向大致錯 晋1^的開σ部且裝滿液體之浸潰槽的非接觸液 封裝置,該非接觸液縣置包括: • .甬:::出部’其配置於上述開口部其中之-側,朝向 體之噴流,·及 自上述其巾之-侧噴出流 • J封部’其配置於上述開口部另一側,以封住上述液 -自上述開口部之上述另—側的流出。 2.如請求们之非接㈣封裝置,其中上述液封部係,配 置於上述開口部之上述另一侧,朝向通過上述開口部之 上述工件自上述另一側喷出流體之噴流的喷流噴出部。 3·如請求項2之非接觸液封裝置,其中配置於上述開口部 其中之-側之上述噴流噴出部與配置於上述開口部之上 述另-側的上述噴流噴出部之間的間隙,係越向下方則 Φ 寬度越窄。 4. 如明求項1之非接觸液封裝置,其中上述液封部係配置 於上述開η部之上述另-侧且與上述工件之上述另一侧 表面接觸的圓柱狀部件。 5. 如請求項1至4中任-項之非接觸液封裝置,其中上述噴 流噴出部包括:喷流體管路,其供給有上述流體;及喷 流嘴,其設置於上述喷流體管路之上述工件侧,並噴出 上述噴流。 、 125312.doc 200831719 6·如請求項5之非接觸液封 於垂直於上述工件移動 /、 述噴流嘴係相對 侧傾斜的方向。 方向之方向’朝向向上述浸漬槽 7·如請求項5之非接觸 垂直於上述工件移動方向 :置向其中上述嘴流嘴係朝向 8. 如#求項5至7中任_項之非接觸液封裝置 流噴出部具有排列於上 、 ,、中上述贺 9. 如請求項8之非接觸置之述噴流嘴。 之噴孔各自為圓形。、,、中上迷複數個噴流嘴 10.2求項9之非接觸液封裝置,其中上述複 =孔係越是處於下方之上述喷流嘴的纽則孔^ 11. 如請求項8至10中任一炤夕此处細> 、 Τ^項之非接觸液封裝置,其中排列 :一下方向之上述複數個噴流嘴之喷孔間距係越向下方200831719 X. Patent application scope · A non-contact liquid sealing device, characterized in that: a single piece or a strip-shaped workpiece is directly provided with a σ portion which is substantially offset by a width direction and filled with a liquid impregnation groove In contact with the liquid sealing device, the non-contact liquid county includes: • .甬::: the outlet portion is disposed on the side of the opening, the jet toward the body, and the jet from the side of the towel. The sealing portion is disposed on the other side of the opening to seal the outflow of the liquid from the other side of the opening. 2. The non-contact (four) sealing device of the request, wherein the liquid sealing portion is disposed on the other side of the opening, and sprays a jet of a fluid from the other side toward the workpiece passing through the opening Flow spout. 3. The non-contact liquid sealing device according to claim 2, wherein a gap between the jet ejecting portion disposed on a side of the opening portion and the jet ejecting portion disposed on the other side of the opening portion is The more downward, the narrower the Φ width. 4. The non-contact liquid sealing device according to claim 1, wherein the liquid sealing portion is disposed on the other side of the opening portion and in contact with the other side surface of the workpiece. 5. The non-contact liquid sealing device of any one of claims 1 to 4, wherein the jet ejecting portion comprises: a jet fluid line supplied with the fluid; and a jet nozzle disposed in the jet fluid line The workpiece side is sprayed with the jet stream. 125312.doc 200831719 6. The non-contact liquid seal of claim 5 is oriented perpendicular to the workpiece movement / in a direction inclined to the opposite side of the nozzle. The direction of the direction 'is toward the above-mentioned immersion tank 7 · The non-contact of the request item 5 is perpendicular to the moving direction of the workpiece: the direction in which the above nozzle nozzle is oriented toward 8. The non-contact of any of the items _ 5 to 7 The liquid ejecting device flow ejecting portion has a nozzle which is arranged in the upper, middle, and middle portions. The orifices are each circular. And the non-contact liquid sealing device of the plurality of nozzles 10.2, wherein the above-mentioned complex = hole system is below the nozzle hole of the nozzle nozzle. 11. In claims 8 to 10 a non-contact liquid sealing device of any of the above-mentioned details, wherein the arrangement of the nozzles of the plurality of nozzles in the lower direction is downward 月求項1至11中任一項之非接觸液封裝置,其中上述 開口部係越向下方則寬度越窄。 13· —種非接觸液封方法,其特徵在於·· 其係^侧壁設置有單片或帶狀工件以寬度方向大致錯 直之狀恐通過的開口部且裝滿液體之浸潰槽的非接觸液 封方法, 畲上述工件通過裝滿上述液體之上述浸潰槽之上述開 口邛時,朝向通過上述開口部之上述工件,自上述工件 兩侧噴出流體之喷流,且利用上述噴流以非接觸之形式 125312.doc 200831719 封住上述開口部。 14· -種非接觸液封方法,其特徵在於·· 其係於側壁設置有單片 之浸潰槽的非接觸液 直之早片次咿狀工件以寬度方向大致鉛 直之狀悲通過的開口部且裳滿液體 封方法, =述開口部其中之—側配置液封部,該液封部與上 ^ ^述其中之—侧表面接觸,以封住上述液體自 上=開之上述其中之_侧的流出, 田上述工件通過裝滿上述液體之上述浸潰槽的上述開 :部時,朝向通過上述開口部之上述工件,自上述開口 另側,出流體之噴流,且利用上述喷流,以非接觸 形式封住上述液體自上述開口部之上述另一側的流 出。 125312.docThe non-contact liquid sealing device according to any one of the items 1 to 11, wherein the width of the opening portion is narrower as it goes downward. 13. A non-contact liquid sealing method, characterized in that: the side wall of the system is provided with a single piece or a strip-shaped workpiece which is substantially misaligned in the width direction and is filled with a liquid impregnation groove. In the contact liquid sealing method, when the workpiece passes through the opening 装 of the immersion tank filled with the liquid, a jet of fluid is ejected from both sides of the workpiece toward the workpiece passing through the opening, and the jet is used to Contact form 125312.doc 200831719 Seal the above opening. A non-contact liquid sealing method, characterized in that: the non-contact liquid which is provided with a single-plate dipping groove on the side wall is an opening portion which is slightly vertical in the width direction. And the liquid sealing method is carried out, wherein the liquid sealing portion is disposed on the side of the opening portion, and the liquid sealing portion is in contact with the side surface of the upper portion to seal the liquid from above. When the workpiece passes through the opening portion of the dipping groove filled with the liquid, the workpiece passes toward the workpiece passing through the opening, and the fluid flows out from the other side of the opening, and the jet is used. The outflow of the liquid from the other side of the opening is sealed in a non-contact manner. 125312.doc
TW096136922A 2006-12-14 2007-10-02 Apparatus and method for non-contact liquid sealing TW200831719A (en)

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