JP2009026751A5 - - Google Patents

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Publication number
JP2009026751A5
JP2009026751A5 JP2008159058A JP2008159058A JP2009026751A5 JP 2009026751 A5 JP2009026751 A5 JP 2009026751A5 JP 2008159058 A JP2008159058 A JP 2008159058A JP 2008159058 A JP2008159058 A JP 2008159058A JP 2009026751 A5 JP2009026751 A5 JP 2009026751A5
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JP
Japan
Prior art keywords
conductive film
photocatalytic conductive
film
light
photocatalytic
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JP2008159058A
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English (en)
Japanese (ja)
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JP2009026751A (ja
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Priority to JP2008159058A priority Critical patent/JP2009026751A/ja
Priority claimed from JP2008159058A external-priority patent/JP2009026751A/ja
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Publication of JP2009026751A5 publication Critical patent/JP2009026751A5/ja
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JP2008159058A 2007-06-19 2008-06-18 パターン形成方法、発光装置の作製方法および発光装置 Withdrawn JP2009026751A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008159058A JP2009026751A (ja) 2007-06-19 2008-06-18 パターン形成方法、発光装置の作製方法および発光装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007160895 2007-06-19
JP2008159058A JP2009026751A (ja) 2007-06-19 2008-06-18 パターン形成方法、発光装置の作製方法および発光装置

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JP2009026751A JP2009026751A (ja) 2009-02-05
JP2009026751A5 true JP2009026751A5 (enExample) 2011-06-02

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JP2008159058A Withdrawn JP2009026751A (ja) 2007-06-19 2008-06-18 パターン形成方法、発光装置の作製方法および発光装置

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US (2) US8017422B2 (enExample)
JP (1) JP2009026751A (enExample)
KR (2) KR101451370B1 (enExample)

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TWI489628B (zh) * 2009-04-02 2015-06-21 Semiconductor Energy Lab 半導體裝置和其製造方法
KR101213708B1 (ko) * 2009-06-03 2012-12-18 엘지디스플레이 주식회사 어레이 기판 및 이의 제조방법
KR102221207B1 (ko) 2009-09-04 2021-03-03 가부시키가이샤 한도오따이 에네루기 켄큐쇼 발광 장치 및 발광 장치를 제작하기 위한 방법
KR101084278B1 (ko) * 2009-11-05 2011-11-16 삼성모바일디스플레이주식회사 표시장치 및 표시장치의 제조방법
KR101119046B1 (ko) * 2010-01-08 2012-03-02 삼성모바일디스플레이주식회사 유기전계발광표시장치 및 그의 제조방법
TWI402968B (zh) * 2010-02-10 2013-07-21 Au Optronics Corp 畫素結構及其製造方法以及電子裝置的製造方法
CN101894858B (zh) * 2010-03-09 2011-12-21 电子科技大学 一种有源驱动有机电致发光器件及其制备方法
KR20120026970A (ko) * 2010-09-10 2012-03-20 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치 및 발광 장치
CN102117840B (zh) * 2010-12-15 2012-04-25 杭州杭鑫电子工业有限公司 一种多重金属扩散快恢复二极管及其制备方法
US8829509B2 (en) 2011-04-22 2014-09-09 Panasonic Corporation Organic EL display panel and method for manufacturing same
TWI441940B (zh) * 2011-06-09 2014-06-21 Shih Hua Technology Ltd 圖案化導電元件的製備方法
US8912020B2 (en) 2011-11-23 2014-12-16 International Business Machines Corporation Integrating active matrix inorganic light emitting diodes for display devices
JP6083122B2 (ja) * 2012-03-27 2017-02-22 凸版印刷株式会社 有機エレクトロルミネッセンス素子及びその製造方法
KR101485935B1 (ko) * 2012-11-15 2015-01-26 스미도모쥬기가이고교 가부시키가이샤 태양전지의 제조방법, 및 태양전지
KR102113600B1 (ko) * 2012-12-07 2020-05-21 엘지디스플레이 주식회사 유기 발광 다이오드 표시 장치 및 이의 제조 방법
US9012259B2 (en) 2013-01-17 2015-04-21 Stmicroelectronics S.R.L. Thin film transistors formed by organic semiconductors using a hybrid patterning regime
JP6202714B2 (ja) * 2013-03-08 2017-09-27 日本放送協会 薄膜トランジスタ素子の製造方法及び塗布型半導体層のパターニング方法
JP6564559B2 (ja) 2013-05-10 2019-08-21 株式会社半導体エネルギー研究所 表示パネル及び電子機器
US10910350B2 (en) * 2014-05-24 2021-02-02 Hiphoton Co., Ltd. Structure of a semiconductor array
JP2016046142A (ja) * 2014-08-25 2016-04-04 パイオニア株式会社 発光装置
JP2016046141A (ja) * 2014-08-25 2016-04-04 パイオニア株式会社 発光装置
US10743413B2 (en) * 2018-02-07 2020-08-11 Shenzhen China Star Optoelectronics Technology Co., Ltd. Flexible substrate and method for manufacturing same
US11985881B2 (en) 2018-06-29 2024-05-14 Semiconductor Energy Laboratory Co., Ltd. Display panel, display device, input/output device, data processing device
CN111180583A (zh) * 2019-10-15 2020-05-19 北京元芯碳基集成电路研究院 晶体管及其制造方法
JP2020031070A (ja) * 2019-12-02 2020-02-27 パイオニア株式会社 発光装置
US11906157B2 (en) 2020-08-07 2024-02-20 Pure-Light Te chnologies, Inc. Photocatalyst formulations and coatings
US11819824B2 (en) * 2020-08-07 2023-11-21 Pure-Light Technologies, Inc. Surface coatings for self-decontamination
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US12439650B2 (en) * 2021-01-15 2025-10-07 Taiwan Semiconductor Manufacturing Co., Ltd. CMOS fabrication methods for back-gate transistor
CN115528063B (zh) * 2021-06-24 2025-06-27 京东方科技集团股份有限公司 显示基板及其制备方法、显示装置

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