US20050170643A1 - Forming method of contact hole, and manufacturing method of semiconductor device, liquid crystal display device and EL display device - Google Patents

Forming method of contact hole, and manufacturing method of semiconductor device, liquid crystal display device and EL display device Download PDF

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Publication number
US20050170643A1
US20050170643A1 US11/038,068 US3806805A US2005170643A1 US 20050170643 A1 US20050170643 A1 US 20050170643A1 US 3806805 A US3806805 A US 3806805A US 2005170643 A1 US2005170643 A1 US 2005170643A1
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United States
Prior art keywords
film
display
forming
mask pattern
contact hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US11/038,068
Inventor
Gen Fujii
Hiroko Shiroguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Filing date
Publication date
Priority to JP2004022039 priority Critical
Priority to JP2004-022039 priority
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Assigned to SEMICONDUCTOR ENERGY LABORATORY CO., LTD. reassignment SEMICONDUCTOR ENERGY LABORATORY CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: FUJII, GEN, SHIROGUCHI, HIROKO
Publication of US20050170643A1 publication Critical patent/US20050170643A1/en
Abandoned legal-status Critical Current

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