JP2009026750A - チャンバ内電子検出器 - Google Patents

チャンバ内電子検出器 Download PDF

Info

Publication number
JP2009026750A
JP2009026750A JP2008158789A JP2008158789A JP2009026750A JP 2009026750 A JP2009026750 A JP 2009026750A JP 2008158789 A JP2008158789 A JP 2008158789A JP 2008158789 A JP2008158789 A JP 2008158789A JP 2009026750 A JP2009026750 A JP 2009026750A
Authority
JP
Japan
Prior art keywords
charged particle
particle beam
detector
vacuum chamber
beam system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008158789A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009026750A5 (enExample
Inventor
Mostafa Maazouz
モスタファ・マーゾウズ
Trevor Dingle
トレバー・ディングル
Robert Gerlach
ロバート・ジャーラッチ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FEI Co
Original Assignee
FEI Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FEI Co filed Critical FEI Co
Publication of JP2009026750A publication Critical patent/JP2009026750A/ja
Publication of JP2009026750A5 publication Critical patent/JP2009026750A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2443—Scintillation detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24435—Microchannel plates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2445—Photon detectors for X-rays, light, e.g. photomultipliers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Measurement Of Radiation (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2008158789A 2007-06-18 2008-06-18 チャンバ内電子検出器 Pending JP2009026750A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US94479207P 2007-06-18 2007-06-18

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2014086925A Division JP2014132598A (ja) 2007-06-18 2014-04-18 チャンバ内電子検出器

Publications (2)

Publication Number Publication Date
JP2009026750A true JP2009026750A (ja) 2009-02-05
JP2009026750A5 JP2009026750A5 (enExample) 2011-08-04

Family

ID=39671425

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2008158789A Pending JP2009026750A (ja) 2007-06-18 2008-06-18 チャンバ内電子検出器
JP2014086925A Pending JP2014132598A (ja) 2007-06-18 2014-04-18 チャンバ内電子検出器

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2014086925A Pending JP2014132598A (ja) 2007-06-18 2014-04-18 チャンバ内電子検出器

Country Status (3)

Country Link
US (2) US8164059B2 (enExample)
EP (1) EP2006881A3 (enExample)
JP (2) JP2009026750A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150026970A (ko) * 2013-09-02 2015-03-11 가부시키가이샤 히다치 하이테크 사이언스 하전 입자 빔 장치

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5758577B2 (ja) * 2007-02-06 2015-08-05 エフ・イ−・アイ・カンパニー 高圧荷電粒子ビーム・システム
EP2006881A3 (en) * 2007-06-18 2010-01-06 FEI Company In-chamber electron detector
US7847268B2 (en) * 2008-05-30 2010-12-07 El-Mul Technologies, Ltd. Three modes particle detector
WO2010132124A1 (en) 2009-05-15 2010-11-18 Aspex Corporation Electron microscope with integrated detector(s)
DE102010001346B4 (de) * 2010-01-28 2014-05-08 Carl Zeiss Microscopy Gmbh Teilchenstrahlgerät und Verfahren zum Betreiben eines Teilchenstrahlgeräts
US8729471B2 (en) 2010-07-30 2014-05-20 Pulsetor, Llc Electron detector including an intimately-coupled scintillator-photomultiplier combination, and electron microscope and X-ray detector employing same
US9679741B2 (en) 2010-11-09 2017-06-13 Fei Company Environmental cell for charged particle beam system
JP2012138324A (ja) * 2010-12-28 2012-07-19 Topcon Corp 二次電子検出器、及び荷電粒子ビーム装置
WO2013022735A1 (en) 2011-08-05 2013-02-14 Pulsetor, Llc Electron detector including one or more intimately-coupled scintillator-photomultiplier combinations, and electron microscope employing same
US8770037B2 (en) * 2011-10-14 2014-07-08 Chrysler Group Llc System and method for structure stiffness determination
CN104956461B (zh) * 2013-01-31 2016-10-19 株式会社日立高新技术 复合带电粒子检测器、带电粒子束装置以及带电粒子检测器
CN107342205B (zh) * 2016-05-03 2019-07-23 睿励科学仪器（上海）有限公司 一种带电粒子探测装置
US9972474B2 (en) 2016-07-31 2018-05-15 Fei Company Electron microscope with multiple types of integrated x-ray detectors arranged in an array
WO2021176513A1 (ja) * 2020-03-02 2021-09-10 株式会社日立ハイテク 荷電粒子検出器、荷電粒子線装置、放射線検出器および放射線検出装置
WO2022174187A2 (en) * 2021-02-15 2022-08-18 E.A. Fischione Instruments, Inc. System and method for uniform ion milling
DE102021125639A1 (de) * 2021-10-04 2023-04-06 Carl Zeiss Microscopy Gmbh Teilchenstrahlsystem

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0369853U (enExample) * 1989-11-10 1991-07-11
JPH07142022A (ja) * 1993-11-19 1995-06-02 Hitachi Ltd 集束イオンビーム装置及び荷電粒子検出器
JPH1116531A (ja) * 1997-06-23 1999-01-22 Apuko:Kk 二次電子検出器
JP2002075264A (ja) * 2000-08-29 2002-03-15 Jeol Ltd 低真空走査電子顕微鏡
US7009187B2 (en) * 2002-08-08 2006-03-07 Fei Company Particle detector suitable for detecting ions and electrons

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1128107A (en) * 1965-06-23 1968-09-25 Hitachi Ltd Scanning electron microscope
US3538328A (en) 1968-03-04 1970-11-03 Varian Associates Scintillation-type ion detector employing a secondary emitter target surrounding the ion path
US3783281A (en) * 1972-02-03 1974-01-01 Perkin Elmer Corp Electron microscope
US3894233A (en) 1972-10-27 1975-07-08 Hitachi Ltd Ion microprobe analyzer
DE2534796C3 (de) 1975-08-04 1979-07-05 Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V., 3400 Goettingen Rotationssymetrischer Ionen-Elektronen-Konverter
FR2408910A1 (fr) 1977-11-15 1979-06-08 Commissariat Energie Atomique Spectrographe de masse
FR2447559A1 (fr) 1979-01-23 1980-08-22 Commissariat Energie Atomique Detecteur panoramique d'ions
FR2575597B1 (fr) * 1984-12-28 1987-03-20 Onera (Off Nat Aerospatiale) Appareil pour la micro-analyse ionique a tres haute resolution d'un echantillon solide
JPS6371680A (ja) 1986-09-16 1988-04-01 Hitachi Ltd イオン検出器
JPS63293847A (ja) * 1987-05-26 1988-11-30 Matsushita Electric Ind Co Ltd 半導体検査装置
JPH0815064B2 (ja) 1987-11-25 1996-02-14 株式会社日立製作所 集束エネルギービーム加工装置および加工方法
JPH01220352A (ja) * 1988-02-26 1989-09-04 Hitachi Ltd 走査電子顕微鏡及びその類似装置
US5065029A (en) * 1990-08-03 1991-11-12 Gatan, Inc. Cooled CCD camera for an electron microscope
JPH06187940A (ja) 1992-12-18 1994-07-08 Hitachi Ltd 荷電粒子検出器
DE4316805C2 (de) 1993-05-19 1997-03-06 Bruker Franzen Analytik Gmbh Nachweis schwerer Ionen in einem Flugzeitmassenspektrometer
JP3221797B2 (ja) * 1994-06-14 2001-10-22 株式会社日立製作所 試料作成方法及びその装置
US5635720A (en) * 1995-10-03 1997-06-03 Gatan, Inc. Resolution-enhancement device for an optically-coupled image sensor for an electron microscope
JPH09106777A (ja) * 1995-10-11 1997-04-22 Hamamatsu Photonics Kk 電子顕微鏡用電子増倍器
DE19644713A1 (de) 1996-10-28 1998-05-07 Bruker Franzen Analytik Gmbh Hochauflösender Hochmassendetektor für Flugzeitmassenspektrometer
US6265812B1 (en) * 1996-11-06 2001-07-24 Hamamatsu Photonics K.K. Electron multiplier
US5866901A (en) 1996-12-05 1999-02-02 Mks Instruments, Inc. Apparatus for and method of ion detection using electron multiplier over a range of high pressures
EP0988646A1 (en) * 1997-06-13 2000-03-29 Gatan, Inc. Methods and apparatus for improving resolution and reducing noise in an image detector for an electron microscope
US5990483A (en) * 1997-10-06 1999-11-23 El-Mul Technologies Ltd. Particle detection and particle detector devices
JPH11154479A (ja) * 1997-11-20 1999-06-08 Hitachi Ltd ２次電子画像検出方法及びその装置並びに集束荷電粒子ビームによる処理方法及びその装置
US6828729B1 (en) 2000-03-16 2004-12-07 Burle Technologies, Inc. Bipolar time-of-flight detector, cartridge and detection method
EP1299897B1 (de) * 2000-07-07 2008-04-09 Carl Zeiss NTS GmbH Detektor für variierende druckbereiche und elektronenmikroskop mit einem entsprechenden detektor
JP4178741B2 (ja) * 2000-11-02 2008-11-12 株式会社日立製作所 荷電粒子線装置および試料作製装置
WO2002061458A1 (fr) 2001-01-31 2002-08-08 Hamamatsu Photonics K. K. Detecteur de faisceau electronique, microscope electronique de type a balayage, spectrometre de masse et detecteur d'ions
US6906318B2 (en) 2003-02-13 2005-06-14 Micromass Uk Limited Ion detector
JP2004294282A (ja) * 2003-03-27 2004-10-21 Renesas Technology Corp 結晶解析装置
EP1501115B1 (en) * 2003-07-14 2009-07-01 FEI Company Dual beam system
JP4291109B2 (ja) * 2003-10-28 2009-07-08 エスアイアイ・ナノテクノロジー株式会社 複合型荷電粒子ビーム装置
EP1891656B1 (en) 2005-05-11 2019-11-27 El-Mul Technologies Ltd Particle detector for secondary ions and direct and or indirect secondary electrons
EP2006881A3 (en) * 2007-06-18 2010-01-06 FEI Company In-chamber electron detector
WO2013022735A1 (en) * 2011-08-05 2013-02-14 Pulsetor, Llc Electron detector including one or more intimately-coupled scintillator-photomultiplier combinations, and electron microscope employing same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0369853U (enExample) * 1989-11-10 1991-07-11
JPH07142022A (ja) * 1993-11-19 1995-06-02 Hitachi Ltd 集束イオンビーム装置及び荷電粒子検出器
JPH1116531A (ja) * 1997-06-23 1999-01-22 Apuko:Kk 二次電子検出器
JP2002075264A (ja) * 2000-08-29 2002-03-15 Jeol Ltd 低真空走査電子顕微鏡
US7009187B2 (en) * 2002-08-08 2006-03-07 Fei Company Particle detector suitable for detecting ions and electrons

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150026970A (ko) * 2013-09-02 2015-03-11 가부시키가이샤 히다치 하이테크 사이언스 하전 입자 빔 장치
KR102169574B1 (ko) 2013-09-02 2020-10-23 가부시키가이샤 히다치 하이테크 사이언스 하전 입자 빔 장치

Also Published As

Publication number Publication date
US8164059B2 (en) 2012-04-24
JP2014132598A (ja) 2014-07-17
US20120199738A1 (en) 2012-08-09
EP2006881A3 (en) 2010-01-06
EP2006881A2 (en) 2008-12-24
US20080308742A1 (en) 2008-12-18

Similar Documents

Publication Publication Date Title
JP2009026750A (ja) チャンバ内電子検出器
CN1773268B (zh) 离子束系统和用于检测离子束的系统
JP6012191B2 (ja) 荷電粒子顕微鏡に用いられる検出方法
US7847268B2 (en) Three modes particle detector
US8581188B2 (en) Electron detector including one or more intimately-coupled scintillator-photomultiplier combinations, and electron microscope employing same
US9341585B2 (en) X-ray detector including integrated electron detector
EP1636819B1 (en) Particle detector suitable for detecting ions and electrons
US20060289748A1 (en) Particle detector for secondary ions and direct and or indirect secondary electrons
JP6962706B2 (ja) 帯電粒子検出装置
JP2007128863A (ja) 縦続接続イメージインテンシファイア
US8237125B2 (en) Particle detection system
US20070051879A1 (en) Image Intensifier Device and Method
US9076629B2 (en) Particle detection system
JP2007073529A (ja) イメージインテンシファイア装置および方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090413

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20090413

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110616

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20110616

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130206

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20130504

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20130510

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130603

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20131218