JP2009014709A5 - - Google Patents
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- Publication number
- JP2009014709A5 JP2009014709A5 JP2008140448A JP2008140448A JP2009014709A5 JP 2009014709 A5 JP2009014709 A5 JP 2009014709A5 JP 2008140448 A JP2008140448 A JP 2008140448A JP 2008140448 A JP2008140448 A JP 2008140448A JP 2009014709 A5 JP2009014709 A5 JP 2009014709A5
- Authority
- JP
- Japan
- Prior art keywords
- sample
- angle
- sample holder
- tilting
- degrees
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 14
- 238000010894 electron beam technology Methods 0.000 claims 6
- 238000010884 ion-beam technique Methods 0.000 claims 5
- 238000003801 milling Methods 0.000 claims 4
- 238000003384 imaging method Methods 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 230000009977 dual effect Effects 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/809,715 | 2007-06-01 | ||
| US11/809,715 US8835845B2 (en) | 2007-06-01 | 2007-06-01 | In-situ STEM sample preparation |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009014709A JP2009014709A (ja) | 2009-01-22 |
| JP2009014709A5 true JP2009014709A5 (enExample) | 2011-07-07 |
| JP5090255B2 JP5090255B2 (ja) | 2012-12-05 |
Family
ID=39708954
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008140448A Active JP5090255B2 (ja) | 2007-06-01 | 2008-05-29 | 原位置でのstemサンプル作製方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8835845B2 (enExample) |
| EP (1) | EP1998356B1 (enExample) |
| JP (1) | JP5090255B2 (enExample) |
| AT (1) | ATE473512T1 (enExample) |
| DE (1) | DE602008001685D1 (enExample) |
Families Citing this family (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4533306B2 (ja) * | 2005-12-06 | 2010-09-01 | 株式会社日立ハイテクノロジーズ | 半導体ウェハ検査方法及び欠陥レビュー装置 |
| JP5127148B2 (ja) | 2006-03-16 | 2013-01-23 | 株式会社日立ハイテクノロジーズ | イオンビーム加工装置 |
| DE102007026847A1 (de) * | 2007-06-06 | 2008-12-11 | Carl Zeiss Nts Gmbh | Teilchenstrahlgerät und Verfahren zur Anwendung bei einem Teilchenstrahlgerät |
| US8394454B2 (en) * | 2008-03-08 | 2013-03-12 | Omniprobe, Inc. | Method and apparatus for precursor delivery system for irradiation beam instruments |
| US20100025580A1 (en) * | 2008-08-01 | 2010-02-04 | Omniprobe, Inc. | Grid holder for stem analysis in a charged particle instrument |
| JP5302595B2 (ja) * | 2008-08-06 | 2013-10-02 | 株式会社日立ハイテクノロジーズ | 傾斜観察方法および観察装置 |
| DE102008052006B4 (de) * | 2008-10-10 | 2018-12-20 | 3D-Micromac Ag | Verfahren und Vorrichtung zur Herstellung von Proben für die Transmissionselektronenmikroskopie |
| CN102272878B (zh) * | 2008-10-31 | 2014-07-23 | Fei公司 | 样本厚度的测量和终点确定 |
| JP5103422B2 (ja) * | 2009-02-27 | 2012-12-19 | 株式会社日立ハイテクノロジーズ | 荷電粒子ビーム装置 |
| US20110017922A1 (en) * | 2009-07-24 | 2011-01-27 | Omniprobe, Inc. | Variable-tilt tem specimen holder for charged-particle beam instruments |
| CN101988909B (zh) * | 2009-08-06 | 2012-03-07 | 中芯国际集成电路制造(上海)有限公司 | 低k介电材料的失效分析方法 |
| JP2011187267A (ja) * | 2010-03-08 | 2011-09-22 | Jeol Ltd | 試料ホルダ及びマルチビームシステム |
| DE102010024625A1 (de) * | 2010-06-22 | 2011-12-22 | Carl Zeiss Nts Gmbh | Verfahren zum Bearbeiten eines Objekts |
| JP5386453B2 (ja) * | 2010-08-24 | 2014-01-15 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置および試料観察方法 |
| DE102011002583B9 (de) | 2011-01-12 | 2018-06-28 | Carl Zeiss Microscopy Gmbh | Teilchenstrahlgerät und Verfahren zur Bearbeitung und/oder Analyse einer Probe |
| JP5973466B2 (ja) * | 2011-01-28 | 2016-08-23 | エフ・イ−・アイ・カンパニー | Tem試料の調製 |
| DE102011006588A1 (de) * | 2011-03-31 | 2012-10-04 | Carl Zeiss Nts Gmbh | Teilchenstrahlgerät mit Detektoranordnung |
| US8859963B2 (en) | 2011-06-03 | 2014-10-14 | Fei Company | Methods for preparing thin samples for TEM imaging |
| US8912490B2 (en) | 2011-06-03 | 2014-12-16 | Fei Company | Method for preparing samples for imaging |
| US8604446B2 (en) | 2011-08-08 | 2013-12-10 | The State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of The University Of Oregon | Devices and methods for cryo lift-out with in situ probe |
| CN103946684B (zh) * | 2011-12-01 | 2017-06-23 | Fei 公司 | 用于横截面视图薄层的背侧打薄的高吞吐量tem制备工艺和硬件 |
| DE102012202519A1 (de) * | 2012-02-17 | 2013-08-22 | Carl Zeiss Microscopy Gmbh | Verfahren und Vorrichtungen zur Präparation mikroskopischer Proben mit Hilfe von gepulstem Licht |
| US8884247B2 (en) * | 2012-09-25 | 2014-11-11 | Fei Company | System and method for ex situ analysis of a substrate |
| DE102012020478A1 (de) * | 2012-10-18 | 2014-05-08 | Carl Zeiss Microscopy Gmbh | Teilchenstrahlsystem und Verfahren zum Bearbeiten einer TEM-Probe |
| EP2765591B1 (en) * | 2013-02-08 | 2016-07-13 | FEI Company | Sample preparation stage |
| CZ304824B6 (cs) * | 2013-07-11 | 2014-11-19 | Tescan Orsay Holding, A.S. | Způsob opracovávání vzorku v zařízení se dvěma nebo více částicovými svazky a zařízení k jeho provádění |
| JP6453580B2 (ja) * | 2013-08-14 | 2019-01-16 | エフ・イ−・アイ・カンパニー | 試料調製中におけるtem試料からのプローブの分離 |
| EP2899744A1 (en) * | 2014-01-24 | 2015-07-29 | Carl Zeiss Microscopy GmbH | Method for preparing and analyzing an object as well as particle beam device for performing the method |
| CN104091745B (zh) * | 2014-07-18 | 2016-06-01 | 镇江乐华电子科技有限公司 | 一种集成tem荧光屏和stem探测器的一体化结构 |
| JP6346034B2 (ja) * | 2014-08-29 | 2018-06-20 | 日本電子株式会社 | 3次元像構築方法、画像処理装置、および電子顕微鏡 |
| WO2016067039A1 (en) * | 2014-10-29 | 2016-05-06 | Omniprobe, Inc | Rapid tem sample preparation method with backside fib milling |
| EP3038131A1 (en) | 2014-12-22 | 2016-06-29 | FEI Company | Improved specimen holder for a charged particle microscope |
| US9978560B2 (en) | 2016-06-30 | 2018-05-22 | International Business Machines Corporation | System and method for performing nano beam diffraction analysis |
| DE102017212020B3 (de) | 2017-07-13 | 2018-05-30 | Carl Zeiss Microscopy Gmbh | Verfahren zur In-situ-Präparation und zum Transfer mikroskopischer Proben, Computerprogrammprodukt sowie mikroskopische Probe |
| US10453646B2 (en) * | 2017-09-06 | 2019-10-22 | Fei Company | Tomography-assisted TEM prep with requested intervention automation workflow |
| CN109839517B (zh) * | 2017-11-28 | 2023-10-10 | 中国科学院金属研究所 | 扫描或聚焦离子束电镜连接透射电镜样品杆的转换装置 |
| CZ2018157A3 (cs) * | 2018-03-29 | 2019-10-09 | Tescan Brno, S.R.O. | Zařízení pro vytvoření a uložení lamely |
| DE102018108974B3 (de) * | 2018-04-16 | 2019-05-09 | Carl Zeiss Microscopy Gmbh | Verfahren zum Herstellen einer TEM-Probe |
| CN109461640B (zh) * | 2018-11-30 | 2024-03-22 | 中国科学院金属研究所 | 透射、扫描和聚焦离子束电镜通用样品杆及转接装置 |
| CN112577982A (zh) * | 2020-12-09 | 2021-03-30 | 广州添利电子科技有限公司 | 一种pcb表面处理金属薄层质量分析方法 |
| TWI782719B (zh) * | 2021-09-28 | 2022-11-01 | 汎銓科技股份有限公司 | 一種製備掃描電容顯微鏡試片的方法 |
| DE102022119041A1 (de) * | 2022-07-28 | 2024-02-08 | Carl Zeiss Microscopy Gmbh | Verfahren zum Befestigen eines Objekts an einem Manipulator und zum Bewegen des Objekts in einem Teilchenstrahlgerät, Computerprogrammprodukt sowie Teilchenstrahlgerät |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5435850A (en) | 1993-09-17 | 1995-07-25 | Fei Company | Gas injection system |
| US5851413A (en) | 1996-06-19 | 1998-12-22 | Micrion Corporation | Gas delivery systems for particle beam processing |
| JP3805547B2 (ja) | 1999-01-21 | 2006-08-02 | 株式会社日立製作所 | 試料作製装置 |
| US6841788B1 (en) | 2000-08-03 | 2005-01-11 | Ascend Instruments, Inc. | Transmission electron microscope sample preparation |
| JP4178741B2 (ja) * | 2000-11-02 | 2008-11-12 | 株式会社日立製作所 | 荷電粒子線装置および試料作製装置 |
| JP2004071486A (ja) * | 2002-08-09 | 2004-03-04 | Seiko Instruments Inc | 集束荷電粒子ビーム装置 |
| NL1022426C2 (nl) * | 2003-01-17 | 2004-07-26 | Fei Co | Werkwijze voor het vervaardigen en transmissief bestralen van een preparaat alsmede deeltjes optisch systeem. |
| DE60308482T2 (de) | 2003-04-28 | 2007-06-21 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Vorrichtung und Verfahren zur Untersuchung einer Probe eines Spezimen mittels eines Elektronenstrahls |
| JP2006114225A (ja) * | 2004-10-12 | 2006-04-27 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
| JP4664041B2 (ja) * | 2004-10-27 | 2011-04-06 | 株式会社日立ハイテクノロジーズ | 荷電粒子ビーム装置及び試料作製方法 |
| JP5020483B2 (ja) | 2005-07-08 | 2012-09-05 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| US7423263B2 (en) | 2006-06-23 | 2008-09-09 | Fei Company | Planar view sample preparation |
| EP2106555B1 (en) | 2006-10-20 | 2015-01-07 | FEI Company | Method for s/tem sample analysis |
| US7834315B2 (en) * | 2007-04-23 | 2010-11-16 | Omniprobe, Inc. | Method for STEM sample inspection in a charged particle beam instrument |
-
2007
- 2007-06-01 US US11/809,715 patent/US8835845B2/en active Active
-
2008
- 2008-05-29 JP JP2008140448A patent/JP5090255B2/ja active Active
- 2008-05-30 DE DE602008001685T patent/DE602008001685D1/de active Active
- 2008-05-30 AT AT08157258T patent/ATE473512T1/de not_active IP Right Cessation
- 2008-05-30 EP EP08157258A patent/EP1998356B1/en not_active Not-in-force
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