DE602008001685D1 - In-Situ-STEM-Probenherstellung - Google Patents
In-Situ-STEM-ProbenherstellungInfo
- Publication number
- DE602008001685D1 DE602008001685D1 DE602008001685T DE602008001685T DE602008001685D1 DE 602008001685 D1 DE602008001685 D1 DE 602008001685D1 DE 602008001685 T DE602008001685 T DE 602008001685T DE 602008001685 T DE602008001685 T DE 602008001685T DE 602008001685 D1 DE602008001685 D1 DE 602008001685D1
- Authority
- DE
- Germany
- Prior art keywords
- sample
- stem
- sample preparation
- fib
- tem sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
- H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching for microworking, e.g. etching of gratings, trimming of electrical components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3174—Etching microareas
- H01J2237/31745—Etching microareas for preparing specimen to be viewed in microscopes or analyzed in microanalysers
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Sampling And Sample Adjustment (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/809,715 US8835845B2 (en) | 2007-06-01 | 2007-06-01 | In-situ STEM sample preparation |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602008001685D1 true DE602008001685D1 (de) | 2010-08-19 |
Family
ID=39708954
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602008001685T Active DE602008001685D1 (de) | 2007-06-01 | 2008-05-30 | In-Situ-STEM-Probenherstellung |
Country Status (5)
Country | Link |
---|---|
US (1) | US8835845B2 (de) |
EP (1) | EP1998356B1 (de) |
JP (1) | JP5090255B2 (de) |
AT (1) | ATE473512T1 (de) |
DE (1) | DE602008001685D1 (de) |
Families Citing this family (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4533306B2 (ja) * | 2005-12-06 | 2010-09-01 | 株式会社日立ハイテクノロジーズ | 半導体ウェハ検査方法及び欠陥レビュー装置 |
JP5127148B2 (ja) * | 2006-03-16 | 2013-01-23 | 株式会社日立ハイテクノロジーズ | イオンビーム加工装置 |
DE102007026847A1 (de) * | 2007-06-06 | 2008-12-11 | Carl Zeiss Nts Gmbh | Teilchenstrahlgerät und Verfahren zur Anwendung bei einem Teilchenstrahlgerät |
WO2009114112A2 (en) | 2008-03-08 | 2009-09-17 | Omniprobe, Inc. | Method and apparatus for precursor delivery system for irradiation beam instruments |
WO2010014252A2 (en) * | 2008-08-01 | 2010-02-04 | Omniprobe, Inc. | Grid holder for stem analysis in a charged particle instrument |
JP5302595B2 (ja) * | 2008-08-06 | 2013-10-02 | 株式会社日立ハイテクノロジーズ | 傾斜観察方法および観察装置 |
DE102008052006B4 (de) * | 2008-10-10 | 2018-12-20 | 3D-Micromac Ag | Verfahren und Vorrichtung zur Herstellung von Proben für die Transmissionselektronenmikroskopie |
EP2367195B1 (de) * | 2008-10-31 | 2014-03-12 | FEI Company | Messung der Probendicke und Endpunkbestimmung |
JP5103422B2 (ja) * | 2009-02-27 | 2012-12-19 | 株式会社日立ハイテクノロジーズ | 荷電粒子ビーム装置 |
US20110017922A1 (en) * | 2009-07-24 | 2011-01-27 | Omniprobe, Inc. | Variable-tilt tem specimen holder for charged-particle beam instruments |
CN101988909B (zh) * | 2009-08-06 | 2012-03-07 | 中芯国际集成电路制造(上海)有限公司 | 低k介电材料的失效分析方法 |
JP2011187267A (ja) * | 2010-03-08 | 2011-09-22 | Jeol Ltd | 試料ホルダ及びマルチビームシステム |
DE102010024625A1 (de) * | 2010-06-22 | 2011-12-22 | Carl Zeiss Nts Gmbh | Verfahren zum Bearbeiten eines Objekts |
JP5386453B2 (ja) * | 2010-08-24 | 2014-01-15 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置および試料観察方法 |
DE102011002583B9 (de) * | 2011-01-12 | 2018-06-28 | Carl Zeiss Microscopy Gmbh | Teilchenstrahlgerät und Verfahren zur Bearbeitung und/oder Analyse einer Probe |
WO2012103534A1 (en) * | 2011-01-28 | 2012-08-02 | Fei Company | Tem sample preparation |
DE102011006588A1 (de) * | 2011-03-31 | 2012-10-04 | Carl Zeiss Nts Gmbh | Teilchenstrahlgerät mit Detektoranordnung |
US8912490B2 (en) | 2011-06-03 | 2014-12-16 | Fei Company | Method for preparing samples for imaging |
US8859963B2 (en) | 2011-06-03 | 2014-10-14 | Fei Company | Methods for preparing thin samples for TEM imaging |
US8604446B2 (en) | 2011-08-08 | 2013-12-10 | The State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of The University Of Oregon | Devices and methods for cryo lift-out with in situ probe |
WO2013082496A1 (en) | 2011-12-01 | 2013-06-06 | Fei Company | High throughput tem preparation processes and hardware for backside thinning of cross-sectional view lamella |
DE102012202519A1 (de) * | 2012-02-17 | 2013-08-22 | Carl Zeiss Microscopy Gmbh | Verfahren und Vorrichtungen zur Präparation mikroskopischer Proben mit Hilfe von gepulstem Licht |
US8884247B2 (en) * | 2012-09-25 | 2014-11-11 | Fei Company | System and method for ex situ analysis of a substrate |
DE102012020478A1 (de) * | 2012-10-18 | 2014-05-08 | Carl Zeiss Microscopy Gmbh | Teilchenstrahlsystem und Verfahren zum Bearbeiten einer TEM-Probe |
EP2765591B1 (de) * | 2013-02-08 | 2016-07-13 | FEI Company | Probenvorbereitungshalter |
CZ2013547A3 (cs) * | 2013-07-11 | 2014-11-19 | Tescan Orsay Holding, A.S. | Způsob opracovávání vzorku v zařízení se dvěma nebo více částicovými svazky a zařízení k jeho provádění |
JP6453580B2 (ja) * | 2013-08-14 | 2019-01-16 | エフ・イ−・アイ・カンパニー | 試料調製中におけるtem試料からのプローブの分離 |
EP2899744A1 (de) * | 2014-01-24 | 2015-07-29 | Carl Zeiss Microscopy GmbH | Verfahren zur Herstellung und Analyse eines Objekts und Teilchenstrahlvorrichtung zur Durchführung des Verfahrens |
CN104091745B (zh) * | 2014-07-18 | 2016-06-01 | 镇江乐华电子科技有限公司 | 一种集成tem荧光屏和stem探测器的一体化结构 |
JP6346034B2 (ja) * | 2014-08-29 | 2018-06-20 | 日本電子株式会社 | 3次元像構築方法、画像処理装置、および電子顕微鏡 |
US20160189929A1 (en) * | 2014-10-29 | 2016-06-30 | Omniprobe, Inc. | Rapid tem sample preparation method with backside fib milling |
EP3038131A1 (de) | 2014-12-22 | 2016-06-29 | FEI Company | Verbesserter Probenhalter für Ladungsträgerteilchenmikroskop |
US9978560B2 (en) | 2016-06-30 | 2018-05-22 | International Business Machines Corporation | System and method for performing nano beam diffraction analysis |
DE102017212020B3 (de) | 2017-07-13 | 2018-05-30 | Carl Zeiss Microscopy Gmbh | Verfahren zur In-situ-Präparation und zum Transfer mikroskopischer Proben, Computerprogrammprodukt sowie mikroskopische Probe |
US10453646B2 (en) * | 2017-09-06 | 2019-10-22 | Fei Company | Tomography-assisted TEM prep with requested intervention automation workflow |
CN109839517B (zh) * | 2017-11-28 | 2023-10-10 | 中国科学院金属研究所 | 扫描或聚焦离子束电镜连接透射电镜样品杆的转换装置 |
DE102018108974B3 (de) * | 2018-04-16 | 2019-05-09 | Carl Zeiss Microscopy Gmbh | Verfahren zum Herstellen einer TEM-Probe |
CN109461640B (zh) * | 2018-11-30 | 2024-03-22 | 中国科学院金属研究所 | 透射、扫描和聚焦离子束电镜通用样品杆及转接装置 |
CN112577982A (zh) * | 2020-12-09 | 2021-03-30 | 广州添利电子科技有限公司 | 一种pcb表面处理金属薄层质量分析方法 |
TWI782719B (zh) * | 2021-09-28 | 2022-11-01 | 汎銓科技股份有限公司 | 一種製備掃描電容顯微鏡試片的方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5435850A (en) | 1993-09-17 | 1995-07-25 | Fei Company | Gas injection system |
US5851413A (en) | 1996-06-19 | 1998-12-22 | Micrion Corporation | Gas delivery systems for particle beam processing |
US6841788B1 (en) * | 2000-08-03 | 2005-01-11 | Ascend Instruments, Inc. | Transmission electron microscope sample preparation |
JP4178741B2 (ja) * | 2000-11-02 | 2008-11-12 | 株式会社日立製作所 | 荷電粒子線装置および試料作製装置 |
JP2004071486A (ja) * | 2002-08-09 | 2004-03-04 | Seiko Instruments Inc | 集束荷電粒子ビーム装置 |
NL1022426C2 (nl) * | 2003-01-17 | 2004-07-26 | Fei Co | Werkwijze voor het vervaardigen en transmissief bestralen van een preparaat alsmede deeltjes optisch systeem. |
EP1473560B1 (de) | 2003-04-28 | 2006-09-20 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Vorrichtung und Verfahren zur Untersuchung einer Probe eines Prüfkörpers mittels Elektronenstrahls |
JP2006114225A (ja) * | 2004-10-12 | 2006-04-27 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
JP4664041B2 (ja) * | 2004-10-27 | 2011-04-06 | 株式会社日立ハイテクノロジーズ | 荷電粒子ビーム装置及び試料作製方法 |
JP5020483B2 (ja) | 2005-07-08 | 2012-09-05 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
US7423263B2 (en) * | 2006-06-23 | 2008-09-09 | Fei Company | Planar view sample preparation |
WO2008051937A2 (en) | 2006-10-20 | 2008-05-02 | Fei Company | Method for creating s/tem sample and sample structure |
US7834315B2 (en) * | 2007-04-23 | 2010-11-16 | Omniprobe, Inc. | Method for STEM sample inspection in a charged particle beam instrument |
-
2007
- 2007-06-01 US US11/809,715 patent/US8835845B2/en active Active
-
2008
- 2008-05-29 JP JP2008140448A patent/JP5090255B2/ja active Active
- 2008-05-30 DE DE602008001685T patent/DE602008001685D1/de active Active
- 2008-05-30 AT AT08157258T patent/ATE473512T1/de not_active IP Right Cessation
- 2008-05-30 EP EP08157258A patent/EP1998356B1/de not_active Not-in-force
Also Published As
Publication number | Publication date |
---|---|
JP2009014709A (ja) | 2009-01-22 |
EP1998356B1 (de) | 2010-07-07 |
US20080296498A1 (en) | 2008-12-04 |
US8835845B2 (en) | 2014-09-16 |
JP5090255B2 (ja) | 2012-12-05 |
ATE473512T1 (de) | 2010-07-15 |
EP1998356A2 (de) | 2008-12-03 |
EP1998356A3 (de) | 2009-03-11 |
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