JP6453580B2 - 試料調製中におけるtem試料からのプローブの分離 - Google Patents
試料調製中におけるtem試料からのプローブの分離 Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
- G01N1/32—Polishing; Etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
- H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching for microworking, e.g. etching of gratings, trimming of electrical components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/208—Elements or methods for movement independent of sample stage for influencing or moving or contacting or transferring the sample or parts thereof, e.g. prober needles or transfer needles in FIB/SEM systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/304—Controlling tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3174—Etching microareas
- H01J2237/31745—Etching microareas for preparing specimen to be viewed in microscopes or analyzed in microanalysers
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Description
204 電子ビーム・カラム
206 集束イオン・ビーム(FIB)カラム
208 試料室
209 ポンプ・システム
210 電子源
216 電子ビーム
218 加工物
224 可動ステージ
Claims (18)
- TEM分析用の試料を調製する方法であって、
イオン・ビーム・システムに基板を装填するステップと、
イオン・ビーム・ミリングによって前記基板から試料を切り離すステップと、
前記試料をプローブに保持する結合を形成する荷電粒子ビーム誘起付着を使用して前記試料を前記プローブに取り付けるステップと、
前記試料を試料ホルダまで運ぶステップと、
前記試料を前記プローブに保持している結合よりも大きい結合を形成する荷電粒子ビーム誘起付着を使用して前記試料を前記試料ホルダに取り付けるステップと、
前記プローブまたは前記試料ホルダを相対移動させることによって前記試料から前記プローブを切り離すステップであり、移動させる前に前記プローブから前記試料を切断しないステップであって、前記相対移動の方向は、前記プローブと前記試料の間の前記結合が弱く、前記試料と前記試料ホルダの間の前記結合が相対的により強い方向である、ステップと
を含む方法。 - 前記試料が前記プローブに荷電粒子ビーム誘起付着を使用して取り付けられており、前記試料が前記プローブに点で取り付けられ、前記試料が前記試料ホルダに線で取り付けられる、請求項1に記載の方法。
- 前記相対移動の方向は、前記試料が前記試料ホルダに取り付けられる前記線に沿って行われる、請求項2に記載の方法。
- 前記プローブまたは前記試料ホルダを相対移動させることによって前記試料から前記プローブを切り離すステップが、前記試料と前記プローブの相対移動によって前記試料と前記プローブの間の前記結合を切り、前記試料を前記試料ホルダに取り付けられたままにするステップを含む、請求項1に記載の方法。
- 前記試料をプローブに取り付けるステップが、ビーム誘起付着を使用して前記プローブを前記試料に取り付けて第1の結合を形成するステップを含み、前記試料を前記試料ホルダに取り付けるステップが、荷電粒子ビーム誘起付着を使用して第2の結合を形成するステップを含み、前記第1の結合が前記第2の結合よりも小さい、請求項1から4のいずれか一項に記載の方法。
- 前記第1の結合が点結合であり、前記第2の結合が線結合である、請求項5に記載の方法。
- 前記プローブまたは前記試料ホルダを相対移動させることによって前記試料から前記プローブを切り離すステップが、前記プローブを移動させることによって前記試料から前記プローブを切り離すステップを含む、請求項1から6のいずれか一項に記載の方法。
- 前記プローブまたは前記試料ホルダを相対移動させることによって前記試料から前記プローブを切り離すステップが、前記試料ホルダを移動させることによって前記試料から前記プローブを切り離すステップを含む、請求項1から6のいずれか一項に記載の方法。
- 前記試料を前記試料ホルダに取り付けるステップが、前記試料を、歯の付いたTEM試料ホルダに取り付けるステップを含む、請求項1から8のいずれか一項に記載の方法。
- イオン・ビーム・ミリングによって前記基板から試料を切り離すステップが、薄片を切り離すステップを含む、請求項1から9のいずれか一項に記載の方法。
- イオン・ビーム・ミリングによって前記基板から試料を切り離すステップが、塊を切り離すステップを含む、請求項1から10のいずれか一項に記載の方法。
- イオン・ビーム・ミリングによって前記基板から試料を切り離すステップが、平面視試料を切り離すステップを含む、請求項1から11のいずれか一項に記載の方法。
- イオン・ビーム・ミリングによって前記基板から試料を切り離すステップが、断面視試料を切り離すステップを含む、請求項1から11のいずれか一項に記載の方法。
- イオン・ビーム・ミリングによって前記基板から試料を切り離すステップが、観察領域の厚さが50nm未満の試料を切り離すステップを含む、請求項1から13のいずれか一項に記載の方法。
- イオン・ビーム・ミリングによって前記基板から試料を切り離すステップが、シリコンを含む試料を切り離すステップを含む、請求項1から14のいずれか一項に記載の方法。
- TEM試料を調製するシステムであって、
荷電粒子の供給源と、
前記荷電粒子を加工物の表面に焦束させるレンズと、
前記加工物を保持する加工物ホルダであり、少なくとも2次元内で移動することができる加工物ホルダと、
前記加工物から切り離された試料を保持する試料ホルダと、
前記加工物から切り離された前記試料を前記試料ホルダまで移動させる可動プローブと、
前記加工物から切り離された前記試料を前記試料ホルダに取り付けるための荷電粒子ビーム付着用の前駆体ガスの供給源と、
前記システムを制御するコンピュータであり、請求項1から15のいずれか一項に記載の方法を実行するようにプログラムされたコンピュータと
を備えるシステム。 - 前記プローブを移動させることによって前記プローブを前記試料から切り離すように、前記コンピュータがプログラムされた、請求項16に記載のシステム。
- 請求項1から15のいずれか一項に記載の方法を実行するためのコンピュータ命令を記憶したコンピュータ可読媒体。
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US10175295B2 (en) * | 2015-06-25 | 2019-01-08 | Fei Company | Optical nanoprobing of integrated circuits |
CN105500389A (zh) * | 2016-02-03 | 2016-04-20 | 苏州大学 | 微纳机器人末端执行器自动更换装置 |
US10401265B1 (en) * | 2018-03-30 | 2019-09-03 | Micron Technology, Inc. | Methods for acquiring planar view stem images of device structures |
US10410829B1 (en) * | 2018-03-30 | 2019-09-10 | Micron Technology, Inc. | Methods for acquiring planar view stem images of device structures |
US11972923B2 (en) | 2021-12-31 | 2024-04-30 | Fei Company | Systems and methods for performing sample lift-out for highly reactive materials |
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US7511282B2 (en) * | 2006-05-25 | 2009-03-31 | Fei Company | Sample preparation |
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US8258473B2 (en) * | 2010-11-12 | 2012-09-04 | Nanotem, Inc. | Method and apparatus for rapid preparation of multiple specimens for transmission electron microscopy |
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CN104374633B (zh) | 2019-04-09 |
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