JP2009003435A5 - - Google Patents
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- Publication number
- JP2009003435A5 JP2009003435A5 JP2008127868A JP2008127868A JP2009003435A5 JP 2009003435 A5 JP2009003435 A5 JP 2009003435A5 JP 2008127868 A JP2008127868 A JP 2008127868A JP 2008127868 A JP2008127868 A JP 2008127868A JP 2009003435 A5 JP2009003435 A5 JP 2009003435A5
- Authority
- JP
- Japan
- Prior art keywords
- light
- transistor
- emitting device
- single crystal
- crystal semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 14
- 239000013078 crystal Substances 0.000 claims 13
- 239000004065 semiconductor Substances 0.000 claims 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 7
- 229910052814 silicon oxide Inorganic materials 0.000 claims 7
- 230000015572 biosynthetic process Effects 0.000 claims 2
- 150000002500 ions Chemical class 0.000 claims 2
- 238000000926 separation method Methods 0.000 claims 2
- 239000003990 capacitor Substances 0.000 claims 1
- 238000005229 chemical vapour deposition Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 1
- 150000001282 organosilanes Chemical class 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008127868A JP5154299B2 (ja) | 2007-05-18 | 2008-05-15 | 発光装置 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007132803 | 2007-05-18 | ||
| JP2007132803 | 2007-05-18 | ||
| JP2008127868A JP5154299B2 (ja) | 2007-05-18 | 2008-05-15 | 発光装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012265980A Division JP5444445B2 (ja) | 2007-05-18 | 2012-12-05 | 発光装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009003435A JP2009003435A (ja) | 2009-01-08 |
| JP2009003435A5 true JP2009003435A5 (https=) | 2011-05-12 |
| JP5154299B2 JP5154299B2 (ja) | 2013-02-27 |
Family
ID=40287880
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008127868A Expired - Fee Related JP5154299B2 (ja) | 2007-05-18 | 2008-05-15 | 発光装置 |
| JP2012265980A Expired - Fee Related JP5444445B2 (ja) | 2007-05-18 | 2012-12-05 | 発光装置 |
| JP2013263187A Withdrawn JP2014123129A (ja) | 2007-05-18 | 2013-12-20 | 発光装置 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012265980A Expired - Fee Related JP5444445B2 (ja) | 2007-05-18 | 2012-12-05 | 発光装置 |
| JP2013263187A Withdrawn JP2014123129A (ja) | 2007-05-18 | 2013-12-20 | 発光装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US8513678B2 (https=) |
| JP (3) | JP5154299B2 (https=) |
| KR (1) | KR101481737B1 (https=) |
Families Citing this family (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7877895B2 (en) | 2006-06-26 | 2011-02-01 | Tokyo Electron Limited | Substrate processing apparatus |
| US8232598B2 (en) * | 2007-09-20 | 2012-07-31 | Semiconductor Energy Laboratory Co., Ltd. | Display device and method for manufacturing the same |
| JP2009151293A (ja) * | 2007-11-30 | 2009-07-09 | Semiconductor Energy Lab Co Ltd | 表示装置及び表示装置の作製方法、並びに電子機器 |
| US8736587B2 (en) * | 2008-07-10 | 2014-05-27 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| EP2178133B1 (en) * | 2008-10-16 | 2019-09-18 | Semiconductor Energy Laboratory Co., Ltd. | Flexible Light-Emitting Device, Electronic Device, and Method for Manufacturing Flexible-Light Emitting Device |
| US20100224880A1 (en) * | 2009-03-05 | 2010-09-09 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| KR101613865B1 (ko) * | 2009-03-26 | 2016-04-20 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 발광 장치 및 그 제작 방법 |
| JP5581106B2 (ja) * | 2009-04-27 | 2014-08-27 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| KR102005736B1 (ko) * | 2009-10-16 | 2019-07-31 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치의 제작 방법 |
| JP5740132B2 (ja) | 2009-10-26 | 2015-06-24 | 株式会社半導体エネルギー研究所 | 表示装置及び半導体装置 |
| KR102220606B1 (ko) | 2009-11-06 | 2021-03-02 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 그 제작 방법 |
| US9142804B2 (en) * | 2010-02-09 | 2015-09-22 | Samsung Display Co., Ltd. | Organic light-emitting device including barrier layer and method of manufacturing the same |
| JP5969216B2 (ja) * | 2011-02-11 | 2016-08-17 | 株式会社半導体エネルギー研究所 | 発光素子、表示装置、照明装置、及びこれらの作製方法 |
| US8928010B2 (en) | 2011-02-25 | 2015-01-06 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
| CN105702873B (zh) * | 2011-03-30 | 2017-11-24 | 株式会社半导体能源研究所 | 发光元件 |
| KR101960759B1 (ko) * | 2011-04-08 | 2019-03-21 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 발광 장치, 전자 기기, 및 조명 장치 |
| JP2013178500A (ja) * | 2012-02-02 | 2013-09-09 | Semiconductor Energy Lab Co Ltd | シリアルパラレル変換回路、表示装置、シリアルパラレル変換回路の駆動方法 |
| US8946731B2 (en) * | 2012-09-24 | 2015-02-03 | International Business Machines Corporation | OLED display with spalled semiconductor driving circuitry and other integrated functions |
| KR102034071B1 (ko) * | 2013-03-26 | 2019-10-18 | 엘지디스플레이 주식회사 | 폴리 실리콘 박막트랜지스터를 포함하는 유기발광 디스플레이 장치 및 이의 제조방법 |
| US9443872B2 (en) | 2014-03-07 | 2016-09-13 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| WO2021035405A1 (zh) | 2019-08-23 | 2021-03-04 | 京东方科技集团股份有限公司 | 显示装置及其制造方法和驱动基板 |
| CN105185816A (zh) * | 2015-10-15 | 2015-12-23 | 京东方科技集团股份有限公司 | 阵列基板及其制造方法、显示装置 |
| US11600234B2 (en) | 2015-10-15 | 2023-03-07 | Ordos Yuansheng Optoelectronics Co., Ltd. | Display substrate and driving method thereof |
| WO2021035415A1 (zh) | 2019-08-23 | 2021-03-04 | 京东方科技集团股份有限公司 | 显示装置及其制备方法 |
| JP6917700B2 (ja) | 2015-12-02 | 2021-08-11 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| US20180090720A1 (en) * | 2016-09-27 | 2018-03-29 | Universal Display Corporation | Flexible OLED Display Module |
| US10319880B2 (en) * | 2016-12-02 | 2019-06-11 | Innolux Corporation | Display device |
| KR102312349B1 (ko) * | 2017-06-30 | 2021-10-13 | 엘지디스플레이 주식회사 | 유기발광다이오드 표시장치 |
| CN109817672B (zh) * | 2019-01-29 | 2020-12-29 | 京东方科技集团股份有限公司 | 有机电致发光显示基板及其制造方法、显示面板、装置 |
| US12266303B2 (en) | 2019-08-23 | 2025-04-01 | Boe Technology Group Co., Ltd. | Display device and manufacturing method thereof |
| EP4020596B1 (en) | 2019-08-23 | 2025-04-16 | BOE Technology Group Co., Ltd. | Display device and manufacturing method therefor |
| EP4020447B1 (en) | 2019-08-23 | 2024-03-27 | BOE Technology Group Co., Ltd. | Pixel circuit and driving method therefor, and display substrate and driving method therefor, and display device |
| CN112840461B (zh) | 2019-08-23 | 2025-02-25 | 京东方科技集团股份有限公司 | 显示面板及其制造方法、显示装置 |
| US12120914B2 (en) | 2019-08-23 | 2024-10-15 | Boe Technology Group Co., Ltd. | Display device and manufacturing method thereof |
| CN112771674B (zh) | 2019-08-27 | 2022-02-22 | 京东方科技集团股份有限公司 | 电子装置基板及其制作方法、电子装置 |
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| JPH0766426A (ja) | 1993-08-27 | 1995-03-10 | Semiconductor Energy Lab Co Ltd | 半導体装置およびその作製方法 |
| US5849108A (en) * | 1996-04-26 | 1998-12-15 | Canon Kabushiki Kaisha | Photovoltaic element with zno layer having increasing fluorine content in layer thickness direction |
| US6159824A (en) | 1997-05-12 | 2000-12-12 | Silicon Genesis Corporation | Silicon-on-silicon wafer bonding process using a thin film blister-separation method |
| JP2000012864A (ja) | 1998-06-22 | 2000-01-14 | Semiconductor Energy Lab Co Ltd | 半導体装置の作製方法 |
| JP3385972B2 (ja) | 1998-07-10 | 2003-03-10 | 信越半導体株式会社 | 貼り合わせウェーハの製造方法および貼り合わせウェーハ |
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| JP3884351B2 (ja) | 2002-08-26 | 2007-02-21 | 株式会社 日立ディスプレイズ | 画像表示装置およびその製造方法 |
| US7176528B2 (en) | 2003-02-18 | 2007-02-13 | Corning Incorporated | Glass-based SOI structures |
| US7229703B2 (en) | 2003-03-31 | 2007-06-12 | Dai Nippon Printing Co. Ltd. | Gas barrier substrate |
| JP2004303562A (ja) | 2003-03-31 | 2004-10-28 | Dainippon Printing Co Ltd | 有機エレクトロルミネッセント素子用基板 |
| JP4754772B2 (ja) | 2003-05-16 | 2011-08-24 | 株式会社半導体エネルギー研究所 | 発光装置及び該発光装置を用いた電子機器 |
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| JP4641710B2 (ja) | 2003-06-18 | 2011-03-02 | 株式会社半導体エネルギー研究所 | 表示装置 |
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| JP4479250B2 (ja) | 2004-01-21 | 2010-06-09 | ソニー株式会社 | 表示装置の製造方法および表示装置 |
| JP5110772B2 (ja) | 2004-02-03 | 2012-12-26 | 株式会社半導体エネルギー研究所 | 半導体薄膜層を有する基板の製造方法 |
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| JP2005310742A (ja) | 2004-03-25 | 2005-11-04 | Sanyo Electric Co Ltd | 有機エレクトロルミネッセンス素子 |
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| TWI429327B (zh) | 2005-06-30 | 2014-03-01 | Semiconductor Energy Lab | 半導體裝置、顯示裝置、及電子設備 |
| US7898623B2 (en) * | 2005-07-04 | 2011-03-01 | Semiconductor Energy Laboratory Co., Ltd. | Display device, electronic device and method of driving display device |
| FR2888663B1 (fr) | 2005-07-13 | 2008-04-18 | Soitec Silicon On Insulator | Procede de diminution de la rugosite d'une couche epaisse d'isolant |
| EP3614442A3 (en) | 2005-09-29 | 2020-03-25 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having oxide semiconductor layer and manufactoring method thereof |
| EP1777689B1 (en) * | 2005-10-18 | 2016-08-10 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, and display device and electronic equipment each having the same |
| KR20090115222A (ko) | 2005-11-15 | 2009-11-04 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체장치 제조방법 |
| KR100698086B1 (ko) * | 2005-12-29 | 2007-03-23 | 동부일렉트로닉스 주식회사 | 반도체소자의 제조방법 |
| US7651896B2 (en) | 2006-08-30 | 2010-01-26 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing semiconductor device |
| FR2911430B1 (fr) | 2007-01-15 | 2009-04-17 | Soitec Silicon On Insulator | "procede de fabrication d'un substrat hybride" |
| CN101281912B (zh) | 2007-04-03 | 2013-01-23 | 株式会社半导体能源研究所 | Soi衬底及其制造方法以及半导体装置 |
-
2008
- 2008-05-12 US US12/149,979 patent/US8513678B2/en not_active Expired - Fee Related
- 2008-05-15 JP JP2008127868A patent/JP5154299B2/ja not_active Expired - Fee Related
- 2008-05-15 KR KR20080045008A patent/KR101481737B1/ko not_active Expired - Fee Related
-
2012
- 2012-12-05 JP JP2012265980A patent/JP5444445B2/ja not_active Expired - Fee Related
-
2013
- 2013-08-19 US US13/969,911 patent/US9431574B2/en not_active Expired - Fee Related
- 2013-12-20 JP JP2013263187A patent/JP2014123129A/ja not_active Withdrawn
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