JP2008544575A5 - - Google Patents

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JP2008544575A5
JP2008544575A5 JP2008519425A JP2008519425A JP2008544575A5 JP 2008544575 A5 JP2008544575 A5 JP 2008544575A5 JP 2008519425 A JP2008519425 A JP 2008519425A JP 2008519425 A JP2008519425 A JP 2008519425A JP 2008544575 A5 JP2008544575 A5 JP 2008544575A5
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source material
plasma
plasma source
coating layer
compound
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JP2008519425A
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JP5091130B2 (ja
JP2008544575A (ja
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Priority claimed from US11/168,190 external-priority patent/US7365349B2/en
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JP2008519425A 2005-06-27 2006-06-23 Ｅｕｖ光源集光器寿命の改善 Expired - Fee Related JP5091130B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/168,190 US7365349B2 (en) 2005-06-27 2005-06-27 EUV light source collector lifetime improvements
US11/168,190 2005-06-27
PCT/US2006/024463 WO2007002386A2 (en) 2005-06-27 2006-06-23 Euv light source collector lifetime improvements

Publications (3)

Publication Number Publication Date
JP2008544575A JP2008544575A (ja) 2008-12-04
JP2008544575A5 true JP2008544575A5 (enExample) 2009-08-06
JP5091130B2 JP5091130B2 (ja) 2012-12-05

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Application Number Title Priority Date Filing Date
JP2008519425A Expired - Fee Related JP5091130B2 (ja) 2005-06-27 2006-06-23 Ｅｕｖ光源集光器寿命の改善
JP2008519459A Expired - Fee Related JP5156625B2 (ja) 2005-06-27 2006-06-23 Ｅｕｖ光源集光器の侵食の緩和
JP2008519423A Pending JP2008544574A (ja) 2005-06-27 2006-06-23 Ｅｕｖ光源集光器の侵食の緩和

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2008519459A Expired - Fee Related JP5156625B2 (ja) 2005-06-27 2006-06-23 Ｅｕｖ光源集光器の侵食の緩和
JP2008519423A Pending JP2008544574A (ja) 2005-06-27 2006-06-23 Ｅｕｖ光源集光器の侵食の緩和

Country Status (4)

Country Link
US (1) US7365349B2 (enExample)
EP (1) EP1899697B1 (enExample)
JP (3) JP5091130B2 (enExample)
WO (1) WO2007002386A2 (enExample)

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JP5559562B2 (ja) 2009-02-12 2014-07-23 ギガフォトン株式会社 極端紫外光光源装置
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