JP2008544550A5 - - Google Patents

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Publication number
JP2008544550A5
JP2008544550A5 JP2008518281A JP2008518281A JP2008544550A5 JP 2008544550 A5 JP2008544550 A5 JP 2008544550A5 JP 2008518281 A JP2008518281 A JP 2008518281A JP 2008518281 A JP2008518281 A JP 2008518281A JP 2008544550 A5 JP2008544550 A5 JP 2008544550A5
Authority
JP
Japan
Prior art keywords
dielectric substrate
photoresist
array
photomask
holes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008518281A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008544550A (ja
Filing date
Publication date
Priority claimed from SG200504031A external-priority patent/SG128504A1/en
Application filed filed Critical
Publication of JP2008544550A publication Critical patent/JP2008544550A/ja
Publication of JP2008544550A5 publication Critical patent/JP2008544550A5/ja
Pending legal-status Critical Current

Links

JP2008518281A 2005-06-22 2006-06-20 ホールを有する誘電体基板及び製造分野における方法 Pending JP2008544550A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SG200504031A SG128504A1 (en) 2005-06-22 2005-06-22 Dielectric substrate with holes and method of manufacture
PCT/US2006/023832 WO2007001995A1 (en) 2005-06-22 2006-06-20 Dielectric substrate with holes and method of manufacture

Publications (2)

Publication Number Publication Date
JP2008544550A JP2008544550A (ja) 2008-12-04
JP2008544550A5 true JP2008544550A5 (enrdf_load_stackoverflow) 2009-07-09

Family

ID=37057055

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008518281A Pending JP2008544550A (ja) 2005-06-22 2006-06-20 ホールを有する誘電体基板及び製造分野における方法

Country Status (8)

Country Link
US (1) US20100051324A1 (enrdf_load_stackoverflow)
EP (1) EP1894451A1 (enrdf_load_stackoverflow)
JP (1) JP2008544550A (enrdf_load_stackoverflow)
KR (1) KR20080017381A (enrdf_load_stackoverflow)
CN (1) CN101248708B (enrdf_load_stackoverflow)
CA (1) CA2613282A1 (enrdf_load_stackoverflow)
SG (2) SG149040A1 (enrdf_load_stackoverflow)
WO (1) WO2007001995A1 (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102223764A (zh) * 2010-04-16 2011-10-19 富葵精密组件(深圳)有限公司 软性电路板的制作方法
KR20130143061A (ko) 2010-11-03 2013-12-30 쓰리엠 이노베이티브 프로퍼티즈 컴파니 와이어 본드 프리 다이를 사용한 가요성 led 디바이스
CN102162991A (zh) * 2011-04-02 2011-08-24 深南电路有限公司 阻焊曝光底片及线路板制作工艺
KR102031967B1 (ko) * 2013-05-07 2019-10-14 엘지이노텍 주식회사 발광 소자 패키지
JP2016197178A (ja) * 2015-04-03 2016-11-24 株式会社ジャパンディスプレイ 表示装置
CN111667770B (zh) * 2020-07-15 2021-10-08 武汉华星光电技术有限公司 柔性显示装置
KR20220125046A (ko) * 2021-03-04 2022-09-14 삼성전자주식회사 연성회로기판 및 이를 포함하는 전자 장치

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4720915A (en) * 1986-03-25 1988-01-26 True Grid, Ltd. Printed circuit board and process for its manufacture
JPH04342148A (ja) * 1991-05-20 1992-11-27 Toshiba Corp テープキャリア
WO1995026122A1 (de) * 1994-03-23 1995-09-28 Dyconex Patente Ag Folienleiterplatten und verfahren zu deren herstellung
JPH08186336A (ja) * 1994-12-28 1996-07-16 Mitsubishi Electric Corp 回路基板、駆動回路モジュール及びそれを用いた液晶表示装置並びにそれらの製造方法
US5759744A (en) * 1995-02-24 1998-06-02 University Of New Mexico Methods and apparatus for lithography of sparse arrays of sub-micrometer features
JP2869969B2 (ja) * 1995-04-28 1999-03-10 ソニーケミカル株式会社 フレキシブル回路基板の製造方法
KR100199368B1 (ko) * 1996-06-21 1999-06-15 김영환 반도체 소자 제조용 콘택 마스크
JP3238369B2 (ja) * 1998-04-10 2001-12-10 ソニーケミカル株式会社 フォトレジスト用組成物、及びフレキシブルプリント配線板の製造方法
JP3327252B2 (ja) * 1999-05-20 2002-09-24 日本電気株式会社 テープキャリア、ｔｃｐおよび液晶表示装置
TW436933B (en) * 1999-12-30 2001-05-28 Taiwan Semiconductor Mfg Method for defining a pattern
KR100333627B1 (ko) * 2000-04-11 2002-04-22 구자홍 다층 인쇄회로기판 및 그 제조방법
US20030039893A1 (en) * 2001-08-22 2003-02-27 Jeff Farnsworth Exposed phase edge mask method for generating periodic structures with subwavelength feature
JP2004014880A (ja) * 2002-06-07 2004-01-15 Sumitomo Metal Mining Co Ltd フレキシブル配線基板およびその製造方法
US6905621B2 (en) * 2002-10-10 2005-06-14 Taiwan Semiconductor Manufacturing Co., Ltd. Method for preventing the etch transfer of sidelobes in contact hole patterns

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