JP2008538728A - ナノワイヤー分散組成物およびその使用 - Google Patents
ナノワイヤー分散組成物およびその使用 Download PDFInfo
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- JP2008538728A JP2008538728A JP2008506571A JP2008506571A JP2008538728A JP 2008538728 A JP2008538728 A JP 2008538728A JP 2008506571 A JP2008506571 A JP 2008506571A JP 2008506571 A JP2008506571 A JP 2008506571A JP 2008538728 A JP2008538728 A JP 2008538728A
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- nanowire
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- nanowires
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- nanowire dispersion
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Classifications
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
- C30B33/005—Oxydation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- C—CHEMISTRY; METALLURGY
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- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
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- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
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- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
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- C—CHEMISTRY; METALLURGY
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- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/46—Sulfur-, selenium- or tellurium-containing compounds
- C30B29/48—AIIBVI compounds wherein A is Zn, Cd or Hg, and B is S, Se or Te
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- C—CHEMISTRY; METALLURGY
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- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
- C30B29/602—Nanotubes
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- H10F77/20—Electrodes
- H10F77/244—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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- Y10T428/24372—Particulate matter
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- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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- Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
- Y10T428/24372—Particulate matter
- Y10T428/24405—Polymer or resin [e.g., natural or synthetic rubber, etc.]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
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| US67113105P | 2005-04-13 | 2005-04-13 | |
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| EP (1) | EP1871162B1 (https=) |
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Cited By (4)
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| JP2019505403A (ja) * | 2015-12-31 | 2019-02-28 | ダウ グローバル テクノロジーズ エルエルシー | ナノ構造材料の連続フロー合成 |
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Families Citing this family (51)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9056783B2 (en) | 1998-12-17 | 2015-06-16 | Hach Company | System for monitoring discharges into a waste water collection system |
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| JP4528324B2 (ja) * | 2007-01-11 | 2010-08-18 | 本田技研工業株式会社 | 熱輸送流体およびその製造方法 |
| JP2008201834A (ja) * | 2007-02-16 | 2008-09-04 | Honda Motor Co Ltd | 熱輸送流体 |
| US8283724B2 (en) | 2007-02-26 | 2012-10-09 | Semiconductor Energy Laboratory Co., Ltd. | Memory element and semiconductor device, and method for manufacturing the same |
| JP5314591B2 (ja) * | 2007-03-08 | 2013-10-16 | 旭化成メディカル株式会社 | 微多孔膜のインテグリティテスト方法 |
| US7859036B2 (en) | 2007-04-05 | 2010-12-28 | Micron Technology, Inc. | Memory devices having electrodes comprising nanowires, systems including same and methods of forming same |
| JP6017110B2 (ja) | 2007-05-29 | 2016-11-09 | ティーピーケイ ホールディング カンパニー リミテッド | 粒子含有表面とその関連方法 |
| WO2009029341A2 (en) * | 2007-07-09 | 2009-03-05 | Nanocomp Technologies, Inc. | Chemically-assisted alignment of nanotubes within extensible structures |
| US8455055B1 (en) * | 2007-10-26 | 2013-06-04 | The Boeing Company | Aligning nanotubes |
| TW200946266A (en) * | 2008-02-27 | 2009-11-16 | Kuraray Co | Method of manufacturing metalnanowire and dispersion medium comprising the resultant metalnanowire, and transparent conductive film |
| JP5360739B2 (ja) * | 2008-03-05 | 2013-12-04 | 独立行政法人物質・材料研究機構 | 電子素子とその製造方法 |
| US8350144B2 (en) * | 2008-05-23 | 2013-01-08 | Swaminathan Ramesh | Hybrid photovoltaic cell module |
| EP2143768A1 (en) * | 2008-07-11 | 2010-01-13 | Acreo AB | Waterbased casting or printing composition |
| US10105875B2 (en) | 2008-08-21 | 2018-10-23 | Cam Holding Corporation | Enhanced surfaces, coatings, and related methods |
| JP5599461B2 (ja) * | 2009-07-17 | 2014-10-01 | ケアストリーム ヘルス インク | セルロースエスエルを含む透明導電物品 |
| CN102482457B (zh) | 2009-09-09 | 2015-04-15 | Qd视光有限公司 | 包含纳米颗粒的颗粒、其应用和方法 |
| WO2011031876A1 (en) | 2009-09-09 | 2011-03-17 | Qd Vision, Inc. | Formulations including nanoparticles |
| KR101564330B1 (ko) | 2009-10-15 | 2015-10-29 | 삼성전자주식회사 | 유기 나노와이어를 포함하는 태양전지 |
| US8396420B2 (en) * | 2009-12-30 | 2013-03-12 | Ubidyne, Inc. | Active antenna system for a mobile communications network as well as a method for relaying a plurality of radio signals through the active antenna system |
| AU2011220397B2 (en) * | 2010-02-27 | 2015-09-03 | Nuovo Film Suzhou China Inc. | Structures with surface-embedded additives and related manufacturing methods |
| KR20130038812A (ko) * | 2010-03-19 | 2013-04-18 | 케어스트림 헬스 인코포레이티드 | 투명한 전도성 필름용 부식 방지제 |
| KR20110126998A (ko) * | 2010-05-18 | 2011-11-24 | 삼성전자주식회사 | Ｃｎｔ 조성물, ｃｎｔ 막구조체, 액정표시장치, ｃｎｔ 막구조체의 제조방법 및 액정표시장치의 제조방법 |
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| US9000660B2 (en) * | 2010-11-15 | 2015-04-07 | Laurence H. Cooke | Uses of hydrocarbon nanorings |
| WO2012078191A1 (en) * | 2010-12-07 | 2012-06-14 | Rhodia Operations | Electrically conductive nanostructures, method for making such nanostructures, electrically conductive polymer films containing such nanostructures, and electronic devices containing such films |
| JP6014603B2 (ja) | 2011-01-04 | 2016-10-25 | ナノコンプ テクノロジーズ インコーポレイテッド | ナノチューブベースの絶縁体 |
| JP2013016455A (ja) * | 2011-01-13 | 2013-01-24 | Jnc Corp | 透明導電膜の形成に用いられる塗膜形成用組成物 |
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| US20140205845A1 (en) * | 2013-01-18 | 2014-07-24 | Carestream Health, Inc. | Stabilization agents for transparent conductive films |
| US9718691B2 (en) | 2013-06-17 | 2017-08-01 | Nanocomp Technologies, Inc. | Exfoliating-dispersing agents for nanotubes, bundles and fibers |
| KR101683532B1 (ko) * | 2013-07-31 | 2016-12-08 | 고려대학교 산학협력단 | 바나듐 옥사이드 나노와이어를 이용한 다공성 고분자막의 제조방법 및 이에 따라 제조된 다공성 고분자막 |
| KR102152632B1 (ko) * | 2013-08-23 | 2020-09-09 | 엘지이노텍 주식회사 | 나노 와이어 잉크 |
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| US10190051B2 (en) | 2014-06-10 | 2019-01-29 | Alexium, Inc. | Emulsification of hydrophobic organophosphorous compounds |
| US9607726B2 (en) * | 2015-01-30 | 2017-03-28 | Xerox Corporation | Composition comprising silver nanowires |
| US9947430B2 (en) | 2015-01-30 | 2018-04-17 | Xerox Corporation | Transparent conductive film comprising silver nanowires |
| CN110534684A (zh) * | 2019-08-27 | 2019-12-03 | 华南理工大学 | 一种一维纳米线改性聚合物隔膜及其制备方法与应用 |
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Citations (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1128669A (ja) * | 1997-07-04 | 1999-02-02 | Mitsubishi Materials Corp | 精密切断用超砥粒メタルボンド砥石およびその製造方法 |
| JP2001167692A (ja) * | 1999-10-18 | 2001-06-22 | Lucent Technol Inc | 位置合せされたナノワイヤを備えた物品および物品を製作するプロセス |
| JP2002009278A (ja) * | 2000-06-21 | 2002-01-11 | Toshiba Corp | 半導体装置及びその製造方法 |
| JP2002154819A (ja) * | 2000-11-09 | 2002-05-28 | Japan Science & Technology Corp | 酸化珪素のナノワイヤの製造方法 |
| JP2002220300A (ja) * | 2001-01-18 | 2002-08-09 | Vision Arts Kk | ナノファイバーおよびナノファイバーの作製方法 |
| JP2003020228A (ja) * | 2001-07-03 | 2003-01-24 | Fuji Photo Film Co Ltd | 金属または金属−カルコゲンナノ粒子の液相合成法およびこれを用いた相変化光記録媒体 |
| WO2003107359A1 (en) * | 2002-06-14 | 2003-12-24 | Hyperion Catalysis International, Inc. | Electroconductive carbon fibril-based inks and coatings |
| WO2004032193A2 (en) * | 2002-09-30 | 2004-04-15 | Nanosys, Inc. | Large-area nanoenabled macroelectronic substrates and uses therefor |
| US20040157414A1 (en) * | 2000-03-29 | 2004-08-12 | Gole James L. | Silicon based nanospheres and nanowires |
| JP2004238503A (ja) * | 2003-02-06 | 2004-08-26 | Mitsubishi Materials Corp | 金属ナノ繊維含有組成物およびその用途 |
| US20040175844A1 (en) * | 2002-12-09 | 2004-09-09 | The Regents Of The University Of California | Sacrificial template method of fabricating a nanotube |
| JP2004271735A (ja) * | 2003-03-06 | 2004-09-30 | Fuji Photo Film Co Ltd | 硬化性コーティング組成物の製造方法、硬化膜、反射防止膜、偏光板、及び画像表示装置 |
| JP2004311265A (ja) * | 2003-04-09 | 2004-11-04 | Sumitomo Electric Ind Ltd | 導電性インク及びその製造方法 |
| WO2004101430A1 (ja) * | 2003-05-13 | 2004-11-25 | Mitsubishi Materials Corporation | 金属ナノロッドの製造方法およびその用途 |
| US20050009224A1 (en) * | 2003-06-20 | 2005-01-13 | The Regents Of The University Of California | Nanowire array and nanowire solar cells and methods for forming the same |
| US20050025694A1 (en) * | 2000-12-12 | 2005-02-03 | Zhiqiang Zhang | Preparation of stable carbon nanotube dispersions in liquids |
| JP2005070318A (ja) * | 2003-08-22 | 2005-03-17 | Fuji Photo Film Co Ltd | 防眩性反射防止フィルムおよびその製造方法、偏光板並びに画像表示装置 |
Family Cites Families (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5505928A (en) | 1991-11-22 | 1996-04-09 | The Regents Of University Of California | Preparation of III-V semiconductor nanocrystals |
| WO1993010564A1 (en) | 1991-11-22 | 1993-05-27 | The Regents Of The University Of California | Semiconductor nanocrystals covalently bound to solid inorganic surfaces using self-assembled monolayers |
| US6048616A (en) | 1993-04-21 | 2000-04-11 | Philips Electronics N.A. Corp. | Encapsulated quantum sized doped semiconductor particles and method of manufacturing same |
| EP0647690B1 (en) | 1993-10-08 | 2000-01-12 | Kabushiki Kaisha Toshiba | Pigment dispersion composition, display apparatus, and method of manufacturing the apparatus |
| US5690807A (en) | 1995-08-03 | 1997-11-25 | Massachusetts Institute Of Technology | Method for producing semiconductor particles |
| US5869405A (en) | 1996-01-03 | 1999-02-09 | Micron Technology, Inc. | In situ rapid thermal etch and rapid thermal oxidation |
| US6036774A (en) | 1996-02-26 | 2000-03-14 | President And Fellows Of Harvard College | Method of producing metal oxide nanorods |
| US5897945A (en) | 1996-02-26 | 1999-04-27 | President And Fellows Of Harvard College | Metal oxide nanorods |
| EP0792688A1 (en) | 1996-03-01 | 1997-09-03 | Dow Corning Corporation | Nanoparticles of silicon oxide alloys |
| US5997832A (en) | 1997-03-07 | 1999-12-07 | President And Fellows Of Harvard College | Preparation of carbide nanorods |
| US6413489B1 (en) | 1997-04-15 | 2002-07-02 | Massachusetts Institute Of Technology | Synthesis of nanometer-sized particles by reverse micelle mediated techniques |
| US5990479A (en) | 1997-11-25 | 1999-11-23 | Regents Of The University Of California | Organo Luminescent semiconductor nanocrystal probes for biological applications and process for making and using such probes |
| WO2001003208A1 (en) | 1999-07-02 | 2001-01-11 | President And Fellows Of Harvard College | Nanoscopic wire-based devices, arrays, and methods of their manufacture |
| US6306736B1 (en) | 2000-02-04 | 2001-10-23 | The Regents Of The University Of California | Process for forming shaped group III-V semiconductor nanocrystals, and product formed using process |
| US6225198B1 (en) | 2000-02-04 | 2001-05-01 | The Regents Of The University Of California | Process for forming shaped group II-VI semiconductor nanocrystals, and product formed using process |
| GB0020273D0 (en) | 2000-08-18 | 2000-10-04 | Avecia Ltd | Chemical composition |
| CN101887935B (zh) | 2000-08-22 | 2013-09-11 | 哈佛学院董事会 | 掺杂的拉长半导体,其生长,包含这类半导体的器件及其制造 |
| KR20030055346A (ko) | 2000-12-11 | 2003-07-02 | 프레지던트 앤드 펠로우즈 오브 하버드 칼리지 | 나노센서 |
| EP1374309A1 (en) | 2001-03-30 | 2004-01-02 | The Regents Of The University Of California | Methods of fabricating nanostructures and nanowires and devices fabricated therefrom |
| US6896864B2 (en) | 2001-07-10 | 2005-05-24 | Battelle Memorial Institute | Spatial localization of dispersed single walled carbon nanotubes into useful structures |
| CA2457189C (en) * | 2001-09-28 | 2011-08-09 | Boston Scientific Limited | Medical devices comprising nanomaterials and therapeutic methods utilizing the same |
| US6872645B2 (en) | 2002-04-02 | 2005-03-29 | Nanosys, Inc. | Methods of positioning and/or orienting nanostructures |
| US20040026684A1 (en) | 2002-04-02 | 2004-02-12 | Nanosys, Inc. | Nanowire heterostructures for encoding information |
| WO2004023527A2 (en) | 2002-09-05 | 2004-03-18 | Nanosys, Inc. | Nanostructure and nanocomposite based compositions and photovoltaic devices |
| US7051945B2 (en) | 2002-09-30 | 2006-05-30 | Nanosys, Inc | Applications of nano-enabled large area macroelectronic substrates incorporating nanowires and nanowire composites |
| AU2003283778A1 (en) * | 2002-11-18 | 2004-06-15 | Koninklijke Philips Electronics N.V. | Dispersion of nanowires of semiconductor material |
| US7067328B2 (en) | 2003-09-25 | 2006-06-27 | Nanosys, Inc. | Methods, devices and compositions for depositing and orienting nanostructures |
| JP2008506254A (ja) | 2004-07-07 | 2008-02-28 | ナノシス・インコーポレイテッド | ナノワイヤーの集積及び組み込みのためのシステムおよび方法 |
| DE102004034567A1 (de) * | 2004-07-17 | 2006-02-23 | Daimlerchrysler Ag | Vorrichtung zur Schwingungsdämpfung |
-
2006
- 2006-04-06 US US11/399,307 patent/US7745498B2/en active Active
- 2006-04-06 EP EP20060749643 patent/EP1871162B1/en not_active Expired - Lifetime
- 2006-04-06 WO PCT/US2006/013290 patent/WO2006113207A2/en not_active Ceased
- 2006-04-06 JP JP2008506571A patent/JP2008538728A/ja active Pending
-
2010
- 2010-05-14 US US12/780,572 patent/US20100237288A1/en not_active Abandoned
-
2014
- 2014-08-26 JP JP2014172027A patent/JP2015037831A/ja active Pending
Patent Citations (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1128669A (ja) * | 1997-07-04 | 1999-02-02 | Mitsubishi Materials Corp | 精密切断用超砥粒メタルボンド砥石およびその製造方法 |
| JP2001167692A (ja) * | 1999-10-18 | 2001-06-22 | Lucent Technol Inc | 位置合せされたナノワイヤを備えた物品および物品を製作するプロセス |
| US20040157414A1 (en) * | 2000-03-29 | 2004-08-12 | Gole James L. | Silicon based nanospheres and nanowires |
| JP2002009278A (ja) * | 2000-06-21 | 2002-01-11 | Toshiba Corp | 半導体装置及びその製造方法 |
| JP2002154819A (ja) * | 2000-11-09 | 2002-05-28 | Japan Science & Technology Corp | 酸化珪素のナノワイヤの製造方法 |
| US20050025694A1 (en) * | 2000-12-12 | 2005-02-03 | Zhiqiang Zhang | Preparation of stable carbon nanotube dispersions in liquids |
| JP2002220300A (ja) * | 2001-01-18 | 2002-08-09 | Vision Arts Kk | ナノファイバーおよびナノファイバーの作製方法 |
| JP2003020228A (ja) * | 2001-07-03 | 2003-01-24 | Fuji Photo Film Co Ltd | 金属または金属−カルコゲンナノ粒子の液相合成法およびこれを用いた相変化光記録媒体 |
| WO2003107359A1 (en) * | 2002-06-14 | 2003-12-24 | Hyperion Catalysis International, Inc. | Electroconductive carbon fibril-based inks and coatings |
| WO2004032193A2 (en) * | 2002-09-30 | 2004-04-15 | Nanosys, Inc. | Large-area nanoenabled macroelectronic substrates and uses therefor |
| US20040175844A1 (en) * | 2002-12-09 | 2004-09-09 | The Regents Of The University Of California | Sacrificial template method of fabricating a nanotube |
| JP2004238503A (ja) * | 2003-02-06 | 2004-08-26 | Mitsubishi Materials Corp | 金属ナノ繊維含有組成物およびその用途 |
| JP2004271735A (ja) * | 2003-03-06 | 2004-09-30 | Fuji Photo Film Co Ltd | 硬化性コーティング組成物の製造方法、硬化膜、反射防止膜、偏光板、及び画像表示装置 |
| JP2004311265A (ja) * | 2003-04-09 | 2004-11-04 | Sumitomo Electric Ind Ltd | 導電性インク及びその製造方法 |
| WO2004101430A1 (ja) * | 2003-05-13 | 2004-11-25 | Mitsubishi Materials Corporation | 金属ナノロッドの製造方法およびその用途 |
| US20050009224A1 (en) * | 2003-06-20 | 2005-01-13 | The Regents Of The University Of California | Nanowire array and nanowire solar cells and methods for forming the same |
| JP2005070318A (ja) * | 2003-08-22 | 2005-03-17 | Fuji Photo Film Co Ltd | 防眩性反射防止フィルムおよびその製造方法、偏光板並びに画像表示装置 |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5472299B2 (ja) * | 2009-06-24 | 2014-04-16 | コニカミノルタ株式会社 | 透明電極、該透明電極に用いられる導電性繊維の精製方法、及び有機エレクトロルミネッセンス素子 |
| JP2012238592A (ja) * | 2011-04-28 | 2012-12-06 | Fujifilm Corp | 金属ナノワイヤを含有する分散液および導電膜 |
| JP2019505403A (ja) * | 2015-12-31 | 2019-02-28 | ダウ グローバル テクノロジーズ エルエルシー | ナノ構造材料の連続フロー合成 |
| JP7018021B2 (ja) | 2015-12-31 | 2022-02-09 | ダウ グローバル テクノロジーズ エルエルシー | ナノ構造材料の連続フロー合成 |
| US12568714B2 (en) | 2022-07-05 | 2026-03-03 | Kabushiki Kaisha Toshiba | Transparent electrode, producing method thereof, and electronic device using transparent electrode |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2006113207A3 (en) | 2009-02-05 |
| WO2006113207A2 (en) | 2006-10-26 |
| EP1871162A4 (en) | 2009-09-02 |
| US7745498B2 (en) | 2010-06-29 |
| EP1871162B1 (en) | 2014-03-12 |
| JP2015037831A (ja) | 2015-02-26 |
| US20060257637A1 (en) | 2006-11-16 |
| US20100237288A1 (en) | 2010-09-23 |
| EP1871162A2 (en) | 2008-01-02 |
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