JP2008533249A - 低分子量有機成分を含む重合性組成物 - Google Patents
低分子量有機成分を含む重合性組成物 Download PDFInfo
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- JP2008533249A JP2008533249A JP2008501051A JP2008501051A JP2008533249A JP 2008533249 A JP2008533249 A JP 2008533249A JP 2008501051 A JP2008501051 A JP 2008501051A JP 2008501051 A JP2008501051 A JP 2008501051A JP 2008533249 A JP2008533249 A JP 2008533249A
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- acrylate
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- organic component
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Classifications
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- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08J5/18—Manufacture of films or sheets
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K19/00—Liquid crystal materials
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
- C09K2323/03—Viewing layer characterised by chemical composition
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- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0033—Means for improving the coupling-out of light from the light guide
- G02B6/005—Means for improving the coupling-out of light from the light guide provided by one optical element, or plurality thereof, placed on the light output side of the light guide
- G02B6/0053—Prismatic sheet or layer; Brightness enhancement element, sheet or layer
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- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0065—Manufacturing aspects; Material aspects
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
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- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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Families Citing this family (61)
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| US8836212B2 (en) | 2007-01-11 | 2014-09-16 | Qd Vision, Inc. | Light emissive printed article printed with quantum dot ink |
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| WO2009014590A2 (en) | 2007-06-25 | 2009-01-29 | Qd Vision, Inc. | Compositions and methods including depositing nanomaterial |
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| CN101469250B (zh) | 2007-12-26 | 2012-09-19 | 3M创新有限公司 | 可去除的防雾涂层、制品、涂料组合物和方法 |
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| JP6034613B2 (ja) * | 2012-07-31 | 2016-11-30 | 第一工業製薬株式会社 | 無機化合物微粒子分散組成物の製造方法および無機化合物微粒子分散硬化物の製造方法 |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08217991A (ja) * | 1995-02-02 | 1996-08-27 | Minnesota Mining & Mfg Co <3M> | 放射線硬化性材料 |
| JP2004516367A (ja) * | 2000-12-21 | 2004-06-03 | スリーエム イノベイティブ プロパティズ カンパニー | 高屈折率の微細複製樹脂 |
Family Cites Families (109)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2742604A (en) | 1951-04-25 | 1956-04-17 | Bosch Arma Corp | Electromechanical resolvers |
| US4576850A (en) | 1978-07-20 | 1986-03-18 | Minnesota Mining And Manufacturing Company | Shaped plastic articles having replicated microstructure surfaces |
| DE3374717D1 (en) | 1982-03-16 | 1988-01-07 | Du Pont | Use of a negative acting photopolymerizable element as a solder mask |
| US4542449A (en) * | 1983-08-29 | 1985-09-17 | Canadian Patents & Development Limited | Lighting panel with opposed 45° corrugations |
| US4487904A (en) * | 1983-09-21 | 1984-12-11 | Toray Industries, Inc. | Urethanized acrylic resin material for plastic lens and lens composed thereof |
| US4812032A (en) * | 1984-09-19 | 1989-03-14 | Toray Industries, Inc. | Highly-refractive plastic lens |
| EP0176874A3 (en) * | 1984-09-19 | 1988-02-10 | Toray Industries, Inc. | A highly-refractive plastic lens |
| US4568445A (en) * | 1984-12-21 | 1986-02-04 | Honeywell Inc. | Electrode system for an electro-chemical sensor for measuring vapor concentrations |
| JPH0735407B2 (ja) * | 1985-10-18 | 1995-04-19 | 住友化学工業株式会社 | 反応性モノマ−を分散媒とする酸化物ゾル |
| US5073462A (en) * | 1986-12-02 | 1991-12-17 | E. I. Du Pont De Nemours And Company | Photopolymerizable composition having superior adhesion, articles and processes |
| US4937172A (en) * | 1986-12-02 | 1990-06-26 | E. I. Du Pont De Nemours And Company | Photopolymerizable composition having superior adhesion, articles and processes |
| US5045397A (en) * | 1987-02-13 | 1991-09-03 | Hughes Aircraft Company | Optical adhesive system having low refractive index |
| JPS63279201A (ja) * | 1987-05-12 | 1988-11-16 | Kureha Chem Ind Co Ltd | 樹脂レンズ |
| US5354821A (en) * | 1988-08-31 | 1994-10-11 | Henkel Kommanditgesellschaft Auf Aktien | Radically polymerizable multicomponent mixtures and their use (III) |
| JPH0288615A (ja) * | 1988-09-27 | 1990-03-28 | Mitsubishi Rayon Co Ltd | 難燃性液状感光性樹脂組成物 |
| US4962163A (en) * | 1989-01-17 | 1990-10-09 | The Dow Chemical Company | Vinyl ester resins containing mesogenic/rigid rodlike moieties |
| US5066750A (en) * | 1989-01-17 | 1991-11-19 | The Dow Chemical Company | Vinyl ester resins containing mesogenic/rigid rodlike moieties |
| US5164464A (en) * | 1989-01-17 | 1992-11-17 | The Dow Chemical Company | Vinyl ester resins containing mesogenic/rigid rodlike moieties |
| US5183597A (en) * | 1989-02-10 | 1993-02-02 | Minnesota Mining And Manufacturing Company | Method of molding microstructure bearing composite plastic articles |
| US5175030A (en) * | 1989-02-10 | 1992-12-29 | Minnesota Mining And Manufacturing Company | Microstructure-bearing composite plastic articles and method of making |
| US5486949A (en) * | 1989-06-20 | 1996-01-23 | The Dow Chemical Company | Birefringent interference polarizer |
| JPH03160058A (ja) * | 1989-11-17 | 1991-07-10 | Mitsubishi Rayon Co Ltd | 架橋硬化型樹脂組成物 |
| CA2030145A1 (en) * | 1989-11-20 | 1991-05-21 | Thomas E. Dueber | Flame retardant adhesive composition and laminates |
| US5247038A (en) * | 1989-11-29 | 1993-09-21 | Mitsubishi Rayon Co., Ltd. | Polybutylene glycol dimethacrylate and resin composition for cast polymerization |
| AU634338B2 (en) * | 1990-02-08 | 1993-02-18 | Mitsubishi Rayon Company Limited | Composition for plastic lenses |
| JP2873126B2 (ja) * | 1991-04-17 | 1999-03-24 | 日本ペイント株式会社 | 体積ホログラム記録用感光性組成物 |
| US5193597A (en) | 1991-08-26 | 1993-03-16 | Strong Manufacturing Company | Material stripper and debris removal apparatus therefor |
| JP3155327B2 (ja) * | 1992-03-27 | 2001-04-09 | 三菱化学株式会社 | 高屈折率光学材料およびその製造法 |
| US5691846A (en) * | 1993-10-20 | 1997-11-25 | Minnesota Mining And Manufacturing Company | Ultra-flexible retroreflective cube corner composite sheetings and methods of manufacture |
| EP0657761B1 (en) * | 1993-12-08 | 1999-03-17 | Matsushita Electric Industrial Co., Ltd. | A liquid crystal panel with ultraviolet radiation reducing means, manufacturing method therefor and projection display apparatus using the same |
| US5828488A (en) * | 1993-12-21 | 1998-10-27 | Minnesota Mining And Manufacturing Co. | Reflective polarizer display |
| US5882774A (en) * | 1993-12-21 | 1999-03-16 | Minnesota Mining And Manufacturing Company | Optical film |
| CA2141515A1 (en) * | 1994-02-08 | 1995-08-09 | John D. Blizzard | Abrasion-resistant coating |
| JPH10501008A (ja) * | 1994-05-19 | 1998-01-27 | ミネソタ マイニング アンド マニュファクチャリング カンパニー | Ｑ良された親水性を有するポリマー物品およびその製造方法 |
| JPH08113616A (ja) * | 1994-10-18 | 1996-05-07 | Mitsubishi Rayon Co Ltd | 活性エネルギー線硬化性組成物およびレンズシート |
| US5635278A (en) * | 1995-02-03 | 1997-06-03 | Minnesota Mining And Manufacturing Company | Scratch resistant optical films and method for producing same |
| US5626800A (en) * | 1995-02-03 | 1997-05-06 | Minnesota Mining And Manufacturing Company | Prevention of groove tip deformation in brightness enhancement film |
| US5855983A (en) * | 1995-02-03 | 1999-01-05 | Minnesota Mining And Manufacturing Company | Flame retardant ultraviolet cured multi-layered film |
| KR100398940B1 (ko) * | 1995-03-03 | 2003-12-31 | 미네소타 마이닝 앤드 매뉴팩춰링 캄파니 | 다양한높이의구조화면을갖는광지향성필름과이러한필름으로구성된물품 |
| JP3298891B2 (ja) | 1995-04-28 | 2002-07-08 | 日本油脂ビーエーエスエフコーティングス株式会社 | 塗料組成物、塗料組成物の製造方法及び無機酸化物ゾルの分散体の製造方法 |
| JP3190251B2 (ja) * | 1995-06-06 | 2001-07-23 | 太陽インキ製造株式会社 | アルカリ現像型のフレキシブルプリント配線板用光硬化性・熱硬化性樹脂組成物 |
| US5714218A (en) * | 1995-08-21 | 1998-02-03 | Dainippon Printing Co., Ltd. | Ionizing radiation-curable resin composition for optical article, optical article, and surface light source |
| US5917664A (en) * | 1996-02-05 | 1999-06-29 | 3M Innovative Properties Company | Brightness enhancement film with soft cutoff |
| US5825543A (en) * | 1996-02-29 | 1998-10-20 | Minnesota Mining And Manufacturing Company | Diffusely reflecting polarizing element including a first birefringent phase and a second phase |
| US5783120A (en) * | 1996-02-29 | 1998-07-21 | Minnesota Mining And Manufacturing Company | Method for making an optical film |
| US5919551A (en) * | 1996-04-12 | 1999-07-06 | 3M Innovative Properties Company | Variable pitch structured optical film |
| US5908874A (en) * | 1996-06-18 | 1999-06-01 | 3M Innovative Properties Company | Polymerizable compositions containing fluorochemicals to reduce melting temperature |
| US5760126A (en) * | 1996-12-20 | 1998-06-02 | Minnesota Mining And Manufacturing Company | Aqueous fluorochemical compositions and abrasion-resistant coatings therefrom |
| EP0860742B1 (en) * | 1997-02-25 | 2001-04-04 | E.I. Du Pont De Nemours And Company | Flexible, flame-retardant, photoimageable composition for coating printing circuits |
| US6280063B1 (en) * | 1997-05-09 | 2001-08-28 | 3M Innovative Properties Company | Brightness enhancement article |
| US6107364A (en) * | 1997-05-09 | 2000-08-22 | 3M Innovative Properties Company | Methyl styrene as a high index of refraction monomer |
| US6355754B1 (en) * | 1997-05-09 | 2002-03-12 | 3M Innovative Properties Company | High refractive index chemical composition and polymers and polymeric material derived therefrom |
| US5932626A (en) * | 1997-05-09 | 1999-08-03 | Minnesota Mining And Manufacturing Company | Optical product prepared from high index of refraction brominated monomers |
| MY122234A (en) * | 1997-05-13 | 2006-04-29 | Inst Neue Mat Gemein Gmbh | Nanostructured moulded bodies and layers and method for producing same |
| US5898523A (en) * | 1997-07-02 | 1999-04-27 | Minnesota Mining & Manufacturing Company | Tiled retroreflective sheeting composed of highly canted cube corner elements |
| US6599631B2 (en) * | 2001-01-26 | 2003-07-29 | Nanogram Corporation | Polymer-inorganic particle composites |
| US6265061B1 (en) * | 1998-05-04 | 2001-07-24 | 3M Innovative Properties Company | Retroflective articles including a cured ceramer composite coating having abrasion and stain resistant characteristics |
| JPH11349645A (ja) * | 1998-06-11 | 1999-12-21 | Mitsubishi Rayon Co Ltd | 活性エネルギー線硬化性樹脂組成物および光学シート |
| US6329058B1 (en) * | 1998-07-30 | 2001-12-11 | 3M Innovative Properties Company | Nanosize metal oxide particles for producing transparent metal oxide colloids and ceramers |
| JP4279465B2 (ja) * | 1998-07-30 | 2009-06-17 | スリーエム カンパニー | 透明な金属酸化物のコロイド及びセラマーを製造するためのナノサイズ金属酸化物の粒子 |
| US6359170B1 (en) * | 1998-09-02 | 2002-03-19 | 3M Innovative Properties Company | Brominated materials |
| JP3900506B2 (ja) * | 1998-11-06 | 2007-04-04 | Ｊｓｒ株式会社 | 液状硬化性樹脂組成物、その硬化物および反射防止膜 |
| EP1014113A3 (en) | 1998-12-21 | 2001-05-09 | Dsm N.V. | Photo curable resin composition and optical parts |
| US6261700B1 (en) * | 1998-12-30 | 2001-07-17 | 3M Innovative Properties Co | Ceramer containing a brominated polymer and inorganic oxide particles |
| WO2000055653A1 (en) * | 1999-03-16 | 2000-09-21 | Zms, Llc | Precision integral articles |
| US20010036546A1 (en) * | 1999-08-03 | 2001-11-01 | Kaytor Scott R. | Dimensionally stabilized diffuse reflective articles |
| US6356391B1 (en) * | 1999-10-08 | 2002-03-12 | 3M Innovative Properties Company | Optical film with variable angle prisms |
| US6368682B1 (en) * | 1999-10-22 | 2002-04-09 | 3M Innovative Properties Company | Composition and structures made therefrom |
| US6376590B2 (en) * | 1999-10-28 | 2002-04-23 | 3M Innovative Properties Company | Zirconia sol, process of making and composite material |
| JP3679976B2 (ja) * | 2000-05-31 | 2005-08-03 | 株式会社巴川製紙所 | ディスプレイ用貼着フィルム |
| JP2002053792A (ja) * | 2000-08-08 | 2002-02-19 | Toto Ltd | 吸水性コーティング組成物 |
| US6683720B2 (en) * | 2000-12-14 | 2004-01-27 | Mitsui Chemicals, Inc. | Reflector, sidelight type backlighting apparatus and reflector substrate |
| US6872444B2 (en) * | 2001-01-30 | 2005-03-29 | The Procter & Gamble Company | Enhancement of color on surfaces |
| US6593392B2 (en) * | 2001-06-22 | 2003-07-15 | Corning Incorporated | Curable halogenated compositions |
| US7420005B2 (en) * | 2001-06-28 | 2008-09-02 | Dai Nippon Printing Co., Ltd. | Photocurable resin composition, finely embossed pattern-forming sheet, finely embossed transfer sheet, optical article, stamper and method of forming finely embossed pattern |
| US6656990B2 (en) * | 2001-07-11 | 2003-12-02 | Corning Incorporated | Curable high refractive index compositions |
| US6576887B2 (en) * | 2001-08-15 | 2003-06-10 | 3M Innovative Properties Company | Light guide for use with backlit display |
| US6844374B2 (en) * | 2001-10-03 | 2005-01-18 | Lord Corporation | Enhanced scratch resistant coatings using inorganic fillers |
| JP4124991B2 (ja) * | 2001-10-23 | 2008-07-23 | Ｄｉｃ株式会社 | フレネルレンズ用活性エネルギー線硬化型樹脂組成物及びフレネルレンズシート |
| US6962946B2 (en) * | 2001-11-21 | 2005-11-08 | 3M Innovative Properties Company | Nanoparticles having a rutile-like crystalline phase and method of preparing same |
| JP2005529984A (ja) * | 2002-02-19 | 2005-10-06 | フォトン−エックス・インコーポレーテッド | 光用途のポリマーナノ複合材 |
| US20050256219A1 (en) | 2002-03-11 | 2005-11-17 | Hideaki Takase | Photocurable resin composition and optical component |
| US20030180029A1 (en) * | 2002-03-15 | 2003-09-25 | Garito Anthony F. | Optical polymer nanocomposite substrates with surface relief structures |
| EP1532162B1 (en) * | 2002-06-28 | 2013-08-07 | THE GOVERNMENT OF THE UNITED STATES OF AMERICA, as represented by THE SECRETARY, DEPARTMENT OF HEALTH AND HUMAN SERVICES | Humanized anti-tag-72 cc49 for diagnosis and therapy of human tumors |
| DE60220518T2 (de) | 2002-08-08 | 2008-02-07 | Nissan Motor Co., Ltd., Yokohama | Acryl-urethan-Beschichtungszusammensetzung |
| JP4117679B2 (ja) * | 2002-09-26 | 2008-07-16 | 三菱マテリアル株式会社 | 安定性の良い金属コロイドとその用途 |
| US6844047B2 (en) * | 2002-10-07 | 2005-01-18 | Eastman Kodak Company | Optical element containing nanocomposite materials |
| US6727309B1 (en) * | 2002-10-08 | 2004-04-27 | 3M Innovative Properties Company | Floor finish composition |
| US6818276B2 (en) * | 2002-10-24 | 2004-11-16 | Eastman Kodak Company | Light management film with colorant receiving layer |
| US6833176B2 (en) * | 2003-01-06 | 2004-12-21 | General Electric Company | Radiation curable microstructure-bearing articles |
| US6844950B2 (en) * | 2003-01-07 | 2005-01-18 | General Electric Company | Microstructure-bearing articles of high refractive index |
| GB0304011D0 (en) * | 2003-02-21 | 2003-03-26 | Microsharp Corp Ltd | High refractive index material |
| US7041365B2 (en) * | 2003-05-12 | 2006-05-09 | 3M Innovative Properties Company | Static dissipative optical construction |
| US6846089B2 (en) * | 2003-05-16 | 2005-01-25 | 3M Innovative Properties Company | Method for stacking surface structured optical films |
| US7046439B2 (en) * | 2003-05-22 | 2006-05-16 | Eastman Kodak Company | Optical element with nanoparticles |
| US7361409B2 (en) * | 2003-08-22 | 2008-04-22 | 3M Innovative Properties Company | Microstructured article comprising a polymerized composition having low glass transition temperature |
| US7045558B2 (en) * | 2003-08-29 | 2006-05-16 | General Electric Company | Method of making a high refractive index optical management coating and the coating |
| US7169375B2 (en) | 2003-08-29 | 2007-01-30 | General Electric Company | Metal oxide nanoparticles, methods of making, and methods of use |
| US7282272B2 (en) * | 2003-09-12 | 2007-10-16 | 3M Innovative Properties Company | Polymerizable compositions comprising nanoparticles |
| US7074463B2 (en) * | 2003-09-12 | 2006-07-11 | 3M Innovative Properties Company | Durable optical element |
| US20050124713A1 (en) * | 2003-12-04 | 2005-06-09 | Jones Clinton L. | Brightness enhancing film composition |
| US6998425B2 (en) * | 2003-12-23 | 2006-02-14 | General Electric Company | UV curable coating compositions and uses thereof |
| JP2005314661A (ja) | 2004-03-30 | 2005-11-10 | Mitsubishi Chemicals Corp | 樹脂成形体 |
| DE102004026423A1 (de) * | 2004-05-29 | 2005-12-22 | Basf Coatings Ag | Integriertes Dual-Cure-Beschichtungsstoffsystem und seine Verwendung für die Innen- und Außenbeschichtung komplex geformter dreidimensionaler Substrate |
| TWI317444B (en) * | 2004-09-03 | 2009-11-21 | Eternal Chemical Co Ltd | Optical film having high hardness and use thereof |
| US20060204676A1 (en) * | 2005-03-11 | 2006-09-14 | Jones Clinton L | Polymerizable composition comprising low molecular weight organic component |
| TWI287115B (en) * | 2005-10-07 | 2007-09-21 | Eternal Chemical Co Ltd | Brightness enhancement film |
| TWI417324B (zh) * | 2005-11-15 | 2013-12-01 | 3M Innovative Properties Co | 增亮膜及無機奈米粒子之表面處理方法 |
| US20070206286A1 (en) * | 2006-03-01 | 2007-09-06 | Fujifilm Corporartion | Optical film, production process thereof, anti-reflection film, polarizing plate and display device |
-
2005
- 2005-03-11 US US11/077,598 patent/US20060204676A1/en not_active Abandoned
-
2006
- 2006-03-10 JP JP2008501051A patent/JP2008533249A/ja not_active Withdrawn
- 2006-03-10 AT AT10171624T patent/ATE557317T1/de active
- 2006-03-10 AT AT06738109T patent/ATE509290T1/de not_active IP Right Cessation
- 2006-03-10 WO PCT/US2006/009007 patent/WO2006099357A2/en not_active Ceased
- 2006-03-10 KR KR1020077020634A patent/KR101252316B1/ko not_active Expired - Fee Related
- 2006-03-10 CN CN200680007952XA patent/CN101137915B/zh active Active
- 2006-03-10 EP EP20060738109 patent/EP1861735B1/en not_active Not-in-force
- 2006-03-10 TW TW95108321A patent/TWI448717B/zh not_active IP Right Cessation
- 2006-03-10 EP EP20100171624 patent/EP2256524B1/en not_active Not-in-force
- 2006-03-10 US US11/814,757 patent/US8025934B2/en not_active Expired - Fee Related
-
2010
- 2010-09-10 US US12/879,057 patent/US8034421B2/en active Active
-
2011
- 2011-09-07 US US13/226,646 patent/US8241755B2/en not_active Expired - Fee Related
-
2013
- 2013-04-23 JP JP2013090130A patent/JP2013178551A/ja active Pending
-
2015
- 2015-12-28 JP JP2015257202A patent/JP2016136245A/ja active Pending
-
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- 2018-06-20 JP JP2018116673A patent/JP7138491B2/ja active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08217991A (ja) * | 1995-02-02 | 1996-08-27 | Minnesota Mining & Mfg Co <3M> | 放射線硬化性材料 |
| JP2004516367A (ja) * | 2000-12-21 | 2004-06-03 | スリーエム イノベイティブ プロパティズ カンパニー | 高屈折率の微細複製樹脂 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009040906A (ja) * | 2007-08-09 | 2009-02-26 | Teijin Dupont Films Japan Ltd | 輝度向上シート用ポリエステルフィルム |
| JP2012512273A (ja) * | 2008-12-15 | 2012-05-31 | スリーエム イノベイティブ プロパティズ カンパニー | 表面処理剤を含む高屈折率無機酸化物ナノ粒子、重合性樹脂組成物、及び物品 |
| JP2013191800A (ja) * | 2012-03-15 | 2013-09-26 | Tokyo Ohka Kogyo Co Ltd | 光インプリント用の膜形成組成物及び光学部材の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2256524B1 (en) | 2012-05-09 |
| WO2006099357A3 (en) | 2007-01-25 |
| US20080253148A1 (en) | 2008-10-16 |
| US20100331442A1 (en) | 2010-12-30 |
| CN101137915B (zh) | 2010-06-23 |
| US8034421B2 (en) | 2011-10-11 |
| EP1861735A2 (en) | 2007-12-05 |
| US8025934B2 (en) | 2011-09-27 |
| WO2006099357A2 (en) | 2006-09-21 |
| TW200643453A (en) | 2006-12-16 |
| KR101252316B1 (ko) | 2013-04-08 |
| ATE557317T1 (de) | 2012-05-15 |
| JP2013178551A (ja) | 2013-09-09 |
| TWI448717B (zh) | 2014-08-11 |
| ATE509290T1 (de) | 2011-05-15 |
| KR20070110082A (ko) | 2007-11-15 |
| US20060204676A1 (en) | 2006-09-14 |
| JP2016136245A (ja) | 2016-07-28 |
| JP7138491B2 (ja) | 2022-09-16 |
| US20110318538A1 (en) | 2011-12-29 |
| EP2256524A1 (en) | 2010-12-01 |
| US8241755B2 (en) | 2012-08-14 |
| JP2018142029A (ja) | 2018-09-13 |
| CN101137915A (zh) | 2008-03-05 |
| EP1861735B1 (en) | 2011-05-11 |
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