JP2008519905A5 - - Google Patents

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Publication number
JP2008519905A5
JP2008519905A5 JP2007540349A JP2007540349A JP2008519905A5 JP 2008519905 A5 JP2008519905 A5 JP 2008519905A5 JP 2007540349 A JP2007540349 A JP 2007540349A JP 2007540349 A JP2007540349 A JP 2007540349A JP 2008519905 A5 JP2008519905 A5 JP 2008519905A5
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JP
Japan
Prior art keywords
organic material
manifold
opening
reservoir
state
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JP2007540349A
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English (en)
Japanese (ja)
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JP2008519905A (ja
JP5270165B2 (ja
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Priority claimed from US10/984,667 external-priority patent/US7465475B2/en
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Publication of JP2008519905A publication Critical patent/JP2008519905A/ja
Publication of JP2008519905A5 publication Critical patent/JP2008519905A5/ja
Application granted granted Critical
Publication of JP5270165B2 publication Critical patent/JP5270165B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2007540349A 2004-11-09 2005-10-26 気化した有機材料の付着の制御 Expired - Lifetime JP5270165B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/984,667 2004-11-09
US10/984,667 US7465475B2 (en) 2004-11-09 2004-11-09 Method for controlling the deposition of vaporized organic material
PCT/US2005/038767 WO2006052467A2 (en) 2004-11-09 2005-10-26 Controlling the application of vaporized organic material

Publications (3)

Publication Number Publication Date
JP2008519905A JP2008519905A (ja) 2008-06-12
JP2008519905A5 true JP2008519905A5 (enExample) 2008-10-30
JP5270165B2 JP5270165B2 (ja) 2013-08-21

Family

ID=35589528

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007540349A Expired - Lifetime JP5270165B2 (ja) 2004-11-09 2005-10-26 気化した有機材料の付着の制御

Country Status (8)

Country Link
US (1) US7465475B2 (enExample)
EP (5) EP2278042B1 (enExample)
JP (1) JP5270165B2 (enExample)
KR (1) KR101212581B1 (enExample)
CN (1) CN101052738B (enExample)
DE (1) DE602005022765D1 (enExample)
TW (1) TWI382098B (enExample)
WO (1) WO2006052467A2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7465475B2 (en) 2004-11-09 2008-12-16 Eastman Kodak Company Method for controlling the deposition of vaporized organic material
US8986780B2 (en) * 2004-11-19 2015-03-24 Massachusetts Institute Of Technology Method and apparatus for depositing LED organic film
US7989021B2 (en) 2005-07-27 2011-08-02 Global Oled Technology Llc Vaporizing material at a uniform rate
JP4959961B2 (ja) * 2005-07-29 2012-06-27 株式会社ジャパンディスプレイセントラル 有機ｅｌ素子の製造方法
US7883583B2 (en) * 2008-01-08 2011-02-08 Global Oled Technology Llc Vaporization apparatus with precise powder metering
US8852347B2 (en) * 2010-06-11 2014-10-07 Tokyo Electron Limited Apparatus for chemical vapor deposition control
US9345573B2 (en) 2012-05-30 2016-05-24 Neovasc Tiara Inc. Methods and apparatus for loading a prosthesis onto a delivery system

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JPH09219289A (ja) 1996-02-09 1997-08-19 Chisso Corp 有機薄膜電界発光素子とその製造方法
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US6070551A (en) * 1996-05-13 2000-06-06 Applied Materials, Inc. Deposition chamber and method for depositing low dielectric constant films
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US5904961A (en) * 1997-01-24 1999-05-18 Eastman Kodak Company Method of depositing organic layers in organic light emitting devices
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EP0895206A1 (de) 1997-07-29 1999-02-03 Esselte Meto International GmbH Sicherungselement für die elektronische Artikelsicherung
US5869135A (en) * 1997-10-03 1999-02-09 Massachusetts Institute Of Technology Selective chemical vapor deposition of polymers
US6051321A (en) * 1997-10-24 2000-04-18 Quester Technology, Inc. Low dielectric constant materials and method
US6337102B1 (en) * 1997-11-17 2002-01-08 The Trustees Of Princeton University Low pressure vapor phase deposition of organic thin films
JP2000068055A (ja) 1998-08-26 2000-03-03 Tdk Corp 有機ｅｌ素子用蒸発源、この有機ｅｌ素子用蒸発源を用いた有機ｅｌ素子の製造装置および製造方法
US6237529B1 (en) * 2000-03-03 2001-05-29 Eastman Kodak Company Source for thermal physical vapor deposition of organic electroluminescent layers
JP2002030419A (ja) * 2000-07-18 2002-01-31 Canon Inc 成膜装置および方法
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JP4593008B2 (ja) * 2001-05-23 2010-12-08 キヤノンアネルバ株式会社 蒸着源並びにそれを用いた薄膜形成方法及び形成装置
US6749906B2 (en) * 2002-04-25 2004-06-15 Eastman Kodak Company Thermal physical vapor deposition apparatus with detachable vapor source(s) and method
US7056560B2 (en) * 2002-05-08 2006-06-06 Applies Materials Inc. Ultra low dielectric materials based on hybrid system of linear silicon precursor and organic porogen by plasma-enhanced chemical vapor deposition (PECVD)
JP3822135B2 (ja) * 2002-05-13 2006-09-13 日本パイオニクス株式会社 気化供給装置
JP2004010990A (ja) * 2002-06-10 2004-01-15 Sony Corp 薄膜形成装置
KR100490537B1 (ko) * 2002-07-23 2005-05-17 삼성에스디아이 주식회사 가열용기와 이를 이용한 증착장치
US6844891B1 (en) * 2003-07-08 2005-01-18 Eastman Kodak Company Aligning in five degrees of freedom a multichannel laser printhead for transferring OLED material
US6837939B1 (en) * 2003-07-22 2005-01-04 Eastman Kodak Company Thermal physical vapor deposition source using pellets of organic material for making OLED displays
US7232588B2 (en) 2004-02-23 2007-06-19 Eastman Kodak Company Device and method for vaporizing temperature sensitive materials
JP4366226B2 (ja) * 2004-03-30 2009-11-18 東北パイオニア株式会社 有機ｅｌパネルの製造方法、有機ｅｌパネルの成膜装置
DE102004041854B4 (de) * 2004-04-27 2008-11-13 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zur thermischen Vakuumbeschichtung
US7465475B2 (en) 2004-11-09 2008-12-16 Eastman Kodak Company Method for controlling the deposition of vaporized organic material

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