KR101212581B1 - 증착 제어 방법 및 장치 - Google Patents

증착 제어 방법 및 장치 Download PDF

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Publication number
KR101212581B1
KR101212581B1 KR1020077010467A KR20077010467A KR101212581B1 KR 101212581 B1 KR101212581 B1 KR 101212581B1 KR 1020077010467 A KR1020077010467 A KR 1020077010467A KR 20077010467 A KR20077010467 A KR 20077010467A KR 101212581 B1 KR101212581 B1 KR 101212581B1
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KR
South Korea
Prior art keywords
organic material
manifold
heating device
temperature
deposition
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KR1020077010467A
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English (en)
Korean (ko)
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KR20070084078A (ko
Inventor
제레미 매튜 그레이스
마이클 롱
마이클 루이스 보로슨
진메이 장
브루스 에드워드 코페
토마스 윌리암 팔로네
네일 피터 리덴
Original Assignee
글로벌 오엘이디 테크놀러지 엘엘씨
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Publication of KR20070084078A publication Critical patent/KR20070084078A/ko
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020077010467A 2004-11-09 2005-10-26 증착 제어 방법 및 장치 Expired - Lifetime KR101212581B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/984,667 2004-11-09
US10/984,667 US7465475B2 (en) 2004-11-09 2004-11-09 Method for controlling the deposition of vaporized organic material

Publications (2)

Publication Number Publication Date
KR20070084078A KR20070084078A (ko) 2007-08-24
KR101212581B1 true KR101212581B1 (ko) 2012-12-14

Family

ID=35589528

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077010467A Expired - Lifetime KR101212581B1 (ko) 2004-11-09 2005-10-26 증착 제어 방법 및 장치

Country Status (8)

Country Link
US (1) US7465475B2 (enExample)
EP (5) EP2278042B1 (enExample)
JP (1) JP5270165B2 (enExample)
KR (1) KR101212581B1 (enExample)
CN (1) CN101052738B (enExample)
DE (1) DE602005022765D1 (enExample)
TW (1) TWI382098B (enExample)
WO (1) WO2006052467A2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7465475B2 (en) 2004-11-09 2008-12-16 Eastman Kodak Company Method for controlling the deposition of vaporized organic material
US8986780B2 (en) * 2004-11-19 2015-03-24 Massachusetts Institute Of Technology Method and apparatus for depositing LED organic film
US7989021B2 (en) 2005-07-27 2011-08-02 Global Oled Technology Llc Vaporizing material at a uniform rate
JP4959961B2 (ja) * 2005-07-29 2012-06-27 株式会社ジャパンディスプレイセントラル 有機ｅｌ素子の製造方法
US7883583B2 (en) * 2008-01-08 2011-02-08 Global Oled Technology Llc Vaporization apparatus with precise powder metering
US8852347B2 (en) * 2010-06-11 2014-10-07 Tokyo Electron Limited Apparatus for chemical vapor deposition control
US9345573B2 (en) 2012-05-30 2016-05-24 Neovasc Tiara Inc. Methods and apparatus for loading a prosthesis onto a delivery system

Citations (1)

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Publication number Priority date Publication date Assignee Title
JP2002030419A (ja) * 2000-07-18 2002-01-31 Canon Inc 成膜装置および方法

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JPS58167602A (ja) * 1982-03-29 1983-10-03 Futaba Corp 有機物薄膜の形成方法
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US5900279A (en) * 1995-11-20 1999-05-04 Tri Chemical Laboratory Inc. Processes for the chemical vapor deposition and solvent used for the processes
JPH09219289A (ja) 1996-02-09 1997-08-19 Chisso Corp 有機薄膜電界発光素子とその製造方法
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US6070551A (en) * 1996-05-13 2000-06-06 Applied Materials, Inc. Deposition chamber and method for depositing low dielectric constant films
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US5904961A (en) * 1997-01-24 1999-05-18 Eastman Kodak Company Method of depositing organic layers in organic light emitting devices
CN1144198C (zh) * 1997-05-08 2004-03-31 松下电器产业株式会社 光记录媒体制造装置和制造方法
EP0895206A1 (de) 1997-07-29 1999-02-03 Esselte Meto International GmbH Sicherungselement für die elektronische Artikelsicherung
US5869135A (en) * 1997-10-03 1999-02-09 Massachusetts Institute Of Technology Selective chemical vapor deposition of polymers
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Also Published As

Publication number Publication date
WO2006052467A2 (en) 2006-05-18
EP2278043A1 (en) 2011-01-26
EP2278042A1 (en) 2011-01-26
EP2278042B1 (en) 2017-02-08
JP2008519905A (ja) 2008-06-12
EP2216425A3 (en) 2010-11-10
US20060099345A1 (en) 2006-05-11
CN101052738B (zh) 2011-04-27
WO2006052467A3 (en) 2006-12-21
EP2278044B1 (en) 2017-02-08
JP5270165B2 (ja) 2013-08-21
TWI382098B (zh) 2013-01-11
KR20070084078A (ko) 2007-08-24
CN101052738A (zh) 2007-10-10
EP1831421A2 (en) 2007-09-12
TW200622014A (en) 2006-07-01
EP1831421B1 (en) 2010-08-04
DE602005022765D1 (de) 2010-09-16
EP2216425A2 (en) 2010-08-11
US7465475B2 (en) 2008-12-16
EP2278043B1 (en) 2016-08-17
EP2278044A1 (en) 2011-01-26

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