JP2008519449A - 粒子ビームのためのマルチビームモジュレータ及び基板のマスクレス構造化のためのマルチビームモジュレータの使用 - Google Patents
粒子ビームのためのマルチビームモジュレータ及び基板のマスクレス構造化のためのマルチビームモジュレータの使用 Download PDFInfo
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
- H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/043—Beam blanking
- H01J2237/0435—Multi-aperture
- H01J2237/0437—Semiconductor substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
- H01J2237/31774—Multi-beam
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Abstract
Description
101 行
102 列
103 開口
Claims (22)
- 粒子ビームから複数の個々のビームを生成するマルチビームモジュレータであって、
粒子ビームはマルチビームモジュレータを少なくとも部分的にその表面にわたって照明し、マルチビームモジュレータは複数の開口群を有し、それぞれの開口群は、全ての開口行の全体がm×nセルの行列を画定するように開口行群から形成され、mのセルは1つの行を形成し、kの開口がそれぞれの行に形成された、マルチビームモジュレータにおいて、
行内の開口の密度が不均質に分布されることを特徴とするマルチビームモジュレータ。 - 行内の開口が一様に間隔を置いて配置され、セル内で測定される開口間の距離は行のセルの数と行内の開口の数の比より小さいことを特徴とする請求項1に記載のマルチビームモジュレータ。
- 行内の開口の数kが64〜512であることを特徴とする請求項2に記載のマルチビームモジュレータ。
- 行のセルの数mが4096であることを特徴とする請求項1〜3のいずれか一項に記載のマルチビームモジュレータ。
- 3〜7のセルが行内の開口の間に設けられることを特徴とする請求項1〜4のいずれか一項に記載のマルチビームモジュレータ。
- セルは正方形の形を有し、ターゲット(6)上に書き込まれるべきピクセルに一致することを特徴とする請求項1〜5のいずれか一項に記載のマルチビームモジュレータ。
- 複数の開口行が組み合わさり開口行サブグループを形成し、複数の開口行サブグループが開口行群を形成することを特徴とする請求項1〜6のいずれか一項に記載のマルチビームモジュレータ。
- 6の開口行が組み合わさり開口行サブグループを形成することを特徴とする請求項7に記載のマルチビームモジュレータ。
- 行方向の隣接する開口行群が、それぞれの場合に行方向に2864セルだけずれ、行方向と直交する方向に1〜5セルだけずれることを特徴とする請求項8に記載のマルチビームモジュレータ。
- 開口行群が不均質にずれていることを特徴とする請求項8に記載のマルチビームモジュレータ。
- 複数の開口行群が組み合わさり開口群を形成し、開口プレートのチップ上に一様に配置されることを特徴とする請求項1〜10のいずれか一項に記載のマルチビームモジュレータ。
- 開口群が、開口による構造化が実行されていないウェブで分離されていることを特徴とする請求項11に記載のマルチビームモジュレータ。
- ウェブが平行であることを特徴とする請求項12に記載のマルチビームモジュレータ。
- 開口群が中心の回りに対称的に配置されることを特徴とする請求項11に記載のマルチビームモジュレータ。
- 少なくとも1つの電子回路がアクティブな開口プレート上に構造化されることを特徴とする請求項1〜14のいずれか一項に記載のマルチビームモジュレータ。
- 少なくとも1つの電子回路がデータを開口プレート上に形成されたシフトレジスタに供給することを特徴とする請求項15に記載のマルチビームモジュレータ。
- シフトレジスタチェーンがそれぞれの開口行と結合し、当該シフトレジスタチェーンは、セルからセルへの入力データの、全ての開口行の第1開口の開口から最終開口の開口への同期したシフトを行うことを特徴とする請求項16に記載のマルチビームモジュレータ。
- ビット幅1〜kのグレースケール情報が、シフトレジスタによりマルチビームモジュレータのモジュレータ要素に供給され、kは6ビット〜8ビットであることを特徴とする請求項17に記載のマルチビームモジュレータ。
- グレースケール情報からオン・オフ信号を得るために、開口当たりの開口行のシフトレジスタに加えて組み合わせ論理がさらに設けられることを特徴とする請求項18に記載のマルチビームモジュレータ。
- グレースケール情報からオン・オフ信号を得るために、開口当たりの開口行のシフトレジスタに加えて順序論理回路がさらに設けられることを特徴とする請求項18に記載のマルチビームモジュレータ。
- 順序論理回路をプログラミングするためにグレースケール情報のシフトレジスタが使用され、適切な「Config」信号ネットワークがさらに実施されることを特徴とする請求項20に記載のマルチビームモジュレータ。
- 基板のマスクレス構造化のためのマルチビームモジュレータであって、
複数の個々のビームが生成され、粒子ビームはマルチビームモジュレータを少なくとも部分的にその表面にわたって照明し、開口行群を有する複数の開口群がマルチビームモジュレータに形成され、開口行の全体がm×nの行列を画定し、mのセルが1つの行を形成し、kの開口がそれぞれの行に形成された、マルチビームモジュレータにおいて、
行内の開口の密度が不均質に分布されることを特徴とするマルチビームモジュレータの使用。
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DE102004052994A DE102004052994C5 (de) | 2004-11-03 | 2004-11-03 | Multistrahlmodulator für einen Partikelstrahl und Verwendung des Multistrahlmodulators zur maskenlosen Substratsstrukturierung |
PCT/EP2005/055521 WO2006048391A1 (de) | 2004-11-03 | 2005-10-25 | Multistrahlmodulator für einen partikelstrahl und verwendung des multistrahlmodulators zur maskenlosen substratsstrukturierung |
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JP2008519449A true JP2008519449A (ja) | 2008-06-05 |
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Also Published As
Publication number | Publication date |
---|---|
EP1812947B1 (de) | 2013-03-20 |
DE102004052994B4 (de) | 2008-03-13 |
US7741620B2 (en) | 2010-06-22 |
US20080128638A1 (en) | 2008-06-05 |
EP1812947A1 (de) | 2007-08-01 |
JP4576432B2 (ja) | 2010-11-10 |
WO2006048391A1 (de) | 2006-05-11 |
EP1812947B2 (de) | 2016-08-10 |
DE102004052994C5 (de) | 2010-08-26 |
DE102004052994A1 (de) | 2006-05-04 |
TW200616001A (en) | 2006-05-16 |
TWI389161B (zh) | 2013-03-11 |
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