JP2008516889A5 - - Google Patents

Download PDF

Info

Publication number
JP2008516889A5
JP2008516889A5 JP2007538024A JP2007538024A JP2008516889A5 JP 2008516889 A5 JP2008516889 A5 JP 2008516889A5 JP 2007538024 A JP2007538024 A JP 2007538024A JP 2007538024 A JP2007538024 A JP 2007538024A JP 2008516889 A5 JP2008516889 A5 JP 2008516889A5
Authority
JP
Japan
Prior art keywords
silylamine
silica particles
treating agent
alkyl
dispersion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007538024A
Other languages
English (en)
Japanese (ja)
Other versions
JP5032328B2 (ja
JP2008516889A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2005/037728 external-priority patent/WO2006045012A2/en
Publication of JP2008516889A publication Critical patent/JP2008516889A/ja
Publication of JP2008516889A5 publication Critical patent/JP2008516889A5/ja
Application granted granted Critical
Publication of JP5032328B2 publication Critical patent/JP5032328B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2007538024A 2004-10-20 2005-10-20 水性コロイドシリカ分散液からの直接的疎水性シリカの製造法 Expired - Fee Related JP5032328B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US62058904P 2004-10-20 2004-10-20
US60/620,589 2004-10-20
PCT/US2005/037728 WO2006045012A2 (en) 2004-10-20 2005-10-20 Method of preparing hydrophobic silica directly from an aqueous colloidal silica dispersion

Publications (3)

Publication Number Publication Date
JP2008516889A JP2008516889A (ja) 2008-05-22
JP2008516889A5 true JP2008516889A5 (https=) 2008-12-11
JP5032328B2 JP5032328B2 (ja) 2012-09-26

Family

ID=36203696

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007538024A Expired - Fee Related JP5032328B2 (ja) 2004-10-20 2005-10-20 水性コロイドシリカ分散液からの直接的疎水性シリカの製造法

Country Status (4)

Country Link
US (1) US7811540B2 (https=)
EP (1) EP1807347B1 (https=)
JP (1) JP5032328B2 (https=)
WO (1) WO2006045012A2 (https=)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2275039T3 (es) 2003-04-24 2007-06-01 Goldschmidt Gmbh Procedimiento para la produccion de revestimientos laminares desprendibles, repelentes de la suciedad y del agua.
US8974590B2 (en) * 2003-12-18 2015-03-10 The Armor All/Stp Products Company Treatments and kits for creating renewable surface protective coatings
US8034173B2 (en) * 2003-12-18 2011-10-11 Evonik Degussa Gmbh Processing compositions and method of forming the same
US7828889B2 (en) * 2003-12-18 2010-11-09 The Clorox Company Treatments and kits for creating transparent renewable surface protective coatings
US7186440B2 (en) * 2005-07-04 2007-03-06 Nissan Chemical Industries, Ltd. Process for producing hydrophobic silica powder
ATE509891T1 (de) * 2005-12-20 2011-06-15 Evonik Degussa Gmbh Pyrogen hergestelltes siliciumdioxid
US8435474B2 (en) * 2006-09-15 2013-05-07 Cabot Corporation Surface-treated metal oxide particles
US8455165B2 (en) * 2006-09-15 2013-06-04 Cabot Corporation Cyclic-treated metal oxide
US20080070146A1 (en) * 2006-09-15 2008-03-20 Cabot Corporation Hydrophobic-treated metal oxide
US8202502B2 (en) 2006-09-15 2012-06-19 Cabot Corporation Method of preparing hydrophobic silica
JP5194563B2 (ja) * 2007-05-28 2013-05-08 信越化学工業株式会社 耐擦傷性コーティング組成物、及び被覆物品
EP2025381A1 (de) * 2007-07-30 2009-02-18 Nanoresins AG Verfahren zum Entfernen basischer oder saurer Verbindungen aus einer lösungsmittelhaltigen Metalloxiddispersion insbesondere Kieselsäure
JP4431605B2 (ja) * 2007-08-09 2010-03-17 シャープ株式会社 トナーの製造方法、トナー、二成分現像剤、現像装置および画像形成装置
WO2009044689A1 (ja) * 2007-09-29 2009-04-09 Zeon Corporation 静電荷像現像用正帯電性トナー
EP2145929B1 (de) 2008-07-18 2020-06-24 Evonik Operations GmbH Verfahren zur Herstellung redispergierbarer, oberflächenmodifizierter Siliciumdioxidpartikel
ES2784739T3 (es) * 2008-10-01 2020-09-30 Nippon Aerosil Co Ltd Partículas finas de sílice hidrófobas y composición para tóner electrofotográfico
TWI488746B (zh) * 2009-02-13 2015-06-21 Toyo Aluminium Kk 層積體及容器
JP5249903B2 (ja) * 2009-10-22 2013-07-31 味の素株式会社 樹脂組成物
US20110244382A1 (en) * 2010-04-06 2011-10-06 Christopher Alyson M Hydrophobic silica particles and method of producing same
JP5250003B2 (ja) * 2010-09-13 2013-07-31 株式会社日立製作所 樹脂材料及びこれを用いた高電圧機器
JP5811620B2 (ja) 2010-12-13 2015-11-11 富士ゼロックス株式会社 シリカ粒子の製造方法
EP2732002B1 (en) 2011-07-11 2015-07-08 Cabot Corporation Oil emulsification and polycyclic aromatic hydrocarbon adsorption using fine particles as dispersants
JP2013092748A (ja) 2011-10-26 2013-05-16 Cabot Corp 複合体粒子を含むトナー添加剤
US9581922B2 (en) 2012-03-26 2017-02-28 Cabot Corporation Treated fumed silica
US20140120339A1 (en) 2012-10-31 2014-05-01 Cabot Corporation Porous carbon monoliths templated by pickering emulsions
JP6195524B2 (ja) * 2014-01-28 2017-09-13 日揮触媒化成株式会社 疎水性シリカ粉末およびその製造方法
US10259944B2 (en) * 2014-07-24 2019-04-16 Denka Company Limited Silica fine powder and use thereof
JP6507655B2 (ja) * 2015-01-14 2019-05-08 リコーイメージング株式会社 多孔質膜用塗工液及びその製造方法
CN108473857A (zh) 2015-09-29 2018-08-31 卡博特专业流体股份有限公司 具有被颗粒稳定化的乳液的低固体物的油基井液
CN106185964B (zh) * 2016-07-20 2018-03-06 福建远翔新材料股份有限公司 一种超级绝热材料用二氧化硅的制备方法
DE112017005577T5 (de) 2016-11-04 2019-08-29 Cabot Corporation Nanokomposite, enthaltend kristallinen Polyester und Organosiliciumdioxid
US12514310B2 (en) 2017-01-24 2026-01-06 Smarterials Technology Gmbh Damage-resistant gloves with breach-indicator function
EP3573807B1 (en) * 2017-01-24 2024-10-02 Smarterials Technology GmbH Damage-resistant gloves with breach-indicator function
JP6968632B2 (ja) * 2017-09-07 2021-11-17 扶桑化学工業株式会社 疎水性シリカ粉末
DE112019000531T5 (de) * 2018-01-25 2020-10-22 Cabot Corporation Wässrige hydrophobe Siliciumdioxiddispersionen
CN112639625B (zh) 2018-08-07 2025-09-19 卡博特公司 用于调色剂添加剂的复合颗粒
JP7155046B2 (ja) 2019-03-06 2022-10-18 扶桑化学工業株式会社 疎水性シリカ粉末及びトナー樹脂粒子
CN115348990B (zh) * 2020-02-04 2024-06-04 卡博特公司 用于基于液体的增材制造的组合物
US20220162452A1 (en) * 2020-11-22 2022-05-26 Melior Innovations, Inc. Functionalized Silicon Oxycarbide Additives And Pigments, And Methods Of Make The Materials
JP2025522646A (ja) 2022-05-27 2025-07-16 キャボット コーポレイション 断熱用エアロゲル組成物

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2786042A (en) 1951-11-23 1957-03-19 Du Pont Process for preparing sols of colloidal particles of reacted amorphous silica and products thereof
US3015645A (en) 1954-10-06 1962-01-02 Dow Corning Silica powders
SE312880B (https=) 1964-05-06 1969-07-28 Degussa
DE1963439A1 (de) * 1969-12-18 1971-06-24 Dynamit Nobel Ag Verfahren zur Herstellung poroeser Kieselsaeure
US3810843A (en) 1971-05-28 1974-05-14 Gen Electric Silicone-silica compositions
US4208316A (en) 1978-06-29 1980-06-17 Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler Hydrophobic precipitated silicic acid and compositions containing same
US4344800A (en) 1980-06-03 1982-08-17 Dow Corning Corporation Method for producing hydrophobic reinforcing silica fillers and fillers obtained thereby
JPS5778549A (en) 1980-11-04 1982-05-17 Canon Inc Developer for electrophotography
FR2613708B1 (fr) * 1987-04-13 1990-10-12 Rhone Poulenc Chimie Silice de precipitation hydrophobe, son procede de preparation et son application au renforcement des elastomeres silicones
US5226930A (en) 1988-06-03 1993-07-13 Monsanto Japan, Ltd. Method for preventing agglomeration of colloidal silica and silicon wafer polishing composition using the same
JP2646150B2 (ja) * 1990-08-27 1997-08-25 出光興産 株式会社 撥水性シリカゾルおよびその製造方法
JP3318997B2 (ja) * 1993-02-03 2002-08-26 三菱マテリアル株式会社 疎水性シリカ粉体、その製法および電子写真用現像剤
DE19500674A1 (de) 1995-01-12 1996-07-18 Degussa Oberflächenmodifizierte pyrogen hergestellte Mischoxide, Verfahren zu ihrer Herstellung und Verwendung
US5989768A (en) 1997-03-06 1999-11-23 Cabot Corporation Charge-modified metal oxides with cyclic silazane and electrostatographic systems incorporating same
US5908660A (en) * 1997-09-03 1999-06-01 Dow Corning Corporation Method of preparing hydrophobic precipitated silica
DE19756831A1 (de) * 1997-12-19 1999-07-01 Wacker Chemie Gmbh Siliciumdioxid, das an seiner Oberfläche teil- oder vollständig silylierte Polykieselsäureketten trägt
US5919298A (en) * 1998-01-12 1999-07-06 Dow Corning Corporation Method for preparing hydrophobic fumed silica
US6051672A (en) 1998-08-24 2000-04-18 Dow Corning Corporation Method for making hydrophobic non-aggregated colloidal silica
DE19857912A1 (de) 1998-12-16 2000-07-06 Degussa Toner und/oder Toner-Mischungen
US6174926B1 (en) 1999-01-13 2001-01-16 Cabot Corporation Method of preparing organically modified silica
WO2001012731A1 (en) * 1999-08-19 2001-02-22 Ppg Industries Ohio, Inc. Hydrophobic particulate inorganic oxides and polymeric compositions containing same
JP4076681B2 (ja) 1999-08-24 2008-04-16 富士ゼロックス株式会社 静電潜像現像用トナーの製造方法
JP4046921B2 (ja) * 2000-02-24 2008-02-13 触媒化成工業株式会社 シリカ系微粒子、該微粒子分散液の製造方法、および被膜付基材
US6203960B1 (en) 2000-08-22 2001-03-20 Xerox Corporation Toner compositions
JP4390994B2 (ja) 2000-09-27 2009-12-24 富士ゼロックス株式会社 静電荷像現像用トナー、それを用いた画像形成方法及び画像形成装置
US6861115B2 (en) 2001-05-18 2005-03-01 Cabot Corporation Ink jet recording medium comprising amine-treated silica
EP1554220B2 (en) * 2002-10-14 2014-11-05 Akzo Nobel N.V. Use of a colloidal silica dispersion
JP2004168559A (ja) * 2002-11-15 2004-06-17 Nippon Aerosil Co Ltd 高分散高疎水性シリカ粉末とその製造方法

Similar Documents

Publication Publication Date Title
JP2008516889A5 (https=)
JP4188462B2 (ja) 疎水性沈降シリカの製造方法
JP4430164B2 (ja) 疎水性非凝集コロイドシリカの製造方法
JP5032328B2 (ja) 水性コロイドシリカ分散液からの直接的疎水性シリカの製造法
CN104386672B (zh) 一种具有非对称结构的氧化石墨烯材料的制备方法
JP6284443B2 (ja) コアシェル型シリカ粒子を含有するコロイダルシリカの製造方法
JP2009536174A5 (https=)
CN103288867A (zh) 一种新型烷氧基硅烷基poss及其制备方法和应用
JP2014527094A5 (https=)
CN102558220B (zh) 一种笼型正丙基低聚倍半硅氧烷的制备方法
JP5600718B2 (ja) 中空シリカナノ粒子の製造方法
KR100714299B1 (ko) 유기-무기 혼성 나노복합체 졸의 제조방법
JP2017095297A (ja) シリカ粒子の製造方法およびシリカ粒子
JP2019147099A (ja) Ｃｏ２吸着材
CN101857607B (zh) 十三氟辛基丙基笼型倍半硅氧烷及其制备方法
JP5826679B2 (ja) パーフルオロカーボンスルホン酸ポリマー含有ナノコンポジット粒子の製造方法
KR101276763B1 (ko) 소수성 실리카의 제조 방법
WO2005095503A1 (en) Silicone rubber
CN105819455B (zh) 一种介孔硅胶纳米颗粒的制备方法及其应用
CN106044781B (zh) 一种长径比可控及孔道功能化二氧化硅纳米棒及其制备方法
JP2019011440A (ja) シリカエアロゲル及びその製造方法
JP4645884B2 (ja) シリカ系メソ構造体及びその製造方法
WO2023022126A1 (ja) 気体分離膜
KR101290822B1 (ko) 방오성 개질 폴리노보넨 및 이를 적용한 방오성 코팅물질
JP2001294775A (ja) 疎水性沈降シリカの製造方法