JP5032328B2 - 水性コロイドシリカ分散液からの直接的疎水性シリカの製造法 - Google Patents

水性コロイドシリカ分散液からの直接的疎水性シリカの製造法 Download PDF

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Publication number
JP5032328B2
JP5032328B2 JP2007538024A JP2007538024A JP5032328B2 JP 5032328 B2 JP5032328 B2 JP 5032328B2 JP 2007538024 A JP2007538024 A JP 2007538024A JP 2007538024 A JP2007538024 A JP 2007538024A JP 5032328 B2 JP5032328 B2 JP 5032328B2
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Japan
Prior art keywords
silica particles
dispersion
silylamine
treating agent
silica
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Expired - Fee Related
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JP2007538024A
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English (en)
Japanese (ja)
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JP2008516889A (ja
JP2008516889A5 (https=
Inventor
イー． アダムス，カーティス
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Cabot Corp
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Cabot Corp
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Publication of JP2008516889A5 publication Critical patent/JP2008516889A5/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C09C1/30—Silicic acid
    • C09C1/3081—Treatment with organo-silicon compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G9/00—Developers
    • G03G9/08—Developers with toner particles
    • G03G9/097—Plasticisers; Charge controlling agents
    • G03G9/09708—Inorganic compounds
    • G03G9/09716—Inorganic compounds treated with organic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G9/00—Developers
    • G03G9/08—Developers with toner particles
    • G03G9/097—Plasticisers; Charge controlling agents
    • G03G9/09708—Inorganic compounds
    • G03G9/09725—Silicon-oxides; Silicates
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Materials Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Glanulating (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Developing Agents For Electrophotography (AREA)
JP2007538024A 2004-10-20 2005-10-20 水性コロイドシリカ分散液からの直接的疎水性シリカの製造法 Expired - Fee Related JP5032328B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US62058904P 2004-10-20 2004-10-20
US60/620,589 2004-10-20
PCT/US2005/037728 WO2006045012A2 (en) 2004-10-20 2005-10-20 Method of preparing hydrophobic silica directly from an aqueous colloidal silica dispersion

Publications (3)

Publication Number Publication Date
JP2008516889A JP2008516889A (ja) 2008-05-22
JP2008516889A5 JP2008516889A5 (https=) 2008-12-11
JP5032328B2 true JP5032328B2 (ja) 2012-09-26

Family

ID=36203696

Family Applications (1)

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JP2007538024A Expired - Fee Related JP5032328B2 (ja) 2004-10-20 2005-10-20 水性コロイドシリカ分散液からの直接的疎水性シリカの製造法

Country Status (4)

Country Link
US (1) US7811540B2 (https=)
EP (1) EP1807347B1 (https=)
JP (1) JP5032328B2 (https=)
WO (1) WO2006045012A2 (https=)

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US7828889B2 (en) * 2003-12-18 2010-11-09 The Clorox Company Treatments and kits for creating transparent renewable surface protective coatings
US7186440B2 (en) * 2005-07-04 2007-03-06 Nissan Chemical Industries, Ltd. Process for producing hydrophobic silica powder
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US8455165B2 (en) * 2006-09-15 2013-06-04 Cabot Corporation Cyclic-treated metal oxide
US20080070146A1 (en) * 2006-09-15 2008-03-20 Cabot Corporation Hydrophobic-treated metal oxide
US8202502B2 (en) 2006-09-15 2012-06-19 Cabot Corporation Method of preparing hydrophobic silica
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JP4431605B2 (ja) * 2007-08-09 2010-03-17 シャープ株式会社 トナーの製造方法、トナー、二成分現像剤、現像装置および画像形成装置
WO2009044689A1 (ja) * 2007-09-29 2009-04-09 Zeon Corporation 静電荷像現像用正帯電性トナー
EP2145929B1 (de) 2008-07-18 2020-06-24 Evonik Operations GmbH Verfahren zur Herstellung redispergierbarer, oberflächenmodifizierter Siliciumdioxidpartikel
ES2784739T3 (es) * 2008-10-01 2020-09-30 Nippon Aerosil Co Ltd Partículas finas de sílice hidrófobas y composición para tóner electrofotográfico
TWI488746B (zh) * 2009-02-13 2015-06-21 Toyo Aluminium Kk 層積體及容器
JP5249903B2 (ja) * 2009-10-22 2013-07-31 味の素株式会社 樹脂組成物
US20110244382A1 (en) * 2010-04-06 2011-10-06 Christopher Alyson M Hydrophobic silica particles and method of producing same
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JP2013092748A (ja) 2011-10-26 2013-05-16 Cabot Corp 複合体粒子を含むトナー添加剤
US9581922B2 (en) 2012-03-26 2017-02-28 Cabot Corporation Treated fumed silica
US20140120339A1 (en) 2012-10-31 2014-05-01 Cabot Corporation Porous carbon monoliths templated by pickering emulsions
JP6195524B2 (ja) * 2014-01-28 2017-09-13 日揮触媒化成株式会社 疎水性シリカ粉末およびその製造方法
US10259944B2 (en) * 2014-07-24 2019-04-16 Denka Company Limited Silica fine powder and use thereof
JP6507655B2 (ja) * 2015-01-14 2019-05-08 リコーイメージング株式会社 多孔質膜用塗工液及びその製造方法
CN108473857A (zh) 2015-09-29 2018-08-31 卡博特专业流体股份有限公司 具有被颗粒稳定化的乳液的低固体物的油基井液
CN106185964B (zh) * 2016-07-20 2018-03-06 福建远翔新材料股份有限公司 一种超级绝热材料用二氧化硅的制备方法
DE112017005577T5 (de) 2016-11-04 2019-08-29 Cabot Corporation Nanokomposite, enthaltend kristallinen Polyester und Organosiliciumdioxid
US12514310B2 (en) 2017-01-24 2026-01-06 Smarterials Technology Gmbh Damage-resistant gloves with breach-indicator function
EP3573807B1 (en) * 2017-01-24 2024-10-02 Smarterials Technology GmbH Damage-resistant gloves with breach-indicator function
JP6968632B2 (ja) * 2017-09-07 2021-11-17 扶桑化学工業株式会社 疎水性シリカ粉末
DE112019000531T5 (de) * 2018-01-25 2020-10-22 Cabot Corporation Wässrige hydrophobe Siliciumdioxiddispersionen
CN112639625B (zh) 2018-08-07 2025-09-19 卡博特公司 用于调色剂添加剂的复合颗粒
JP7155046B2 (ja) 2019-03-06 2022-10-18 扶桑化学工業株式会社 疎水性シリカ粉末及びトナー樹脂粒子
CN115348990B (zh) * 2020-02-04 2024-06-04 卡博特公司 用于基于液体的增材制造的组合物
US20220162452A1 (en) * 2020-11-22 2022-05-26 Melior Innovations, Inc. Functionalized Silicon Oxycarbide Additives And Pigments, And Methods Of Make The Materials
JP2025522646A (ja) 2022-05-27 2025-07-16 キャボット コーポレイション 断熱用エアロゲル組成物

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Also Published As

Publication number Publication date
US20060171872A1 (en) 2006-08-03
EP1807347B1 (en) 2014-01-22
EP1807347A2 (en) 2007-07-18
WO2006045012A2 (en) 2006-04-27
JP2008516889A (ja) 2008-05-22
EP1807347A4 (en) 2012-02-22
WO2006045012A3 (en) 2006-10-26
US7811540B2 (en) 2010-10-12

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