JP2008508713A - 高信頼性コンタクト - Google Patents
高信頼性コンタクト Download PDFInfo
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- JP2008508713A JP2008508713A JP2007523511A JP2007523511A JP2008508713A JP 2008508713 A JP2008508713 A JP 2008508713A JP 2007523511 A JP2007523511 A JP 2007523511A JP 2007523511 A JP2007523511 A JP 2007523511A JP 2008508713 A JP2008508713 A JP 2008508713A
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- nickel
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- germanium
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- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 114
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 57
- 238000000034 method Methods 0.000 claims abstract description 38
- 230000002776 aggregation Effects 0.000 claims abstract description 19
- 239000006057 Non-nutritive feed additive Substances 0.000 claims abstract description 17
- 238000005054 agglomeration Methods 0.000 claims abstract description 15
- 239000000758 substrate Substances 0.000 claims description 34
- 229910052732 germanium Inorganic materials 0.000 claims description 25
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 25
- 239000000463 material Substances 0.000 claims description 21
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 claims description 13
- 229910000577 Silicon-germanium Inorganic materials 0.000 claims description 12
- 229910045601 alloy Inorganic materials 0.000 claims description 7
- 239000000956 alloy Substances 0.000 claims description 7
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 239000004614 Process Aid Substances 0.000 claims 3
- SCCCLDWUZODEKG-UHFFFAOYSA-N germanide Chemical compound [GeH3-] SCCCLDWUZODEKG-UHFFFAOYSA-N 0.000 abstract description 13
- 239000010410 layer Substances 0.000 description 70
- 238000000137 annealing Methods 0.000 description 9
- 239000002019 doping agent Substances 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 238000009792 diffusion process Methods 0.000 description 6
- 229910021332 silicide Inorganic materials 0.000 description 6
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 6
- 238000004220 aggregation Methods 0.000 description 4
- 239000010941 cobalt Substances 0.000 description 4
- 229910017052 cobalt Inorganic materials 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 229910021341 titanium silicide Inorganic materials 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- -1 cobalt metals Chemical class 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000002198 insoluble material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000004151 rapid thermal annealing Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000002195 soluble material Substances 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/482—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body
- H01L23/485—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body consisting of layered constructions comprising conductive layers and insulating layers, e.g. planar contacts
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
- H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
- H01L21/28512—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table
- H01L21/28518—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table the conductive layers comprising silicides
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- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8238—Complementary field-effect transistors, e.g. CMOS
- H01L21/823807—Complementary field-effect transistors, e.g. CMOS with a particular manufacturing method of the channel structures, e.g. channel implants, halo or pocket implants, or channel materials
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- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8238—Complementary field-effect transistors, e.g. CMOS
- H01L21/823814—Complementary field-effect transistors, e.g. CMOS with a particular manufacturing method of the source or drain structures, e.g. specific source or drain implants or silicided source or drain structures or raised source or drain structures
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- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8238—Complementary field-effect transistors, e.g. CMOS
- H01L21/823828—Complementary field-effect transistors, e.g. CMOS with a particular manufacturing method of the gate conductors, e.g. particular materials, shapes
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- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8238—Complementary field-effect transistors, e.g. CMOS
- H01L21/823871—Complementary field-effect transistors, e.g. CMOS interconnection or wiring or contact manufacturing related aspects
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- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/84—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being other than a semiconductor body, e.g. being an insulating body
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
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- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Electrodes Of Semiconductors (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Contacts (AREA)
- Conductive Materials (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Abstract
Description
Claims (16)
- コンタクトを製作する方法であって、
少なくともゲルマニウムを含有する活性領域を含む基板を設けること、
前記活性領域上にニッケルを含有するコンタクト層を堆積させること、
前記コンタクト層に加工助剤を供給すること、及び
ニッケル基コンタクトを形成するために前記基板を加工することを含み、前記加工が、前記基板をアニールして反応を起こし、前期ニッケル基コンタクトを形成することを含み、前記加工助剤が、加工中に前記コンタクト層での凝集を妨げる、前記方法。 - 基板が、上面層がゲルマニウム又はシリコンゲルマニウムを含有する多層基板を含む、請求項1に記載の方法。
- 基板が、ゲルマニウム又はシリコンゲルマニウムを含有する、請求項1に記載の方法。
- 加工助剤が、ニッケル基コンタクトに不溶性である、請求項1から3のいずれかに記載の方法。
- 加工助剤が、Ta、Ti、Mo、W、Zr又はそれらの組合せを含む、請求項4に記載の方法。
- 加工助剤を供給することが、コンタクト層の上にキャップ層を形成することを含む、請求項1から5のいずれかに記載の方法。
- キャップ層の厚みが、約500℃以上の温度での凝集を妨げるのに十分である、請求項6に記載の方法。
- キャップ層の厚みが、少なくとも最高約700℃までの温度での凝集を妨げるのに十分である、請求項6に記載の方法。
- キャップ層の厚みが、約50nm以下である、請求項6に記載の方法。
- 加工助剤を供給することが、ニッケル及び前記加工助剤を含有するニッケル基合金コンタクト層を形成するために、コンタクト層を堆積させるステップに前記加工助剤を組み入れることを含む、請求項1から5のいずれかに記載の方法。
- ニッケル基合金中の加工助剤が、約50原子百分率未満である、請求項10に記載の方法。
- コンタクト層における加工助剤の割合が、約500℃以上の温度で加工中に凝集を妨げるのに十分である、請求項10に記載の方法。
- コンタクト層における加工助剤の割合が、少なくとも最高約700℃までの温度で加工中に凝集を妨げるのに十分である、請求項10に記載の方法。
- 加工助剤が、ニッケル基コンタクトに可溶性及び不溶性の材料の組合せを含む、請求項1から3のいずれかに記載の方法。
- 加工助剤が、Pt及び/又はPdを含有する、請求項1から3のいずれかに記載の方法。
- 少なくともゲルマニウムを含有する活性領域を有する基板と、
前記活性領域に結合された、ニッケルを含むコンタクトと、
前記コンタクトと接触する加工助剤とを含む集積回路であって、前記加工助剤が、前記コンタクトを形成するために、加工中に前記コンタクトにおける前記ニッケルの凝集を妨げる、集積回路。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/SG2004/000220 WO2006011851A1 (en) | 2004-07-27 | 2004-07-27 | Reliable contacts |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2008508713A true JP2008508713A (ja) | 2008-03-21 |
Family
ID=35786494
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2007523511A Pending JP2008508713A (ja) | 2004-07-27 | 2004-07-27 | 高信頼性コンタクト |
Country Status (6)
Country | Link |
---|---|
US (1) | US20070272955A1 (ja) |
EP (1) | EP1787332A4 (ja) |
JP (1) | JP2008508713A (ja) |
CN (1) | CN101032028A (ja) |
TW (1) | TW200605307A (ja) |
WO (1) | WO2006011851A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007214481A (ja) * | 2006-02-13 | 2007-08-23 | Toshiba Corp | 半導体装置 |
JP5653577B2 (ja) * | 2007-08-31 | 2015-01-14 | アイメックImec | ゲルマナイド成長の改良方法およびそれにより得られたデバイス |
US8354344B2 (en) * | 2007-08-31 | 2013-01-15 | Imec | Methods for forming metal-germanide layers and devices obtained thereby |
JP5243762B2 (ja) * | 2007-09-25 | 2013-07-24 | 国立大学法人名古屋大学 | ジャーマナイド薄膜、ジャーマナイド薄膜の作成方法、ジャーマナイド薄膜を備えたゲルマニウム構造体 |
CN101635262B (zh) * | 2009-08-07 | 2012-05-30 | 北京大学 | 一种锗基肖特基晶体管的制备方法 |
EP2704199B1 (en) | 2012-09-03 | 2020-01-01 | IMEC vzw | Method of manufacturing a semiconductor device |
CN103594518B (zh) * | 2013-11-08 | 2016-09-21 | 清华大学 | 金属源漏结构及其形成方法 |
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2004
- 2004-07-27 EP EP04749242A patent/EP1787332A4/en not_active Withdrawn
- 2004-07-27 US US11/572,632 patent/US20070272955A1/en not_active Abandoned
- 2004-07-27 WO PCT/SG2004/000220 patent/WO2006011851A1/en active Application Filing
- 2004-07-27 CN CNA200480043680XA patent/CN101032028A/zh active Pending
- 2004-07-27 JP JP2007523511A patent/JP2008508713A/ja active Pending
-
2005
- 2005-07-20 TW TW094124581A patent/TW200605307A/zh unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002289558A (ja) * | 2001-03-23 | 2002-10-04 | Sharp Corp | SiGe上に熱的に安定化したニッケルゲルマノシリサイドを形成するための方法 |
US20040123922A1 (en) * | 2002-12-31 | 2004-07-01 | Cyril Cabral | Retarding agglomeration of Ni monosilicide using Ni alloys |
JP2005019943A (ja) * | 2003-06-27 | 2005-01-20 | Samsung Electronics Co Ltd | ニッケル合金サリサイド工程、それを用いて半導体素子を製造する方法、これにより形成されたニッケル合金シリサイド膜及びそれを用いて製造された半導体素子 |
Also Published As
Publication number | Publication date |
---|---|
CN101032028A (zh) | 2007-09-05 |
EP1787332A4 (en) | 2010-02-17 |
WO2006011851A1 (en) | 2006-02-02 |
US20070272955A1 (en) | 2007-11-29 |
TW200605307A (en) | 2006-02-01 |
EP1787332A1 (en) | 2007-05-23 |
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