JP2008243342A - 磁気ディスク用ガラス基板の超音波洗浄装置および超音波洗浄方法、磁気ディスク製造方法ならびに磁気ディスク - Google Patents
磁気ディスク用ガラス基板の超音波洗浄装置および超音波洗浄方法、磁気ディスク製造方法ならびに磁気ディスク Download PDFInfo
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- JP2008243342A JP2008243342A JP2007086603A JP2007086603A JP2008243342A JP 2008243342 A JP2008243342 A JP 2008243342A JP 2007086603 A JP2007086603 A JP 2007086603A JP 2007086603 A JP2007086603 A JP 2007086603A JP 2008243342 A JP2008243342 A JP 2008243342A
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- glass substrate
- magnetic disk
- cleaning
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- 239000000758 substrate Substances 0.000 title claims abstract description 121
- 238000004506 ultrasonic cleaning Methods 0.000 title claims abstract description 83
- 238000000034 method Methods 0.000 title claims description 59
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 239000007788 liquid Substances 0.000 claims abstract description 148
- 238000004140 cleaning Methods 0.000 claims abstract description 91
- 230000000694 effects Effects 0.000 claims abstract description 30
- 238000007599 discharging Methods 0.000 claims abstract description 13
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- 230000000717 retained effect Effects 0.000 abstract 2
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- 238000005498 polishing Methods 0.000 description 20
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 18
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- 238000003426 chemical strengthening reaction Methods 0.000 description 8
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- 229940058401 polytetrafluoroethylene Drugs 0.000 description 5
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- 239000004743 Polypropylene Substances 0.000 description 4
- 239000005354 aluminosilicate glass Substances 0.000 description 4
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- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 4
- 229920001155 polypropylene Polymers 0.000 description 4
- 229920000915 polyvinyl chloride Polymers 0.000 description 4
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- 229920005989 resin Polymers 0.000 description 4
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- 239000010432 diamond Substances 0.000 description 3
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
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- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
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- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
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- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 1
- BBGHYLZUPCGKCT-UHFFFAOYSA-N 1-ethenyl-1H-indene hydrofluoride Chemical compound F.C1=CC=C2C(C=C)C=CC2=C1 BBGHYLZUPCGKCT-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
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- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910018068 Li 2 O Inorganic materials 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
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- 239000005345 chemically strengthened glass Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
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- 238000003280 down draw process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
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- 239000002241 glass-ceramic Substances 0.000 description 1
- 229910000856 hastalloy Inorganic materials 0.000 description 1
- 238000011086 high cleaning Methods 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- 239000010702 perfluoropolyether Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
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- 239000002002 slurry Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000010408 sweeping Methods 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
Images
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Surface Treatment Of Glass (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007086603A JP2008243342A (ja) | 2007-03-29 | 2007-03-29 | 磁気ディスク用ガラス基板の超音波洗浄装置および超音波洗浄方法、磁気ディスク製造方法ならびに磁気ディスク |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007086603A JP2008243342A (ja) | 2007-03-29 | 2007-03-29 | 磁気ディスク用ガラス基板の超音波洗浄装置および超音波洗浄方法、磁気ディスク製造方法ならびに磁気ディスク |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008243342A true JP2008243342A (ja) | 2008-10-09 |
| JP2008243342A5 JP2008243342A5 (enExample) | 2010-05-13 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007086603A Pending JP2008243342A (ja) | 2007-03-29 | 2007-03-29 | 磁気ディスク用ガラス基板の超音波洗浄装置および超音波洗浄方法、磁気ディスク製造方法ならびに磁気ディスク |
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| Country | Link |
|---|---|
| JP (1) | JP2008243342A (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101850344A (zh) * | 2010-05-28 | 2010-10-06 | 上海集成电路研发中心有限公司 | 半导体器件清洗装置及清洗方法 |
| WO2012099126A1 (ja) | 2011-01-18 | 2012-07-26 | 電気化学工業株式会社 | 超音波洗浄方法及び装置 |
| WO2013099729A1 (ja) * | 2011-12-28 | 2013-07-04 | コニカミノルタ株式会社 | 情報記録媒体用ガラス基板の製造方法 |
| CN117920664A (zh) * | 2023-12-25 | 2024-04-26 | 彩虹（合肥）液晶玻璃有限公司 | 一种液晶玻璃基板清洗系统 |
| CN121017169A (zh) * | 2025-10-28 | 2025-11-28 | 航菱微(泰州)科技有限公司 | 一种基于超声波清洗的晶圆清洗装置 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0290525A (ja) * | 1988-09-28 | 1990-03-30 | Toshiba Corp | 超音波洗浄装置 |
| JPH10109073A (ja) * | 1996-10-04 | 1998-04-28 | Puretetsuku:Kk | 高周波洗浄装置 |
| JPH10165910A (ja) * | 1996-12-16 | 1998-06-23 | Sony Corp | 超音波洗浄装置 |
| JP2000058493A (ja) * | 1998-08-03 | 2000-02-25 | Memc Kk | シリコンウエハの洗浄装置 |
| JP2007044662A (ja) * | 2005-08-12 | 2007-02-22 | Kaijo Corp | 超音波洗浄装置 |
-
2007
- 2007-03-29 JP JP2007086603A patent/JP2008243342A/ja active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0290525A (ja) * | 1988-09-28 | 1990-03-30 | Toshiba Corp | 超音波洗浄装置 |
| JPH10109073A (ja) * | 1996-10-04 | 1998-04-28 | Puretetsuku:Kk | 高周波洗浄装置 |
| JPH10165910A (ja) * | 1996-12-16 | 1998-06-23 | Sony Corp | 超音波洗浄装置 |
| JP2000058493A (ja) * | 1998-08-03 | 2000-02-25 | Memc Kk | シリコンウエハの洗浄装置 |
| JP2007044662A (ja) * | 2005-08-12 | 2007-02-22 | Kaijo Corp | 超音波洗浄装置 |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101850344A (zh) * | 2010-05-28 | 2010-10-06 | 上海集成电路研发中心有限公司 | 半导体器件清洗装置及清洗方法 |
| WO2012099126A1 (ja) | 2011-01-18 | 2012-07-26 | 電気化学工業株式会社 | 超音波洗浄方法及び装置 |
| US9643221B2 (en) | 2011-01-18 | 2017-05-09 | Denka Company Limited | Ultrasonic cleaning method and apparatus |
| WO2013099729A1 (ja) * | 2011-12-28 | 2013-07-04 | コニカミノルタ株式会社 | 情報記録媒体用ガラス基板の製造方法 |
| JPWO2013099729A1 (ja) * | 2011-12-28 | 2015-05-07 | Hoya株式会社 | 情報記録媒体用ガラス基板の製造方法 |
| CN117920664A (zh) * | 2023-12-25 | 2024-04-26 | 彩虹（合肥）液晶玻璃有限公司 | 一种液晶玻璃基板清洗系统 |
| CN121017169A (zh) * | 2025-10-28 | 2025-11-28 | 航菱微(泰州)科技有限公司 | 一种基于超声波清洗的晶圆清洗装置 |
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