JP2008243342A5 - - Google Patents

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Publication number
JP2008243342A5
JP2008243342A5 JP2007086603A JP2007086603A JP2008243342A5 JP 2008243342 A5 JP2008243342 A5 JP 2008243342A5 JP 2007086603 A JP2007086603 A JP 2007086603A JP 2007086603 A JP2007086603 A JP 2007086603A JP 2008243342 A5 JP2008243342 A5 JP 2008243342A5
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JP
Japan
Prior art keywords
ultrasonic
liquid
inner tank
glass substrate
magnetic disk
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Pending
Application number
JP2007086603A
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English (en)
Japanese (ja)
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JP2008243342A (ja
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Publication date
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Priority to JP2007086603A priority Critical patent/JP2008243342A/ja
Priority claimed from JP2007086603A external-priority patent/JP2008243342A/ja
Publication of JP2008243342A publication Critical patent/JP2008243342A/ja
Publication of JP2008243342A5 publication Critical patent/JP2008243342A5/ja
Pending legal-status Critical Current

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JP2007086603A 2007-03-29 2007-03-29 磁気ディスク用ガラス基板の超音波洗浄装置および超音波洗浄方法、磁気ディスク製造方法ならびに磁気ディスク Pending JP2008243342A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007086603A JP2008243342A (ja) 2007-03-29 2007-03-29 磁気ディスク用ガラス基板の超音波洗浄装置および超音波洗浄方法、磁気ディスク製造方法ならびに磁気ディスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007086603A JP2008243342A (ja) 2007-03-29 2007-03-29 磁気ディスク用ガラス基板の超音波洗浄装置および超音波洗浄方法、磁気ディスク製造方法ならびに磁気ディスク

Publications (2)

Publication Number Publication Date
JP2008243342A JP2008243342A (ja) 2008-10-09
JP2008243342A5 true JP2008243342A5 (enExample) 2010-05-13

Family

ID=39914475

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007086603A Pending JP2008243342A (ja) 2007-03-29 2007-03-29 磁気ディスク用ガラス基板の超音波洗浄装置および超音波洗浄方法、磁気ディスク製造方法ならびに磁気ディスク

Country Status (1)

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JP (1) JP2008243342A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101850344A (zh) * 2010-05-28 2010-10-06 上海集成电路研发中心有限公司 半导体器件清洗装置及清洗方法
EP2666550A4 (en) 2011-01-18 2014-10-29 Denki Kagaku Kogyo Kk ULTRASONIC PURIFICATION METHOD AND DEVICE
CN104160444B (zh) * 2011-12-28 2017-03-15 Hoya株式会社 信息记录介质用玻璃基板的制造方法
CN117920664A (zh) * 2023-12-25 2024-04-26 彩虹（合肥）液晶玻璃有限公司 一种液晶玻璃基板清洗系统
CN121017169A (zh) * 2025-10-28 2025-11-28 航菱微(泰州)科技有限公司 一种基于超声波清洗的晶圆清洗装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0290525A (ja) * 1988-09-28 1990-03-30 Toshiba Corp 超音波洗浄装置
JP3349636B2 (ja) * 1996-10-04 2002-11-25 株式会社プレテック 高周波洗浄装置
JPH10165910A (ja) * 1996-12-16 1998-06-23 Sony Corp 超音波洗浄装置
JP2000058493A (ja) * 1998-08-03 2000-02-25 Memc Kk シリコンウエハの洗浄装置
JP2007044662A (ja) * 2005-08-12 2007-02-22 Kaijo Corp 超音波洗浄装置

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