JP2008228304A5 - - Google Patents

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Publication number
JP2008228304A5
JP2008228304A5 JP2008059620A JP2008059620A JP2008228304A5 JP 2008228304 A5 JP2008228304 A5 JP 2008228304A5 JP 2008059620 A JP2008059620 A JP 2008059620A JP 2008059620 A JP2008059620 A JP 2008059620A JP 2008228304 A5 JP2008228304 A5 JP 2008228304A5
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JP
Japan
Prior art keywords
amplification device
amplifying
amplification
bypass capacitor
switching elements
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008059620A
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English (en)
Japanese (ja)
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JP2008228304A (ja
JP5675033B2 (ja
Filing date
Publication date
Priority claimed from EP07004878A external-priority patent/EP1968188B1/de
Application filed filed Critical
Publication of JP2008228304A publication Critical patent/JP2008228304A/ja
Publication of JP2008228304A5 publication Critical patent/JP2008228304A5/ja
Application granted granted Critical
Publication of JP5675033B2 publication Critical patent/JP5675033B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2008059620A 2007-03-09 2008-03-10 Ｄ級増幅装置 Active JP5675033B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP07004878A EP1968188B1 (de) 2007-03-09 2007-03-09 Klasse-D Verstärkeranordnung
EP07004878.0 2007-03-09

Publications (3)

Publication Number Publication Date
JP2008228304A JP2008228304A (ja) 2008-09-25
JP2008228304A5 true JP2008228304A5 (https=) 2011-04-28
JP5675033B2 JP5675033B2 (ja) 2015-02-25

Family

ID=38123951

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008059620A Active JP5675033B2 (ja) 2007-03-09 2008-03-10 Ｄ級増幅装置

Country Status (3)

Country Link
US (1) US7705676B2 (https=)
EP (1) EP1968188B1 (https=)
JP (1) JP5675033B2 (https=)

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US12525433B2 (en) 2021-06-09 2026-01-13 Applied Materials, Inc. Method and apparatus to reduce feature charging in plasma processing chamber
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US12106938B2 (en) 2021-09-14 2024-10-01 Applied Materials, Inc. Distortion current mitigation in a radio frequency plasma processing chamber
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