JP2008046580A - ワイヤーグリッド偏光子製造システム及びその製造方法 - Google Patents

ワイヤーグリッド偏光子製造システム及びその製造方法 Download PDF

Info

Publication number
JP2008046580A
JP2008046580A JP2006317914A JP2006317914A JP2008046580A JP 2008046580 A JP2008046580 A JP 2008046580A JP 2006317914 A JP2006317914 A JP 2006317914A JP 2006317914 A JP2006317914 A JP 2006317914A JP 2008046580 A JP2008046580 A JP 2008046580A
Authority
JP
Japan
Prior art keywords
unit
photoresist
stamp
substrate
wire grid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006317914A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008046580A5 (enExample
Inventor
Daiko Shu
大 鎬 秋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of JP2008046580A publication Critical patent/JP2008046580A/ja
Publication of JP2008046580A5 publication Critical patent/JP2008046580A5/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3025Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3058Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Polarising Elements (AREA)
JP2006317914A 2006-08-16 2006-11-27 ワイヤーグリッド偏光子製造システム及びその製造方法 Pending JP2008046580A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020060076959A KR20080015536A (ko) 2006-08-16 2006-08-16 와이어 그리드 편광자 제조 시스템 및 제조 방법

Publications (2)

Publication Number Publication Date
JP2008046580A true JP2008046580A (ja) 2008-02-28
JP2008046580A5 JP2008046580A5 (enExample) 2009-12-24

Family

ID=38962156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006317914A Pending JP2008046580A (ja) 2006-08-16 2006-11-27 ワイヤーグリッド偏光子製造システム及びその製造方法

Country Status (6)

Country Link
US (1) US20080041816A1 (enExample)
EP (1) EP1914571A3 (enExample)
JP (1) JP2008046580A (enExample)
KR (1) KR20080015536A (enExample)
CN (1) CN101126894A (enExample)
TW (1) TW200811487A (enExample)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009265187A (ja) * 2008-04-22 2009-11-12 Fuji Electric Device Technology Co Ltd インプリント方法およびその装置
JP2010040879A (ja) * 2008-08-06 2010-02-18 Canon Inc インプリント装置及びインプリント方法
JP2011000806A (ja) * 2009-06-19 2011-01-06 Tokyo Electron Ltd インプリントシステム、インプリント方法、プログラム及びコンピュータ記憶媒体
JP2013020182A (ja) * 2011-07-13 2013-01-31 Asahi Kasei E-Materials Corp ワイヤグリッド偏光板及びワイヤグリッド偏光板の製造方法
US9146460B2 (en) 2008-04-22 2015-09-29 Fuji Electric Co., Ltd. Imprinting method and apparatus therefor
US20170075051A1 (en) 2015-09-16 2017-03-16 Korea Institute Of Machinery & Materials Method of manufacturing wire grid polarizer
US10969677B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask
US10969686B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
US11029596B2 (en) 2016-01-27 2021-06-08 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI481496B (zh) * 2007-12-19 2015-04-21 Heptagon Micro Optics Pte Ltd 製造光學元件的方法
CN102044476B (zh) * 2009-10-13 2013-06-19 中芯国际集成电路制造(上海)有限公司 金属图案的形成方法
KR20120075877A (ko) * 2010-12-29 2012-07-09 삼성전자주식회사 액정 디스플레이 패널 및 이를 포함하는 장치
US20130043956A1 (en) * 2011-08-15 2013-02-21 Honeywell International Inc. Systems and methods for a nanofabricated optical circular polarizer
KR20140030382A (ko) 2012-08-27 2014-03-12 삼성디스플레이 주식회사 액정 표시 장치 및 이의 제조 방법
CN104058362B (zh) * 2013-03-21 2017-06-27 无锡华润上华半导体有限公司 微电子机械系统的加工方法
KR102056902B1 (ko) 2013-05-29 2019-12-18 삼성전자주식회사 와이어 그리드 편광판 및 이를 구비하는 액정 표시패널 및 액정 표시장치
KR102089661B1 (ko) 2013-08-27 2020-03-17 삼성전자주식회사 와이어 그리드 편광판 및 이를 구비하는 액정 표시패널 및 액정 표시장치
WO2019065098A1 (ja) * 2017-09-27 2019-04-04 日本電気硝子株式会社 光学膜付きガラス板及びその製造方法
KR102022268B1 (ko) * 2018-02-14 2019-09-19 한국기계연구원 순간가열방식 및 용액전사방식의 임프린트 장치와, 그 방법
CN109270620B (zh) * 2018-11-16 2022-07-19 京东方科技集团股份有限公司 金属线栅偏振片的制作方法及显示面板
CN109445012A (zh) * 2018-12-20 2019-03-08 深圳市华星光电半导体显示技术有限公司 线栅型偏光片制作方法及透明显示装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0664693A (ja) * 1992-08-10 1994-03-08 Tatsuno Co Ltd 給油装置
JP2004311938A (ja) * 2002-12-06 2004-11-04 Samsung Electronics Co Ltd マルチチップパッケージ用のダイ貼付と硬化インライン装置
JP2005103991A (ja) * 2003-09-30 2005-04-21 Dainippon Printing Co Ltd 複製版の製造方法
JP2005173597A (ja) * 2003-12-06 2005-06-30 Samsung Electronics Co Ltd 回折レンズアレイモールドの製造方法、及びそれに用いられるuv照射器
JP2006084776A (ja) * 2004-09-16 2006-03-30 Lg Electronics Inc ワイヤーグリッド偏光子及びその製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7218465B1 (en) * 2002-06-28 2007-05-15 Seagate Technology Llc Magnetic media patterning via contact printing utilizing stamper having magnetic pattern formed in non-magnetic substrate
CA2522218A1 (en) * 2003-04-14 2004-10-28 National Graphics, Inc. Lenticular images formed on selected images portions
JP2005153091A (ja) * 2003-11-27 2005-06-16 Hitachi Ltd 転写方法及び転写装置
KR20050075580A (ko) * 2004-01-16 2005-07-21 엘지전자 주식회사 나노 임프린트 리쏘그라피를 이용한 대면적 스탬프 제작방법
US20060056024A1 (en) * 2004-09-15 2006-03-16 Ahn Seh W Wire grid polarizer and manufacturing method thereof

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0664693A (ja) * 1992-08-10 1994-03-08 Tatsuno Co Ltd 給油装置
JP2004311938A (ja) * 2002-12-06 2004-11-04 Samsung Electronics Co Ltd マルチチップパッケージ用のダイ貼付と硬化インライン装置
JP2005103991A (ja) * 2003-09-30 2005-04-21 Dainippon Printing Co Ltd 複製版の製造方法
JP2005173597A (ja) * 2003-12-06 2005-06-30 Samsung Electronics Co Ltd 回折レンズアレイモールドの製造方法、及びそれに用いられるuv照射器
JP2006084776A (ja) * 2004-09-16 2006-03-30 Lg Electronics Inc ワイヤーグリッド偏光子及びその製造方法

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009265187A (ja) * 2008-04-22 2009-11-12 Fuji Electric Device Technology Co Ltd インプリント方法およびその装置
US8834774B2 (en) 2008-04-22 2014-09-16 Fuji Electric Co., Ltd. Imprinting method and apparatus therefor
US9146460B2 (en) 2008-04-22 2015-09-29 Fuji Electric Co., Ltd. Imprinting method and apparatus therefor
JP2010040879A (ja) * 2008-08-06 2010-02-18 Canon Inc インプリント装置及びインプリント方法
JP2011000806A (ja) * 2009-06-19 2011-01-06 Tokyo Electron Ltd インプリントシステム、インプリント方法、プログラム及びコンピュータ記憶媒体
JP2013020182A (ja) * 2011-07-13 2013-01-31 Asahi Kasei E-Materials Corp ワイヤグリッド偏光板及びワイヤグリッド偏光板の製造方法
US20170075051A1 (en) 2015-09-16 2017-03-16 Korea Institute Of Machinery & Materials Method of manufacturing wire grid polarizer
JP2017058653A (ja) * 2015-09-16 2017-03-23 コリア・インスティテュート・オブ・マシナリー・アンド・マテリアルズKorea Institute Of Machinery & Materials ワイヤグリッド偏光子の製造方法
US9638851B2 (en) 2015-09-16 2017-05-02 Korea Institute Of Machinery & Materials Method of manufacturing wire grid polarizer
US10969677B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask
US10969686B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
US11029596B2 (en) 2016-01-27 2021-06-08 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby

Also Published As

Publication number Publication date
EP1914571A2 (en) 2008-04-23
US20080041816A1 (en) 2008-02-21
EP1914571A3 (en) 2010-01-20
CN101126894A (zh) 2008-02-20
TW200811487A (en) 2008-03-01
KR20080015536A (ko) 2008-02-20

Similar Documents

Publication Publication Date Title
JP2008046580A (ja) ワイヤーグリッド偏光子製造システム及びその製造方法
US10923681B2 (en) Packaging method of OLED display device using sacrificial layer in bonding region
JP5202428B2 (ja) 蒸着装置用マスク密着手段及びそれを用いた蒸着装置
CN100428527C (zh) 掩模及其制法、场致发光装置及其制法以及电子机器
TW201343939A (zh) 蒸鍍罩體及蒸鍍罩體之製造方法
US20060148114A1 (en) Method of forming mask and mask
KR20140063805A (ko) 증착 마스크, 증착 마스크의 제조 방법 및 박막 패턴 형성 방법
TW200841765A (en) Mask frame assembly for thin film deposition of flat panel display and deposition apparatus using the same
CN104206016B (zh) 薄膜图案形成方法
TWI679716B (zh) 可撓性電子裝置之製造方法
JP2003347524A (ja) 素子の転写方法、素子の配列方法及び画像表示装置の製造方法
JP5804457B2 (ja) マスク
KR102435235B1 (ko) 마스크의 제조 방법 및 마스크
KR20150113742A (ko) 증발원 및 이를 포함하는 증착장치
JP5935101B2 (ja) 薄膜パターン形成方法
US20190378725A1 (en) Method for transferring a pattern from an organic mask
US10732503B2 (en) Silane coupling agent and method of manufacturing wire grid pattern using the same
US11277930B2 (en) Method of manufacturing display substrate and display substrate motherboard
CN116463592B (zh) 一种掩膜板制作方法及掩膜板
KR101362298B1 (ko) 지그 타입 플렉시블 패드를 이용한 기판 합착 장치 및 합착 방법
JP2008108596A (ja) マスク蒸着法、およびマスク蒸着装置
US7834332B2 (en) Thin film pattern forming device and method
KR102722670B1 (ko) 전자빔을 이용한 미세패턴 형성 장치
KR102235600B1 (ko) 마스크 프레임 조립체 및 그것을 이용하는 증착 장치
KR102666398B1 (ko) 마스크의 제조 방법

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20091105

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20091105

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20101012

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20110509

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110517

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20111227