JP2008031199A - 感光性樹脂及び感光性樹脂組成物 - Google Patents
感光性樹脂及び感光性樹脂組成物 Download PDFInfo
- Publication number
- JP2008031199A JP2008031199A JP2006203084A JP2006203084A JP2008031199A JP 2008031199 A JP2008031199 A JP 2008031199A JP 2006203084 A JP2006203084 A JP 2006203084A JP 2006203084 A JP2006203084 A JP 2006203084A JP 2008031199 A JP2008031199 A JP 2008031199A
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- JP
- Japan
- Prior art keywords
- meth
- photosensitive resin
- acrylate
- mass
- hydroxyphenyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 229920005989 resin Polymers 0.000 title claims abstract description 62
- 239000011347 resin Substances 0.000 title claims abstract description 62
- 239000011342 resin composition Substances 0.000 title claims abstract description 30
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 101
- 125000004464 hydroxyphenyl group Chemical group 0.000 claims abstract description 29
- 229920000642 polymer Polymers 0.000 claims abstract description 25
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims abstract description 20
- 239000003999 initiator Substances 0.000 claims abstract description 13
- 239000003960 organic solvent Substances 0.000 claims abstract description 10
- 239000000178 monomer Substances 0.000 claims abstract description 9
- 229920001577 copolymer Polymers 0.000 claims description 29
- 150000001875 compounds Chemical class 0.000 claims description 18
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 10
- 239000002253 acid Substances 0.000 claims description 9
- 239000000470 constituent Substances 0.000 claims description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract description 10
- 238000002845 discoloration Methods 0.000 abstract description 7
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract description 3
- 238000007259 addition reaction Methods 0.000 abstract description 3
- 238000000016 photochemical curing Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 49
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- 238000000034 method Methods 0.000 description 19
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- 239000011248 coating agent Substances 0.000 description 12
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- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 9
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 8
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- 230000000052 comparative effect Effects 0.000 description 7
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- PJMXUSNWBKGQEZ-UHFFFAOYSA-N (4-hydroxyphenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(O)C=C1 PJMXUSNWBKGQEZ-UHFFFAOYSA-N 0.000 description 6
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
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- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 239000012298 atmosphere Substances 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 6
- 229910052753 mercury Inorganic materials 0.000 description 6
- 239000003505 polymerization initiator Substances 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 239000003513 alkali Substances 0.000 description 5
- 239000012299 nitrogen atmosphere Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- 230000032683 aging Effects 0.000 description 4
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 238000010538 cationic polymerization reaction Methods 0.000 description 4
- 238000007334 copolymerization reaction Methods 0.000 description 4
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 230000018109 developmental process Effects 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 239000007870 radical polymerization initiator Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- UAJRSHJHFRVGMG-UHFFFAOYSA-N 1-ethenyl-4-methoxybenzene Chemical compound COC1=CC=C(C=C)C=C1 UAJRSHJHFRVGMG-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 2
- SDJHPPZKZZWAKF-UHFFFAOYSA-N 2,3-dimethylbuta-1,3-diene Chemical compound CC(=C)C(C)=C SDJHPPZKZZWAKF-UHFFFAOYSA-N 0.000 description 2
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 2
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 2
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 2
- JJRUAPNVLBABCN-UHFFFAOYSA-N 2-(ethenoxymethyl)oxirane Chemical compound C=COCC1CO1 JJRUAPNVLBABCN-UHFFFAOYSA-N 0.000 description 2
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- OCKQMFDZQUFKRD-UHFFFAOYSA-N 2-[(3-ethenylphenyl)methoxymethyl]oxirane Chemical compound C=CC1=CC=CC(COCC2OC2)=C1 OCKQMFDZQUFKRD-UHFFFAOYSA-N 0.000 description 2
- ZADXFVHUPXKZBJ-UHFFFAOYSA-N 2-[(4-ethenylphenyl)methoxymethyl]oxirane Chemical compound C1=CC(C=C)=CC=C1COCC1OC1 ZADXFVHUPXKZBJ-UHFFFAOYSA-N 0.000 description 2
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- DPNXHTDWGGVXID-UHFFFAOYSA-N 2-isocyanatoethyl prop-2-enoate Chemical compound C=CC(=O)OCCN=C=O DPNXHTDWGGVXID-UHFFFAOYSA-N 0.000 description 2
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- XAYDWGMOPRHLEP-UHFFFAOYSA-N 6-ethenyl-7-oxabicyclo[4.1.0]heptane Chemical compound C1CCCC2OC21C=C XAYDWGMOPRHLEP-UHFFFAOYSA-N 0.000 description 2
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Abstract
【解決手段】ヒドロキシフェニル(メタ)アクリレートを含む重合体にグリシジル(メタ)クリレート、アクリル酸等を付加反応して不飽和二重結合を導入した感光性樹脂。
上記の感光性樹脂、光ラジカル開始剤、ラジカル重合性モノマー及び/又は有機溶剤を含有する感光性樹脂組成物。
【選択図】なし
Description
同様に液晶表示素子や固体撮像素子などに使用されるカラーフィルタを製作するために用いられる材料としては、様々なネガ型の感光性樹脂組成物が使用されているが、パターン特性や現像性には、まだまだ改良の余地がある。
即ち、本発明は以下の通りである。
(2)共重合体が、ヒドロキシフェニル(メタ)アクリレートと(メタ)アクリル酸を構成成分として含有する共重合体である上記(1)に記載の感光性樹脂。
(3)共重合体が、ヒドロキシフェニル(メタ)アクリレートとグリシジル(メタ)アクリレートを構成成分として含有する共重合体である上記(1)に記載の感光性樹脂。
(4)平均分子量(Mw)が1,500〜50,000である上記(1)〜(3)のいずれかに記載の感光性樹脂。
(6) 不飽和二重結合を有する化合物が、グリシジル(メタ)アクリレートである上記(5)に記載の感光性樹脂。
(7) 不飽和二重結合を有する化合物が、不飽和一塩基酸である上記(5)に記載の感光性樹脂。
(8)上記(1)〜(7)のいずれかに記載の感光性樹脂、光ラジカル開始剤、ラジカル重合性モノマー及び/又は有機溶剤を含有する感光性樹脂組成物。
本発明の感光性樹脂はヒドロキシフェニル(メタ)アクリレートを含む重合体または共重合体に不飽和二重結合を導入した樹脂である。
先ず、ヒドロキシフェニル(メタ)アクリレートを含む重合体または共重合体について説明する。
ヒドロキシフェニル(メタ)アクリレートを含む重合体は、ヒドロキシフェニル(メタ)アクリレートからなる構成単位を必須成分として含み、具体的には、o−ヒドロキシフェニルアクリレート、m−ヒドロキシフェニルアクリレート、p−ヒドロキシフェニルアクリレート、o−ヒドロキシフェニルメタクリレート、m−ヒドロキシフェニルメタクリレート、p−ヒドロキシフェニルメタクリレートの重合体が挙げられ、これらの単独又は2種以上を組み合わせて使用できる。
分子量の調整はメルカプタン類に代表される連鎖移動剤を使用することも出来る。
導入方法は特に制限なく、一般的にはビニル基、アリル基、(メタ)アクリロイル基、などの不飽和二重結合を有する化合物をヒドロキシフェニル(メタ)アクリレートを含む重合体または共重合体に付加反応させることが挙げられる。
この好ましい態様としては例えば、ヒドロキシフェニル(メタ)アクリレートを少なくとも構成成分として含有する重合体にグリシジル(メタ)アクリレートを付加させる方法、ヒドロキシフェニル(メタ)アクリレート及び(メタ)アクリル酸を少なくとも構成成分として含有する重合体にグリシジル(メタ)アクリレートを付加させる方法、ヒドロキシフェニル(メタ)アクリレート及びグリシジル(メタ)アクリレートを少なくとも構成成分として含有する重合体に不飽和一塩基酸を付加させる方法等が挙げられる。
(平均分子量の測定)
得られた感光性樹脂の重量平均分子量(Mw)、及び分子量分布(Mw/Mn)の値はゲル・パーミッション・クロマトグラフィー(GPC)を用いて、下記条件にて測定し、ポリスチレン換算にて算出した。
カラム:ショーデックス KF−801+KF−802+KF−802+KF−803
カラム温度:40℃
展開溶媒:テトラヒドロフラン
検出器:示差屈折計(ショーデックス RI−101)
流速:1ml/min
各実施例及び比較例にて得られた感光性樹脂の重量平均分子量、及び分子量分布を表1に示す。
還流冷却器、攪拌機を備えたフラスコに、p−ヒドロキシフェニルメタクリレート100質量部、プロピレングリコールモノメチルエーテルアセテート500質量部、2,2’−アゾビスイソブチロニトリル8質量部を仕込み、窒素雰囲気下、攪拌しながら液温を80℃まで上昇させ、80℃で8時間反応し、100℃で1時間エージングを行って重合体を得た。次に、フラスコ内を空気雰囲気下に替え、ハイドロキノン0.05質量部、トリスジメチルアミノメチルフェノール0.1質量部、グリシジルメタクリレート31.9質量部を添加し、80℃で6時間反応した。固形分濃度を40質量%(以下の例も質量%)に調整し、感光性樹脂[A−1]を含む樹脂溶液を得た。この樹脂の構造式を下記に示す。式中の40、60は配合割合から求めた各組成比(モル%)を意味する。以下同じ。
還流冷却器、攪拌機を備えたフラスコに、p−ヒドロキシフェニルメタクリレート87.7質量部、メタクリル酸メチル12.3質量部、プロピレングリコールモノメチルエーテルアセテート500質量部、2,2’−アゾビスイソブチロニトリル8質量部を仕込み、窒素雰囲気下、攪拌しながら液温を80℃まで上昇させ、80℃で8時間反応し、100℃で1時間エージングを行って共重合体を得た。次に、フラスコ内を空気雰囲気下に替え、ハイドロキノン0.05質量部、トリスジメチルアミノメチルフェノール0.1質量部、グリシジルメタクリレート35.0質量部を添加し、80℃で6時間反応した。固形分濃度を40%に調整し、感光性樹脂[A−3]を含む溶液を得た。
還流冷却器、攪拌機を備えたフラスコに、p−ヒドロキシフェニルメタクリレート76.4質量部、ジシクロペンタニルメタクリレート23.6質量部、プロピレングリコールモノメチルエーテルアセテート500質量部、2,2’−アゾビスイソブチロニトリル8質量部を仕込み、窒素雰囲気下、攪拌しながら液温を80℃まで上昇させ、80℃で8時間反応し、100℃で1時間エージングを行って共重合体を得た。次に、フラスコ内を空気雰囲気下に替え、ハイドロキノン0.05質量部、トリスジメチルアミノメチルフェノール0.1質量部、グリシジルメタクリレート30.5質量部を添加し、80℃で6時間反応した。固形分濃度を40%に調整し、感光性樹脂[A−4]を含む溶液を得た。
還流冷却器、攪拌機を備えたフラスコに、p−ヒドロキシフェニルメタクリレート82.8質量部、メタクリル酸17.2質量部、プロピレングリコールモノメチルエーテルアセテート500質量部、2,2’−アゾビスイソブチロニトリル8質量部を仕込み、窒素雰囲気下、攪拌しながら液温を80℃まで上昇させ、80℃で8時間反応し、100℃で1時間エージングを行って共重合体を得た。次に、フラスコ内を空気雰囲気下に替え、ハイドロキノン0.05質量部、トリスジメチルアミノメチルフェノール0.1質量部、グリシジルメタクリレート37.8質量部を添加し、80℃で6時間反応した。固形分濃度を40%に調整し、感光性樹脂[B−1]を含む溶液を得た。
還流冷却器、攪拌機を備えたフラスコに、p−ヒドロキシフェニルメタクリレート65.3質量部、グリシジルメタクリレート34.7質量部、プロピレングリコールモノメチルエーテルアセテート500質量部、2,2’−アゾビスイソブチロニトリル8質量部を仕込み、窒素雰囲気下、攪拌しながら液温を80℃まで上昇させ、80℃で8時間反応し、100℃で1時間エージングを行って共重合体を得た。次に、フラスコ内を空気雰囲気下に替え、ハイドロキノン0.05質量部、トリスジメチルアミノメチルフェノール0.1質量部、アクリル酸17.6質量部を添加し、80℃で6時間反応した。固形分濃度を40%に調整し、感光性樹脂[C−1]を含む溶液を得た。
還流冷却器、攪拌機を備えたフラスコに、メタクリル酸メチル43.7質量部、メタクリル酸56.3質量部、プロピレングリコールモノメチルエーテルアセテート500質量部、2,2’−アゾビスイソブチロニトリル8質量部を仕込み、窒素雰囲気下、攪拌しながら液温を80℃まで上昇させ、80℃で8時間反応し、100℃で1時間エージングを行って共重合体を得た。次に、フラスコ内を空気雰囲気下に替え、ハイドロキノン0.05質量部、トリスジメチルアミノメチルフェノール0.1質量部、グリシジルメタクリレート62.0質量部を添加し、80℃で6時間反応した。固形分濃度を40%に調整し、感光性樹脂[D−1]を含む溶液を得た。
還流冷却器、攪拌機を備えたフラスコに、ポリヒドロキシスチレン100質量部、プロピレングリコールモノメチルエーテルアセテート500質量部、ハイドロキノン0.05質量部、トリスジメチルアミノメチルフェノール0.1質量部、グリシジルメタクリレート47.3質量部を添加し、80℃で6時間反応した。固形分濃度を40%に調整し、感光性樹脂[D−2]を含む溶液を得た。
感光性樹脂組成物の各特性を表2及び表3に示す。
実施例1〜6及び比較例1〜2で得られた感光性樹脂溶液100質量部、光ラジカル開始剤として2,2−ジメトキシ−2−フェニルアセトフェノン3質量部を添加して感光性樹脂組成物を得た。得られた感光性樹脂組成物をアセトンで脱脂したガラス板に厚さ50μmで塗布し、80℃オーブンで20分間乾燥させて、感光性樹脂の塗膜を得た。
実施例1〜6及び比較例1〜2で得られた感光性樹脂溶液100質量部、光ラジカル開始剤として2,2−ジメトキシ−2−フェニルアセトフェノン4質量部、ペンタエリスリトールテトラアクリレート4質量部を添加して感光性樹脂組成物を得た。得られた感光性樹脂組成物をアセトンで脱脂したガラス板に厚さ50μmで塗布し、80℃オーブンで20分間乾燥させて、感光性樹脂の塗膜を得た。
[現像性]
乾燥した塗膜にパターンマスクを介して超高圧水銀灯を用いて500mJ/cm2露光し、2.38%テトラメチルアンモニウムヒドロキシドの水溶液にて2分間浸漬して現像し、純水でリンスを行った。格子状の凹凸パターンが転写された物を○、パターンが転写されなかった物を×とした。
乾燥した塗膜に超高圧水銀灯を用いて500mJ/cm2全面露光し、200℃、30分間オーブンで加熱処理して硬化塗膜を得た。得られた硬化塗膜付きのガラス基板について、分光光度計を使用して波長400〜800nmの最低透過率をガラス基板をブランクとして測定した。90%以上を○、80〜90%を△、80%未満を×とした。
200℃、30分間加熱処理させた後、再び230℃で2時間、更に250℃で1時間加熱処理し、膜厚測定を行った。200℃、30分間加熱処理後膜厚に対して、再加熱後の膜厚変化を膜厚減少率で算出した。再加熱後の膜厚減少率が20%未満の場合を○、20〜30%を△、30%以上の場合を×とした。
200℃、30分間加熱処理させた後、再び230℃で2時間、更に250℃で1時間加熱処理し、波長400〜800nmの最低透過率をガラス基板をブランクとして測定した。80%以上を○、70〜80%を△、70%未満を×とした。
Claims (8)
- ヒドロキシフェニル(メタ)アクリレートを含む重合体または共重合体に不飽和二重結合を導入した感光性樹脂。
- 共重合体が、ヒドロキシフェニル(メタ)アクリレートと(メタ)アクリル酸を構成成分として含有する共重合体である請求項1に記載の感光性樹脂。
- 共重合体が、ヒドロキシフェニル(メタ)アクリレートとグリシジル(メタ)アクリレートを構成成分として含有する共重合体である請求項1に記載の感光性樹脂。
- 平均分子量(Mw)が1,500〜50,000である請求項1〜3のいずれかに記載の感光性樹脂。
- 請求項1〜4のいずれかに記載の重合体または共重合体に不飽和二重結合を有する化合物を付加させて得られる感光性樹脂。
- 不飽和二重結合を有する化合物が、グリシジル(メタ)アクリレートである請求項5に記載の感光性樹脂。
- 不飽和二重結合を有する化合物が、不飽和一塩基酸である請求項5に記載の感光性樹脂。
- 請求項1〜7のいずれかに記載の感光性樹脂、光ラジカル開始剤、ラジカル重合性モノマー及び/又は有機溶剤を含有する感光性樹脂組成物。
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