JP2007530682A5 - - Google Patents

Download PDF

Info

Publication number
JP2007530682A5
JP2007530682A5 JP2007506249A JP2007506249A JP2007530682A5 JP 2007530682 A5 JP2007530682 A5 JP 2007530682A5 JP 2007506249 A JP2007506249 A JP 2007506249A JP 2007506249 A JP2007506249 A JP 2007506249A JP 2007530682 A5 JP2007530682 A5 JP 2007530682A5
Authority
JP
Japan
Prior art keywords
polycyclic
monocyclic
group
perfluorovinyl
monomer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007506249A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007530682A (ja
Filing date
Publication date
Priority claimed from US10/812,191 external-priority patent/US7214475B2/en
Application filed filed Critical
Publication of JP2007530682A publication Critical patent/JP2007530682A/ja
Publication of JP2007530682A5 publication Critical patent/JP2007530682A5/ja
Pending legal-status Critical Current

Links

JP2007506249A 2004-03-29 2005-03-23 光学材料用化合物及び製造方法 Pending JP2007530682A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/812,191 US7214475B2 (en) 2004-03-29 2004-03-29 Compound for optical materials and methods of fabrication
PCT/US2005/009656 WO2005097843A1 (en) 2004-03-29 2005-03-23 Compound for optical materials and methods of fabrication

Publications (2)

Publication Number Publication Date
JP2007530682A JP2007530682A (ja) 2007-11-01
JP2007530682A5 true JP2007530682A5 (https=) 2008-04-24

Family

ID=34963875

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007506249A Pending JP2007530682A (ja) 2004-03-29 2005-03-23 光学材料用化合物及び製造方法

Country Status (8)

Country Link
US (1) US7214475B2 (https=)
EP (1) EP1732937A1 (https=)
JP (1) JP2007530682A (https=)
KR (1) KR20060134133A (https=)
CN (1) CN1938342A (https=)
MY (1) MY139112A (https=)
TW (1) TW200609240A (https=)
WO (1) WO2005097843A1 (https=)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101840077B (zh) * 2005-02-16 2015-09-02 皇家飞利浦电子股份有限公司 发光物体及其应用
US8529993B2 (en) * 2006-05-01 2013-09-10 Zetta Research andDevelopment LLC—RPO Series Low volatility polymers for two-stage deposition processes
ATE543846T1 (de) * 2006-12-15 2012-02-15 Jnc Corp Fluorhaltiges polymer und harzzusammensetzung
US20100304512A1 (en) * 2007-11-30 2010-12-02 University Of Toledo System for Diagnosis and Treatment of Photovoltaic and Other Semiconductor Devices
US8574944B2 (en) * 2008-03-28 2013-11-05 The University Of Toledo System for selectively filling pin holes, weak shunts and/or scribe lines in photovoltaic devices and photovoltaic cells made thereby
CN102382132A (zh) * 2010-08-30 2012-03-21 珠海市吉林大学无机合成与制备化学重点实验室 多孔硅氧烷有机骨架材料及其制备方法
US20120135165A1 (en) * 2010-11-29 2012-05-31 Yu-Hui Huang Antiglare and antiseptic coating material and touchscreen coated with the same
US20120177920A1 (en) * 2011-01-11 2012-07-12 Yu-Hui Huang Antiglare and antiseptic coating material and touchscreen coated with the same
US9731456B2 (en) 2013-03-14 2017-08-15 Sabic Global Technologies B.V. Method of manufacturing a functionally graded article
US10287398B2 (en) 2014-12-30 2019-05-14 Momentive Performance Materials Inc. Siloxane coordination polymers
EP3240807A4 (en) 2014-12-30 2018-08-08 Momentive Performance Materials Inc. Functionalized siloxane materials
JP7215904B2 (ja) * 2016-10-27 2023-01-31 Ube株式会社 ポリイミドおよびそれを用いたフレキシブルデバイス
US11572454B2 (en) 2017-02-08 2023-02-07 Architectural Solutions Ip, Llc Flame resistant material and resultant products
CN110734525B (zh) * 2018-07-18 2022-07-01 浙江省化工研究院有限公司 一种含氟笼型倍半硅氧烷改性聚三氟氯乙烯树脂
KR102564761B1 (ko) * 2019-03-07 2023-08-07 앱솔릭스 인코포레이티드 패키징 기판 및 이를 포함하는 반도체 장치
KR102537004B1 (ko) 2019-03-12 2023-05-26 앱솔릭스 인코포레이티드 패키징 기판 및 이의 제조방법
US11652039B2 (en) 2019-03-12 2023-05-16 Absolics Inc. Packaging substrate with core layer and cavity structure and semiconductor device comprising the same
CN110606955B (zh) * 2019-08-12 2021-04-27 武汉华星光电半导体显示技术有限公司 一种硬化层聚合物薄膜和制备方法
WO2021229340A1 (en) * 2020-05-14 2021-11-18 3M Innovative Properties Company Fluorinated photoinitiators and fluorinated (co)polymer layers made using the same

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5292620A (en) 1988-01-15 1994-03-08 E. I. Du Pont De Nemours And Company Optical waveguide devices, elements for making the devices and methods of making the devices and elements
US5023380A (en) 1989-06-09 1991-06-11 The Dow Chemical Company Perfluorovinyl compounds
JPH0317088A (ja) * 1989-06-15 1991-01-25 Toshiba Silicone Co Ltd 有機ケイ素化合物
JPH0953015A (ja) * 1995-08-11 1997-02-25 Nitto Denko Corp 紫外線感光性含フッ素シリコーン組成物
JP3861966B2 (ja) * 2000-02-16 2006-12-27 信越化学工業株式会社 高分子化合物、化学増幅レジスト材料及びパターン形成方法
US20030176718A1 (en) 2002-01-08 2003-09-18 Rantala Juha T. Methods and compounds for making coatings, waveguides and other optical devices
AU2003201736A1 (en) 2002-01-08 2003-07-24 Silecs, Inc. Materials and methods for forming hybrid organic-inorganic dielectric materials
US6803476B2 (en) 2002-01-08 2004-10-12 Silecs Oy Methods and compounds for making coatings, waveguides and other optical devices
US6831189B2 (en) 2002-01-08 2004-12-14 Silecs Oy Methods and compounds for making coatings, waveguides and other optical devices
US20030171607A1 (en) 2002-01-08 2003-09-11 Rantala Juha T. Methods and compounds for making coatings, waveguides and other optical devices
US6924384B2 (en) 2002-01-08 2005-08-02 Silecs Oy Methods and compounds for making coatings, waveguides and other optical devices
WO2003059990A1 (en) 2002-01-17 2003-07-24 Silecs Oy Thin films and methods for the preparation thereof

Similar Documents

Publication Publication Date Title
JP2007530682A5 (https=)
JP5279703B2 (ja) 光及び/又は熱硬化性共重合体、硬化性樹脂組成物及び硬化物
JP2008133246A5 (https=)
JP2009543340A5 (https=)
JP2010031091A (ja) 硬化性共重合体及び硬化性樹脂組成物
JPWO2009078336A1 (ja) 感光性樹脂組成物
TW201239528A (en) Cured composition for nano-imprint, nano-imprint molding and method for forming pattern
KR20160123240A (ko) 나노 임프린트용 조성물 및 나노 임프린트 패턴 형성 방법
JP5449666B2 (ja) アルカリ可溶性樹脂及びその製造方法、並びにアルカリ可溶性樹脂を用いた感光性樹脂組成物、硬化物及びカラーフィルター
CN112646085B (zh) 一种基于双马来酰亚胺基树脂的光敏树脂组合物及其在405nm 3D打印中的应用
TW201413381A (zh) 光壓印用硬化性組成物、圖案形成方法、微細圖案以及半導體元件的製造方法
CN102174059A (zh) 含巯基的低倍多聚硅氧烷化合物及其紫外光刻胶组合物以及压印工艺
JP2020091464A5 (https=)
KR20130062258A (ko) 액정 소자를 제조하는 방법 및 액정 소자
CN106950800A (zh) 光敏组合物
JPWO2019156008A1 (ja) キット、インプリント用下層膜形成組成物、積層体、これらを用いた製造方法
JP5610046B2 (ja) 光導波路の製造方法及び光導波路
KR20150105378A (ko) 경화막 형성용 수지 조성물
JP2016134629A5 (https=)
CN1967383A (zh) 感光性树脂组合物
TWI753982B (zh) 負型感光性樹脂組成物
TWI717489B (zh) 層間絕緣膜形成用組成物、層間絕緣膜及層間絕緣膜圖型之形成方法及裝置
CN107957654A (zh) 一种用于大面积纳米压印的紫外光固化混杂体系压印胶
JP5075691B2 (ja) 光及び/又は熱硬化性共重合体、硬化性樹脂組成物及び硬化物
JP2010031272A (ja) 感光性樹脂組成物