JP2007530682A - 光学材料用化合物及び製造方法 - Google Patents

光学材料用化合物及び製造方法 Download PDF

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Publication number
JP2007530682A
JP2007530682A JP2007506249A JP2007506249A JP2007530682A JP 2007530682 A JP2007530682 A JP 2007530682A JP 2007506249 A JP2007506249 A JP 2007506249A JP 2007506249 A JP2007506249 A JP 2007506249A JP 2007530682 A JP2007530682 A JP 2007530682A
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group
polymer
monomer
electro
monocyclic
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JP2007506249A
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Japanese (ja)
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JP2007530682A5 (https=
Inventor
アーベン，クリストフ・ジョルジュ
ブレイタン，エリック・マイケル
亮 玉城
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General Electric Co
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General Electric Co
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Publication of JP2007530682A publication Critical patent/JP2007530682A/ja
Publication of JP2007530682A5 publication Critical patent/JP2007530682A5/ja
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/21—Cyclic compounds having at least one ring containing silicon, but no carbon in the ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F14/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
    • C08F14/18—Monomers containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Silicon Polymers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Liquid Crystal Substances (AREA)
  • Optical Integrated Circuits (AREA)
  • Fireproofing Substances (AREA)
JP2007506249A 2004-03-29 2005-03-23 光学材料用化合物及び製造方法 Pending JP2007530682A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/812,191 US7214475B2 (en) 2004-03-29 2004-03-29 Compound for optical materials and methods of fabrication
PCT/US2005/009656 WO2005097843A1 (en) 2004-03-29 2005-03-23 Compound for optical materials and methods of fabrication

Publications (2)

Publication Number Publication Date
JP2007530682A true JP2007530682A (ja) 2007-11-01
JP2007530682A5 JP2007530682A5 (https=) 2008-04-24

Family

ID=34963875

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007506249A Pending JP2007530682A (ja) 2004-03-29 2005-03-23 光学材料用化合物及び製造方法

Country Status (8)

Country Link
US (1) US7214475B2 (https=)
EP (1) EP1732937A1 (https=)
JP (1) JP2007530682A (https=)
KR (1) KR20060134133A (https=)
CN (1) CN1938342A (https=)
MY (1) MY139112A (https=)
TW (1) TW200609240A (https=)
WO (1) WO2005097843A1 (https=)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2008072765A1 (ja) * 2006-12-15 2010-04-02 チッソ株式会社 フッ素系重合体および樹脂組成物
CN114678339A (zh) * 2019-03-07 2022-06-28 爱玻索立克公司 封装基板以及半导体装置
US12198994B2 (en) 2019-03-12 2025-01-14 Absolics Inc. Packaging substrate and method for manufacturing same
US12456672B2 (en) 2019-03-12 2025-10-28 Absolics Inc. Packaging substrate having element group in cavity unit and semiconductor device comprising the same

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101840077B (zh) * 2005-02-16 2015-09-02 皇家飞利浦电子股份有限公司 发光物体及其应用
US8529993B2 (en) * 2006-05-01 2013-09-10 Zetta Research andDevelopment LLC—RPO Series Low volatility polymers for two-stage deposition processes
US20100304512A1 (en) * 2007-11-30 2010-12-02 University Of Toledo System for Diagnosis and Treatment of Photovoltaic and Other Semiconductor Devices
US8574944B2 (en) * 2008-03-28 2013-11-05 The University Of Toledo System for selectively filling pin holes, weak shunts and/or scribe lines in photovoltaic devices and photovoltaic cells made thereby
CN102382132A (zh) * 2010-08-30 2012-03-21 珠海市吉林大学无机合成与制备化学重点实验室 多孔硅氧烷有机骨架材料及其制备方法
US20120135165A1 (en) * 2010-11-29 2012-05-31 Yu-Hui Huang Antiglare and antiseptic coating material and touchscreen coated with the same
US20120177920A1 (en) * 2011-01-11 2012-07-12 Yu-Hui Huang Antiglare and antiseptic coating material and touchscreen coated with the same
US9731456B2 (en) 2013-03-14 2017-08-15 Sabic Global Technologies B.V. Method of manufacturing a functionally graded article
US10287398B2 (en) 2014-12-30 2019-05-14 Momentive Performance Materials Inc. Siloxane coordination polymers
EP3240807A4 (en) 2014-12-30 2018-08-08 Momentive Performance Materials Inc. Functionalized siloxane materials
JP7215904B2 (ja) * 2016-10-27 2023-01-31 Ｕｂｅ株式会社 ポリイミドおよびそれを用いたフレキシブルデバイス
US11572454B2 (en) 2017-02-08 2023-02-07 Architectural Solutions Ip, Llc Flame resistant material and resultant products
CN110734525B (zh) * 2018-07-18 2022-07-01 浙江省化工研究院有限公司 一种含氟笼型倍半硅氧烷改性聚三氟氯乙烯树脂
CN110606955B (zh) * 2019-08-12 2021-04-27 武汉华星光电半导体显示技术有限公司 一种硬化层聚合物薄膜和制备方法
WO2021229340A1 (en) * 2020-05-14 2021-11-18 3M Innovative Properties Company Fluorinated photoinitiators and fluorinated (co)polymer layers made using the same

Citations (3)

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Publication number Priority date Publication date Assignee Title
JPH0317088A (ja) * 1989-06-15 1991-01-25 Toshiba Silicone Co Ltd 有機ケイ素化合物
JPH0953015A (ja) * 1995-08-11 1997-02-25 Nitto Denko Corp 紫外線感光性含フッ素シリコーン組成物
JP2001226432A (ja) * 2000-02-16 2001-08-21 Shin Etsu Chem Co Ltd 高分子化合物、化学増幅レジスト材料及びパターン形成方法

Family Cites Families (9)

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US5292620A (en) 1988-01-15 1994-03-08 E. I. Du Pont De Nemours And Company Optical waveguide devices, elements for making the devices and methods of making the devices and elements
US5023380A (en) 1989-06-09 1991-06-11 The Dow Chemical Company Perfluorovinyl compounds
US20030176718A1 (en) 2002-01-08 2003-09-18 Rantala Juha T. Methods and compounds for making coatings, waveguides and other optical devices
AU2003201736A1 (en) 2002-01-08 2003-07-24 Silecs, Inc. Materials and methods for forming hybrid organic-inorganic dielectric materials
US6803476B2 (en) 2002-01-08 2004-10-12 Silecs Oy Methods and compounds for making coatings, waveguides and other optical devices
US6831189B2 (en) 2002-01-08 2004-12-14 Silecs Oy Methods and compounds for making coatings, waveguides and other optical devices
US20030171607A1 (en) 2002-01-08 2003-09-11 Rantala Juha T. Methods and compounds for making coatings, waveguides and other optical devices
US6924384B2 (en) 2002-01-08 2005-08-02 Silecs Oy Methods and compounds for making coatings, waveguides and other optical devices
WO2003059990A1 (en) 2002-01-17 2003-07-24 Silecs Oy Thin films and methods for the preparation thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0317088A (ja) * 1989-06-15 1991-01-25 Toshiba Silicone Co Ltd 有機ケイ素化合物
JPH0953015A (ja) * 1995-08-11 1997-02-25 Nitto Denko Corp 紫外線感光性含フッ素シリコーン組成物
JP2001226432A (ja) * 2000-02-16 2001-08-21 Shin Etsu Chem Co Ltd 高分子化合物、化学増幅レジスト材料及びパターン形成方法

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
LIU, MACROMOLECULES, vol. V33 N10, JPN5007005240, 2000, pages 3514 - 3517, ISSN: 0001896437 *
WENSHENG ZHOU ET AL.: "Perfluorocyclobutyl (PFCB) copolymers containing polyhedral oligomeric silsesquioxanes (POSS) for po", POLYMER PREPRINTS, vol. 44, no. 1, JPN6011019389, 2003, pages 923, XP009111257, ISSN: 0001896438 *

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2008072765A1 (ja) * 2006-12-15 2010-04-02 チッソ株式会社 フッ素系重合体および樹脂組成物
CN114678339A (zh) * 2019-03-07 2022-06-28 爱玻索立克公司 封装基板以及半导体装置
JP2023113866A (ja) * 2019-03-07 2023-08-16 アブソリックス インコーポレイテッド パッケージング基板及びこれを含む半導体装置
US12165979B2 (en) 2019-03-07 2024-12-10 Absolics Inc. Packaging substrate and semiconductor apparatus comprising same
JP7685011B2 (ja) 2019-03-07 2025-05-28 アブソリックス インコーポレイテッド パッケージング基板及びこれを含む半導体装置
US12198994B2 (en) 2019-03-12 2025-01-14 Absolics Inc. Packaging substrate and method for manufacturing same
US12456672B2 (en) 2019-03-12 2025-10-28 Absolics Inc. Packaging substrate having element group in cavity unit and semiconductor device comprising the same

Also Published As

Publication number Publication date
WO2005097843A1 (en) 2005-10-20
TW200609240A (en) 2006-03-16
US20050214479A1 (en) 2005-09-29
MY139112A (en) 2009-08-28
KR20060134133A (ko) 2006-12-27
US7214475B2 (en) 2007-05-08
CN1938342A (zh) 2007-03-28
WO2005097843A8 (en) 2006-10-05
EP1732937A1 (en) 2006-12-20

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