JP2007529623A - 硫化物膜の真空堆積中における酸素及び水の除去（ゲッタリング）方法 - Google Patents

硫化物膜の真空堆積中における酸素及び水の除去（ゲッタリング）方法 Download PDF

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JP2007529623A
JP2007529623A JP2007503159A JP2007503159A JP2007529623A JP 2007529623 A JP2007529623 A JP 2007529623A JP 2007503159 A JP2007503159 A JP 2007503159A JP 2007503159 A JP2007503159 A JP 2007503159A JP 2007529623 A JP2007529623 A JP 2007529623A
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Japan
Prior art keywords
deposition
species
getter
phosphor
deposition chamber
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JP2007503159A
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Japanese (ja)
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JP2007529623A5 (https=
Inventor
ダン・デウォン・チョン
ポール・バリー・デル・ベル・ベルズ
スティーブン・チャールズ・クール
アブドゥル・エム・ナクア
ジェームズ・アレクサンダー・ロバート・スタイルズ
ヨン−セォン・イ
テリー・ハント
ヴィンセント・ジョセフ・アルフレッド・プグリエセ
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アイファイアー・テクノロジー・コープ
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Publication of JP2007529623A publication Critical patent/JP2007529623A/ja
Publication of JP2007529623A5 publication Critical patent/JP2007529623A5/ja
Withdrawn legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0623—Sulfides, selenides or tellurides

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Luminescent Compositions (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
JP2007503159A 2004-03-15 2005-03-15 硫化物膜の真空堆積中における酸素及び水の除去（ゲッタリング）方法 Withdrawn JP2007529623A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US55271704P 2004-03-15 2004-03-15
PCT/CA2005/000386 WO2005087971A1 (en) 2004-03-15 2005-03-15 Method for gettering oxygen and water during vacuum deposition of sulfide films

Publications (2)

Publication Number Publication Date
JP2007529623A true JP2007529623A (ja) 2007-10-25
JP2007529623A5 JP2007529623A5 (https=) 2008-05-01

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ID=34975608

Family Applications (1)

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JP2007503159A Withdrawn JP2007529623A (ja) 2004-03-15 2005-03-15 硫化物膜の真空堆積中における酸素及び水の除去（ゲッタリング）方法

Country Status (6)

Country Link
US (1) US8057856B2 (https=)
JP (1) JP2007529623A (https=)
CN (1) CN1938448A (https=)
CA (1) CA2554817A1 (https=)
TW (1) TW200602505A (https=)
WO (1) WO2005087971A1 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007526602A (ja) 2004-03-04 2007-09-13 アイファイアー・テクノロジー・コープ チオアルミネート発光体に対する反応性金属供給源及び堆積方法
CN100581309C (zh) * 2004-04-27 2010-01-13 富士胶片株式会社 有机电致发光元件及其制造方法
US20060269656A1 (en) * 2005-05-26 2006-11-30 Eastman Kodak Company Reducing contamination in OLED processing systems
DE202009003677U1 (de) * 2009-03-17 2010-04-29 Porextherm-Dämmstoffe Gmbh Indikator zum Nachweis des Eindringens von Luft- und/oder Feuchte in eine Vakuum-, Druck- oder Schutzgasverpackung
EP2360289A1 (de) * 2010-02-23 2011-08-24 Saint-Gobain Glass France Vorrichtung und Verfahren zum Abscheiden einer aus mindestens zwei Komponenten bestehenden Schicht auf einem Gegenstand
HK1215127A2 (zh) * 2015-06-17 2016-08-12 Master Dynamic Limited 制品涂层的设备、仪器和工艺
US11519095B2 (en) * 2019-04-22 2022-12-06 Peng DU MBE system with direct evaporation pump to cold panel
CN117535632A (zh) * 2020-04-01 2024-02-09 佳能安内华股份有限公司 成膜设备、控制设备以及成膜方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL132102C (https=) 1965-02-25 1900-01-01
US4022939A (en) 1975-12-18 1977-05-10 Western Electric Company, Inc. Synchronous shielding in vacuum deposition system
US4118542A (en) 1977-01-17 1978-10-03 Wall Colmonoy Corporation Controlled atmosphere and vacuum processes
US5432015A (en) 1992-05-08 1995-07-11 Westaim Technologies, Inc. Electroluminescent laminate with thick film dielectric
US5508586A (en) 1993-06-17 1996-04-16 Saes Getters S.P.A. Integrated getter device suitable for flat displays
EP0656430B2 (en) 1993-11-09 2000-01-12 Galileo Vacuum Systems S.R.L. Process and apparatus for the codeposition of metallic oxides on plastic films.
JPH07138739A (ja) * 1993-11-11 1995-05-30 Sony Corp 真空蒸着装置
BR9707403A (pt) 1996-02-09 1999-04-06 Getters Spa Combinação de materiais para a partida em baixa temperatura da ativação de materiais absorventes metálicos e dispositivos absorventes metálicos que contêm os mesmos
US5976900A (en) 1997-12-08 1999-11-02 Cypress Semiconductor Corp. Method of reducing impurity contamination in semiconductor process chambers
IT1297013B1 (it) 1997-12-23 1999-08-03 Getters Spa Sistema getter per la purificazione dell'atmosfera di lavoro nei processi di deposizione fisica da vapore
US6077404A (en) 1998-02-17 2000-06-20 Applied Material, Inc. Reflow chamber and process
US6241477B1 (en) * 1999-08-25 2001-06-05 Applied Materials, Inc. In-situ getter in process cavity of processing chamber
US6586878B1 (en) 1999-12-16 2003-07-01 Koninklijke Philips Electronics N.V. Metal halide lamp with improved getter orientation
US20020122895A1 (en) 2000-09-14 2002-09-05 Cheong Dan Daeweon Magnesium barium thioaluminate and related phosphor materials
US6610352B2 (en) * 2000-12-22 2003-08-26 Ifire Technology, Inc. Multiple source deposition process
US6447654B1 (en) 2001-05-29 2002-09-10 Ifire Technology Inc. Single source sputtering of thioaluminate phosphor films
CN1561405A (zh) * 2001-09-27 2005-01-05 纳幕尔杜邦公司 用于溅射淀积的双源单腔的方法和设备
US6897474B2 (en) * 2002-04-12 2005-05-24 Universal Display Corporation Protected organic electronic devices and methods for making the same
TW200420740A (en) * 2003-01-30 2004-10-16 Ifire Technology Inc Controlled sulfur species deposition process

Also Published As

Publication number Publication date
US20050227005A1 (en) 2005-10-13
CA2554817A1 (en) 2005-09-22
US8057856B2 (en) 2011-11-15
CN1938448A (zh) 2007-03-28
TW200602505A (en) 2006-01-16
WO2005087971A1 (en) 2005-09-22

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