JP2007529623A5 - - Google Patents
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- Publication number
- JP2007529623A5 JP2007529623A5 JP2007503159A JP2007503159A JP2007529623A5 JP 2007529623 A5 JP2007529623 A5 JP 2007529623A5 JP 2007503159 A JP2007503159 A JP 2007503159A JP 2007503159 A JP2007503159 A JP 2007503159A JP 2007529623 A5 JP2007529623 A5 JP 2007529623A5
- Authority
- JP
- Japan
- Prior art keywords
- deposition
- species
- deposition chamber
- composition
- phosphor film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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- 238000000151 deposition Methods 0.000 claims 18
- 230000008021 deposition Effects 0.000 claims 17
- 238000000034 method Methods 0.000 claims 14
- 239000000203 mixture Substances 0.000 claims 11
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 8
- 239000010408 film Substances 0.000 claims 7
- 238000001704 evaporation Methods 0.000 claims 5
- 239000000758 substrate Substances 0.000 claims 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 3
- 229910052760 oxygen Inorganic materials 0.000 claims 3
- 239000001301 oxygen Substances 0.000 claims 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 claims 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims 2
- 230000008020 evaporation Effects 0.000 claims 2
- 230000000737 periodic effect Effects 0.000 claims 2
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical compound S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 claims 2
- 239000010409 thin film Substances 0.000 claims 2
- 229910052719 titanium Inorganic materials 0.000 claims 2
- 239000010936 titanium Substances 0.000 claims 2
- 229910000838 Al alloy Inorganic materials 0.000 claims 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims 1
- COHCXWLRUISKOO-UHFFFAOYSA-N [AlH3].[Ba] Chemical compound [AlH3].[Ba] COHCXWLRUISKOO-UHFFFAOYSA-N 0.000 claims 1
- 229910045601 alloy Inorganic materials 0.000 claims 1
- 239000000956 alloy Substances 0.000 claims 1
- 229910002092 carbon dioxide Inorganic materials 0.000 claims 1
- 239000001569 carbon dioxide Substances 0.000 claims 1
- 229910002091 carbon monoxide Inorganic materials 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 150000004763 sulfides Chemical class 0.000 claims 1
- 229910052717 sulfur Inorganic materials 0.000 claims 1
- 239000011593 sulfur Substances 0.000 claims 1
- 239000002344 surface layer Substances 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US55271704P | 2004-03-15 | 2004-03-15 | |
| PCT/CA2005/000386 WO2005087971A1 (en) | 2004-03-15 | 2005-03-15 | Method for gettering oxygen and water during vacuum deposition of sulfide films |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007529623A JP2007529623A (ja) | 2007-10-25 |
| JP2007529623A5 true JP2007529623A5 (https=) | 2008-05-01 |
Family
ID=34975608
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007503159A Withdrawn JP2007529623A (ja) | 2004-03-15 | 2005-03-15 | 硫化物膜の真空堆積中における酸素及び水の除去（ゲッタリング）方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8057856B2 (https=) |
| JP (1) | JP2007529623A (https=) |
| CN (1) | CN1938448A (https=) |
| CA (1) | CA2554817A1 (https=) |
| TW (1) | TW200602505A (https=) |
| WO (1) | WO2005087971A1 (https=) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007526602A (ja) | 2004-03-04 | 2007-09-13 | アイファイアー・テクノロジー・コープ | チオアルミネート発光体に対する反応性金属供給源及び堆積方法 |
| CN100581309C (zh) * | 2004-04-27 | 2010-01-13 | 富士胶片株式会社 | 有机电致发光元件及其制造方法 |
| US20060269656A1 (en) * | 2005-05-26 | 2006-11-30 | Eastman Kodak Company | Reducing contamination in OLED processing systems |
| DE202009003677U1 (de) * | 2009-03-17 | 2010-04-29 | Porextherm-Dämmstoffe Gmbh | Indikator zum Nachweis des Eindringens von Luft- und/oder Feuchte in eine Vakuum-, Druck- oder Schutzgasverpackung |
| EP2360289A1 (de) * | 2010-02-23 | 2011-08-24 | Saint-Gobain Glass France | Vorrichtung und Verfahren zum Abscheiden einer aus mindestens zwei Komponenten bestehenden Schicht auf einem Gegenstand |
| HK1215127A2 (zh) * | 2015-06-17 | 2016-08-12 | Master Dynamic Limited | 制品涂层的设备、仪器和工艺 |
| US11519095B2 (en) * | 2019-04-22 | 2022-12-06 | Peng DU | MBE system with direct evaporation pump to cold panel |
| CN117535632A (zh) * | 2020-04-01 | 2024-02-09 | 佳能安内华股份有限公司 | 成膜设备、控制设备以及成膜方法 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL132102C (https=) | 1965-02-25 | 1900-01-01 | ||
| US4022939A (en) | 1975-12-18 | 1977-05-10 | Western Electric Company, Inc. | Synchronous shielding in vacuum deposition system |
| US4118542A (en) | 1977-01-17 | 1978-10-03 | Wall Colmonoy Corporation | Controlled atmosphere and vacuum processes |
| US5432015A (en) | 1992-05-08 | 1995-07-11 | Westaim Technologies, Inc. | Electroluminescent laminate with thick film dielectric |
| US5508586A (en) | 1993-06-17 | 1996-04-16 | Saes Getters S.P.A. | Integrated getter device suitable for flat displays |
| EP0656430B2 (en) | 1993-11-09 | 2000-01-12 | Galileo Vacuum Systems S.R.L. | Process and apparatus for the codeposition of metallic oxides on plastic films. |
| JPH07138739A (ja) * | 1993-11-11 | 1995-05-30 | Sony Corp | 真空蒸着装置 |
| BR9707403A (pt) | 1996-02-09 | 1999-04-06 | Getters Spa | Combinação de materiais para a partida em baixa temperatura da ativação de materiais absorventes metálicos e dispositivos absorventes metálicos que contêm os mesmos |
| US5976900A (en) | 1997-12-08 | 1999-11-02 | Cypress Semiconductor Corp. | Method of reducing impurity contamination in semiconductor process chambers |
| IT1297013B1 (it) | 1997-12-23 | 1999-08-03 | Getters Spa | Sistema getter per la purificazione dell'atmosfera di lavoro nei processi di deposizione fisica da vapore |
| US6077404A (en) | 1998-02-17 | 2000-06-20 | Applied Material, Inc. | Reflow chamber and process |
| US6241477B1 (en) * | 1999-08-25 | 2001-06-05 | Applied Materials, Inc. | In-situ getter in process cavity of processing chamber |
| US6586878B1 (en) | 1999-12-16 | 2003-07-01 | Koninklijke Philips Electronics N.V. | Metal halide lamp with improved getter orientation |
| US20020122895A1 (en) | 2000-09-14 | 2002-09-05 | Cheong Dan Daeweon | Magnesium barium thioaluminate and related phosphor materials |
| US6610352B2 (en) * | 2000-12-22 | 2003-08-26 | Ifire Technology, Inc. | Multiple source deposition process |
| US6447654B1 (en) | 2001-05-29 | 2002-09-10 | Ifire Technology Inc. | Single source sputtering of thioaluminate phosphor films |
| CN1561405A (zh) * | 2001-09-27 | 2005-01-05 | 纳幕尔杜邦公司 | 用于溅射淀积的双源单腔的方法和设备 |
| US6897474B2 (en) * | 2002-04-12 | 2005-05-24 | Universal Display Corporation | Protected organic electronic devices and methods for making the same |
| TW200420740A (en) * | 2003-01-30 | 2004-10-16 | Ifire Technology Inc | Controlled sulfur species deposition process |
-
2005
- 2005-03-10 US US11/077,343 patent/US8057856B2/en not_active Expired - Fee Related
- 2005-03-14 TW TW094107734A patent/TW200602505A/zh unknown
- 2005-03-15 WO PCT/CA2005/000386 patent/WO2005087971A1/en not_active Ceased
- 2005-03-15 JP JP2007503159A patent/JP2007529623A/ja not_active Withdrawn
- 2005-03-15 CA CA002554817A patent/CA2554817A1/en not_active Abandoned
- 2005-03-15 CN CNA200580008280XA patent/CN1938448A/zh active Pending
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