TW200602505A - Method for gettering oxygen and water during vacuum deposition of sulfide films - Google Patents

Method for gettering oxygen and water during vacuum deposition of sulfide films

Info

Publication number
TW200602505A
TW200602505A TW094107734A TW94107734A TW200602505A TW 200602505 A TW200602505 A TW 200602505A TW 094107734 A TW094107734 A TW 094107734A TW 94107734 A TW94107734 A TW 94107734A TW 200602505 A TW200602505 A TW 200602505A
Authority
TW
Taiwan
Prior art keywords
deposition
vacuum deposition
water during
phosphor
during vacuum
Prior art date
Application number
TW094107734A
Other languages
English (en)
Chinese (zh)
Inventor
Dan Daeweon Cheong
Paul Barry Del Bel Belluz
Stephen Charles Cool
Abdul M Nakua
James Alexander Robert Stiles
Yong-Seon Lee
Terry Hunt
Vincent Joseph Alfred Pugliese
Original Assignee
Ifire Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ifire Technology Corp filed Critical Ifire Technology Corp
Publication of TW200602505A publication Critical patent/TW200602505A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0623—Sulfides, selenides or tellurides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Luminescent Compositions (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
TW094107734A 2004-03-15 2005-03-14 Method for gettering oxygen and water during vacuum deposition of sulfide films TW200602505A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US55271704P 2004-03-15 2004-03-15

Publications (1)

Publication Number Publication Date
TW200602505A true TW200602505A (en) 2006-01-16

Family

ID=34975608

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094107734A TW200602505A (en) 2004-03-15 2005-03-14 Method for gettering oxygen and water during vacuum deposition of sulfide films

Country Status (6)

Country Link
US (1) US8057856B2 (https=)
JP (1) JP2007529623A (https=)
CN (1) CN1938448A (https=)
CA (1) CA2554817A1 (https=)
TW (1) TW200602505A (https=)
WO (1) WO2005087971A1 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007526602A (ja) 2004-03-04 2007-09-13 アイファイアー・テクノロジー・コープ チオアルミネート発光体に対する反応性金属供給源及び堆積方法
CN100581309C (zh) * 2004-04-27 2010-01-13 富士胶片株式会社 有机电致发光元件及其制造方法
US20060269656A1 (en) * 2005-05-26 2006-11-30 Eastman Kodak Company Reducing contamination in OLED processing systems
DE202009003677U1 (de) * 2009-03-17 2010-04-29 Porextherm-Dämmstoffe Gmbh Indikator zum Nachweis des Eindringens von Luft- und/oder Feuchte in eine Vakuum-, Druck- oder Schutzgasverpackung
EP2360289A1 (de) * 2010-02-23 2011-08-24 Saint-Gobain Glass France Vorrichtung und Verfahren zum Abscheiden einer aus mindestens zwei Komponenten bestehenden Schicht auf einem Gegenstand
HK1215127A2 (zh) * 2015-06-17 2016-08-12 Master Dynamic Limited 制品涂层的设备、仪器和工艺
US11519095B2 (en) * 2019-04-22 2022-12-06 Peng DU MBE system with direct evaporation pump to cold panel
CN117535632A (zh) * 2020-04-01 2024-02-09 佳能安内华股份有限公司 成膜设备、控制设备以及成膜方法

Family Cites Families (19)

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NL132102C (https=) 1965-02-25 1900-01-01
US4022939A (en) 1975-12-18 1977-05-10 Western Electric Company, Inc. Synchronous shielding in vacuum deposition system
US4118542A (en) 1977-01-17 1978-10-03 Wall Colmonoy Corporation Controlled atmosphere and vacuum processes
US5432015A (en) 1992-05-08 1995-07-11 Westaim Technologies, Inc. Electroluminescent laminate with thick film dielectric
US5508586A (en) 1993-06-17 1996-04-16 Saes Getters S.P.A. Integrated getter device suitable for flat displays
EP0656430B2 (en) 1993-11-09 2000-01-12 Galileo Vacuum Systems S.R.L. Process and apparatus for the codeposition of metallic oxides on plastic films.
JPH07138739A (ja) * 1993-11-11 1995-05-30 Sony Corp 真空蒸着装置
BR9707403A (pt) 1996-02-09 1999-04-06 Getters Spa Combinação de materiais para a partida em baixa temperatura da ativação de materiais absorventes metálicos e dispositivos absorventes metálicos que contêm os mesmos
US5976900A (en) 1997-12-08 1999-11-02 Cypress Semiconductor Corp. Method of reducing impurity contamination in semiconductor process chambers
IT1297013B1 (it) 1997-12-23 1999-08-03 Getters Spa Sistema getter per la purificazione dell'atmosfera di lavoro nei processi di deposizione fisica da vapore
US6077404A (en) 1998-02-17 2000-06-20 Applied Material, Inc. Reflow chamber and process
US6241477B1 (en) * 1999-08-25 2001-06-05 Applied Materials, Inc. In-situ getter in process cavity of processing chamber
US6586878B1 (en) 1999-12-16 2003-07-01 Koninklijke Philips Electronics N.V. Metal halide lamp with improved getter orientation
US20020122895A1 (en) 2000-09-14 2002-09-05 Cheong Dan Daeweon Magnesium barium thioaluminate and related phosphor materials
US6610352B2 (en) * 2000-12-22 2003-08-26 Ifire Technology, Inc. Multiple source deposition process
US6447654B1 (en) 2001-05-29 2002-09-10 Ifire Technology Inc. Single source sputtering of thioaluminate phosphor films
CN1561405A (zh) * 2001-09-27 2005-01-05 纳幕尔杜邦公司 用于溅射淀积的双源单腔的方法和设备
US6897474B2 (en) * 2002-04-12 2005-05-24 Universal Display Corporation Protected organic electronic devices and methods for making the same
TW200420740A (en) * 2003-01-30 2004-10-16 Ifire Technology Inc Controlled sulfur species deposition process

Also Published As

Publication number Publication date
US20050227005A1 (en) 2005-10-13
JP2007529623A (ja) 2007-10-25
CA2554817A1 (en) 2005-09-22
US8057856B2 (en) 2011-11-15
CN1938448A (zh) 2007-03-28
WO2005087971A1 (en) 2005-09-22

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