IT1297013B1 - Sistema getter per la purificazione dell'atmosfera di lavoro nei processi di deposizione fisica da vapore - Google Patents

Sistema getter per la purificazione dell'atmosfera di lavoro nei processi di deposizione fisica da vapore

Info

Publication number
IT1297013B1
IT1297013B1 IT97MI002862A ITMI972862A IT1297013B1 IT 1297013 B1 IT1297013 B1 IT 1297013B1 IT 97MI002862 A IT97MI002862 A IT 97MI002862A IT MI972862 A ITMI972862 A IT MI972862A IT 1297013 B1 IT1297013 B1 IT 1297013B1
Authority
IT
Italy
Prior art keywords
purification
deposition processes
working atmosphere
getter system
steam deposition
Prior art date
Application number
IT97MI002862A
Other languages
English (en)
Inventor
Andrea Conte
Francesco Mazza
Original Assignee
Getters Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Getters Spa filed Critical Getters Spa
Priority to IT97MI002862A priority Critical patent/IT1297013B1/it
Priority to SG1998004873A priority patent/SG65098A1/en
Priority to CA002254515A priority patent/CA2254515A1/en
Priority to EP98830740A priority patent/EP0926258B1/en
Priority to DE69812305T priority patent/DE69812305T2/de
Priority to CNB981253563A priority patent/CN1177080C/zh
Priority to RU98123573/02A priority patent/RU2211882C2/ru
Priority to US09/218,941 priority patent/US6299746B1/en
Priority to JP36435398A priority patent/JP4331294B2/ja
Priority to KR1019980057037A priority patent/KR100523955B1/ko
Publication of ITMI972862A1 publication Critical patent/ITMI972862A1/it
Application granted granted Critical
Publication of IT1297013B1 publication Critical patent/IT1297013B1/it
Priority to US09/546,122 priority patent/US6508632B1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32853—Hygiene
    • H01J37/32871—Means for trapping or directing unwanted particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
    • H01J7/14—Means for obtaining or maintaining the desired pressure within the vessel
    • H01J7/18—Means for absorbing or adsorbing gas, e.g. by gettering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
IT97MI002862A 1997-12-23 1997-12-23 Sistema getter per la purificazione dell'atmosfera di lavoro nei processi di deposizione fisica da vapore IT1297013B1 (it)

Priority Applications (11)

Application Number Priority Date Filing Date Title
IT97MI002862A IT1297013B1 (it) 1997-12-23 1997-12-23 Sistema getter per la purificazione dell'atmosfera di lavoro nei processi di deposizione fisica da vapore
SG1998004873A SG65098A1 (en) 1997-12-23 1998-11-19 Getter system for purifying the work atmosphere in the processes of physical vapor deposition
CA002254515A CA2254515A1 (en) 1997-12-23 1998-11-26 Getter system for purifying the work atmosphere in the processes of physical vapor deposition
DE69812305T DE69812305T2 (de) 1997-12-23 1998-12-09 Getter-System zur Behandlungsatmosphäre-Reinigung in physikalischen Dampfphasenabscheidungs-Verfahren
EP98830740A EP0926258B1 (en) 1997-12-23 1998-12-09 Getter system for purifying the working atmosphere in physical vapor deposition processes
CNB981253563A CN1177080C (zh) 1997-12-23 1998-12-18 纯化物理气相沉积过程中工作气氛的吸气系统
RU98123573/02A RU2211882C2 (ru) 1997-12-23 1998-12-22 Геттерная система для очистки газовой рабочей атмосферы в процессах физического осаждения из паровой фазы
US09/218,941 US6299746B1 (en) 1997-12-23 1998-12-22 Getter system for purifying the confinement volume in process chambers
JP36435398A JP4331294B2 (ja) 1997-12-23 1998-12-22 物理的蒸着プロセスにおける作業雰囲気を高純度化するためのゲッタシステム
KR1019980057037A KR100523955B1 (ko) 1997-12-23 1998-12-22 물리증착의공정에서의작업분위기를정화하기위한게터시스템
US09/546,122 US6508632B1 (en) 1997-12-23 2000-04-10 Getter system for purifying the confinement volume in process chambers

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT97MI002862A IT1297013B1 (it) 1997-12-23 1997-12-23 Sistema getter per la purificazione dell'atmosfera di lavoro nei processi di deposizione fisica da vapore
US09/218,941 US6299746B1 (en) 1997-12-23 1998-12-22 Getter system for purifying the confinement volume in process chambers

Publications (2)

Publication Number Publication Date
ITMI972862A1 ITMI972862A1 (it) 1999-06-23
IT1297013B1 true IT1297013B1 (it) 1999-08-03

Family

ID=26331555

Family Applications (1)

Application Number Title Priority Date Filing Date
IT97MI002862A IT1297013B1 (it) 1997-12-23 1997-12-23 Sistema getter per la purificazione dell'atmosfera di lavoro nei processi di deposizione fisica da vapore

Country Status (6)

Country Link
US (2) US6299746B1 (it)
EP (1) EP0926258B1 (it)
JP (1) JP4331294B2 (it)
CN (1) CN1177080C (it)
IT (1) IT1297013B1 (it)
SG (1) SG65098A1 (it)

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IT1297013B1 (it) * 1997-12-23 1999-08-03 Getters Spa Sistema getter per la purificazione dell'atmosfera di lavoro nei processi di deposizione fisica da vapore
IT1312248B1 (it) * 1999-04-12 2002-04-09 Getters Spa Metodo per aumentare la produttivita' di processi di deposizione distrati sottili su un substrato e dispositivi getter per la
JP4827294B2 (ja) * 1999-11-29 2011-11-30 株式会社半導体エネルギー研究所 成膜装置及び発光装置の作製方法
TW490714B (en) * 1999-12-27 2002-06-11 Semiconductor Energy Lab Film formation apparatus and method for forming a film
US20020011205A1 (en) 2000-05-02 2002-01-31 Shunpei Yamazaki Film-forming apparatus, method of cleaning the same, and method of manufacturing a light-emitting device
US7517551B2 (en) * 2000-05-12 2009-04-14 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a light-emitting device
IT1317951B1 (it) * 2000-05-30 2003-07-21 Getters Spa Leghe getter non evaporabili
IT1317981B1 (it) * 2000-06-16 2003-07-21 Getters Spa Dispositivi assorbitori di umidita' per amplificatori laser e processo per la loro produzione.
KR100408405B1 (ko) * 2001-05-03 2003-12-06 삼성전자주식회사 반도체 소자의 제조 장치
KR100415615B1 (ko) * 2001-06-13 2004-01-24 엘지전자 주식회사 게터 조성물 및 이를 이용한 전계방출표시소자
SG113448A1 (en) * 2002-02-25 2005-08-29 Semiconductor Energy Lab Fabrication system and a fabrication method of a light emitting device
DE10209423A1 (de) 2002-03-05 2003-09-18 Schwerionenforsch Gmbh Beschichtung aus einer Gettermetall-Legierung sowie Anordnung und Verfahren zur Herstellung derselben
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ITMI20042271A1 (it) * 2004-11-23 2005-02-23 Getters Spa Leghe getter non evaporabili per assorbimento di idrogeno
CN100437899C (zh) * 2006-01-27 2008-11-26 台湾积体电路制造股份有限公司 减少制程环境内的杂质的装置及其方法
JP2008127615A (ja) * 2006-11-20 2008-06-05 Fujitsu Ltd 薄膜形成方法、薄膜形成装置および積層膜
JP5194534B2 (ja) * 2007-04-18 2013-05-08 パナソニック株式会社 真空処理装置
US8709160B2 (en) * 2008-08-22 2014-04-29 United Technologies Corporation Deposition apparatus having thermal hood
ES2582573T3 (es) 2008-09-30 2016-09-13 The Procter & Gamble Company Composiciones limpiadoras líquidas de superficies duras
EP2328999A1 (en) 2008-09-30 2011-06-08 The Procter & Gamble Company Liquid hard surface cleaning composition
EP2328998A1 (en) 2008-09-30 2011-06-08 The Procter & Gamble Company Liquid hard surface cleaning composition
JP2010106290A (ja) * 2008-10-28 2010-05-13 Showa Denko Kk 成膜装置および成膜方法、磁気記録媒体、磁気記録再生装置
US20100307170A1 (en) * 2009-06-08 2010-12-09 Gregory Dean Kendra Cryogenically treated wooden baseball bat
ES2444618T3 (es) 2009-12-22 2014-02-26 The Procter & Gamble Company Composición limpiadora y/o de lavado líquida
WO2011087748A1 (en) 2009-12-22 2011-07-21 The Procter & Gamble Company Liquid cleaning and/or cleansing composition
EP2360289A1 (de) 2010-02-23 2011-08-24 Saint-Gobain Glass France Vorrichtung und Verfahren zum Abscheiden einer aus mindestens zwei Komponenten bestehenden Schicht auf einem Gegenstand
WO2011133438A1 (en) 2010-04-21 2011-10-27 The Procter & Gamble Company Liquid cleaning and/or cleansing composition
EP2431453B1 (en) 2010-09-21 2019-06-19 The Procter & Gamble Company Liquid cleaning and/or cleansing composition
EP2431452B1 (en) 2010-09-21 2015-07-08 The Procter & Gamble Company Liquid cleaning composition
EP2431451A1 (en) 2010-09-21 2012-03-21 The Procter & Gamble Company Liquid detergent composition with abrasive particles
US8852643B2 (en) 2011-06-20 2014-10-07 The Procter & Gamble Company Liquid cleaning and/or cleansing composition
CN103717726A (zh) 2011-06-20 2014-04-09 宝洁公司 液体清洁和/或净化组合物
EP2721134A1 (en) 2011-06-20 2014-04-23 The Procter and Gamble Company Liquid cleaning and/or cleansing composition
EP2537917A1 (en) 2011-06-20 2012-12-26 The Procter & Gamble Company Liquid detergent composition with abrasive particles
ITMI20120144A1 (it) * 2012-02-03 2013-08-04 Getters Spa Miglioramenti per tubi ricevitori di collettori solari
ITMI20121732A1 (it) 2012-10-15 2014-04-16 Getters Spa Pompa getter
EP2719752B1 (en) 2012-10-15 2016-03-16 The Procter and Gamble Company Liquid detergent composition with abrasive particles
US9581042B2 (en) 2012-10-30 2017-02-28 United Technologies Corporation Composite article having metal-containing layer with phase-specific seed particles and method therefor
JP6095586B2 (ja) * 2013-01-25 2017-03-15 有限会社真空実験室 ゲッター部材収納具、ゲッター装置及びゲッターポンプ
EP2808379A1 (en) * 2013-05-29 2014-12-03 The Procter & Gamble Company Liquid cleaning and/or cleansing composition
US20140352721A1 (en) * 2013-05-29 2014-12-04 The Procter & Gamble Company Liquid cleaning and/or cleansing composition
TWI660125B (zh) * 2014-04-03 2019-05-21 義大利商沙斯格特斯公司 吸氣泵
US10229803B2 (en) * 2015-08-09 2019-03-12 Microsemi Corporation High voltage relay systems and methods
US9717674B1 (en) 2016-04-06 2017-08-01 The Procter & Gamble Company Skin cleansing compositions comprising biodegradable abrasive particles
ITUA20163861A1 (it) * 2016-05-27 2017-11-27 Getters Spa Non-evaporable getter alloys particularly suitable for hydrogen and carbon monoxide sorption
US10806692B2 (en) 2016-10-03 2020-10-20 The Procter & Gamble Company Skin cleansing compositions comprising color stable abrasive particles
CN106571281A (zh) * 2016-11-04 2017-04-19 北京有色金属研究总院 一种新型气体吸收元件的批量化制备方法
US10661223B2 (en) * 2017-06-02 2020-05-26 Applied Materials, Inc. Anneal chamber with getter
CN109225119A (zh) * 2018-10-11 2019-01-18 南京恩瑞科技有限公司 一种锆类非蒸散型吸气剂的制备方法
US20210154738A1 (en) * 2019-11-22 2021-05-27 Markforged, Inc. Getter device for sintering additively manufactured parts
CN112626460A (zh) * 2020-11-23 2021-04-09 上海晶维材料科技有限公司 一种高性能Ti-Co-RE靶材及大吸气量薄膜吸气剂制备的方法
GB202103659D0 (en) * 2021-03-17 2021-04-28 Johnson Matthey Plc Getter activation and use

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Also Published As

Publication number Publication date
ITMI972862A1 (it) 1999-06-23
EP0926258A2 (en) 1999-06-30
JP4331294B2 (ja) 2009-09-16
US6508632B1 (en) 2003-01-21
CN1221042A (zh) 1999-06-30
CN1177080C (zh) 2004-11-24
EP0926258B1 (en) 2003-03-19
EP0926258A3 (en) 2001-05-16
JPH11324915A (ja) 1999-11-26
US6299746B1 (en) 2001-10-09
SG65098A1 (en) 2000-05-23

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