IT1312248B1 - Metodo per aumentare la produttivita' di processi di deposizione distrati sottili su un substrato e dispositivi getter per la - Google Patents

Metodo per aumentare la produttivita' di processi di deposizione distrati sottili su un substrato e dispositivi getter per la

Info

Publication number
IT1312248B1
IT1312248B1 IT1999MI000744A ITMI990744A IT1312248B1 IT 1312248 B1 IT1312248 B1 IT 1312248B1 IT 1999MI000744 A IT1999MI000744 A IT 1999MI000744A IT MI990744 A ITMI990744 A IT MI990744A IT 1312248 B1 IT1312248 B1 IT 1312248B1
Authority
IT
Italy
Prior art keywords
getter
chamber
substrate
loaded
getter device
Prior art date
Application number
IT1999MI000744A
Other languages
English (en)
Inventor
Andrea Conte
Francesco Mazza
Marco Moraja
Original Assignee
Getters Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Getters Spa filed Critical Getters Spa
Priority to IT1999MI000744A priority Critical patent/IT1312248B1/it
Priority to TW089105008A priority patent/TWI232889B/zh
Priority to MYPI20001496A priority patent/MY123684A/en
Priority to DE60000873T priority patent/DE60000873T2/de
Priority to EP00922851A priority patent/EP1169489B1/en
Priority to KR10-2001-7013021A priority patent/KR100469527B1/ko
Priority to CNB008070504A priority patent/CN1239738C/zh
Priority to RU2001130362/02A priority patent/RU2240377C2/ru
Priority to PCT/IT2000/000136 priority patent/WO2000061832A1/en
Priority to MXPA01010337A priority patent/MXPA01010337A/es
Priority to CA002365902A priority patent/CA2365902C/en
Priority to AT00922851T priority patent/ATE228582T1/de
Priority to JP2000610878A priority patent/JP3878417B2/ja
Priority to ES00922851T priority patent/ES2186646T3/es
Priority to US09/546,722 priority patent/US6589599B1/en
Priority to AU43122/00A priority patent/AU4312200A/en
Publication of ITMI990744A1 publication Critical patent/ITMI990744A1/it
Application granted granted Critical
Publication of IT1312248B1 publication Critical patent/IT1312248B1/it
Priority to HK02107068.0A priority patent/HK1045860B/zh
Priority to US10/422,205 priority patent/US6858254B2/en
Priority to US10/422,442 priority patent/US20050072356A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
    • F04B37/02—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for evacuating by absorption or adsorption
    • F04B37/04—Selection of specific absorption or adsorption materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
IT1999MI000744A 1999-04-12 1999-04-12 Metodo per aumentare la produttivita' di processi di deposizione distrati sottili su un substrato e dispositivi getter per la IT1312248B1 (it)

Priority Applications (19)

Application Number Priority Date Filing Date Title
IT1999MI000744A IT1312248B1 (it) 1999-04-12 1999-04-12 Metodo per aumentare la produttivita' di processi di deposizione distrati sottili su un substrato e dispositivi getter per la
TW089105008A TWI232889B (en) 1999-04-12 2000-03-17 Method for increasing the yield in processes of deposition of thin layers onto a substrate
MYPI20001496A MY123684A (en) 1999-04-12 2000-04-10 Method for increasing the yield in processes of deposition of thin layers onto a substrate and getter devices for carrying out this method.
JP2000610878A JP3878417B2 (ja) 1999-04-12 2000-04-11 薄層堆積で使用する方法及びゲッターデバイス
KR10-2001-7013021A KR100469527B1 (ko) 1999-04-12 2000-04-11 기판 상에 박층을 증착시키는 공정에서의 생산성 증가 방법
CNB008070504A CN1239738C (zh) 1999-04-12 2000-04-11 提高在基体上薄膜沉积工艺的产率的方法
RU2001130362/02A RU2240377C2 (ru) 1999-04-12 2000-04-11 Способ увеличения производительности процессов осаждения тонких пленок на подложку
PCT/IT2000/000136 WO2000061832A1 (en) 1999-04-12 2000-04-11 Method and getter devices for use in deposition of thin layers
DE60000873T DE60000873T2 (de) 1999-04-12 2000-04-11 Verfahren zur erhöhung der ausbeute bei verfahren zur abscheidung von dünnen schichten auf einem substrat
CA002365902A CA2365902C (en) 1999-04-12 2000-04-11 Method for increasing the yield in processes of deposition of thin layers onto a substrate
AT00922851T ATE228582T1 (de) 1999-04-12 2000-04-11 Verfahren zur erhöhung der ausbeute bei verfahren zur abscheidung von dünnen schichten auf einem substrat
EP00922851A EP1169489B1 (en) 1999-04-12 2000-04-11 Method for increasing the yield in processes of deposition of thin layers onto a substrate
ES00922851T ES2186646T3 (es) 1999-04-12 2000-04-11 Metodo para aumentar el rendimiento en los procesos de deposicion de finas capas sobre un substrato.
US09/546,722 US6589599B1 (en) 1999-04-12 2000-04-11 Easily loaded and unloaded getter device for reducing evacuation time and contamination in a vacuum chamber and method for use of same
AU43122/00A AU4312200A (en) 1999-04-12 2000-04-11 Method and getter devices for use in deposition of thin layers
MXPA01010337A MXPA01010337A (es) 1999-04-12 2000-04-11 Metodo para incrementar la produccion en procesos de deposicion de capas delgadas sobre un substrato.
HK02107068.0A HK1045860B (zh) 1999-04-12 2002-09-26 提高在基體上薄膜沉積工藝的產率的方法
US10/422,205 US6858254B2 (en) 1999-04-12 2003-04-23 Easily loaded and unloaded getter device for reducing evacuation time and contamination in a vacuum chamber and method for use of same
US10/422,442 US20050072356A1 (en) 1999-04-12 2003-04-23 Easily loaded and unloaded getter device for reducing evacuation time and contamination in a vacuum chamber and method for use of same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT1999MI000744A IT1312248B1 (it) 1999-04-12 1999-04-12 Metodo per aumentare la produttivita' di processi di deposizione distrati sottili su un substrato e dispositivi getter per la
US09/546,722 US6589599B1 (en) 1999-04-12 2000-04-11 Easily loaded and unloaded getter device for reducing evacuation time and contamination in a vacuum chamber and method for use of same

Publications (2)

Publication Number Publication Date
ITMI990744A1 ITMI990744A1 (it) 2000-10-12
IT1312248B1 true IT1312248B1 (it) 2002-04-09

Family

ID=28043502

Family Applications (1)

Application Number Title Priority Date Filing Date
IT1999MI000744A IT1312248B1 (it) 1999-04-12 1999-04-12 Metodo per aumentare la produttivita' di processi di deposizione distrati sottili su un substrato e dispositivi getter per la

Country Status (11)

Country Link
US (3) US6589599B1 (it)
EP (1) EP1169489B1 (it)
JP (1) JP3878417B2 (it)
CN (1) CN1239738C (it)
AT (1) ATE228582T1 (it)
AU (1) AU4312200A (it)
CA (1) CA2365902C (it)
DE (1) DE60000873T2 (it)
ES (1) ES2186646T3 (it)
IT (1) IT1312248B1 (it)
WO (1) WO2000061832A1 (it)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1312248B1 (it) 1999-04-12 2002-04-09 Getters Spa Metodo per aumentare la produttivita' di processi di deposizione distrati sottili su un substrato e dispositivi getter per la
US6635116B1 (en) * 2000-08-29 2003-10-21 Lsi Logic Corporation Residual oxygen reduction system
JP4024151B2 (ja) 2001-05-01 2007-12-19 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 放電ランプ
TW583049B (en) 2001-07-20 2004-04-11 Getters Spa Support with integrated deposit of gas absorbing material for manufacturing microelectronic, microoptoelectronic or micromechanical devices
TW533188B (en) 2001-07-20 2003-05-21 Getters Spa Support for microelectronic, microoptoelectronic or micromechanical devices
JP2003257649A (ja) * 2002-03-05 2003-09-12 Sanyo Electric Co Ltd 有機エレクトロルミネッセンス素子の製造方法
DE10209423A1 (de) * 2002-03-05 2003-09-18 Schwerionenforsch Gmbh Beschichtung aus einer Gettermetall-Legierung sowie Anordnung und Verfahren zur Herstellung derselben
US6849131B2 (en) * 2002-10-05 2005-02-01 Taiwan Semiconductor Manufacturing Co., Ltd Truncated dummy plate for process furnace
ITMI20031178A1 (it) * 2003-06-11 2004-12-12 Getters Spa Depositi multistrato getter non evaporabili ottenuti per
US7871660B2 (en) 2003-11-14 2011-01-18 Saes Getters, S.P.A. Preparation of getter surfaces using caustic chemicals
JP4914573B2 (ja) * 2005-02-25 2012-04-11 キヤノンアネルバ株式会社 高誘電体ゲート絶縁膜及び金属ゲート電極を有する電界効果トランジスタの製造方法
ITMI20050616A1 (it) * 2005-04-12 2006-10-13 Getters Spa Processo per la formazione di depositi getter miniaturizzati e depositi getrter cosi'ottenuti
US20110177233A1 (en) * 2008-01-18 2011-07-21 Nxp, B.V. Apparatus for providing material on a deposition surface
US9920418B1 (en) 2010-09-27 2018-03-20 James Stabile Physical vapor deposition apparatus having a tapered chamber
ITMI20121732A1 (it) * 2012-10-15 2014-04-16 Getters Spa Pompa getter
JP5658803B2 (ja) * 2013-07-22 2015-01-28 東京エレクトロン株式会社 クリーニング方法
DE102016123146A1 (de) 2016-06-03 2017-12-07 Movatec Gmbh Vakuumgerät und Verfahren zur Beschichtung von Bauteilen
US10661223B2 (en) 2017-06-02 2020-05-26 Applied Materials, Inc. Anneal chamber with getter
CN113658888B (zh) * 2021-08-16 2023-07-14 长鑫存储技术有限公司 混合制程控制方法、装置、设备及介质

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1173866B (it) * 1984-03-16 1987-06-24 Getters Spa Metodo perfezionato per fabbricare dispositivi getter non evarobili porosi e dispositivi getter cosi' prodotti
US5250324A (en) * 1990-06-25 1993-10-05 Lanxide Technology Company, L.P. Method for forming a surface coating using powdered solid oxidants and parent metals
US5223112A (en) 1991-04-30 1993-06-29 Applied Materials, Inc. Removable shutter apparatus for a semiconductor process chamber
US5500182A (en) * 1991-07-12 1996-03-19 Lanxide Technology Company, Lp Ceramic composite bodies with increased metal content
IT1255438B (it) * 1992-07-17 1995-10-31 Getters Spa Pompa getter non evaporabile
IT1255439B (it) 1992-07-17 1995-10-31 Getters Spa Pompa getter non evaporabile
IT1273349B (it) * 1994-02-28 1997-07-08 Getters Spa Visualizzatore piatto ad emissione di campo contenente un getter e procedimento per il suo ottenimento
US5911560A (en) * 1994-10-31 1999-06-15 Saes Pure Gas, Inc. Getter pump module and system
US6142742A (en) * 1994-10-31 2000-11-07 Saes Pure Gas, Inc. Getter pump module and system
US5685963A (en) * 1994-10-31 1997-11-11 Saes Pure Gas, Inc. In situ getter pump system and method
US6110807A (en) * 1995-06-07 2000-08-29 Saes Getters S.P.A. Process for producing high-porosity non-evaporable getter materials
FR2750248B1 (fr) * 1996-06-19 1998-08-28 Org Europeene De Rech Dispositif de pompage par getter non evaporable et procede de mise en oeuvre de ce getter
US5778682A (en) * 1996-06-20 1998-07-14 Mitel Corporation Reactive PVD with NEG pump
IT1283484B1 (it) * 1996-07-23 1998-04-21 Getters Spa Metodo per la produzione di strati sottili supportati di materiale getter non-evaporabile e dispositivi getter cosi' prodotti
IT1297013B1 (it) * 1997-12-23 1999-08-03 Getters Spa Sistema getter per la purificazione dell'atmosfera di lavoro nei processi di deposizione fisica da vapore
IT1312248B1 (it) * 1999-04-12 2002-04-09 Getters Spa Metodo per aumentare la produttivita' di processi di deposizione distrati sottili su un substrato e dispositivi getter per la
IT1318937B1 (it) * 2000-09-27 2003-09-19 Getters Spa Metodo per la produzione di dispositivi getter porosi con ridottaperdita di particelle e dispositivi cosi' prodotti

Also Published As

Publication number Publication date
US20050072356A1 (en) 2005-04-07
DE60000873D1 (de) 2003-01-09
JP3878417B2 (ja) 2007-02-07
EP1169489B1 (en) 2002-11-27
CN1349565A (zh) 2002-05-15
EP1169489A1 (en) 2002-01-09
DE60000873T2 (de) 2003-08-28
ES2186646T3 (es) 2003-05-16
WO2000061832A1 (en) 2000-10-19
US20030207030A1 (en) 2003-11-06
ATE228582T1 (de) 2002-12-15
JP2002540944A (ja) 2002-12-03
AU4312200A (en) 2000-11-14
CA2365902A1 (en) 2000-10-19
US6858254B2 (en) 2005-02-22
CN1239738C (zh) 2006-02-01
ITMI990744A1 (it) 2000-10-12
CA2365902C (en) 2008-02-19
US6589599B1 (en) 2003-07-08

Similar Documents

Publication Publication Date Title
IT1312248B1 (it) Metodo per aumentare la produttivita' di processi di deposizione distrati sottili su un substrato e dispositivi getter per la
CN101117397B (zh) 吸附膜及其制造方法和带离型膜的吸附膜及其制造方法
WO2003075343A1 (en) Method for holding substrate in vacuum, method for manufacturing liquid crystal display device, and device for holding substrate
IN266855B (it)
CA2354925A1 (en) Apparatus and method for coating substrates
US11814721B2 (en) Method for holding and releasing a substrate
TW348272B (en) Method and apparatus for depositing planar and highly oriented layers
WO2000040784A3 (en) Methods for coating metallic articles
WO2001004929A3 (en) A method of forming a film in a chamber
TW200610433A (en) Mixed solution for display device and manufacturing method of the display device using the same
WO2001070894A3 (de) Elektronenstrahl-vernetzung von haftklebemassen
JPS63102139A (ja) 陰極線管の蛍光面製造方法
HK1044307A1 (en) Method and device for treating substrates.
AU3816199A (en) Device and method for handling substrates
EP0966024A3 (en) Method and apparatus for protection of substrate surface
WO2004073028A3 (en) Method and apparatus for holding a substrate during high pressure processing
EP1323525A3 (de) Verfahren zur Herstellung eines plattenförmigen Trägers
US20100018945A1 (en) System, method and apparatus for batch vapor deposition of adhesion promoter for manufacturing discrete track media and bit-patterned media, and mono-molecular layer lubricant on magnetic recording media
JPH0157661B2 (it)
JPS60227421A (ja) 真空容器
NL1000614C2 (nl) Werkwijze voor het vervaardigen van een gelamineerd produkt.
JP2001291760A (ja) 剥離方法及び剥離用テープ
KR20050083007A (ko) 필름 특성 개선 방법
WO2001036111A3 (de) Verfahren zur herstellung eines mit einem klebstoff beschichteten folienartigen trägermaterials
TW344836B (en) Process for forming a fluorescent-layered metal film