JP2007526602A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2007526602A5 JP2007526602A5 JP2007501081A JP2007501081A JP2007526602A5 JP 2007526602 A5 JP2007526602 A5 JP 2007526602A5 JP 2007501081 A JP2007501081 A JP 2007501081A JP 2007501081 A JP2007501081 A JP 2007501081A JP 2007526602 A5 JP2007526602 A5 JP 2007526602A5
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- physical vapor
- deposition method
- barium
- sulfur
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000005240 physical vapour deposition Methods 0.000 claims 30
- 238000000034 method Methods 0.000 claims 26
- 239000000463 material Substances 0.000 claims 14
- 239000012190 activator Substances 0.000 claims 11
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 9
- 239000000203 mixture Substances 0.000 claims 8
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 7
- 239000012298 atmosphere Substances 0.000 claims 7
- 238000000151 deposition Methods 0.000 claims 6
- 230000008021 deposition Effects 0.000 claims 6
- 229910015999 BaAl Inorganic materials 0.000 claims 5
- 229910052717 sulfur Inorganic materials 0.000 claims 5
- 239000011593 sulfur Substances 0.000 claims 5
- 229910000838 Al alloy Inorganic materials 0.000 claims 4
- COHCXWLRUISKOO-UHFFFAOYSA-N [AlH3].[Ba] Chemical compound [AlH3].[Ba] COHCXWLRUISKOO-UHFFFAOYSA-N 0.000 claims 4
- -1 barium aluminum compound Chemical class 0.000 claims 4
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims 4
- 150000001875 compounds Chemical class 0.000 claims 3
- 230000001681 protective effect Effects 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 3
- 229910052693 Europium Inorganic materials 0.000 claims 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 2
- 229910052788 barium Inorganic materials 0.000 claims 2
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 claims 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 claims 2
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 claims 2
- 229910000765 intermetallic Inorganic materials 0.000 claims 2
- 238000004544 sputter deposition Methods 0.000 claims 2
- 238000002207 thermal evaporation Methods 0.000 claims 2
- 229910052684 Cerium Inorganic materials 0.000 claims 1
- GQCYCMFGFVGYJT-UHFFFAOYSA-N [AlH3].[S] Chemical compound [AlH3].[S] GQCYCMFGFVGYJT-UHFFFAOYSA-N 0.000 claims 1
- 239000013543 active substance Substances 0.000 claims 1
- 239000000010 aprotic solvent Substances 0.000 claims 1
- 150000001553 barium compounds Chemical class 0.000 claims 1
- QKYBEKAEVQPNIN-UHFFFAOYSA-N barium(2+);oxido(oxo)alumane Chemical class [Ba+2].[O-][Al]=O.[O-][Al]=O QKYBEKAEVQPNIN-UHFFFAOYSA-N 0.000 claims 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 claims 1
- 238000005566 electron beam evaporation Methods 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 239000002905 metal composite material Substances 0.000 claims 1
- 239000008188 pellet Substances 0.000 claims 1
- 229920001021 polysulfide Polymers 0.000 claims 1
- 239000005077 polysulfide Substances 0.000 claims 1
- 150000008117 polysulfides Polymers 0.000 claims 1
- 238000005477 sputtering target Methods 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US54955204P | 2004-03-04 | 2004-03-04 | |
| PCT/CA2005/000333 WO2005085493A1 (en) | 2004-03-04 | 2005-03-04 | Reactive metal sources and deposition method for thioaluminate phosphors |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007526602A JP2007526602A (ja) | 2007-09-13 |
| JP2007526602A5 true JP2007526602A5 (https=) | 2008-04-24 |
Family
ID=34919504
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007501081A Withdrawn JP2007526602A (ja) | 2004-03-04 | 2005-03-04 | チオアルミネート発光体に対する反応性金属供給源及び堆積方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US7622149B2 (https=) |
| EP (1) | EP1721026A4 (https=) |
| JP (1) | JP2007526602A (https=) |
| KR (1) | KR20070001167A (https=) |
| CN (1) | CN1926259B (https=) |
| CA (1) | CA2554756A1 (https=) |
| TW (1) | TW200538564A (https=) |
| WO (1) | WO2005085493A1 (https=) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006045195A1 (en) | 2004-10-29 | 2006-05-04 | Ifire Technology Corp. | Novel thiosilicate phosphor compositions and deposition methods using barium-silicon vacuum deposition sources for deposition of thiosilicate phosphor films |
| JP4747751B2 (ja) * | 2005-05-09 | 2011-08-17 | 三菱マテリアル株式会社 | エレクトロルミネッセンス素子における蛍光体膜形成用高強度スパッタリングターゲット |
| JP5028962B2 (ja) * | 2006-11-09 | 2012-09-19 | 住友金属鉱山株式会社 | Ｅｌ発光層形成用スパッタリングターゲットとその製造方法 |
| JP2010525530A (ja) * | 2007-04-30 | 2010-07-22 | アイファイアー・アイピー・コーポレーション | 厚膜誘電性エレクトロルミネセントディスプレイ用の積層厚膜誘電体構造 |
| JP5700259B2 (ja) * | 2010-02-17 | 2015-04-15 | 住友金属鉱山株式会社 | 透明導電膜の製造方法及び透明導電膜、それを用いた素子、透明導電基板並びにそれを用いたデバイス |
| CN103289687B (zh) * | 2012-02-28 | 2015-10-28 | 海洋王照明科技股份有限公司 | 铈掺杂硫代铝酸盐发光薄膜、制备方法及其应用 |
| US20180269044A1 (en) | 2017-03-20 | 2018-09-20 | International Business Machines Corporation | Pvd tool to deposit highly reactive materials |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5432015A (en) * | 1992-05-08 | 1995-07-11 | Westaim Technologies, Inc. | Electroluminescent laminate with thick film dielectric |
| US5505986A (en) * | 1994-02-14 | 1996-04-09 | Planar Systems, Inc. | Multi-source reactive deposition process for the preparation of blue light emitting phosphor layers for AC TFEL devices |
| US5773085A (en) * | 1994-07-04 | 1998-06-30 | Nippon Hoso Kyokai | Method of manufacturing ternary compound thin films |
| US6074575A (en) * | 1994-11-14 | 2000-06-13 | Mitsui Mining & Smelting Co., Ltd. | Thin film electro-luminescence device |
| WO1999034028A1 (fr) * | 1997-12-24 | 1999-07-08 | Kabushiki Kaisha Toshiba | CIBLE DE PULVERISATION, FILM D'INTERCONNEXION A BASE D'Al ET COMPOSANT ELECTRONIQUE |
| JP2001294852A (ja) * | 2000-04-14 | 2001-10-23 | Tdk Corp | 蛍光体とその製造方法、薄膜の製造装置、およびｅｌ素子 |
| US6793962B2 (en) * | 2000-11-17 | 2004-09-21 | Tdk Corporation | EL phosphor multilayer thin film and EL device |
| US6734469B2 (en) * | 2000-11-17 | 2004-05-11 | Tdk Corporation | EL phosphor laminate thin film and EL device |
| US6821647B2 (en) * | 2001-04-19 | 2004-11-23 | Tdk Corporation | Phosphor thin film preparation method, and EL panel |
| US6447654B1 (en) * | 2001-05-29 | 2002-09-10 | Ifire Technology Inc. | Single source sputtering of thioaluminate phosphor films |
| JP3704068B2 (ja) * | 2001-07-27 | 2005-10-05 | ザ ウエステイム コーポレイション | Ｅｌパネル |
| US6793782B2 (en) * | 2001-12-21 | 2004-09-21 | Ifire Technology Inc. | Sputter deposition process for electroluminescent phosphors |
| US6781304B2 (en) * | 2002-01-21 | 2004-08-24 | Tdk Corporation | EL panel |
| JP2003301171A (ja) * | 2002-02-06 | 2003-10-21 | Tdk Corp | 蛍光体薄膜、その製造方法およびｅｌパネル |
| CA2478439A1 (en) * | 2002-03-27 | 2003-10-02 | Ifire Technology Inc. | Yttrium substituted barium thioaluminate phosphor materials |
| WO2005033360A1 (en) * | 2003-10-07 | 2005-04-14 | Ifire Technology Corp. | Polysulfide thermal vapour source for thin sulfide film deposition |
| US8057856B2 (en) * | 2004-03-15 | 2011-11-15 | Ifire Ip Corporation | Method for gettering oxygen and water during vacuum deposition of sulfide films |
-
2005
- 2005-03-04 JP JP2007501081A patent/JP2007526602A/ja not_active Withdrawn
- 2005-03-04 US US11/072,824 patent/US7622149B2/en not_active Expired - Fee Related
- 2005-03-04 TW TW094106638A patent/TW200538564A/zh unknown
- 2005-03-04 EP EP05714575A patent/EP1721026A4/en not_active Withdrawn
- 2005-03-04 CA CA002554756A patent/CA2554756A1/en not_active Abandoned
- 2005-03-04 KR KR1020067017963A patent/KR20070001167A/ko not_active Ceased
- 2005-03-04 CN CN2005800065109A patent/CN1926259B/zh not_active Expired - Fee Related
- 2005-03-04 WO PCT/CA2005/000333 patent/WO2005085493A1/en not_active Ceased
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CA2467790A1 (en) | Non-evaporable getter multilayer deposits obtained by cathodic deposition and process for their manufacturing | |
| ITMI20002099A1 (it) | Metodo per la produzione di dispositivi getter porosi con ridotta perdita di particelle e dispositivi cosi' prodotti | |
| JP2007526602A5 (https=) | ||
| JP2005200764A (ja) | 環境バリア皮膜 | |
| KR20130125796A (ko) | 다층 코팅을 포함하는 강판 | |
| ATE306571T1 (de) | Sputtertarget und verfahren zur herstellung eines solchen targets | |
| JP5139768B2 (ja) | Ｔｉ−Ａｌ系合金の表面処理方法およびそれによって得られたＴｉ−Ａｌ系合金 | |
| US8057856B2 (en) | Method for gettering oxygen and water during vacuum deposition of sulfide films | |
| JP2007529623A5 (https=) | ||
| US7622149B2 (en) | Reactive metal sources and deposition method for thioaluminate phosphors | |
| EP1884959B1 (en) | Phosphor or scintillator screens or panels having a topcoat layer. | |
| JP2004269985A (ja) | 硬質皮膜 | |
| TW200814129A (en) | Electrode for cold cathode fluorescent lamp | |
| JP2016526097A (ja) | ターボチャージャー用バリア層 | |
| CA2607620A1 (en) | High strength sputtering target for forming phosphor film in electroluminescence element | |
| CA2590400A1 (en) | Novel thiosilicate phosphor compositions and deposition methods using barium-silicon vacuum deposition sources for deposition of thiosilicate phosphor films | |
| US20210395897A1 (en) | PVD Barrier Coating for Superalloy Substrates | |
| JP2006351357A (ja) | 赤色ｅｌ素子 | |
| Nyenge et al. | Auger electron spectroscopy study and depth profile analyses of the CaS: Eu2+ pulsed laser deposited thin luminescent films | |
| Lee et al. | Oxidation of nano-multilayered CrN/AlMgSiN thin films between 600 and 900° C in air | |
| JP2009021020A (ja) | 耐腐食性に優れたリフレクタを有する車両用灯具 | |
| JP4826919B2 (ja) | 有機エレクトロルミネッセンス素子の陰極を構成する金属膜 | |
| KR100421948B1 (ko) | 복합코팅된 티타늄 알루미나이드계 합금 | |
| KR20160133841A (ko) | 니켈 원소가 도핑된 산화 마그네슘 입자를 포함하는 게터 조성물 | |
| JP2007146034A (ja) | 蛍光体薄膜とその成膜方法 |