JP2007526268A - P2x3およびp2x2/3アンタゴニストとしてのジアミノピリミジン - Google Patents
P2x3およびp2x2/3アンタゴニストとしてのジアミノピリミジン Download PDFInfo
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- JP2007526268A JP2007526268A JP2007501184A JP2007501184A JP2007526268A JP 2007526268 A JP2007526268 A JP 2007526268A JP 2007501184 A JP2007501184 A JP 2007501184A JP 2007501184 A JP2007501184 A JP 2007501184A JP 2007526268 A JP2007526268 A JP 2007526268A
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- Prior art keywords
- methoxy
- isopropyl
- alkyl
- hydrogen
- mmol
- Prior art date
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- 102100040479 P2X purinoceptor 2 Human genes 0.000 title 1
- 101710189968 P2X purinoceptor 2 Proteins 0.000 title 1
- 102100040460 P2X purinoceptor 3 Human genes 0.000 title 1
- 101710189970 P2X purinoceptor 3 Proteins 0.000 title 1
- 229940058936 antimalarials diaminopyrimidines Drugs 0.000 title 1
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- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
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- 125000002294 quinazolinyl group Chemical group N1=C(N=CC2=CC=CC=C12)* 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
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- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
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- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
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- 125000005304 thiadiazolidinyl group Chemical group 0.000 description 1
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- CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 description 1
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- WRECIMRULFAWHA-UHFFFAOYSA-N trimethyl borate Chemical compound COB(OC)OC WRECIMRULFAWHA-UHFFFAOYSA-N 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
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- ABDKAPXRBAPSQN-UHFFFAOYSA-N veratrole Chemical compound COC1=CC=CC=C1OC ABDKAPXRBAPSQN-UHFFFAOYSA-N 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D239/00—Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings
- C07D239/02—Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings
- C07D239/24—Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings having three or more double bonds between ring members or between ring members and non-ring members
- C07D239/28—Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings having three or more double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, directly attached to ring carbon atoms
- C07D239/46—Two or more oxygen, sulphur or nitrogen atoms
- C07D239/48—Two nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
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- C07D239/02—Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings
- C07D239/24—Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings having three or more double bonds between ring members or between ring members and non-ring members
- C07D239/28—Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings having three or more double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, directly attached to ring carbon atoms
- C07D239/46—Two or more oxygen, sulphur or nitrogen atoms
- C07D239/48—Two nitrogen atoms
- C07D239/49—Two nitrogen atoms with an aralkyl radical, or substituted aralkyl radical, attached in position 5, e.g. trimethoprim
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- A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
- A61K31/495—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with two or more nitrogen atoms as the only ring heteroatoms, e.g. piperazine or tetrazines
- A61K31/505—Pyrimidines; Hydrogenated pyrimidines, e.g. trimethoprim
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Abstract
Description
(式中、
Xは、−CH2−;−O−;−CHOH−;−S(O)n−:または−NRc−であり、ここで、nは0〜2であり、Rcは水素またはアルキルであり;
Yは、水素;または−NRdReであり、ここで、RdおよびReの一方は水素であり、他方は、水素;アルキル;シクロアルキル;シクロアルキルアルキル;ハロアルキル;ハロアルコキシ;ヒドロキシアルキル;アルコキシアルキル;アセチル;アルキルスルホニル;アルキルスルホニルアルキル;アミノカルボニルオキシアルキル;ヒドロキシカルボニルアルキル;ヒドロキシアルキルオキシカルボニルアルキル;アリール;アラルキル;アリールスルホニル;ヘテロアリール;ヘテロアリールアルキル;ヘテロアリールスルホニル;ヘテロシクリル;またはヘテロシクリルアルキルであり;
Dは、場合により酸素であり;
R1は、アルキル;アルケニル;シクロアルキル;シクロアルケニル;ハロ;ハロアルキル;ヒドロキシアルキル;またはアルコキシであり;
R2、R3、R4、およびR5は、各々独立して、水素;アルキル;アルケニル;アミノ;ハロ;アミド;ハロアルキル;アルコキシ;ヒドロキシ;ハロアルコキシ;ニトロ;アミノ;ヒドロキシアルキル;アルコキシアルキル;ヒドロキシアルコキシ;アルキニルアルコキシ;アルキルスルホニル;アリールスルホニル;シアノ;アリール;ヘテロアリール;ヘテロシクリル;ヘテロシクリルアルコキシ;アリールオキシ;ヘテロアリールオキシ;アラルキルオキシ;ヘテロアラルキルオキシ;場合により置換されているフェノキシ;−(CH2)m−(Z)n−(CO)−Rf、または−(CH2)m−(Z)n−SO2−(NRg)n−Rfであり、ここで、mおよびnは、各々独立して、0または1であり、ZはOまたはNRgであり、Rfは、水素、アルキル、ヒドロキシ、アルコキシ、アミノ、ヒドロキシアルキル、またはアルコキシアルキルであり、各Rgは、独立して、水素またはアルキルであるか;あるいは、R3およびR4は、一緒になって、アルキレンジオキシを形成していてもよく;あるいは、R3およびR4は、それらが結合している原子と一緒になって、O、S、およびNから選択される1または2個のヘテロ原子を場合により含む5または6員環を形成していてもよく;あるいは、R2およびR3は、一緒になって、アルキレンジオキシを形成していてもよく;あるいは、R2およびR3は、それらが結合している原子と一緒になって、O、S、およびNから選択される1または2個のヘテロ原子を場合により含む5または6員環を形成していてもよく;
R6は、水素;アルキル;ハロ;ハロアルキル;アミノ;またはアルコキシであり;
R7およびR8の一方は水素であり、他方は、水素;アルキル;シクロアルキル;シクロアルキルアルキル;ハロアルキル;ハロアルコキシ;ヒドロキシアルキル;アルコキシアルキル;アセチル;アルキルスルホニル;アルキルスルホニルアルキル;アミノカルボニルオキシアルキル;ヒドロキシカルボニルアルキル;ヒドロキシアルキルオキシカルボニルアルキル;アリール;アラルキル;アリールスルホニル;ヘテロアリール;ヘテロアリールアルキル;ヘテロアリールスルホニル;ヘテロシクリル;またはヘテロシクリルアルキルであり;
ただし、Xが−CH2−であり、R7、R8、Rd、およびReが水素である場合には、R1は、イソプロピル、イソプロペニル、シクロプロピル、またはヨードである)
で示される化合物またはその薬学的に許容されうる塩を提供する。
(式中、
Xは、−CH2−;−O−;−C(O)−;−CHOH−;−S(O)n−:または−NRc−であり、ここで、nは0〜2であり、Rcは水素またはアルキルであり;
Yは、水素;または−NRdReであり、ここで、RdおよびReの一方は水素であり、他方は、水素;アルキル;シクロアルキル;シクロアルキルアルキル;ハロアルキル;ハロアルコキシ;ヒドロキシアルキル;アルコキシアルキル;アセチル;アルキルスルホニル;アルキルスルホニルアルキル;アリール;アラルキル;アリールスルホニル;ヘテロアリール;ヘテロアリールアルキル;ヘテロアリールスルホニル;ヘテロシクリル;またはヘテロシクリルアルキルであり;
R1は、アルキル;アルケニル;シクロアルキル;シクロアルケニル;ハロ;ハロアルキル;またはアルコキシであり;
R2、R3、R4、およびR5は、各々独立して、水素;アルキル;アミノ;アミド;ハロアルキル;アルコキシ;アルキルスルホニル;アリールスルホニル;スルホンアミド;シアノ;アセチル;ヘテロアリール;カルボン酸;カルボン酸アミド;尿素;カルバメート;アセトアミド;または場合により置換されているフェノキシであるか;あるいは、R3およびR4は一緒になってアルキレンジオキシを形成していてもよく;あるいは、R3およびR4はそれらが結合している原子と一緒になって、O、SおよびNから選択される1または2個のヘテロ原子を含む5または6員環を形成していてもよく;あるいは、R2およびR3は一緒になってアルキレンジオキシを形成していてもよく;あるいは、R2およびR3はそれらが結合している原子と一緒になって、O、SおよびNから選択される1または2個のヘテロ原子を含む5または6員環を形成していてもよく;
R6は、水素;アルキル;ハロアルキル;アミノ;またはアルコキシであり;
R7およびR8の一方は水素であり、他方は、水素;アルキル;シクロアルキル;シクロアルキルアルキル;ハロアルキル;ヒドロキシアルキル;アルコキシアルキル;アセチル;アルキルスルホニル;アルキルスルホニルアルキル;アリール;アラルキル;アリールスルホニル;ヘテロアリール;ヘテロアリールアルキル;ヘテロアリールスルホニル;ヘテロシクリル;またはヘテロシクリルアルキルである)
で示される化合物またはその薬学的に許容されうる塩、溶媒和物、もしくはプロドラッグを投与することを含む。
塩酸、臭化水素酸、硫酸、硝酸、リン酸などの無機酸を用いて形成される酸付加塩;または、酢酸、ベンゼンスルホン酸、安息香酸、ショウノウスルホン酸、クエン酸、エタンスルホン酸、フマル酸、グルコヘプトン酸、グルコン酸、グルタミン酸、グリコール酸、ヒドロキシナフトエ酸、2−ヒドロキシエタンスルホン酸、乳酸、マレイン酸、リンゴ酸、マロン酸、マンデル酸、メタンスルホン酸、ムコン酸、2−ナフタレン−スルホン酸、プロピオン酸、サリチル酸、コハク酸、酒石酸、p−トルエンスルホン酸、トリメチル酢酸などの有機酸を用いて形成される酸付加塩;あるいは、
親化合物に存在する酸性プロトンが、金属イオン、例えばアルカリ金属イオン、アルカリ土類イオン、もしくはアルミニウムイオンにより置き換えられている場合に形成される塩;または、有機もしくは無機塩基と配位している場合に形成される塩が挙げられる。許容されうる有機塩基には、ジエタノールアミン、エタノールアミン、N−メチルグルカミン、トリエタノールアミン、トロメタミンなどが挙げられる。許容される無機塩基には、水酸化アルミニウム、水酸化カルシウム、水酸化カリウム、炭酸ナトリウム、および水酸化ナトリウムが挙げられる。
(i)疾病状態を予防すること、すなわち、疾病状態にさらされているかまたはその素因がある可能性があるが、まだ疾病状態の症状を経験または呈していない、被験体の疾病状態の臨床症状を発症させないこと、
(ii)疾病状態を抑止すること、すなわち、疾病状態またはその臨床症状の発症を停止させること、
(iii)疾病状態を寛解すること、すなわち、疾病状態またはその臨床症状の一時的または永久的減退を引き起こすこと
が含まれる。
(式中、
Xは、−CH2−;または−O−であり;
R1は、アルキル;アルケニル;シクロアルキル;またはシクロアルケニル;またはハロであり;
R3およびR4は、各々独立して、水素;アルキル;アルケニル;アミノ;ハロ;アミド;ハロアルキル;アルコキシ;ヒドロキシ;ハロアルコキシ;ニトロ;ヒドロキシアルキル;アルコキシアルキル;ヒドロキシアルコキシ;アルキニルアルコキシ;アルキルスルホニル;アリールスルホニル;シアノ;アリール;ヘテロアリール;ヘテロシクリル;ヘテロシクリルアルコキシ;アリールオキシ;ヘテロアリールオキシ;アラルキルオキシ;ヘテロアラルキルオキシ;場合により置換されているフェノキシ;−(CH2)m−(Z)n−(CO)−Rf、または−(CH2)m−(Z)n−SO2−(NRg)n−Rfであり、ここで、mおよびnは、各々独立して、0または1であり、Zは、OまたはNRgであり、Rfは、水素、アルキル、ヒドロキシ、アルコキシ、アミノ、ヒドロキシアルキル、またはアルコキシアルキルであり、各Rgは、独立して、水素またはアルキルであるか;あるいは、R3およびR4は、一緒になって、アルキレンジオキシを形成していてもよく;あるいは、R3およびR4は、それらが結合している原子と一緒になって、O、S、およびNから選択される1または2個のヘテロ原子を場合により含む5または6員環を形成していてもよく;
R7およびR8の一方は水素であり、他方は、水素;アルキル;シクロアルキル;シクロアルキルアルキル;ハロアルキル;ハロアルコキシ;ヒドロキシアルキル;アルコキシアルキル;アセチル;アルキルスルホニル;アルキルスルホニルアルキル;アミノカルボニルオキシアルキル;ヒドロキシカルボニルアルキル;ヒドロキシアルキルオキシカルボニルアルキル;アリール;アラルキル;アリールスルホニル;ヘテロアリール;ヘテロアリールアルキル;ヘテロアリールスルホニル;ヘテロシクリル;またはヘテロシクリルアルキルであり;
RdおよびReの一方は水素であり、他方は、水素;アルキル;シクロアルキル;シクロアルキルアルキル;ハロアルキル;ハロアルコキシ;ヒドロキシアルキル;アルコキシアルキル;アセチル;アルキルスルホニル;アルキルスルホニルアルキル;アミノカルボニルオキシアルキル;ヒドロキシカルボニルアルキル;ヒドロキシアルキルオキシカルボニルアルキル;アリール;アラルキル;アリールスルホニル;ヘテロアリール;ヘテロアリールアルキル;ヘテロアリールスルホニル;ヘテロシクリル;またはヘテロシクリルアルキルである)
で示されていてもよい。
(式中、
R1は、イソプロピル;イソプロペニル;シクロプロピル;またはヨードであり;
R3およびR4は、各々独立して、水素;アルキル;アルケニル;アミノ;ハロ;アミド;ハロアルキル;アルコキシ;ヒドロキシ;ハロアルコキシ;ニトロ;ヒドロキシアルキル;アルコキシアルキル;ヒドロキシアルコキシ;アルキニルアルコキシ;アルキルスルホニル;アリールスルホニル;シアノ;アリール;ヘテロアリール;ヘテロシクリル;ヘテロシクリルアルコキシ;アリールオキシ;ヘテロアリールオキシ;アラルキルオキシ;ヘテロアラルキルオキシ;場合により置換されているフェノキシ;−(CH2)m−(Z)n−(CO)−Rf、または−(CH2)m−(Z)n−SO2−(NRg)n−Rfであり、ここで、mおよびnは、各々独立して、0または1であり、Zは、OまたはNRgであり、Rfは、水素、アルキル、ヒドロキシ、アルコキシ、アミノ、ヒドロキシアルキル、またはアルコキシアルキルであり、各Rgは、独立して、水素またはアルキルであるか;あるいは、R3およびR4は、一緒になってアルキレンジオキシを形成していてもよく;あるいは、R3およびR4は、それらが結合している原子と一緒になって、O、S、およびNから選択される1または2個のヘテロ原子を場合により含む5または6員環を形成していてもよく;
R7およびR8の一方は水素であり、他方は、水素;アルキル;シクロアルキル;シクロアルキルアルキル;ハロアルキル;ハロアルコキシ;ヒドロキシアルキル;アルコキシアルキル;アセチル;アルキルスルホニル;アルキルスルホニルアルキル;アミノカルボニルオキシアルキル;ヒドロキシカルボニルアルキル;ヒドロキシアルキルオキシカルボニルアルキル;アリール;アラルキル;アリールスルホニル;ヘテロアリール;ヘテロアリールアルキル;ヘテロアリールスルホニル;ヘテロシクリル;またはヘテロシクリルアルキルであり;
RdおよびReの一方は水素であり、他方は、水素;アルキル;シクロアルキル;シクロアルキルアルキル;ハロアルキル;ハロアルコキシ;ヒドロキシアルキル;アルコキシアルキル;アセチル;アルキルスルホニル;アルキルスルホニルアルキル;アミノカルボニルオキシアルキル;ヒドロキシカルボニルアルキル;ヒドロキシアルキルオキシカルボニルアルキル;アリール;アラルキル;アリールスルホニル;ヘテロアリール;ヘテロアリールアルキル;ヘテロアリールスルホニル;ヘテロシクリル;またはヘテロシクリルアルキルである)
で示されていてもよい。
(式中、
R1は、アルキル;アルケニル;シクロアルキル;またはシクロアルケニルであり;
R3およびR4は、各々独立して、水素;アルキル;アルケニル;アミノ;ハロ;アミド;ハロアルキル;アルコキシ;ヒドロキシ;ハロアルコキシ;ニトロ;ヒドロキシアルキル;アルコキシアルキル;ヒドロキシアルコキシ;アルキニルアルコキシ;アルキルスルホニル;アリールスルホニル;シアノ;アリール;ヘテロアリール;ヘテロシクリル;ヘテロシクリルアルコキシ;アリールオキシ;ヘテロアリールオキシ;アラルキルオキシ;ヘテロアラルキルオキシ;場合により置換されているフェノキシ;−(CH2)m−(Z)n−(CO)−Rf、または−(CH2)m−(Z)n−SO2−(NRg)n−Rfであり、ここで、mおよびnは、各々独立して、0または1であり、Zは、OまたはNRgであり、Rfは、水素、アルキル、ヒドロキシ、アルコキシ、アミノ、ヒドロキシアルキル、またはアルコキシアルキルであり、各Rgは、独立して、水素またはアルキルであるか;あるいは、R3およびR4は、一緒になってアルキレンジオキシを形成していてもよく;あるいは、R3およびR4は、それらが結合している原子と一緒になって、O、S、およびNから選択される1または2個のヘテロ原子を場合により含む5または6員環を形成していてもよく;
R7およびR8の一方は水素であり、他方は、水素;アルキル;シクロアルキル;シクロアルキルアルキル;ハロアルキル;ハロアルコキシ;ヒドロキシアルキル;アルコキシアルキル;アセチル;アルキルスルホニル;アルキルスルホニルアルキル;アミノカルボニルオキシアルキル;ヒドロキシカルボニルアルキル;ヒドロキシアルキルオキシカルボニルアルキル;アリール;アラルキル;アリールスルホニル;ヘテロアリール;ヘテロアリールアルキル;ヘテロアリールスルホニル;ヘテロシクリル;またはヘテロシクリルアルキルであり;
RdおよびReの一方は水素であり、他方は、水素;アルキル;シクロアルキル;シクロアルキルアルキル;ハロアルキル;ハロアルコキシ;ヒドロキシアルキル;アルコキシアルキル;アセチル;アルキルスルホニル;アルキルスルホニルアルキル;アミノカルボニルオキシアルキル;ヒドロキシカルボニルアルキル;ヒドロキシアルキルオキシカルボニルアルキル;アリール;アラルキル;アリールスルホニル;ヘテロアリール;ヘテロアリールアルキル;ヘテロアリールスルホニル;ヘテロシクリル;またはヘテロシクリルアルキルである)
で示されていてもよい。
(式中、
R3およびR4は、各々独立して、水素;アルキル;アルケニル;アミノ;ハロ;アミド;ハロアルキル;アルコキシ;ヒドロキシ;ハロアルコキシ;ニトロ;ヒドロキシアルキル;アルコキシアルキル;ヒドロキシアルコキシ;アルキニルアルコキシ;アルキルスルホニル;アリールスルホニル;シアノ;アリール;ヘテロアリール;ヘテロシクリル;ヘテロシクリルアルコキシ;アリールオキシ;ヘテロアリールオキシ;アラルキルオキシ;ヘテロアラルキルオキシ;場合により置換されているフェノキシ;−(CH2)m−(Z)n−(CO)−Rf、または−(CH2)m−(Z)n−SO2−(NRg)n−Rfであり、ここで、mおよびnは、各々独立して、0または1であり、Zは、OまたはNRgであり、Rfは、水素、アルキル、ヒドロキシ、アルコキシ、アミノ、ヒドロキシアルキル、またはアルコキシアルキルであり、各Rgは、独立して、水素またはアルキルであるか;あるいは、R3およびR4は、一緒になってアルキレンジオキシを形成していてもよく;あるいは、R3およびR4は、それらが結合している原子と一緒になって、O、S、およびNから選択される1または2個のヘテロ原子を場合により含む5または6員環を形成していてもよく;
R7およびR8の一方は水素であり、他方は、水素;アルキル;シクロアルキル;シクロアルキルアルキル;ハロアルキル;ハロアルコキシ;ヒドロキシアルキル;アルコキシアルキル;アセチル;アルキルスルホニル;アルキルスルホニルアルキル;アミノカルボニルオキシアルキル;ヒドロキシカルボニルアルキル;ヒドロキシアルキルオキシカルボニルアルキル;アリール;アラルキル;アリールスルホニル;ヘテロアリール;ヘテロアリールアルキル;ヘテロアリールスルホニル;ヘテロシクリル;またはヘテロシクリルアルキルであり;
RdおよびReの一方は水素であり、他方は、水素;アルキル;シクロアルキル;シクロアルキルアルキル;ハロアルキル;ハロアルコキシ;ヒドロキシアルキル;アルコキシアルキル;アセチル;アルキルスルホニル;アルキルスルホニルアルキル;アミノカルボニルオキシアルキル;ヒドロキシカルボニルアルキル;ヒドロキシアルキルオキシカルボニルアルキル;アリール;アラルキル;アリールスルホニル;ヘテロアリール;ヘテロアリールアルキル;ヘテロアリールスルホニル;ヘテロシクリル;またはヘテロシクリルアルキルである)
で示されていてもよい。
(式中、
R3およびR4は、各々独立して、水素;アルキル;アルケニル;アミノ;ハロ;アミド;ハロアルキル;アルコキシ;ヒドロキシ;ハロアルコキシ;ニトロ;ヒドロキシアルキル;アルコキシアルキル;ヒドロキシアルコキシ;アルキニルアルコキシ;アルキルスルホニル;アリールスルホニル;シアノ;アリール;ヘテロアリール;ヘテロシクリル;ヘテロシクリルアルコキシ;アリールオキシ;ヘテロアリールオキシ;アラルキルオキシ;ヘテロアラルキルオキシ;場合により置換されているフェノキシ;−(CH2)m−(Z)n−(CO)−Rf、または−(CH2)m−(Z)n−SO2−(NRg)n−Rfであり、ここで、mおよびnは、各々独立して、0または1であり、Zは、OまたはNRgであり、Rfは、水素、アルキル、ヒドロキシ、アルコキシ、アミノ、ヒドロキシアルキル、またはアルコキシアルキルであり、各Rgは、独立して、水素またはアルキルであるか;あるいは、R3およびR4は、一緒になってアルキレンジオキシを形成していてもよく;あるいは、R3およびR4は、それらが結合している原子と一緒になって、O、S、およびNから選択される1または2個のヘテロ原子を場合により含む5または6員環を形成していてもよく;
R7およびR8の一方は水素であり、他方は、水素;アルキル;シクロアルキル;シクロアルキルアルキル;ハロアルキル;ハロアルコキシ;ヒドロキシアルキル;アルコキシアルキル;アセチル;アルキルスルホニル;アルキルスルホニルアルキル;アミノカルボニルオキシアルキル;ヒドロキシカルボニルアルキル;ヒドロキシアルキルオキシカルボニルアルキル;アリール;アラルキル;アリールスルホニル;ヘテロアリール;ヘテロアリールアルキル;ヘテロアリールスルホニル;ヘテロシクリル;またはヘテロシクリルアルキルであり;
RdおよびReの一方は水素であり、他方は、水素;アルキル;シクロアルキル;シクロアルキルアルキル;ハロアルキル;ハロアルコキシ;ヒドロキシアルキル;アルコキシアルキル;アセチル;アルキルスルホニル;アルキルスルホニルアルキル;アミノカルボニルオキシアルキル;ヒドロキシカルボニルアルキル;ヒドロキシアルキルオキシカルボニルアルキル;アリール;アラルキル;アリールスルホニル;ヘテロアリール;ヘテロアリールアルキル;ヘテロアリールスルホニル;ヘテロシクリル;またはヘテロシクリルアルキルである)
で示されていてもよい。
(式中、
Xは、−CH2−;または−O−であり;
R1は、アルキル;アルケニル;シクロアルキル;またはシクロアルケニル;またはハロであり;
R2は、水素;アルキル;アルケニル;アミノ;ハロ;アミド;ハロアルキル;アルコキシ;ヒドロキシ;ハロアルコキシ;ニトロ;ヒドロキシアルキル;アルコキシアルキル;ヒドロキシアルコキシ;アルキニルアルコキシ;アルキルスルホニル;アリールスルホニル;シアノ;アリール;ヘテロアリール;ヘテロシクリル;ヘテロシクリルアルコキシ;アリールオキシ;ヘテロアリールオキシ;アラルキルオキシ;ヘテロアラルキルオキシ;場合により置換されているフェノキシ;または−(CH2)m−(Z)n−(CO)−Rf、または−(CH2)m−(Z)n−SO2−(NRg)n−Rfであり、ここで、mおよびnは、各々独立して、0または1であり、Zは、OまたはNRgであり、Rfは、水素、アルキル、ヒドロキシ、アルコキシ、アミノ、ヒドロキシアルキル、またはアルコキシアルキルであり、各Rgは、独立して、水素またはアルキルであり;
R7およびR8の一方は水素であり、他方は、水素;アルキル;シクロアルキル;シクロアルキルアルキル;ハロアルキル;ハロアルコキシ;ヒドロキシアルキル;アルコキシアルキル;アセチル;アルキルスルホニル;アルキルスルホニルアルキル;アミノカルボニルオキシアルキル;ヒドロキシカルボニルアルキル;ヒドロキシアルキルオキシカルボニルアルキル;アリール;アラルキル;アリールスルホニル;ヘテロアリール;ヘテロアリールアルキル;ヘテロアリールスルホニル;ヘテロシクリル;またはヘテロシクリルアルキルであり;
RdおよびReの一方は水素であり、他方は、水素;アルキル;シクロアルキル;シクロアルキルアルキル;ハロアルキル;ハロアルコキシ;ヒドロキシアルキル;アルコキシアルキル;アセチル;アルキルスルホニル;アルキルスルホニルアルキル;アミノカルボニルオキシアルキル;ヒドロキシカルボニルアルキル;ヒドロキシアルキルオキシカルボニルアルキル;アリール;アラルキル;アリールスルホニル;ヘテロアリール;ヘテロアリールアルキル;ヘテロアリールスルホニル;ヘテロシクリル;またはヘテロシクリルアルキルであり;
Qは、CR9であり、AおよびEの一方はO、S、またはNR10であり、他方はCR9またはNであるか;あるいは
Qは、Nであり、AおよびEの一方はNR10であり、他方はCR9であり;
各R9は、独立して、水素、アルキル、ハロ、またはアルコキシであり;
R10は、水素、アルキル、ヒドロキシアルキル、アルコキシアルキル、−(CH2)m−(Z)n−(CO)−Rf、または−(CH2)m−(Z)n−SO2−(NRg)n−Rfである)
で示されていてもよい。
(式中、
Xは、−CH2−;または−O−であり;
R1は、アルキル;アルケニル;シクロアルキル;またはシクロアルケニル;またはハロであり;
R4は、水素;アルキル;アルケニル;アミノ;ハロ;アミド;ハロアルキル;アルコキシ;ヒドロキシ;ハロアルコキシ;ニトロ;ヒドロキシアルキル;アルコキシアルキル;ヒドロキシアルコキシ;アルキニルアルコキシ;アルキルスルホニル;アリールスルホニル;シアノ;アリール;ヘテロアリール;ヘテロシクリル;ヘテロシクリルアルコキシ;アリールオキシ;ヘテロアリールオキシ;アラルキルオキシ;ヘテロアラルキルオキシ;場合により置換されているフェノキシ;または−(CH2)m−(Z)n−(CO)−Rf、または−(CH2)m−(Z)n−SO2−(NRg)n−Rfであり、ここで、mおよびnは、各々独立して、0または1であり、ZはOまたはNRgであり、Rfは、水素、アルキル、ヒドロキシ、アルコキシ、アミノ、ヒドロキシアルキル、またはアルコキシアルキルであり、各Rgは、独立して、水素またはアルキルであり;
R7およびR8の一方は水素であり、他方は、水素;アルキル;シクロアルキル;シクロアルキルアルキル;ハロアルキル;ハロアルコキシ;ヒドロキシアルキル;アルコキシアルキル;アセチル;アルキルスルホニル;アルキルスルホニルアルキル;アミノカルボニルオキシアルキル;ヒドロキシカルボニルアルキル;ヒドロキシアルキルオキシカルボニルアルキル;アリール;アラルキル;アリールスルホニル;ヘテロアリール;ヘテロアリールアルキル;ヘテロアリールスルホニル;ヘテロシクリル;またはヘテロシクリルアルキルであり;
RdおよびReの一方は水素であり、他方は、水素;アルキル;シクロアルキル;シクロアルキルアルキル;ハロアルキル;ハロアルコキシ;ヒドロキシアルキル;アルコキシアルキル;アセチル;アルキルスルホニル;アルキルスルホニルアルキル;アミノカルボニルオキシアルキル;ヒドロキシカルボニルアルキル;ヒドロキシアルキルオキシカルボニルアルキル;アリール;アラルキル;アリールスルホニル;ヘテロアリール;ヘテロアリールアルキル;ヘテロアリールスルホニル;ヘテロシクリル;またはヘテロシクリルアルキルであり;
Qは、CR9であり、AおよびEの一方はO、S、またはNR10であり、他方はCR9またはNであるか;あるいは
Qは、Nであり、AおよびEの一方はNR10であり、他方はCR9であり;
各R9は、独立して、水素、アルキル、ハロ、またはアルコキシであり;
R10は、水素、アルキル、ヒドロキシアルキル、アルコキシアルキル、−(CH2)m−(Z)n−(CO)−Rf、または−(CH2)m−(Z)n−SO2−(NRg)n−Rfである)
で示されていてもよい。
下記の調製例及び実施例は、当業者が本発明をより明確に理解し、実施できるように示されている。それらは、本発明の範囲を制限するものと見なされるべきではなく、単に本発明の代表的なものとして見なされるべきである。
工程1:ビス−ベンジルオキシカルボニル−N−(2−(R)−ヒドロキシ−1−メチル−エチル)−グアニジン
N−(3−エタンスルホニル−1−メチル−プロピル)−グアニジン;
4−グアニジノ−ピペリジン−1−カルボン酸エチルエステル;
N−(1−シクロプロピル−エチル)−グアニジン;
N−(テトラヒドロ−チオピラン−4−イル)−グアニジン;
N−[2−(4−アセチル−ピペラジン−1−イル)−1−メチル−エチル]−グアニジン;
N−(1−ヒドロキシメチル−プロピル)−グアニジン;
N−(1−メタンスルホニル−ピペリジン−4−イル)−グアニジン;及び
N−[3−ヒドロキシ−1−(2−ヒドロキシ−エチル)−プロピル]−グアニジン。
工程1.4−シクロプロピル−1,2−ジメトキシ−ベンゼン
工程1:5−(5−ヨード−2−イソプロピル−4−メトキシ−フェノキシ)−ピリミジン−2,4−ジアミン
工程1.5−[5−(4,5−ジヒドロ−1H−イミダゾール−2−イル)−2−イソプロピル−4−メトキシ−フェノキシ]−ピリミジン−2,4−ジアミン
工程1.5−(5−アミノ−2−イソプロピル−4−メトキシ−フェノキシ)−ピリミジン−2,4−ジアミン
(M+H)+=320。
工程1.5−(5−アミノ−2−イソプロピル−4−メトキシ−フェノキシ)−ピリミジン−2,4−ジアミン
(M+H)=340。
工程1.4−クロロ−N−[5−(2,4−ジアミノ−ピリミジン−5−イルオキシ)−4−イソプロピル−2−メトキシ−フェニル]−ブチルアミド
工程1.5−(2−イソプロピル−5−イソチオシアナート−4−メトキシ−フェノキシ)−ピリミジン−2,4−ジアミン
[MH]+=303。
工程1.5−(2,4−ジアミノ−ピリミジン−5−イルオキシ)−4−イソプロピル−2−メトキシ−ベンゼンスルホニルクロリド
上記工程3の2−イソプロピル−3−メトキシ−フェノールを使用し、続いて実施例2の工程5〜7の手順を使用して、5−(2−イソプロピル−3−メトキシ−フェノキシ)−ピリミジン−2,4−ジアミンを調製した。MS(M+H)=275。
工程1.5−[5−ヨード−2−イソプロピル−4−(2−トリメチルシラニルオキシ−エトキシ)−フェノキシ]−ピリミジン−2,4−ジアミン
工程1.5−(4−アミノ−2−エチルアミノ−ピリミジン−5−イルオキシ)−4−イソプロピル−2−メトキシ−ベンゾニトリル
M+H 381。
工程1.2−ブロモ−1−[4−イソプロピル−2−メトキシ−5−(トルエン−4−スルホニル)−フェニル]−エタノン
工程1.5−(2,4−ジアミノ−ピリミジン−5−イルオキシ)−4−イソプロピル−2−メトキシ−チオベンズアミド
この実施例の工程1で使用した5−(2,4−ジアミノ−ピリミジン−5−イルオキシ)−4−イソプロピル−2−メトキシ−ベンゾニトリルを、スキーム1に記載したように調製した。
無水エタノール5mL中2−(4−エチル−7−メチル−ベンゾ[b]チオフェン−5−イルオキシ)−3−フェニルアミノ−アクリロニトリル(360mg、1mmol)、グアニジンHCl(411mg、4mmol)及びナトリウムメトキシド(880ul、4mmol、メタノール中4.9M溶液)を無水エタノール5ml中で2時間加熱還流した。ピペットを介してEtOH 1ml中の予備混合したグアニジンHCl(411mg、4mmol)及びナトリウムメトキシド(880ul、4mmol、メタノール中4.9M溶液)を加え、反応混合物を2時間加熱還流した。反応混合物を冷却し、水で希釈し、EtOAcで2回抽出し、ブラインで洗浄し、硫酸マグネシウムで乾燥した。溶媒を真空下で除去し、5−(4−エチル−7−メチル−ベンゾ−[b]チオフェン−5−イルオキシ)−ピリミジン−2,4−ジアミン241mgを白色の固体として得た(74%)。質量分析 M+H=301、融点=181℃。この生成物175mgをMeOH及びHCl/ジエチルエーテルから再結晶化して、対応するHCl塩98mg、49%を得た。質量分析 M+H=301、融点>300℃。
塩化メチレン(15ml)中の5−メトキシ−1,3−ジメチル−6−トリフルオロメチル−1H−インドール(725mg、3mmol)を0℃に冷却し、シリンジを介してBBr3(塩化メチレン中の1N溶液14.9ml)をゆっくりと加えた。反応混合物を0℃で15分撹拌し、次に1時間撹拌しながら室温に温めた。反応混合物を1N NaOH 75mLでゆっくりとクエンチした。混合物を1N HClでpH約5に酸性化し、塩化メチレンで抽出し、合わせた有機層を水、ブラインで洗浄し、硫酸マグネシウムで乾燥した。溶媒を減圧下で除去し、残渣をクロマトグラフィー(20%EtOAc/ヘキサン)に付して、1,3−ジメチル−6−トリフルオロメチル−1H−インドール−5−オール235mg(75%)を得た。
実施例62の工程6〜9の手順を使用して、1,3−ジメチル−6−トリフルオロメチル−1H−インドール−5−オールを、5−(1,3−ジメチル−6−トリフルオロメチル−1H−インドール−5−イルオキシ)−ピリミジン−2,4−ジアミンに変換した(70mg)。対応するヒドロクロリド塩をMeOH/ジエチルエーテルから再結晶化した。質量分析 M+H=338、融点256℃。
質量分析 M+H=342 融点>300℃。
工程1.7−イソプロピル−4−メチル−ベンゾオキサゾール−6−オール
工程1.7−イソプロピル−2,4−ジメチル−ベンゾオキサゾール−6−オール
約0.025〜0.5%の活性化合物を含むいくつかの水性懸濁剤を、鼻腔用スプレー製剤として調製した。該製剤は、場合により、例えば、微結晶セルロース、カルボキシメチルセルロースナトリウム、デキストロースなどの不活性成分を含む。塩酸を加えてpHを調整してもよい。鼻腔用スプレー製剤は、典型的には1回の作動で約50〜100μlの製剤を送達する鼻腔用スプレー計量ポンプにより送達してもよい。典型的な投与スケジュールでは、4〜12時間毎に2〜4回噴霧する。
CHO−K1細胞を、クローン化ラットP2X3またはヒトP2X2/3受容体サブユニットでトランスフェクトさせ、フラスコ中で継代培養した。FLIPR実験の18〜24時間前に、細胞をそのフラスコから取り出し、遠心分離にかけ、2.5×105細胞/mlで栄養培地中に再懸濁した。細胞を、壁の黒い96ウェルプレートに50,000細胞/ウェルの密度で分注し、5%CO2中37℃で一晩インキュベートした。実験日に、細胞をFLIPR緩衝液(カルシウムおよびマグネシウムを含まないハンク平衡塩溶液、10mMのHEPES、2mMのCaCl2、2.5mMのプロベネシド;FB)中で洗浄した。各ウェルに、100μlのFBおよび100μlの蛍光ダイFluo−3AM[最終濃度2μM]を加えた。37℃での1時間のダイを負荷させたインキュベート後、細胞を4回FBで洗浄し、最後の75μl/ウェルのFBを各ウェルに残した。
Claims (8)
- 式(I)
(式中、
Xは、−CH2−;−O−;−CHOH−;−S(O)n−:または−NRc−であり、ここで、nは0〜2であり、Rcは水素またはアルキルであり;
Yは、水素;または−NRdReであり、ここで、RdおよびReの一方は水素であり、他方は、水素;アルキル;シクロアルキル;シクロアルキルアルキル;ハロアルキル;ハロアルコキシ;ヒドロキシアルキル;アルコキシアルキル;アセチル;アルキルスルホニル;アルキルスルホニルアルキル;アミノカルボニルオキシアルキル;ヒドロキシカルボニルアルキル;ヒドロキシアルキルオキシカルボニルアルキル;アリール;アラルキル;アリールスルホニル;ヘテロアリール;ヘテロアリールアルキル;ヘテロアリールスルホニル;ヘテロシクリル;またはヘテロシクリルアルキルであり;
Dは、場合により酸素であり;
R1は、アルキル;アルケニル;シクロアルキル;シクロアルケニル;ハロ;ハロアルキル;ヒドロキシアルキル;またはアルコキシであり;
R2、R3、R4、およびR5は、各々独立して、水素;アルキル;アルケニル;アミノ;ハロ;アミド;ハロアルキル;アルコキシ;ヒドロキシ;ハロアルコキシ;ニトロ;アミノ;ヒドロキシアルキル;アルコキシアルキル;ヒドロキシアルコキシ;アルキニルアルコキシ;アルキルスルホニル;アリールスルホニル;シアノ;アリール;ヘテロアリール;ヘテロシクリル;ヘテロシクリルアルコキシ;アリールオキシ;ヘテロアリールオキシ;アラルキルオキシ;ヘテロアラルキルオキシ;場合により置換されているフェノキシ;−(CH2)m−(Z)n−(CO)−Rf、または−(CH2)m−(Z)n−SO2−(NRg)n−Rfであり、ここで、mおよびnは、各々独立して、0または1であり、ZはOまたはNRgであり、Rfは、水素、アルキル、ヒドロキシ、アルコキシ、アミノ、ヒドロキシアルキル、またはアルコキシアルキルであり、各Rgは、独立して、水素またはアルキルであるか;あるいは、R3およびR4は、一緒になって、アルキレンジオキシを形成していてもよく;あるいは、R3およびR4は、それらが結合している原子と一緒になって、O、S、およびNから選択される1または2個のヘテロ原子を場合により含む5または6員環を形成していてもよく;あるいは、R2およびR3は、一緒になって、アルキレンジオキシを形成していてもよく;あるいは、R2およびR3は、それらが結合している原子と一緒になって、O、S、およびNから選択される1または2個のヘテロ原子を場合により含む5または6員環を形成していてもよく;
R6は、水素;アルキル;ハロ;ハロアルキル;アミノ;またはアルコキシであり;
R7およびR8の一方は水素であり、他方は、水素;アルキル;シクロアルキル;シクロアルキルアルキル;ハロアルキル;ハロアルコキシ;ヒドロキシアルキル;アルコキシアルキル;アセチル;アルキルスルホニル;アルキルスルホニルアルキル;アミノカルボニルオキシアルキル;ヒドロキシカルボニルアルキル;ヒドロキシアルキルオキシカルボニルアルキル;アリール;アラルキル;アリールスルホニル;ヘテロアリール;ヘテロアリールアルキル;ヘテロアリールスルホニル;ヘテロシクリル;またはヘテロシクリルアルキルであり;
ただし、Xが−CH2−であり、R7、R8、Rd、およびReが水素である場合には、R1は、イソプロピル、イソプロペニル、シクロプロピル、またはヨードである)
で示される化合物またはその薬学的に許容されうる塩。 - 前記化合物が、(a)式(II)
(式中、
Xは、−CH2−;または−O−であり;
R1は、アルキル;アルケニル;シクロアルキル;またはシクロアルケニル;またはハロであり;
R3およびR4は、各々独立して、水素;アルキル;アルケニル;アミノ;ハロ;アミド;ハロアルキル;アルコキシ;ヒドロキシ;ハロアルコキシ;ニトロ;ヒドロキシアルキル;アルコキシアルキル;ヒドロキシアルコキシ;アルキニルアルコキシ;アルキルスルホニル;アリールスルホニル;シアノ;アリール;ヘテロアリール;ヘテロシクリル;ヘテロシクリルアルコキシ;アリールオキシ;ヘテロアリールオキシ;アラルキルオキシ;ヘテロアラルキルオキシ;場合により置換されているフェノキシ;−(CH2)m−(Z)n−(CO)−Rf、または−(CH2)m−(Z)n−SO2−(NRg)n−Rfであり、ここで、mおよびnは、各々独立して、0または1であり、Zは、OまたはNRgであり、Rfは、水素、アルキル、ヒドロキシ、アルコキシ、アミノ、ヒドロキシアルキル、またはアルコキシアルキルであり、各Rgは、独立して、水素またはアルキルであるか;あるいは、R3およびR4は、一緒になってアルキレンジオキシを形成していてもよく;あるいは、R3およびR4は、それらが結合している原子と一緒になって、O、S、およびNから選択される1または2個のヘテロ原子を場合により含む5または6員環を形成していてもよく;
R7およびR8の一方は水素であり、他方は、水素;アルキル;シクロアルキル;シクロアルキルアルキル;ハロアルキル;ハロアルコキシ;ヒドロキシアルキル;アルコキシアルキル;アセチル;アルキルスルホニル;アルキルスルホニルアルキル;アミノカルボニルオキシアルキル;ヒドロキシカルボニルアルキル;ヒドロキシアルキルオキシカルボニルアルキル;アリール;アラルキル;アリールスルホニル;ヘテロアリール;ヘテロアリールアルキル;ヘテロアリールスルホニル;ヘテロシクリル;またはヘテロシクリルアルキルであり;
RdおよびReの一方は水素であり、他方は、水素;アルキル;シクロアルキル;シクロアルキルアルキル;ハロアルキル;ハロアルコキシ;ヒドロキシアルキル;アルコキシアルキル;アセチル;アルキルスルホニル;アルキルスルホニルアルキル;アミノカルボニルオキシアルキル;ヒドロキシカルボニルアルキル;ヒドロキシアルキルオキシカルボニルアルキル;アリール;アラルキル;アリールスルホニル;ヘテロアリール;ヘテロアリールアルキル;ヘテロアリールスルホニル;ヘテロシクリル;またはヘテロシクリルアルキルである)
で示される化合物であるか、あるいは
(b)式(III)
(式中、
R1は、イソプロピル;イソプロペニル;シクロプロピル;またはヨードであり;
R3、R4、R7、R8、Rd、およびReは、(a)で定義した通りである)
で示される化合物であるか;あるいは
(c)式(IV)
(式中、
R1は、アルキル;アルケニル;シクロアルキル;またはシクロアルケニルであり;
R3、R4、R7、R8、Rd、およびReは、(a)で定義した通りである)
で示される化合物であるか;あるいは
(d)式(V)
(式中、R3、R4、R7、R8、Rd、およびReは、(a)で定義した通りである)
で示される化合物であるか;あるいは
(e)式(VI)
(式中、R3、R4、R7、R8、Rd、およびReは、(a)で定義した通りである)
で示される化合物であるか;あるいは
(f)式(VII)
(式中、
Xは、−CH2−;または−O−であり;
R1は、アルキル;アルケニル;シクロアルキル;またはシクロアルケニル;またはハロであり;
R2は、水素;アルキル;アルケニル;アミノ;ハロ;アミド;ハロアルキル;アルコキシ;ヒドロキシ;ハロアルコキシ;ニトロ;ヒドロキシアルキル;アルコキシアルキル;ヒドロキシアルコキシ;アルキニルアルコキシ;アルキルスルホニル;アリールスルホニル;シアノ;アリール;ヘテロアリール;ヘテロシクリル;ヘテロシクリルアルコキシ;アリールオキシ;ヘテロアリールオキシ;アラルキルオキシ;ヘテロアラルキルオキシ;場合により置換されているフェノキシ;または−(CH2)m−(Z)n−(CO)−Rf、または−(CH2)m−(Z)n−SO2−(NRg)n−Rfであり、ここで、mおよびnは、各々独立して、0または1であり、Zは、OまたはNRgであり、Rfは、水素、アルキル、ヒドロキシ、アルコキシ、アミノ、ヒドロキシアルキル、またはアルコキシアルキルであり、各Rgは、独立して、水素またはアルキルであり;
R7、R8、Rd、およびReは、(a)に定義した通りであり;
Qは、CR9であり、AおよびEの一方はO、S、またはNR10であり、他方はCR9またはNであるか;あるいは
Qは、Nであり、AおよびEの一方はNR10であり、他方はCR9であり;
各R9は、独立して、水素、アルキル、ハロ、またはアルコキシであり;
R10は、水素、アルキル、ヒドロキシアルキル、アルコキシアルキル、−(CH2)m−(Z)n−(CO)−Rf、または−(CH2)m−(Z)n−SO2−(NRg)n−Rfである)
で示される化合物であるか;あるいは
(g)式(VIII)
(式中、
Xは、−CH2−;または−O−であり;
R1は、アルキル;アルケニル;シクロアルキル;またはシクロアルケニル;またはハロであり;
R4は、水素;アルキル;アルケニル;アミノ;ハロ;アミド;ハロアルキル;アルコキシ;ヒドロキシ;ハロアルコキシ;ニトロ;ヒドロキシアルキル;アルコキシアルキル;ヒドロキシアルコキシ;アルキニルアルコキシ;アルキルスルホニル;アリールスルホニル;シアノ;アリール;ヘテロアリール;ヘテロシクリル;ヘテロシクリルアルコキシ;アリールオキシ;ヘテロアリールオキシ;アラルキルオキシ;ヘテロアラルキルオキシ;場合により置換されているフェノキシ;または−(CH2)m−(Z)n−(CO)−Rf、または−(CH2)m−(Z)n−SO2−(NRg)n−Rfであり、ここで、mおよびnは、各々独立して、0または1であり、ZはOまたはNRgであり、Rfは、水素、アルキル、ヒドロキシ、アルコキシ、アミノ、ヒドロキシアルキル、またはアルコキシアルキルであり、各Rgは、独立して、水素またはアルキルであり;
R7、R8、Rd、およびReは、(a)で定義した通りであり;
Qは、CR9であり、AおよびEの一方はO、S、またはNR10であり、他方はCR9またはNであるか;あるいは
Qは、Nであり、AおよびEの一方はNR10であり、他方はCR9であり;
各R9は、独立して、水素、アルキル、ハロ、またはアルコキシであり;
R10は、水素、アルキル、ヒドロキシアルキル、アルコキシアルキル、−(CH2)m−(Z)n−(CO)−Rf、または−(CH2)m−(Z)n−SO2−(NRg)n−Rfである)
で示される化合物である、請求項1の化合物。 - 薬学的に許容されうる賦形剤と請求項1に記載の請求項1の化合物とを含む医薬組成物。
- P2X3またはP2X2/3受容体アンタゴニストにより仲介される疾病を処置する方法であって、それを必要とする被験体に、有効量の請求項1に記載の式(I)の化合物を投与することを含む、前記方法。
- 前記疾病は、泌尿生殖器疾病または疼痛に関連する疾病である、請求項4に記載の方法。
- 前記泌尿生殖器疾病が、膀胱容量の減少;頻尿;切迫尿失禁;緊張性尿失禁;膀胱過活動;良性前立腺肥大症;前立腺炎;排尿筋反射亢進;頻繁な排尿回数;夜間頻尿;尿意切迫;過活動膀胱;骨盤過敏症;尿道炎;前立腺炎;骨盤痛症候群;前立腺痛;膀胱炎;または特発性膀胱過敏症であり、疼痛に関連する疾病が、炎症性疼痛;手術による疼痛;内臓痛;歯痛;月経前疼痛;中枢の痛み;火傷による疼痛;偏頭痛もしくはクラスター頭痛症;神経損傷;神経炎;神経痛;中毒;虚血損傷;間質性膀胱炎;癌性疼痛;ウイルス性、寄生虫性、もしくは細菌性の感染;外傷後の損傷;または過敏腸管症候群に関連する疼痛である、請求項5記載の方法。
- P2X3またはP2X2/3受容体アンタゴニストにより仲介される疾病の処置のための医薬の製造のための、請求項1に記載の化合物の使用。
- 本明細書に記載されている本発明。
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NO (4) | NO339497B1 (ja) |
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PT (1) | PT1725540E (ja) |
RU (1) | RU2422441C2 (ja) |
SI (1) | SI1725540T1 (ja) |
TW (1) | TWI313604B (ja) |
WO (1) | WO2005095359A1 (ja) |
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2019
- 2019-05-22 US US16/419,353 patent/US20190270713A1/en not_active Abandoned
- 2019-12-11 US US16/710,373 patent/US20200115347A1/en not_active Abandoned
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2020
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2022
- 2022-03-22 US US17/655,843 patent/US20230100975A1/en not_active Abandoned
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2023
- 2023-04-27 US US18/308,282 patent/US20240158356A1/en active Pending
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2024
- 2024-03-04 BE BE2024C508C patent/BE2024C508I2/nl unknown
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- 2024-03-06 NO NO2024010C patent/NO2024010I1/no unknown
- 2024-03-12 FR FR24C1011C patent/FR24C1011I1/fr active Active
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