JP2007517647A5 - - Google Patents

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Publication number
JP2007517647A5
JP2007517647A5 JP2006548209A JP2006548209A JP2007517647A5 JP 2007517647 A5 JP2007517647 A5 JP 2007517647A5 JP 2006548209 A JP2006548209 A JP 2006548209A JP 2006548209 A JP2006548209 A JP 2006548209A JP 2007517647 A5 JP2007517647 A5 JP 2007517647A5
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JP
Japan
Prior art keywords
spray
inert gas
temperature setting
housing
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006548209A
Other languages
English (en)
Japanese (ja)
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JP2007517647A (ja
Filing date
Publication date
Priority claimed from DE102004001095A external-priority patent/DE102004001095A1/de
Application filed filed Critical
Publication of JP2007517647A publication Critical patent/JP2007517647A/ja
Publication of JP2007517647A5 publication Critical patent/JP2007517647A5/ja
Pending legal-status Critical Current

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JP2006548209A 2004-01-05 2005-01-05 高周波スプレー装置 Pending JP2007517647A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102004001095A DE102004001095A1 (de) 2004-01-05 2004-01-05 Hochfrequenzzerstäubungsvorrichtung
PCT/EP2005/000041 WO2005065843A1 (de) 2004-01-05 2005-01-05 Hochfrequenzzerstäubungsvorrichtung

Publications (2)

Publication Number Publication Date
JP2007517647A JP2007517647A (ja) 2007-07-05
JP2007517647A5 true JP2007517647A5 (enExample) 2008-01-24

Family

ID=34706780

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006548209A Pending JP2007517647A (ja) 2004-01-05 2005-01-05 高周波スプレー装置

Country Status (12)

Country Link
US (1) US20090032612A1 (enExample)
EP (1) EP1701802B1 (enExample)
JP (1) JP2007517647A (enExample)
CN (1) CN100518957C (enExample)
AT (1) ATE381968T1 (enExample)
AU (1) AU2005203882A1 (enExample)
BR (1) BRPI0506664A (enExample)
CA (1) CA2549372A1 (enExample)
DE (2) DE102004001095A1 (enExample)
ES (1) ES2299992T3 (enExample)
IL (1) IL176279A0 (enExample)
WO (1) WO2005065843A1 (enExample)

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EP1957695B1 (en) 2005-12-07 2011-02-09 Ramot at Tel-Aviv University Ltd. Drug-delivering composite structures
DE102006012389A1 (de) * 2006-03-17 2007-09-20 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Verfahren und Vorrichtung zur Zerstäubung einer Flüssigkeit
US8304012B2 (en) * 2006-05-04 2012-11-06 Advanced Cardiovascular Systems, Inc. Method for drying a stent
DE102007002127A1 (de) * 2007-01-15 2008-07-17 Deutsches Zentrum für Luft- und Raumfahrt e.V. Konstruktionselement
CN101883663A (zh) * 2007-10-16 2010-11-10 Hkpb科技有限公司 表面涂布方法和其用途
US8211489B2 (en) 2007-12-19 2012-07-03 Abbott Cardiovascular Systems, Inc. Methods for applying an application material to an implantable device
US8361538B2 (en) 2007-12-19 2013-01-29 Abbott Laboratories Methods for applying an application material to an implantable device
CN102187429A (zh) * 2008-10-16 2011-09-14 应用材料公司 用于回收来自处理系统的热的方法和设备
DE102010007479B3 (de) * 2010-02-09 2011-06-22 EISENMANN Anlagenbau GmbH & Co. KG, 71032 Anlage zum Beschichten von Gegenständen
US20120082831A1 (en) * 2010-10-04 2012-04-05 Agiltron, Inc. Nano-Porous Coatings and Making Methods
KR101263592B1 (ko) 2011-07-25 2013-05-13 고려대학교 산학협력단 정전기 스프레이 장치
CN102500502B (zh) * 2011-10-10 2016-02-10 苏州科技学院 一种二级超声振动雾化器
JP6126867B2 (ja) * 2013-02-25 2017-05-10 東京応化工業株式会社 塗布装置及び塗布方法
KR101440309B1 (ko) 2013-05-06 2014-09-17 주식회사 노아닉스 노즐 선택형 스텐트 코팅시스템
FI125920B (en) * 2013-09-09 2016-04-15 Beneq Oy A method of coating a substrate
EP3175476A1 (en) * 2014-07-31 2017-06-07 Katholieke Universiteit Leuven Method and apparatus for hot jet treatment
JP6945120B2 (ja) * 2014-08-29 2021-10-06 株式会社Flosfia 金属膜形成方法
WO2017098651A1 (ja) * 2015-12-11 2017-06-15 東芝三菱電機産業システム株式会社 ミスト塗布成膜装置及びミスト塗布成膜方法
DE112016007052T5 (de) * 2016-07-11 2019-03-21 Toshiba Mitsubishi-Electric Industrial Systems Corporation Sprühbeschichtungsfilmbildungsvorrichtung und Sprühbeschichtungsfilmbildungsverfahren
US12097521B2 (en) 2016-07-15 2024-09-24 Transitions Optical, Ltd. Apparatus and method for precision coating of ophthalmic lenses with photochromic coatings
EP3275559B1 (en) * 2016-07-27 2021-09-15 Exel Industries Coating system with an ultrasonic spray head and electrostatic field
GB2555125B (en) * 2016-10-19 2020-05-13 Univ Cape Town Coating system
CN107115997B (zh) * 2017-06-16 2019-09-03 浙江吉利汽车有限公司 一种漆雾溢流拦截装置及风压式喷漆房
CN110000142A (zh) * 2019-04-30 2019-07-12 云谷（固安）科技有限公司 掩膜版清洁装置及方法
CN110108150A (zh) * 2019-06-11 2019-08-09 重庆鸿运和锐科技有限公司 一种提高射流喷雾塔冷效的进风布水拓扑结构装置
CN110624751B (zh) * 2019-10-31 2024-07-23 兰州理工大学 复合场作用下高速金属熔滴/基板碰撞装置及使用方法
WO2021138715A1 (en) * 2020-01-06 2021-07-15 International Scientific Pty Ltd Method of enhanced delivery of liquids to surfaces
CN112221806B (zh) * 2020-10-10 2021-11-30 威海盛洁医疗科技有限公司 一种溶液分散良好的超声雾化喷涂装置及其使用方法
US12420296B2 (en) * 2021-10-06 2025-09-23 Ford Motor Company Ultrasonic atomizer for applying a coating to a substrate with electrostatic charge to prevent droplet coalescence during atomization
CN114345614A (zh) * 2022-03-08 2022-04-15 深圳市库珀科技发展有限公司 一种用于覆膜支架的生产装置
CN114308477A (zh) * 2022-03-17 2022-04-12 深圳市库珀科技发展有限公司 一种用于覆膜支架的自动生产装置
CN114959552B (zh) * 2022-05-05 2023-12-15 江苏大学 一种球粒轰击式零件表面氮碳硼选区共渗系统及方法
TW202422750A (zh) * 2022-10-12 2024-06-01 荷蘭商Ａｓｍ Ｉｐ私人控股有限公司 氣體入口管總成、及基板處理設備
CN117403170B (zh) * 2023-11-01 2025-06-24 山东万创金属科技有限公司 一种喷锌多孔扁管表面喷锌方法

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WO2002003883A2 (en) * 2000-07-10 2002-01-17 Epion Corporation Improving effectiveness of medical stents by gcib
US6927838B2 (en) * 2001-02-27 2005-08-09 Nikon Corporation Multiple stage, stage assembly having independent stage bases
US20030161937A1 (en) * 2002-02-25 2003-08-28 Leiby Mark W. Process for coating three-dimensional substrates with thin organic films and products
US6789741B2 (en) * 2002-03-27 2004-09-14 S. C. Johnson & Son, Inc. Method and apparatus for atomizing liquids having minimal droplet size
JP2003290699A (ja) * 2002-03-29 2003-10-14 Fuji Photo Film Co Ltd ウエブ冷却装置
DE10324415A1 (de) 2003-05-28 2004-12-16 Blue Membranes Gmbh Verfahren zur Beschichtung von Substraten mit kohlenstoffbasiertem Material

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