JP2007509370A - 保護オーバーコート層を有する画像形成要素 - Google Patents
保護オーバーコート層を有する画像形成要素 Download PDFInfo
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- JP2007509370A JP2007509370A JP2006535628A JP2006535628A JP2007509370A JP 2007509370 A JP2007509370 A JP 2007509370A JP 2006535628 A JP2006535628 A JP 2006535628A JP 2006535628 A JP2006535628 A JP 2006535628A JP 2007509370 A JP2007509370 A JP 2007509370A
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- layer
- imaging element
- imaging
- image forming
- image
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- GYVGXEWAOAAJEU-UHFFFAOYSA-N n,n,4-trimethylaniline Chemical compound CN(C)C1=CC=C(C)C=C1 GYVGXEWAOAAJEU-UHFFFAOYSA-N 0.000 description 1
- ALXIOUGHHXXLKX-UHFFFAOYSA-N n,n-dimethyl-2,6-di(propan-2-yl)aniline Chemical compound CC(C)C1=CC=CC(C(C)C)=C1N(C)C ALXIOUGHHXXLKX-UHFFFAOYSA-N 0.000 description 1
- BZFWSDQZPYVFHP-UHFFFAOYSA-N n,n-dimethyl-4-methylsulfanylaniline Chemical compound CSC1=CC=C(N(C)C)C=C1 BZFWSDQZPYVFHP-UHFFFAOYSA-N 0.000 description 1
- XZEJXEZIWLTFJR-UHFFFAOYSA-N n-[4-(dimethylamino)phenyl]acetamide Chemical compound CN(C)C1=CC=C(NC(C)=O)C=C1 XZEJXEZIWLTFJR-UHFFFAOYSA-N 0.000 description 1
- YQCFXPARMSSRRK-UHFFFAOYSA-N n-[6-(prop-2-enoylamino)hexyl]prop-2-enamide Chemical compound C=CC(=O)NCCCCCCNC(=O)C=C YQCFXPARMSSRRK-UHFFFAOYSA-N 0.000 description 1
- 229920005615 natural polymer Polymers 0.000 description 1
- 239000008239 natural water Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000012074 organic phase Substances 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- HRXZRAXKKNUKRF-UHFFFAOYSA-N p-ethyl aniline Natural products CCC1=CC=C(N)C=C1 HRXZRAXKKNUKRF-UHFFFAOYSA-N 0.000 description 1
- 235000019809 paraffin wax Nutrition 0.000 description 1
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 239000001814 pectin Substances 0.000 description 1
- 235000010987 pectin Nutrition 0.000 description 1
- 229920001277 pectin Polymers 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 235000019271 petrolatum Nutrition 0.000 description 1
- 239000012169 petroleum derived wax Substances 0.000 description 1
- 235000019381 petroleum wax Nutrition 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 150000003009 phosphonic acids Chemical group 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000007539 photo-oxidation reaction Methods 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 230000000176 photostabilization Effects 0.000 description 1
- DOIRQSBPFJWKBE-UHFFFAOYSA-N phthalic acid di-n-butyl ester Natural products CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920001485 poly(butyl acrylate) polymer Polymers 0.000 description 1
- 229920001490 poly(butyl methacrylate) polymer Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 229920003225 polyurethane elastomer Polymers 0.000 description 1
- 239000011496 polyurethane foam Substances 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- SJVZUJVRHXYCSP-UHFFFAOYSA-M potassium;octane-1-sulfonate Chemical compound [K+].CCCCCCCCS([O-])(=O)=O SJVZUJVRHXYCSP-UHFFFAOYSA-M 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229940075579 propyl gallate Drugs 0.000 description 1
- 235000010388 propyl gallate Nutrition 0.000 description 1
- 239000000473 propyl gallate Substances 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 239000001008 quinone-imine dye Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000000518 rheometry Methods 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- YGSDEFSMJLZEOE-UHFFFAOYSA-M salicylate Chemical compound OC1=CC=CC=C1C([O-])=O YGSDEFSMJLZEOE-UHFFFAOYSA-M 0.000 description 1
- 229960001860 salicylate Drugs 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229930182490 saponin Natural products 0.000 description 1
- 235000017709 saponins Nutrition 0.000 description 1
- 150000007949 saponins Chemical class 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- SLBXZQMMERXQAL-UHFFFAOYSA-M sodium;1-dodecoxy-4-hydroxy-1,4-dioxobutane-2-sulfonate Chemical compound [Na+].CCCCCCCCCCCCOC(=O)C(S(O)(=O)=O)CC([O-])=O SLBXZQMMERXQAL-UHFFFAOYSA-M 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 239000011115 styrene butadiene Substances 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 125000005017 substituted alkenyl group Chemical group 0.000 description 1
- 125000004426 substituted alkynyl group Chemical group 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- SKIVFJLNDNKQPD-UHFFFAOYSA-N sulfacetamide Chemical compound CC(=O)NS(=O)(=O)C1=CC=C(N)C=C1 SKIVFJLNDNKQPD-UHFFFAOYSA-N 0.000 description 1
- 125000004964 sulfoalkyl group Chemical group 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 150000008053 sultones Chemical class 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- LRBQNJMCXXYXIU-NRMVVENXSA-N tannic acid Chemical compound OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-NRMVVENXSA-N 0.000 description 1
- 229920002258 tannic acid Polymers 0.000 description 1
- 235000015523 tannic acid Nutrition 0.000 description 1
- 229940033123 tannic acid Drugs 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 125000003831 tetrazolyl group Chemical group 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 239000001016 thiazine dye Substances 0.000 description 1
- 150000004897 thiazines Chemical class 0.000 description 1
- 239000001017 thiazole dye Substances 0.000 description 1
- 125000005323 thioketone group Chemical group 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- OKYDCMQQLGECPI-UHFFFAOYSA-N thiopyrylium Chemical class C1=CC=[S+]C=C1 OKYDCMQQLGECPI-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 125000005424 tosyloxy group Chemical group S(=O)(=O)(C1=CC=C(C)C=C1)O* 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
- 239000001003 triarylmethane dye Substances 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- CPRPKIMXLHBUGA-UHFFFAOYSA-N triethyltin Chemical group CC[Sn](CC)CC CPRPKIMXLHBUGA-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 125000004953 trihalomethyl group Chemical group 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- SSWMLKYBHOTWFA-UHFFFAOYSA-J tris[(2-hydroxybenzoyl)oxy]stannyl 2-hydroxybenzoate Chemical compound [Sn+4].Oc1ccccc1C([O-])=O.Oc1ccccc1C([O-])=O.Oc1ccccc1C([O-])=O.Oc1ccccc1C([O-])=O SSWMLKYBHOTWFA-UHFFFAOYSA-J 0.000 description 1
- 238000013024 troubleshooting Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- ZJHHPAUQMCHPRB-UHFFFAOYSA-N urea urea Chemical compound NC(N)=O.NC(N)=O ZJHHPAUQMCHPRB-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 239000001018 xanthene dye Substances 0.000 description 1
- 150000003732 xanthenes Chemical class 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
- 239000011667 zinc carbonate Substances 0.000 description 1
- 229910000010 zinc carbonate Inorganic materials 0.000 description 1
- 235000004416 zinc carbonate Nutrition 0.000 description 1
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
- JRBNKLYSGIHONX-UHFFFAOYSA-L zinc;1-carboxynaphthalen-2-olate Chemical compound [Zn+2].C1=CC=C2C(C(=O)O)=C([O-])C=CC2=C1.C1=CC=C2C(C(=O)O)=C([O-])C=CC2=C1 JRBNKLYSGIHONX-UHFFFAOYSA-L 0.000 description 1
- ZXAUZSQITFJWPS-UHFFFAOYSA-J zirconium(4+);disulfate Chemical compound [Zr+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O ZXAUZSQITFJWPS-UHFFFAOYSA-J 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/687,939 US7166407B2 (en) | 2003-10-17 | 2003-10-17 | Imaging element having protective overcoat layers |
| PCT/US2004/033790 WO2005038526A1 (en) | 2003-10-17 | 2004-10-12 | Imaging element having protective overcoat layers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007509370A true JP2007509370A (ja) | 2007-04-12 |
| JP2007509370A5 JP2007509370A5 (OSRAM) | 2007-11-29 |
Family
ID=34465555
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006535628A Pending JP2007509370A (ja) | 2003-10-17 | 2004-10-12 | 保護オーバーコート層を有する画像形成要素 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7166407B2 (OSRAM) |
| JP (1) | JP2007509370A (OSRAM) |
| CN (1) | CN1867866A (OSRAM) |
| WO (1) | WO2005038526A1 (OSRAM) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080071039A1 (en) * | 2004-09-10 | 2008-03-20 | Mitsui Chemicals Inc. | Protective Material for Heat Sensitive Paper |
| JP4418725B2 (ja) * | 2004-09-24 | 2010-02-24 | 富士フイルム株式会社 | 平版印刷版原版 |
| US8043775B2 (en) * | 2005-03-16 | 2011-10-25 | Idemitsu Kosan Co., Ltd. | Electrophotographic photosensitive body |
| FR2921162B1 (fr) * | 2007-09-14 | 2010-03-12 | Essilor Int | Article d'optique comportant un revetement temporaire bicouche |
| US8765334B2 (en) * | 2010-01-25 | 2014-07-01 | Xerox Corporation | Protective photoreceptor outer layer |
| US9063423B2 (en) * | 2013-02-28 | 2015-06-23 | Eastman Kodak Company | Lithographic printing plate precursors and use |
| EP4221976A4 (en) * | 2020-10-02 | 2024-10-16 | Swimc Llc | Multilayer coating with digital printing |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001330948A (ja) * | 2000-04-20 | 2001-11-30 | Eastman Kodak Co | 自蔵式光硬化可能な像形成集成体 |
| JP2001350258A (ja) * | 2000-04-20 | 2001-12-21 | Eastman Kodak Co | 自蔵式光硬化可能な像形成集成体 |
| JP2002040643A (ja) * | 2000-07-21 | 2002-02-06 | Fuji Photo Film Co Ltd | 感光感熱記録材料 |
| JP2002055445A (ja) * | 2000-08-10 | 2002-02-20 | Cycolor System Co Ltd | 自己発色型感光性感圧記録材料及びその製造方法並びにその画像形成方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4440846A (en) | 1981-11-12 | 1984-04-03 | Mead Corporation | Photocopy sheet employing encapsulated radiation sensitive composition and imaging process |
| US4399209A (en) | 1981-11-12 | 1983-08-16 | The Mead Corporation | Transfer imaging system |
| US4416966A (en) | 1982-08-25 | 1983-11-22 | The Mead Corporation | Capsular imaging system comprising decolorizing agent |
| US4766050A (en) | 1987-03-27 | 1988-08-23 | The Mead Corporation | Imaging system with integral cover sheet |
| AU689336B2 (en) | 1994-06-10 | 1998-03-26 | Eastman Kodak Company | Self-contained imaging assembly and method for forming images therein |
| US6030740A (en) | 1998-03-12 | 2000-02-29 | Cycolor, Inc. | Two-sided imaging material |
| US6080520A (en) | 1999-05-26 | 2000-06-27 | Cycolor, Inc. | Imaging system having opaque support |
| JP2003066599A (ja) * | 2001-08-22 | 2003-03-05 | Cycolor System Co Ltd | ゼラチン保護層含有自己発色型感光性感圧記録材料及びその製造方法 |
-
2003
- 2003-10-17 US US10/687,939 patent/US7166407B2/en not_active Expired - Fee Related
-
2004
- 2004-10-12 CN CNA2004800301893A patent/CN1867866A/zh active Pending
- 2004-10-12 JP JP2006535628A patent/JP2007509370A/ja active Pending
- 2004-10-12 WO PCT/US2004/033790 patent/WO2005038526A1/en not_active Ceased
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001330948A (ja) * | 2000-04-20 | 2001-11-30 | Eastman Kodak Co | 自蔵式光硬化可能な像形成集成体 |
| JP2001350258A (ja) * | 2000-04-20 | 2001-12-21 | Eastman Kodak Co | 自蔵式光硬化可能な像形成集成体 |
| JP2002040643A (ja) * | 2000-07-21 | 2002-02-06 | Fuji Photo Film Co Ltd | 感光感熱記録材料 |
| JP2002055445A (ja) * | 2000-08-10 | 2002-02-20 | Cycolor System Co Ltd | 自己発色型感光性感圧記録材料及びその製造方法並びにその画像形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20050084783A1 (en) | 2005-04-21 |
| US7166407B2 (en) | 2007-01-23 |
| WO2005038526A1 (en) | 2005-04-28 |
| CN1867866A (zh) | 2006-11-22 |
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