JP2007316132A5 - - Google Patents

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Publication number
JP2007316132A5
JP2007316132A5 JP2006142720A JP2006142720A JP2007316132A5 JP 2007316132 A5 JP2007316132 A5 JP 2007316132A5 JP 2006142720 A JP2006142720 A JP 2006142720A JP 2006142720 A JP2006142720 A JP 2006142720A JP 2007316132 A5 JP2007316132 A5 JP 2007316132A5
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JP
Japan
Prior art keywords
mirror
electromagnet
actuator
reflector according
coils
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2006142720A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007316132A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006142720A priority Critical patent/JP2007316132A/ja
Priority claimed from JP2006142720A external-priority patent/JP2007316132A/ja
Priority to US11/749,993 priority patent/US7907326B2/en
Priority to KR1020070047926A priority patent/KR100842001B1/ko
Priority to TW096117957A priority patent/TW200807170A/zh
Publication of JP2007316132A publication Critical patent/JP2007316132A/ja
Publication of JP2007316132A5 publication Critical patent/JP2007316132A5/ja
Withdrawn legal-status Critical Current

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JP2006142720A 2006-05-23 2006-05-23 反射装置 Withdrawn JP2007316132A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006142720A JP2007316132A (ja) 2006-05-23 2006-05-23 反射装置
US11/749,993 US7907326B2 (en) 2006-05-23 2007-05-17 Reflecting apparatus
KR1020070047926A KR100842001B1 (ko) 2006-05-23 2007-05-17 반사 장치
TW096117957A TW200807170A (en) 2006-05-23 2007-05-21 Reflecting apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006142720A JP2007316132A (ja) 2006-05-23 2006-05-23 反射装置

Publications (2)

Publication Number Publication Date
JP2007316132A JP2007316132A (ja) 2007-12-06
JP2007316132A5 true JP2007316132A5 (https=) 2009-07-09

Family

ID=38821798

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006142720A Withdrawn JP2007316132A (ja) 2006-05-23 2006-05-23 反射装置

Country Status (4)

Country Link
US (1) US7907326B2 (https=)
JP (1) JP2007316132A (https=)
KR (1) KR100842001B1 (https=)
TW (1) TW200807170A (https=)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7989756B2 (en) 2008-03-18 2011-08-02 Nikon Corporation Active-isolation mounts for optical elements
DE102008032853A1 (de) * 2008-07-14 2010-01-21 Carl Zeiss Smt Ag Optische Einrichtung mit einem deformierbaren optischen Element
FR2935054B1 (fr) * 2008-08-14 2011-01-28 Alpao Miroir deformable a actionneurs de force et raideur repartie
DE102009009221A1 (de) 2009-02-17 2010-08-26 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Halbleiterlithographie mit einem Aktuatorsystem
EP2275697A1 (en) * 2009-04-23 2011-01-19 Koninklijke Philips Electronics N.V. A magnetic bearing, a rotary stage, and a reflective electron beam lithography apparatus
JP2011119551A (ja) * 2009-12-04 2011-06-16 Nikon Corp 光学部材変形装置、光学系、露光装置、デバイスの製造方法
GB2468557A (en) * 2010-02-05 2010-09-15 Zeiss Carl Smt Ag Optical element module with imaging error correction and position adjustment
EP2469340B1 (en) 2010-12-21 2021-01-06 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
FR2970787B1 (fr) * 2011-01-26 2014-01-10 Alpao Miroir deformable a capteurs capacitifs
DE102011075316A1 (de) 2011-05-05 2012-11-08 Carl Zeiss Smt Gmbh Optisches Modul mit einer Messeinrichtung
DE102011075393B4 (de) * 2011-05-06 2013-08-14 Carl Zeiss Smt Gmbh Anordnung zur Aktuierung eines Elementes in einer Projektionsbelichtungsanlage
DE102013201082A1 (de) * 2013-01-24 2014-03-13 Carl Zeiss Smt Gmbh Anordnung zur Aktuierung eines Elementes in einer mikrolithographischen Projektionsbelichtungsanlage
KR102390697B1 (ko) 2013-01-28 2022-04-26 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치를 위한 방사선 소스, 거울 및 투영 시스템
JP2014225639A (ja) 2013-04-16 2014-12-04 キヤノン株式会社 ミラーユニット及び露光装置
JP6168957B2 (ja) 2013-09-30 2017-07-26 キヤノン株式会社 光学装置、投影光学系、露光装置および物品の製造方法
FR3011942B1 (fr) * 2013-10-11 2017-07-14 Thales Sa Telescope spatial actif a miroir suspendu
JP6336274B2 (ja) * 2013-12-25 2018-06-06 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法
DE102014206686A1 (de) * 2014-04-07 2015-10-08 Carl Zeiss Smt Gmbh Verfahren sowie Anordnung zur Aktuierung eines Elementes
JP6742717B2 (ja) * 2015-12-10 2020-08-19 キヤノン株式会社 光学装置、それを備えた露光装置、および物品の製造方法
CN107015341B (zh) * 2016-01-27 2020-08-21 佳能株式会社 光学设备、投影光学系统、曝光装置及物品制造方法
JP6866131B2 (ja) * 2016-01-27 2021-04-28 キヤノン株式会社 光学装置、それを備えた露光装置、および物品の製造方法
JP2018040856A (ja) * 2016-09-05 2018-03-15 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法
JP6598827B2 (ja) 2017-08-01 2019-10-30 キヤノン株式会社 光学装置、これを用いた露光装置、および物品の製造方法

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JPH08334708A (ja) 1995-06-08 1996-12-17 Mitsubishi Heavy Ind Ltd 形状可変鏡
US6188502B1 (en) * 1998-03-26 2001-02-13 Nec Corporation Laser pointing apparatus and on-fulcrum drive apparatus
US7170665B2 (en) * 2002-07-24 2007-01-30 Olympus Corporation Optical unit provided with an actuator
DE19824030A1 (de) * 1998-05-29 1999-12-02 Zeiss Carl Fa Katadioptrisches Projektionsobjektiv mit adaptivem Spiegel und Projektionsbelichtungsverfahren
US6464363B1 (en) * 1999-03-17 2002-10-15 Olympus Optical Co., Ltd. Variable mirror, optical apparatus and decentered optical system which include variable mirror, variable-optical characteristic optical element or combination thereof
JP2002243918A (ja) 2001-02-14 2002-08-28 Olympus Optical Co Ltd 可変焦点レンズ、光学特性可変光学素子及び光学装置
US6938920B2 (en) 2000-05-01 2005-09-06 Toyoda Gosei Co., Ltd. Occupant arresting device
EP1279572A4 (en) 2000-05-01 2008-06-18 Toyoda Gosei Kk STOPPING DEVICE FOR PROTECTING AN OCCUPANT
WO2001083271A1 (fr) 2000-05-01 2001-11-08 Toyoda Gosei Co., Ltd. Dispositif de retenue de passager
US6398373B1 (en) * 2000-08-09 2002-06-04 Asml Us, Inc. Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems
US6840638B2 (en) 2002-07-03 2005-01-11 Nikon Corporation Deformable mirror with passive and active actuators
US6842277B2 (en) 2002-07-23 2005-01-11 Nikon Corporation Deformable mirror with high-bandwidth servo for rigid body control
US6906848B2 (en) * 2003-02-24 2005-06-14 Exajoule, Llc Micromirror systems with concealed multi-piece hinge structures
JP4574206B2 (ja) * 2003-04-25 2010-11-04 キヤノン株式会社 駆動装置、それを用いた露光装置、デバイスの製造方法
WO2005091077A2 (de) * 2004-02-20 2005-09-29 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage
US7369216B2 (en) * 2004-10-15 2008-05-06 Asml Netherlands B.V. Lithographic system, method for adapting transmission characteristics of an optical pathway within a lithographic system, semiconductor device, method of manufacturing a reflective element for use in a lithographic system, and reflective element manufactured thereby

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