JP2007316132A - 反射装置 - Google Patents

反射装置 Download PDF

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Publication number
JP2007316132A
JP2007316132A JP2006142720A JP2006142720A JP2007316132A JP 2007316132 A JP2007316132 A JP 2007316132A JP 2006142720 A JP2006142720 A JP 2006142720A JP 2006142720 A JP2006142720 A JP 2006142720A JP 2007316132 A JP2007316132 A JP 2007316132A
Authority
JP
Japan
Prior art keywords
mirror
electromagnet
actuator
unit
coil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2006142720A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007316132A5 (https=
Inventor
Shinji Uchida
真司 内田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2006142720A priority Critical patent/JP2007316132A/ja
Priority to US11/749,993 priority patent/US7907326B2/en
Priority to KR1020070047926A priority patent/KR100842001B1/ko
Priority to TW096117957A priority patent/TW200807170A/zh
Publication of JP2007316132A publication Critical patent/JP2007316132A/ja
Publication of JP2007316132A5 publication Critical patent/JP2007316132A5/ja
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
JP2006142720A 2006-05-23 2006-05-23 反射装置 Withdrawn JP2007316132A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006142720A JP2007316132A (ja) 2006-05-23 2006-05-23 反射装置
US11/749,993 US7907326B2 (en) 2006-05-23 2007-05-17 Reflecting apparatus
KR1020070047926A KR100842001B1 (ko) 2006-05-23 2007-05-17 반사 장치
TW096117957A TW200807170A (en) 2006-05-23 2007-05-21 Reflecting apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006142720A JP2007316132A (ja) 2006-05-23 2006-05-23 反射装置

Publications (2)

Publication Number Publication Date
JP2007316132A true JP2007316132A (ja) 2007-12-06
JP2007316132A5 JP2007316132A5 (https=) 2009-07-09

Family

ID=38821798

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006142720A Withdrawn JP2007316132A (ja) 2006-05-23 2006-05-23 反射装置

Country Status (4)

Country Link
US (1) US7907326B2 (https=)
JP (1) JP2007316132A (https=)
KR (1) KR100842001B1 (https=)
TW (1) TW200807170A (https=)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011119551A (ja) * 2009-12-04 2011-06-16 Nikon Corp 光学部材変形装置、光学系、露光装置、デバイスの製造方法
US7989756B2 (en) 2008-03-18 2011-08-02 Nikon Corporation Active-isolation mounts for optical elements
KR20120006552A (ko) * 2009-04-23 2012-01-18 코닌클리케 필립스 일렉트로닉스 엔.브이. 자기 베어링, 회전 스테이지 및 반사 전자 빔 리소그래피 장치
JP2012134486A (ja) * 2010-12-21 2012-07-12 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
JP2012518272A (ja) * 2009-02-17 2012-08-09 カール・ツァイス・エスエムティー・ゲーエムベーハー アクチュエータシステムを備える投影露光装置
JP2014509406A (ja) * 2011-01-26 2014-04-17 アルパオ 容量式センサーを有する可変鏡
JP2014518011A (ja) * 2011-05-05 2014-07-24 カール・ツァイス・エスエムティー・ゲーエムベーハー 測定装置を備えた光学モジュール
JP2014519186A (ja) * 2011-05-06 2014-08-07 カール・ツァイス・エスエムティー・ゲーエムベーハー 投影露光装置の素子を作動させる機構
JP2015075769A (ja) * 2013-10-11 2015-04-20 タレス 懸垂反射鏡を備える能動的宇宙望遠鏡
JP2015126037A (ja) * 2013-12-25 2015-07-06 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法
JP2016177292A (ja) * 2013-01-24 2016-10-06 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の素子を作動させる機構
JP2017513064A (ja) * 2014-04-07 2017-05-25 カール・ツァイス・エスエムティー・ゲーエムベーハー 素子を作動させるための方法および装置
JP2017107070A (ja) * 2015-12-10 2017-06-15 キヤノン株式会社 光学装置、それを備えた露光装置、および物品の製造方法
JP2017134389A (ja) * 2016-01-27 2017-08-03 キヤノン株式会社 光学装置、それを備えた露光装置、および物品の製造方法
WO2018043314A1 (ja) * 2016-09-05 2018-03-08 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法
JP2018116294A (ja) * 2008-07-14 2018-07-26 カール・ツァイス・エスエムティー・ゲーエムベーハー 変形可能な光学素子を有する光学装置
US10884236B2 (en) 2017-08-01 2021-01-05 Canon Kabushiki Kaisha Optical device, projection optical system, exposure apparatus using the same, and method for manufacturing article

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2935054B1 (fr) * 2008-08-14 2011-01-28 Alpao Miroir deformable a actionneurs de force et raideur repartie
GB2468557A (en) * 2010-02-05 2010-09-15 Zeiss Carl Smt Ag Optical element module with imaging error correction and position adjustment
KR102390697B1 (ko) 2013-01-28 2022-04-26 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치를 위한 방사선 소스, 거울 및 투영 시스템
JP2014225639A (ja) 2013-04-16 2014-12-04 キヤノン株式会社 ミラーユニット及び露光装置
JP6168957B2 (ja) 2013-09-30 2017-07-26 キヤノン株式会社 光学装置、投影光学系、露光装置および物品の製造方法
CN107015341B (zh) * 2016-01-27 2020-08-21 佳能株式会社 光学设备、投影光学系统、曝光装置及物品制造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08334708A (ja) 1995-06-08 1996-12-17 Mitsubishi Heavy Ind Ltd 形状可変鏡
US6188502B1 (en) * 1998-03-26 2001-02-13 Nec Corporation Laser pointing apparatus and on-fulcrum drive apparatus
US7170665B2 (en) * 2002-07-24 2007-01-30 Olympus Corporation Optical unit provided with an actuator
DE19824030A1 (de) * 1998-05-29 1999-12-02 Zeiss Carl Fa Katadioptrisches Projektionsobjektiv mit adaptivem Spiegel und Projektionsbelichtungsverfahren
US6464363B1 (en) * 1999-03-17 2002-10-15 Olympus Optical Co., Ltd. Variable mirror, optical apparatus and decentered optical system which include variable mirror, variable-optical characteristic optical element or combination thereof
JP2002243918A (ja) 2001-02-14 2002-08-28 Olympus Optical Co Ltd 可変焦点レンズ、光学特性可変光学素子及び光学装置
US6938920B2 (en) 2000-05-01 2005-09-06 Toyoda Gosei Co., Ltd. Occupant arresting device
EP1279572A4 (en) 2000-05-01 2008-06-18 Toyoda Gosei Kk STOPPING DEVICE FOR PROTECTING AN OCCUPANT
WO2001083271A1 (fr) 2000-05-01 2001-11-08 Toyoda Gosei Co., Ltd. Dispositif de retenue de passager
US6398373B1 (en) * 2000-08-09 2002-06-04 Asml Us, Inc. Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems
US6840638B2 (en) 2002-07-03 2005-01-11 Nikon Corporation Deformable mirror with passive and active actuators
US6842277B2 (en) 2002-07-23 2005-01-11 Nikon Corporation Deformable mirror with high-bandwidth servo for rigid body control
US6906848B2 (en) * 2003-02-24 2005-06-14 Exajoule, Llc Micromirror systems with concealed multi-piece hinge structures
JP4574206B2 (ja) * 2003-04-25 2010-11-04 キヤノン株式会社 駆動装置、それを用いた露光装置、デバイスの製造方法
WO2005091077A2 (de) * 2004-02-20 2005-09-29 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage
US7369216B2 (en) * 2004-10-15 2008-05-06 Asml Netherlands B.V. Lithographic system, method for adapting transmission characteristics of an optical pathway within a lithographic system, semiconductor device, method of manufacturing a reflective element for use in a lithographic system, and reflective element manufactured thereby

Cited By (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7989756B2 (en) 2008-03-18 2011-08-02 Nikon Corporation Active-isolation mounts for optical elements
JP2018116294A (ja) * 2008-07-14 2018-07-26 カール・ツァイス・エスエムティー・ゲーエムベーハー 変形可能な光学素子を有する光学装置
US9030644B2 (en) 2009-02-17 2015-05-12 Carl Zeiss Smt Gmbh Projection exposure apparatus for semiconductor lithography including an actuator system
JP2012518272A (ja) * 2009-02-17 2012-08-09 カール・ツァイス・エスエムティー・ゲーエムベーハー アクチュエータシステムを備える投影露光装置
KR20120006552A (ko) * 2009-04-23 2012-01-18 코닌클리케 필립스 일렉트로닉스 엔.브이. 자기 베어링, 회전 스테이지 및 반사 전자 빔 리소그래피 장치
JP2012524879A (ja) * 2009-04-23 2012-10-18 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 磁気ベアリング、回転段及び反射型電子ビームリソグラフィ装置
KR101659956B1 (ko) 2009-04-23 2016-09-26 코닌클리케 필립스 엔.브이. 자기 베어링, 회전 스테이지 및 반사 전자 빔 리소그래피 장치
JP2011119551A (ja) * 2009-12-04 2011-06-16 Nikon Corp 光学部材変形装置、光学系、露光装置、デバイスの製造方法
US9696630B2 (en) 2010-12-21 2017-07-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9134632B2 (en) 2010-12-21 2015-09-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2012134486A (ja) * 2010-12-21 2012-07-12 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
JP2014509406A (ja) * 2011-01-26 2014-04-17 アルパオ 容量式センサーを有する可変鏡
JP2014518011A (ja) * 2011-05-05 2014-07-24 カール・ツァイス・エスエムティー・ゲーエムベーハー 測定装置を備えた光学モジュール
JP2014519186A (ja) * 2011-05-06 2014-08-07 カール・ツァイス・エスエムティー・ゲーエムベーハー 投影露光装置の素子を作動させる機構
JP2016177292A (ja) * 2013-01-24 2016-10-06 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の素子を作動させる機構
JP2015075769A (ja) * 2013-10-11 2015-04-20 タレス 懸垂反射鏡を備える能動的宇宙望遠鏡
JP2015126037A (ja) * 2013-12-25 2015-07-06 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法
JP2017513064A (ja) * 2014-04-07 2017-05-25 カール・ツァイス・エスエムティー・ゲーエムベーハー 素子を作動させるための方法および装置
JP2017107070A (ja) * 2015-12-10 2017-06-15 キヤノン株式会社 光学装置、それを備えた露光装置、および物品の製造方法
KR20170069146A (ko) * 2015-12-10 2017-06-20 캐논 가부시끼가이샤 광학 장치, 그것을 구비한 노광 장치 및 물품 제조 방법
TWI657317B (zh) * 2015-12-10 2019-04-21 日商佳能股份有限公司 光學裝置、具有此光學裝置的曝光設備以及物品製造方法
KR102111070B1 (ko) 2015-12-10 2020-05-15 캐논 가부시끼가이샤 광학 장치, 그것을 구비한 노광 장치 및 물품 제조 방법
JP2017134389A (ja) * 2016-01-27 2017-08-03 キヤノン株式会社 光学装置、それを備えた露光装置、および物品の製造方法
WO2018043314A1 (ja) * 2016-09-05 2018-03-08 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法
US10884236B2 (en) 2017-08-01 2021-01-05 Canon Kabushiki Kaisha Optical device, projection optical system, exposure apparatus using the same, and method for manufacturing article

Also Published As

Publication number Publication date
US7907326B2 (en) 2011-03-15
US20070286035A1 (en) 2007-12-13
KR100842001B1 (ko) 2008-06-27
KR20070113115A (ko) 2007-11-28
TW200807170A (en) 2008-02-01

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