JP2007250529A5 - - Google Patents

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Publication number
JP2007250529A5
JP2007250529A5 JP2007031474A JP2007031474A JP2007250529A5 JP 2007250529 A5 JP2007250529 A5 JP 2007250529A5 JP 2007031474 A JP2007031474 A JP 2007031474A JP 2007031474 A JP2007031474 A JP 2007031474A JP 2007250529 A5 JP2007250529 A5 JP 2007250529A5
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JP
Japan
Prior art keywords
work piece
charged particle
particle beam
directing
source
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JP2007031474A
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English (en)
Japanese (ja)
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JP2007250529A (ja
JP5600371B2 (ja
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Publication of JP2007250529A5 publication Critical patent/JP2007250529A5/ja
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JP2007031474A 2006-02-15 2007-02-13 荷電粒子ビーム処理のための保護層のスパッタリング・コーティング Active JP5600371B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US77339606P 2006-02-15 2006-02-15
US60/773,396 2006-02-15

Publications (3)

Publication Number Publication Date
JP2007250529A JP2007250529A (ja) 2007-09-27
JP2007250529A5 true JP2007250529A5 (enExample) 2010-04-02
JP5600371B2 JP5600371B2 (ja) 2014-10-01

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ID=37943762

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JP2007031474A Active JP5600371B2 (ja) 2006-02-15 2007-02-13 荷電粒子ビーム処理のための保護層のスパッタリング・コーティング

Country Status (3)

Country Link
US (1) US7675049B2 (enExample)
EP (2) EP1821146A1 (enExample)
JP (1) JP5600371B2 (enExample)

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JP2008171800A (ja) 2006-10-31 2008-07-24 Fei Co 荷電粒子ビーム処理用保護層
JP5105357B2 (ja) * 2007-11-01 2012-12-26 エスアイアイ・ナノテクノロジー株式会社 欠陥認識方法、欠陥観察方法、及び荷電粒子ビーム装置
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NL2004888A (en) * 2009-06-29 2010-12-30 Asml Netherlands Bv Deposition method and apparatus.
JP5595054B2 (ja) * 2010-01-29 2014-09-24 株式会社日立ハイテクサイエンス 電子顕微鏡及び試料分析方法
US9187815B2 (en) * 2010-03-12 2015-11-17 United Technologies Corporation Thermal stabilization of coating material vapor stream
US20110223317A1 (en) * 2010-03-12 2011-09-15 United Technologies Corporation Direct thermal stabilization for coating application
US8859963B2 (en) 2011-06-03 2014-10-14 Fei Company Methods for preparing thin samples for TEM imaging
US8912490B2 (en) 2011-06-03 2014-12-16 Fei Company Method for preparing samples for imaging
US9041793B2 (en) * 2012-05-17 2015-05-26 Fei Company Scanning microscope having an adaptive scan
EP2765591B1 (en) 2013-02-08 2016-07-13 FEI Company Sample preparation stage
EP2787523B1 (en) * 2013-04-03 2016-02-10 Fei Company Low energy ion milling or deposition
EP2811506B1 (en) 2013-06-05 2016-04-06 Fei Company Method for imaging a sample in a dual-beam charged particle apparatus
US9601305B2 (en) 2013-11-11 2017-03-21 Howard Hughes Medical Institute Specimen sample holder for workpiece transport apparatus
EP3249676B1 (en) * 2016-05-27 2018-10-03 FEI Company Dual-beam charged-particle microscope with in situ deposition functionality
FR3080947B1 (fr) * 2018-05-02 2021-02-19 Centre Nat Rech Scient Microscope electronique en transmission equipe d'au moins une source de jet de matiere balistique
DE102020112220B9 (de) * 2020-05-06 2022-05-25 Carl Zeiss Microscopy Gmbh Teilchenstrahlgerät zum Abtragen mindestens eines Materials von einer Materialeinheit und Anordnen des Materials an einem Objekt
US11749496B2 (en) * 2021-06-21 2023-09-05 Fei Company Protective shutter for charged particle microscope
US12308207B2 (en) 2022-08-18 2025-05-20 Applied Materials Israel Ltd. Enhanced deposition rate by thermal isolation cover for GIS manipulator
KR20250157420A (ko) 2023-03-07 2025-11-04 칼 짜이스 에스엠테 게엠베하 하전 입자 빔 이미징을 위한 샘플 준비

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DE602004031073D1 (de) 2003-06-13 2011-03-03 Fei Co Verfahren und Vorrichtung zum Manipulieren von mikroskopischen Proben
US6926935B2 (en) 2003-06-27 2005-08-09 Fei Company Proximity deposition
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US7601246B2 (en) * 2004-09-29 2009-10-13 Lam Research Corporation Methods of sputtering a protective coating on a semiconductor substrate

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