JP2007200615A5 - - Google Patents

Download PDF

Info

Publication number
JP2007200615A5
JP2007200615A5 JP2006015410A JP2006015410A JP2007200615A5 JP 2007200615 A5 JP2007200615 A5 JP 2007200615A5 JP 2006015410 A JP2006015410 A JP 2006015410A JP 2006015410 A JP2006015410 A JP 2006015410A JP 2007200615 A5 JP2007200615 A5 JP 2007200615A5
Authority
JP
Japan
Prior art keywords
light source
target material
ultraviolet light
extreme ultraviolet
source device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006015410A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007200615A (ja
JP5156192B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006015410A priority Critical patent/JP5156192B2/ja
Priority claimed from JP2006015410A external-priority patent/JP5156192B2/ja
Priority to US11/655,109 priority patent/US7608846B2/en
Publication of JP2007200615A publication Critical patent/JP2007200615A/ja
Publication of JP2007200615A5 publication Critical patent/JP2007200615A5/ja
Application granted granted Critical
Publication of JP5156192B2 publication Critical patent/JP5156192B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2006015410A 2006-01-24 2006-01-24 極端紫外光源装置 Expired - Fee Related JP5156192B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2006015410A JP5156192B2 (ja) 2006-01-24 2006-01-24 極端紫外光源装置
US11/655,109 US7608846B2 (en) 2006-01-24 2007-01-19 Extreme ultra violet light source device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006015410A JP5156192B2 (ja) 2006-01-24 2006-01-24 極端紫外光源装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012094542A Division JP5563012B2 (ja) 2012-04-18 2012-04-18 極端紫外光源装置

Publications (3)

Publication Number Publication Date
JP2007200615A JP2007200615A (ja) 2007-08-09
JP2007200615A5 true JP2007200615A5 (enExample) 2008-12-04
JP5156192B2 JP5156192B2 (ja) 2013-03-06

Family

ID=38284625

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006015410A Expired - Fee Related JP5156192B2 (ja) 2006-01-24 2006-01-24 極端紫外光源装置

Country Status (2)

Country Link
US (1) US7608846B2 (enExample)
JP (1) JP5156192B2 (enExample)

Families Citing this family (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7897947B2 (en) * 2007-07-13 2011-03-01 Cymer, Inc. Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
US8653437B2 (en) * 2010-10-04 2014-02-18 Cymer, Llc EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
EP1837897A4 (en) * 2005-01-12 2008-04-16 Nikon Corp LASER PLASMA EUV LIGHT SOURCE, TARGET MEMBER, MANUFACTURING PROCESS FOR A TARGET MEMBER, TARGET PROCESSING METHOD AND EUV EXPOSURE SYSTEM
US8158960B2 (en) * 2007-07-13 2012-04-17 Cymer, Inc. Laser produced plasma EUV light source
JP5076087B2 (ja) * 2006-10-19 2012-11-21 ギガフォトン株式会社 極端紫外光源装置及びノズル保護装置
US8748785B2 (en) * 2007-01-18 2014-06-10 Amastan Llc Microwave plasma apparatus and method for materials processing
JP5358060B2 (ja) * 2007-02-20 2013-12-04 ギガフォトン株式会社 極端紫外光源装置
JP2009099390A (ja) * 2007-10-17 2009-05-07 Tokyo Institute Of Technology 極端紫外光光源装置および極端紫外光発生方法
JP5280066B2 (ja) 2008-02-28 2013-09-04 ギガフォトン株式会社 極端紫外光源装置
JP2010062141A (ja) 2008-08-04 2010-03-18 Komatsu Ltd 極端紫外光源装置
EP2157481A3 (en) * 2008-08-14 2012-06-13 ASML Netherlands B.V. Radiation source, lithographic apparatus, and device manufacturing method
JP5362515B2 (ja) * 2008-10-17 2013-12-11 ギガフォトン株式会社 極端紫外光源装置のターゲット供給装置及びその製造方法
JP5486797B2 (ja) * 2008-12-22 2014-05-07 ギガフォトン株式会社 極端紫外光源装置
JP5455661B2 (ja) * 2009-01-29 2014-03-26 ギガフォトン株式会社 極端紫外光源装置
JP5619779B2 (ja) * 2009-02-13 2014-11-05 ケーエルエー−テンカー コーポレイション 高温プラズマを持続させるための光ポンピング
US8138487B2 (en) * 2009-04-09 2012-03-20 Cymer, Inc. System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber
JP5603135B2 (ja) * 2009-05-21 2014-10-08 ギガフォトン株式会社 チャンバ装置におけるターゲット軌道を計測及び制御する装置及び方法
JPWO2010137625A1 (ja) * 2009-05-27 2012-11-15 ギガフォトン株式会社 ターゲット出力装置及び極端紫外光源装置
WO2011013779A1 (ja) * 2009-07-29 2011-02-03 株式会社小松製作所 極端紫外光源装置、極端紫外光源装置の制御方法、およびそのプログラムを記録した記録媒体
WO2011116898A1 (en) * 2010-03-25 2011-09-29 Eth Zurich Steering device for controlling the direction and/or velocity of droplets of a target material and extreme euv source with such a steering device
US8368039B2 (en) * 2010-04-05 2013-02-05 Cymer, Inc. EUV light source glint reduction system
US8263953B2 (en) * 2010-04-09 2012-09-11 Cymer, Inc. Systems and methods for target material delivery protection in a laser produced plasma EUV light source
JP5726587B2 (ja) * 2010-10-06 2015-06-03 ギガフォトン株式会社 チャンバ装置
JP2012119098A (ja) * 2010-11-29 2012-06-21 Gigaphoton Inc 光学装置、レーザ装置および極端紫外光生成装置
JP2013065804A (ja) * 2010-12-20 2013-04-11 Gigaphoton Inc レーザ装置およびそれを備える極端紫外光生成システム
JP5745964B2 (ja) * 2011-07-22 2015-07-08 ラピスセミコンダクタ株式会社 半導体装置の製造方法及び半導体製造装置
WO2013023710A1 (en) * 2011-08-12 2013-02-21 Asml Netherlands B.V. Radiation source
JP5901210B2 (ja) * 2011-10-06 2016-04-06 浜松ホトニクス株式会社 放射線発生装置及び放射線発生方法
JP5946649B2 (ja) 2012-02-14 2016-07-06 ギガフォトン株式会社 ターゲット供給装置
WO2013131706A1 (en) * 2012-03-07 2013-09-12 Asml Netherlands B.V. Radiation source and lithographic apparatus
US10477665B2 (en) * 2012-04-13 2019-11-12 Amastan Technologies Inc. Microwave plasma torch generating laminar flow for materials processing
JP6099241B2 (ja) * 2012-06-28 2017-03-22 ギガフォトン株式会社 ターゲット供給装置
WO2014019803A1 (en) * 2012-08-01 2014-02-06 Asml Netherlands B.V. Method and apparatus for generating radiation
KR20140036538A (ko) * 2012-09-17 2014-03-26 삼성전자주식회사 극자외선 생성 장치, 이를 포함하는 노광 장치 및 이러한 노광 장치를 사용해서 제조된 전자 디바이스
JP6010438B2 (ja) * 2012-11-27 2016-10-19 浜松ホトニクス株式会社 量子ビーム生成装置、量子ビーム生成方法、及び、レーザ核融合装置
US8872143B2 (en) 2013-03-14 2014-10-28 Asml Netherlands B.V. Target for laser produced plasma extreme ultraviolet light source
US8791440B1 (en) * 2013-03-14 2014-07-29 Asml Netherlands B.V. Target for extreme ultraviolet light source
US8680495B1 (en) * 2013-03-15 2014-03-25 Cymer, Llc Extreme ultraviolet light source
KR102257748B1 (ko) * 2013-04-05 2021-05-28 에이에스엠엘 네델란즈 비.브이. 소스 콜렉터 장치, 리소그래피 장치 및 방법
KR102115543B1 (ko) * 2013-04-26 2020-05-26 삼성전자주식회사 극자외선 광원 장치
WO2014203804A1 (ja) * 2013-06-20 2014-12-24 ギガフォトン株式会社 極端紫外光生成システム
ES2431266B1 (es) * 2013-07-31 2014-09-15 Universidad De Málaga Procedimiento y dispositivo para la producción de nanopartículas mediante irradiación láser de precursores líquidos de tamaño microscópico
US8901523B1 (en) * 2013-09-04 2014-12-02 Asml Netherlands B.V. Apparatus for protecting EUV optical elements
JP6283684B2 (ja) * 2013-11-07 2018-02-21 ギガフォトン株式会社 極端紫外光生成装置及び極端紫外光生成装置の制御方法
US9338870B2 (en) 2013-12-30 2016-05-10 Asml Netherlands B.V. Extreme ultraviolet light source
WO2015139900A1 (en) * 2014-03-18 2015-09-24 Asml Netherlands B.V. Fuel stream generator
US9357625B2 (en) 2014-07-07 2016-05-31 Asml Netherlands B.V. Extreme ultraviolet light source
KR102336300B1 (ko) 2014-11-17 2021-12-07 삼성전자주식회사 극자외선 광원 장치 및 극자외선 광 발생 방법
KR102269695B1 (ko) 2015-03-19 2021-06-25 삼성전자주식회사 극자외선 광 생성 장치
JP6541785B2 (ja) * 2015-07-30 2019-07-10 ギガフォトン株式会社 極端紫外光生成装置
US9426872B1 (en) * 2015-08-12 2016-08-23 Asml Netherlands B.V. System and method for controlling source laser firing in an LPP EUV light source
US9832854B2 (en) * 2015-08-12 2017-11-28 Asml Netherlands B.V. Systems and methods for stabilization of droplet-plasma interaction via laser energy modulation
US11550233B2 (en) 2018-08-14 2023-01-10 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography system and operation method thereof
NL2023879A (en) * 2018-09-26 2020-05-01 Asml Netherlands Bv Apparatus for and method of controlling introduction of euv target material into an euv chamber
CN112684676B (zh) * 2020-12-30 2022-04-26 广东省智能机器人研究院 极紫外光产生方法和装置
JP7731247B2 (ja) * 2021-09-08 2025-08-29 ギガフォトン株式会社 極端紫外光生成装置、及び電子デバイスの製造方法
KR102895880B1 (ko) * 2021-09-10 2025-12-03 경희대학교 산학협력단 전자빔 및 액적 기반 극자외선 광원 장치

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61153935A (ja) * 1984-12-26 1986-07-12 Toshiba Corp プラズマx線発生装置
US4969169A (en) * 1986-04-15 1990-11-06 Hampshire Instruments, Inc. X-ray lithography system
GB2195070B (en) * 1986-09-11 1991-04-03 Hoya Corp Laser plasma x-ray generator capable of continuously generating x-rays
JPH01109646A (ja) * 1987-10-22 1989-04-26 Fujitsu Ltd レーザプラズマx線源
US6831963B2 (en) * 2000-10-20 2004-12-14 University Of Central Florida EUV, XUV, and X-Ray wavelength sources created from laser plasma produced from liquid metal solutions
US6304630B1 (en) 1999-12-24 2001-10-16 U.S. Philips Corporation Method of generating EUV radiation, method of manufacturing a device by means of said radiation, EUV radiation source unit, and lithographic projection apparatus provided with such a radiation source unit
US6724608B2 (en) * 2000-01-14 2004-04-20 Paul Hensley Method for plasma charging a probe
WO2001096028A1 (en) * 2000-06-16 2001-12-20 Ati Properties, Inc. Methods and apparatus for spray forming, atomization and heat transfer
US7439530B2 (en) * 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
US7405416B2 (en) * 2005-02-25 2008-07-29 Cymer, Inc. Method and apparatus for EUV plasma source target delivery
US6855943B2 (en) 2002-05-28 2005-02-15 Northrop Grumman Corporation Droplet target delivery method for high pulse-rate laser-plasma extreme ultraviolet light source
US6792076B2 (en) * 2002-05-28 2004-09-14 Northrop Grumman Corporation Target steering system for EUV droplet generators
JP2004047517A (ja) * 2002-07-08 2004-02-12 Canon Inc 放射線生成装置、放射線生成方法、露光装置並びに露光方法
CN100391316C (zh) * 2003-03-18 2008-05-28 皇家飞利浦电子股份有限公司 借助于等离子体产生远紫外线和/或软x射线辐射的装置和方法
JP4264505B2 (ja) * 2003-03-24 2009-05-20 独立行政法人産業技術総合研究所 レーザープラズマ発生方法及び装置
DE10314849B3 (de) * 2003-03-28 2004-12-30 Xtreme Technologies Gmbh Anordnung zur Stabilisierung der Strahlungsemission eines Plasmas
US6973164B2 (en) * 2003-06-26 2005-12-06 University Of Central Florida Research Foundation, Inc. Laser-produced plasma EUV light source with pre-pulse enhancement
JP4478440B2 (ja) * 2003-12-02 2010-06-09 キヤノン株式会社 ロードロック装置および方法
DE102004005241B4 (de) * 2004-01-30 2006-03-02 Xtreme Technologies Gmbh Verfahren und Einrichtung zur plasmabasierten Erzeugung weicher Röntgenstrahlung
WO2005089131A2 (en) * 2004-03-17 2005-09-29 Cymer, Inc. Lpp euv light source
DE102004036441B4 (de) * 2004-07-23 2007-07-12 Xtreme Technologies Gmbh Vorrichtung und Verfahren zum Dosieren von Targetmaterial für die Erzeugung kurzwelliger elektromagnetischer Strahlung
DE102004037521B4 (de) * 2004-07-30 2011-02-10 Xtreme Technologies Gmbh Vorrichtung zur Bereitstellung von Targetmaterial für die Erzeugung kurzwelliger elektromagnetischer Strahlung
JP4578883B2 (ja) * 2004-08-02 2010-11-10 株式会社小松製作所 極端紫外光源装置

Similar Documents

Publication Publication Date Title
JP2007200615A5 (enExample)
US7608846B2 (en) Extreme ultra violet light source device
US9295147B2 (en) EUV light source using cryogenic droplet targets in mask inspection
US7372056B2 (en) LPP EUV plasma source material target delivery system
US6855943B2 (en) Droplet target delivery method for high pulse-rate laser-plasma extreme ultraviolet light source
US9699877B2 (en) Extreme ultraviolet light generation apparatus including target droplet joining apparatus
JP5563012B2 (ja) 極端紫外光源装置
Dadvand et al. A collapsing bubble-induced microinjector: an experimental study
JP2007288190A (ja) エネルギビームにより生成される変換効率が高く汚染が最小限であるプラズマから、極紫外線を生成するための構造
JP2006086110A5 (enExample)
JP2015532521A (ja) 極紫外光源のためのターゲット材料供給装置
JP4578883B2 (ja) 極端紫外光源装置
TW201618601A (zh) 用以減少極紫外光產生之振盪的系統及方法
US9867267B2 (en) Extreme ultraviolet light source device
US20180009064A1 (en) Three-dimensional modeling device
CN120883730A (zh) 用于生成次级辐射的方法和激光系统
WO2015139900A1 (en) Fuel stream generator
KR20240024078A (ko) 고압 액적 생성기 노즐용 압력 활성화 페룰
TWI826559B (zh) 延長靶材輸送系統壽命之裝置及方法
CN113812214A (zh) 用于控制液滴形成的装置和方法
US12372886B2 (en) Acoustic particle deflection in lithography tool
US20250365843A1 (en) Method and a system for generating stable ultrashort pulses of xuv and soft x-ray radiation
TWI904117B (zh) 監測液滴流中之液滴之裝置及方法及相關之輻射源及微影系統
CN120435917A (zh) 利用靶材料流的热诱导分裂的极紫外光源的装置和方法
CN110709249A (zh) 利用脉冲激光束用于材料移置的方法、装置和系统