JP2006086110A5 - - Google Patents

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Publication number
JP2006086110A5
JP2006086110A5 JP2005202885A JP2005202885A JP2006086110A5 JP 2006086110 A5 JP2006086110 A5 JP 2006086110A5 JP 2005202885 A JP2005202885 A JP 2005202885A JP 2005202885 A JP2005202885 A JP 2005202885A JP 2006086110 A5 JP2006086110 A5 JP 2006086110A5
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Japan
Prior art keywords
nozzle
target
pressure
target material
chamber
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JP2005202885A
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English (en)
Japanese (ja)
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JP2006086110A (ja
JP4264430B2 (ja
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Priority claimed from DE102004036441A external-priority patent/DE102004036441B4/de
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Publication of JP2006086110A5 publication Critical patent/JP2006086110A5/ja
Application granted granted Critical
Publication of JP4264430B2 publication Critical patent/JP4264430B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2005202885A 2004-07-23 2005-07-12 短波長電磁放射線の生成用のターゲット材料を測定するための装置および方法 Expired - Fee Related JP4264430B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102004036441A DE102004036441B4 (de) 2004-07-23 2004-07-23 Vorrichtung und Verfahren zum Dosieren von Targetmaterial für die Erzeugung kurzwelliger elektromagnetischer Strahlung

Publications (3)

Publication Number Publication Date
JP2006086110A JP2006086110A (ja) 2006-03-30
JP2006086110A5 true JP2006086110A5 (enExample) 2009-01-22
JP4264430B2 JP4264430B2 (ja) 2009-05-20

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JP2005202885A Expired - Fee Related JP4264430B2 (ja) 2004-07-23 2005-07-12 短波長電磁放射線の生成用のターゲット材料を測定するための装置および方法

Country Status (3)

Country Link
US (1) US7368742B2 (enExample)
JP (1) JP4264430B2 (enExample)
DE (1) DE102004036441B4 (enExample)

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US7378673B2 (en) * 2005-02-25 2008-05-27 Cymer, Inc. Source material dispenser for EUV light source
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DE102004037521B4 (de) * 2004-07-30 2011-02-10 Xtreme Technologies Gmbh Vorrichtung zur Bereitstellung von Targetmaterial für die Erzeugung kurzwelliger elektromagnetischer Strahlung
DE102004042501A1 (de) * 2004-08-31 2006-03-16 Xtreme Technologies Gmbh Vorrichtung zur Bereitstellung eines reproduzierbaren Targetstromes für die energiestrahlinduzierte Erzeugung kurzwelliger elektromagnetischer Strahlung
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JP2008193014A (ja) * 2007-02-08 2008-08-21 Komatsu Ltd Ｌｐｐ型ｅｕｖ光源装置用ターゲット物質供給装置及びシステム
DE102007056872A1 (de) * 2007-11-26 2009-05-28 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Berlin Strahlungserzeugung mittels Laserbestrahlung eines freien Tröpfchentargets
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JP5551426B2 (ja) * 2008-12-19 2014-07-16 ギガフォトン株式会社 ターゲット供給装置
JP5739099B2 (ja) * 2008-12-24 2015-06-24 ギガフォトン株式会社 ターゲット供給装置、その制御システム、その制御装置およびその制御回路
US8881526B2 (en) * 2009-03-10 2014-11-11 Bastian Family Holdings, Inc. Laser for steam turbine system
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US20120280148A1 (en) * 2010-01-07 2012-11-08 Asml Netherlands B.V. Euv radiation source and lithographic apparatus
US8263953B2 (en) * 2010-04-09 2012-09-11 Cymer, Inc. Systems and methods for target material delivery protection in a laser produced plasma EUV light source
US8258485B2 (en) * 2010-08-30 2012-09-04 Media Lario Srl Source-collector module with GIC mirror and xenon liquid EUV LPP target system
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US9671698B2 (en) * 2012-02-22 2017-06-06 Asml Netherlands B.V. Fuel stream generator, source collector apparatus and lithographic apparatus
SG11201407262VA (en) * 2012-05-21 2014-12-30 Asml Netherlands Bv Radiation source
JP6099241B2 (ja) * 2012-06-28 2017-03-22 ギガフォトン株式会社 ターゲット供給装置
NL2011533A (en) * 2012-10-31 2014-05-06 Asml Netherlands Bv Method and apparatus for generating radiation.
WO2014120985A1 (en) 2013-01-30 2014-08-07 Kla-Tencor Corporation Euv light source using cryogenic droplet targets in mask inspection
JP2017522697A (ja) * 2014-07-17 2017-08-10 シーメンス アクチエンゲゼルシヤフトＳｉｅｍｅｎｓ Ａｋｔｉｅｎｇｅｓｅｌｌｓｃｈａｆｔ Ｘ線管用の流体インジェクタおよび液体金属噴射により液体陽極を提供する方法
US10217625B2 (en) * 2015-03-11 2019-02-26 Kla-Tencor Corporation Continuous-wave laser-sustained plasma illumination source
US10880979B2 (en) * 2015-11-10 2020-12-29 Kla Corporation Droplet generation for a laser produced plasma light source
US10750604B2 (en) 2015-12-17 2020-08-18 Asml Netherlands B.V. Droplet generator for lithographic apparatus, EUV source and lithographic apparatus
KR102709126B1 (ko) 2015-12-17 2024-09-23 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치, 극자외선 소스 및 리소그래피 장치를 위한 액적 생성기
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US10959318B2 (en) * 2018-01-10 2021-03-23 Kla-Tencor Corporation X-ray metrology system with broadband laser produced plasma illuminator
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JP2024126118A (ja) * 2023-03-07 2024-09-20 ウシオ電機株式会社 原料供給装置、光源装置、及び原料供給方法

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