SG11201407262VA - Radiation source - Google Patents

Radiation source

Info

Publication number
SG11201407262VA
SG11201407262VA SG11201407262VA SG11201407262VA SG11201407262VA SG 11201407262V A SG11201407262V A SG 11201407262VA SG 11201407262V A SG11201407262V A SG 11201407262VA SG 11201407262V A SG11201407262V A SG 11201407262VA SG 11201407262V A SG11201407262V A SG 11201407262VA
Authority
SG
Singapore
Prior art keywords
international
droplets
droplet
laser
pulse
Prior art date
Application number
SG11201407262VA
Inventor
Schoot Jan Van
Antonius Kempen
Hermanus Kreuwel
Andrei Mikhailovich Yakunin
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG11201407262VA publication Critical patent/SG11201407262VA/en

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/006—X-ray radiation generated from plasma being produced from a liquid or gas details of the ejection system, e.g. constructional details of the nozzle
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component

Abstract

(12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 28 November 2013 (28.11.2013) WIPOIPCT (10) International Publication Number WO 2013/174620 A1 (51) International Patent Classification: H05G 2/00 (2006.01) (21) International Application Number: (22) International Filing Date: (25) Filing Language: (26) Publication Language: PCT/EP2013/058869 29 April 2013 (29.04.2013) English English (30) Priority Data: 61/649,895 21 May 2012 (21.05.2012) US (71) Applicant: ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324, NL-5500 AH Veldhoven (NL). (72) Inventors: VAN SCHOOT, Jan; Citrushof 8, NL-5632 XN Eindhoven (NL). KEMPEN, Antonius; Ackersdijck- straat 28, NL-5212 GL Den Bosch (NL). (74) Agent: SIEM, Max Yoe She; ASML Netherlands BV, P.O. Box 324, NL-5500 AH Veldhoven (NL). (81) Designated States (unless otherwise indicated, for every kind of national protection available)'. AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available)'. ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3)) (54) Title: RADIATION SOURCE ID' i Ot- —> time O CJ •t i> Pig. 4 (57) Abstract: A radiation source for generating EUV radiation suitable for use in a lithographic apparatus includes a laser configured to fire laser pulses at a target area to which is supplied a stream of fuel droplets. The fuel droplets may be tin droplets that emit EUV radiation when excited by the laser beam. The EUV radiation is collected by a collector. The tin droplets may be pre-condi- tioned by a laser pre-pulse before the main laser pulse with the objective of changing the shape of the droplets so that they are in an optimum condi­ tion for receiving the main laser pulse. Embodi­ ments of the invention take into account the effect of the vaporization of one fuel droplet on succeed­ ing droplets and allow the timing of the main and/or pre-pulse to be adjusted to take into ac­ count any delay in arrival of the subsequent droplet or oscillations in the shape of the sub­ sequent droplet which may be caused by vaporiza­ tion of the preceding droplet.
SG11201407262VA 2012-05-21 2013-04-29 Radiation source SG11201407262VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261649895P 2012-05-21 2012-05-21
PCT/EP2013/058869 WO2013174620A1 (en) 2012-05-21 2013-04-29 Radiation source

Publications (1)

Publication Number Publication Date
SG11201407262VA true SG11201407262VA (en) 2014-12-30

Family

ID=48289135

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201407262VA SG11201407262VA (en) 2012-05-21 2013-04-29 Radiation source

Country Status (7)

Country Link
US (1) US9860966B2 (en)
EP (1) EP2853139B1 (en)
JP (1) JP6198816B2 (en)
KR (1) KR102072064B1 (en)
CN (1) CN104488362B (en)
SG (1) SG11201407262VA (en)
WO (1) WO2013174620A1 (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2011533A (en) * 2012-10-31 2014-05-06 Asml Netherlands Bv Method and apparatus for generating radiation.
WO2014189055A1 (en) * 2013-05-21 2014-11-27 ギガフォトン株式会社 Extreme ultraviolet light generating apparatus
US9338870B2 (en) * 2013-12-30 2016-05-10 Asml Netherlands B.V. Extreme ultraviolet light source
US9832854B2 (en) * 2015-08-12 2017-11-28 Asml Netherlands B.V. Systems and methods for stabilization of droplet-plasma interaction via laser energy modulation
US9426872B1 (en) * 2015-08-12 2016-08-23 Asml Netherlands B.V. System and method for controlling source laser firing in an LPP EUV light source
US20170311429A1 (en) 2016-04-25 2017-10-26 Asml Netherlands B.V. Reducing the effect of plasma on an object in an extreme ultraviolet light source
US9778022B1 (en) 2016-09-14 2017-10-03 Asml Netherlands B.V. Determining moving properties of a target in an extreme ultraviolet light source
US10149375B2 (en) 2016-09-14 2018-12-04 Asml Netherlands B.V. Target trajectory metrology in an extreme ultraviolet light source
JP7239491B2 (en) * 2017-05-30 2023-03-14 エーエスエムエル ネザーランズ ビー．ブイ． source of radiation
US11140765B2 (en) * 2017-09-20 2021-10-05 Asml Netherlands B.V. Radiation source
NL2022460A (en) * 2018-02-28 2019-09-03 Stichting Vu Radiation source
WO2019186754A1 (en) * 2018-03-28 2019-10-03 ギガフォトン株式会社 Extreme ultraviolet light generation system and method for manufacturing electronic device
US11153959B2 (en) * 2018-08-17 2021-10-19 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus and method for generating extreme ultraviolet radiation
TW202041103A (en) 2019-01-30 2020-11-01 荷蘭商Ａｓｍｌ荷蘭公司 Determining moving properties of a target in an extreme ultraviolet light source

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5226948A (en) * 1990-08-30 1993-07-13 University Of Southern California Method and apparatus for droplet stream manufacturing
FR2799667B1 (en) 1999-10-18 2002-03-08 Commissariat Energie Atomique METHOD AND DEVICE FOR GENERATING A DENSE FOG OF MICROMETRIC AND SUBMICROMETRIC DROPLETS, APPLICATION TO THE GENERATION OF LIGHT IN EXTREME ULTRAVIOLET IN PARTICULAR FOR LITHOGRAPHY
US7928416B2 (en) * 2006-12-22 2011-04-19 Cymer, Inc. Laser produced plasma EUV light source
US7897947B2 (en) * 2007-07-13 2011-03-01 Cymer, Inc. Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
US8653437B2 (en) * 2010-10-04 2014-02-18 Cymer, Llc EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
US6664498B2 (en) * 2001-12-04 2003-12-16 General Atomics Method and apparatus for increasing the material removal rate in laser machining
JP3759066B2 (en) * 2002-04-11 2006-03-22 孝晏 望月 Laser plasma generation method and apparatus
US6855943B2 (en) 2002-05-28 2005-02-15 Northrop Grumman Corporation Droplet target delivery method for high pulse-rate laser-plasma extreme ultraviolet light source
TWI299505B (en) 2003-04-08 2008-08-01 Cymer Inc Systems and methods for removal of debris on a reflecting surface of an euv collector in an euv light source
DE102004005242B4 (en) 2004-01-30 2006-04-20 Xtreme Technologies Gmbh Method and apparatus for the plasma-based generation of intense short-wave radiation
DE102004036441B4 (en) * 2004-07-23 2007-07-12 Xtreme Technologies Gmbh Apparatus and method for dosing target material for generating shortwave electromagnetic radiation
US7308007B2 (en) * 2004-12-23 2007-12-11 Colorado State University Research Foundation Increased laser output energy and average power at wavelengths below 35 nm
JP4512747B2 (en) * 2005-03-02 2010-07-28 独立行政法人産業技術総合研究所 Method for generating radiation light from laser plasma, and laser plasma radiation light generating apparatus using the method
US8158960B2 (en) * 2007-07-13 2012-04-17 Cymer, Inc. Laser produced plasma EUV light source
US7872245B2 (en) 2008-03-17 2011-01-18 Cymer, Inc. Systems and methods for target material delivery in a laser produced plasma EUV light source
JP5454881B2 (en) * 2008-08-29 2014-03-26 ギガフォトン株式会社 Extreme ultraviolet light source device and method for generating extreme ultraviolet light
WO2011013779A1 (en) * 2009-07-29 2011-02-03 株式会社小松製作所 Extreme ultraviolet light source, method for controlling extreme ultraviolet light source, and recording medium in which program therefor is recorded
US8598551B2 (en) 2010-01-07 2013-12-03 Asml Netherlands B.V. EUV radiation source comprising a droplet accelerator and lithographic apparatus
US9265136B2 (en) * 2010-02-19 2016-02-16 Gigaphoton Inc. System and method for generating extreme ultraviolet light
US9072153B2 (en) * 2010-03-29 2015-06-30 Gigaphoton Inc. Extreme ultraviolet light generation system utilizing a pre-pulse to create a diffused dome shaped target
CN103460018B (en) * 2011-02-04 2015-09-23 塞通诺米/St有限责任公司 Particle sorting device and method
NL2009372A (en) * 2011-09-28 2013-04-02 Asml Netherlands Bv Methods to control euv exposure dose and euv lithographic methods and apparatus using such methods.
US8895946B2 (en) * 2012-02-11 2014-11-25 Media Lario S.R.L. Source-collector modules for EUV lithography employing a GIC mirror and a LPP source
JP2014078394A (en) * 2012-10-10 2014-05-01 Gigaphoton Inc Extreme-ultraviolet light generation system
US8872123B2 (en) * 2013-01-10 2014-10-28 Asml Netherlands B.V. Method of timing laser beam pulses to regulate extreme ultraviolet light dosing
JP6195474B2 (en) * 2013-05-31 2017-09-13 ギガフォトン株式会社 Extreme ultraviolet light generation apparatus and laser system control method in extreme ultraviolet light generation system

Also Published As

Publication number Publication date
EP2853139B1 (en) 2016-07-13
US20150146182A1 (en) 2015-05-28
WO2013174620A1 (en) 2013-11-28
JP2015520513A (en) 2015-07-16
US9860966B2 (en) 2018-01-02
EP2853139A1 (en) 2015-04-01
JP6198816B2 (en) 2017-09-20
CN104488362B (en) 2017-05-10
KR20150013823A (en) 2015-02-05
KR102072064B1 (en) 2020-01-31
CN104488362A (en) 2015-04-01

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