JP4264430B2 - 短波長電磁放射線の生成用のターゲット材料を測定するための装置および方法 - Google Patents

短波長電磁放射線の生成用のターゲット材料を測定するための装置および方法 Download PDF

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JP4264430B2
JP4264430B2 JP2005202885A JP2005202885A JP4264430B2 JP 4264430 B2 JP4264430 B2 JP 4264430B2 JP 2005202885 A JP2005202885 A JP 2005202885A JP 2005202885 A JP2005202885 A JP 2005202885A JP 4264430 B2 JP4264430 B2 JP 4264430B2
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nozzle
target
pressure
target material
chamber
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JP2006086110A (ja
JP2006086110A5 (enExample
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ヘルゲンハーン グイード
クレープフェル ディートハルト
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イクストリーメ テクノロジース ゲゼルシャフト ミット ベシュレンクテル ハフツング
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0027—Arrangements for controlling the supply; Arrangements for measurements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0023—Constructional details of the ejection system
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • H05G2/0035—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state the material containing metals as principal radiation-generating components

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005202885A 2004-07-23 2005-07-12 短波長電磁放射線の生成用のターゲット材料を測定するための装置および方法 Expired - Fee Related JP4264430B2 (ja)

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DE102004036441A DE102004036441B4 (de) 2004-07-23 2004-07-23 Vorrichtung und Verfahren zum Dosieren von Targetmaterial für die Erzeugung kurzwelliger elektromagnetischer Strahlung

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JP2006086110A JP2006086110A (ja) 2006-03-30
JP2006086110A5 JP2006086110A5 (enExample) 2009-01-22
JP4264430B2 true JP4264430B2 (ja) 2009-05-20

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US (1) US7368742B2 (enExample)
JP (1) JP4264430B2 (enExample)
DE (1) DE102004036441B4 (enExample)

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DE102007056872A1 (de) * 2007-11-26 2009-05-28 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Berlin Strahlungserzeugung mittels Laserbestrahlung eines freien Tröpfchentargets
JP5486795B2 (ja) * 2008-11-20 2014-05-07 ギガフォトン株式会社 極端紫外光源装置及びそのターゲット供給システム
JP5551426B2 (ja) * 2008-12-19 2014-07-16 ギガフォトン株式会社 ターゲット供給装置
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US8258485B2 (en) * 2010-08-30 2012-09-04 Media Lario Srl Source-collector module with GIC mirror and xenon liquid EUV LPP target system
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US9671698B2 (en) * 2012-02-22 2017-06-06 Asml Netherlands B.V. Fuel stream generator, source collector apparatus and lithographic apparatus
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JP6099241B2 (ja) * 2012-06-28 2017-03-22 ギガフォトン株式会社 ターゲット供給装置
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WO2014120985A1 (en) 2013-01-30 2014-08-07 Kla-Tencor Corporation Euv light source using cryogenic droplet targets in mask inspection
JP2017522697A (ja) * 2014-07-17 2017-08-10 シーメンス アクチエンゲゼルシヤフトＳｉｅｍｅｎｓ Ａｋｔｉｅｎｇｅｓｅｌｌｓｃｈａｆｔ Ｘ線管用の流体インジェクタおよび液体金属噴射により液体陽極を提供する方法
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US10959318B2 (en) * 2018-01-10 2021-03-23 Kla-Tencor Corporation X-ray metrology system with broadband laser produced plasma illuminator
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JP2024126118A (ja) * 2023-03-07 2024-09-20 ウシオ電機株式会社 原料供給装置、光源装置、及び原料供給方法

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Publication number Publication date
JP2006086110A (ja) 2006-03-30
DE102004036441A1 (de) 2006-02-16
DE102004036441B4 (de) 2007-07-12
US20060017026A1 (en) 2006-01-26
US7368742B2 (en) 2008-05-06

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