JP2007198896A5 - - Google Patents
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- JP2007198896A5 JP2007198896A5 JP2006017561A JP2006017561A JP2007198896A5 JP 2007198896 A5 JP2007198896 A5 JP 2007198896A5 JP 2006017561 A JP2006017561 A JP 2006017561A JP 2006017561 A JP2006017561 A JP 2006017561A JP 2007198896 A5 JP2007198896 A5 JP 2007198896A5
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- JP
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- 238000000034 method Methods 0.000 claims 6
- 230000005484 gravity Effects 0.000 claims 4
- 230000003287 optical effect Effects 0.000 claims 4
- 238000004458 analytical method Methods 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 230000010287 polarization Effects 0.000 claims 1
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006017561A JP2007198896A (ja) | 2006-01-26 | 2006-01-26 | 計測方法 |
| EP07001652A EP1813988A3 (en) | 2006-01-26 | 2007-01-25 | Measurement method |
| US11/627,153 US7468798B2 (en) | 2006-01-26 | 2007-01-25 | System and method for polarization characteristic measurement of optical systems via centroid analysis |
| KR1020070008207A KR100873531B1 (ko) | 2006-01-26 | 2007-01-26 | 측정방법 |
| CNA2007100047309A CN101008792A (zh) | 2006-01-26 | 2007-01-26 | 测量方法 |
| TW096103023A TW200741814A (en) | 2006-01-26 | 2007-01-26 | Measurement method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006017561A JP2007198896A (ja) | 2006-01-26 | 2006-01-26 | 計測方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007198896A JP2007198896A (ja) | 2007-08-09 |
| JP2007198896A5 true JP2007198896A5 (enExample) | 2009-04-09 |
Family
ID=37951862
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006017561A Withdrawn JP2007198896A (ja) | 2006-01-26 | 2006-01-26 | 計測方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7468798B2 (enExample) |
| EP (1) | EP1813988A3 (enExample) |
| JP (1) | JP2007198896A (enExample) |
| KR (1) | KR100873531B1 (enExample) |
| CN (1) | CN101008792A (enExample) |
| TW (1) | TW200741814A (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007198896A (ja) * | 2006-01-26 | 2007-08-09 | Canon Inc | 計測方法 |
| US7705998B2 (en) * | 2007-09-12 | 2010-04-27 | Infineon Technologies Ag | Method for evaluating an optical imaging process |
| JP5055141B2 (ja) * | 2008-01-10 | 2012-10-24 | キヤノン株式会社 | 評価方法、調整方法、露光装置、およびプログラム |
| JP5176876B2 (ja) * | 2008-10-31 | 2013-04-03 | 富士通セミコンダクター株式会社 | シミュレーション方法、シミュレーション装置、及びシミュレーションプログラム |
| JP5359397B2 (ja) * | 2009-03-10 | 2013-12-04 | 株式会社ニコン | 光学部材及び光学機器 |
| DE102009015393B3 (de) * | 2009-03-20 | 2010-09-02 | Carl Zeiss Smt Ag | Messverfahren und Messsystem zur Messung der Doppelbrechung |
| CN103528688B (zh) * | 2013-07-07 | 2015-08-19 | 浙江大学 | 一种全偏振高光谱干涉成像装置及方法 |
| CN104296676B (zh) * | 2014-09-29 | 2017-04-26 | 中国科学院光电研究院 | 基于低频差声光移频器移相的外差点衍射干涉仪 |
| CN104635241B (zh) * | 2015-03-05 | 2018-02-27 | 北京航空航天大学 | 一种艇载多光谱高光谱对地观测装置 |
| EP3315950A4 (en) * | 2015-06-25 | 2018-12-19 | JFE Steel Corporation | Surface flaw detection device, surface flaw detection method, and manufacturing method for steel material |
| WO2017032525A1 (en) | 2015-08-21 | 2017-03-02 | Asml Netherlands B.V. | Lithographic method and apparatus |
| DE102018211853A1 (de) | 2018-07-17 | 2020-01-23 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zur Charakterisierung der Oberflächenform eines optischen Elements |
| CN111176075B (zh) * | 2018-11-13 | 2021-08-10 | 上海微电子装备(集团)股份有限公司 | 偏振像差检测装置、物镜测试台及光刻设备 |
| KR102047123B1 (ko) * | 2019-05-20 | 2019-11-20 | 한국해양과학기술원 | 시간 영역에서의 계층 식별 방법 |
| CN110307962B (zh) * | 2019-06-28 | 2020-10-27 | 苏州维纳仪器有限责任公司 | 检测光学系统任意波长透射波前的方法 |
| CN112880987B (zh) * | 2019-11-29 | 2022-05-03 | 上海微电子装备(集团)股份有限公司 | 光学元件的偏振性能检测方法及检测系统 |
| US11422086B2 (en) | 2020-05-05 | 2022-08-23 | Microsoft Technology Licensing, Llc | Efficient reading of birefringent data |
| US11341620B2 (en) | 2020-05-05 | 2022-05-24 | Microsoft Technology Licensing, Llc | Background correction for birefringence measurements |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6404482B1 (en) * | 1992-10-01 | 2002-06-11 | Nikon Corporation | Projection exposure method and apparatus |
| JP3413067B2 (ja) | 1997-07-29 | 2003-06-03 | キヤノン株式会社 | 投影光学系及びそれを用いた投影露光装置 |
| US6829041B2 (en) | 1997-07-29 | 2004-12-07 | Canon Kabushiki Kaisha | Projection optical system and projection exposure apparatus having the same |
| US6342945B1 (en) * | 1999-03-31 | 2002-01-29 | Corning Incorporated | System and method for measuring polarization mode dispersion suitable for a production environment |
| JP3339468B2 (ja) * | 1999-06-24 | 2002-10-28 | ミノルタ株式会社 | プリンタ一体型デジタルカメラ |
| US6683710B2 (en) * | 2001-06-01 | 2004-01-27 | Optical Research Associates | Correction of birefringence in cubic crystalline optical systems |
| JP3634782B2 (ja) | 2001-09-14 | 2005-03-30 | キヤノン株式会社 | 照明装置、それを用いた露光装置及びデバイス製造方法 |
| US6970232B2 (en) * | 2001-10-30 | 2005-11-29 | Asml Netherlands B.V. | Structures and methods for reducing aberration in integrated circuit fabrication systems |
| US7453641B2 (en) * | 2001-10-30 | 2008-11-18 | Asml Netherlands B.V. | Structures and methods for reducing aberration in optical systems |
| US6995908B2 (en) * | 2001-10-30 | 2006-02-07 | Asml Netherlands B.V. | Methods for reducing aberration in optical systems |
| US6844972B2 (en) * | 2001-10-30 | 2005-01-18 | Mcguire, Jr. James P. | Reducing aberration in optical systems comprising cubic crystalline optical elements |
| DE10329360B4 (de) | 2002-07-01 | 2008-08-28 | Canon K.K. | Doppelbrechungsmessgerät, Spannungsentfernungseinrichtung, Polarimeter und Belichtungsgerät |
| JP2004061515A (ja) | 2002-07-29 | 2004-02-26 | Cark Zeiss Smt Ag | 光学系による偏光状態への影響を決定する方法及び装置と、分析装置 |
| US6862377B2 (en) * | 2002-10-15 | 2005-03-01 | Agilent Technologies, Inc. | System and method for PMD measurement from coherent spectral analysis |
| WO2005003862A1 (de) | 2003-07-05 | 2005-01-13 | Carl Zeiss Smt Ag | Vorrichtung zur polarisationsspezifischen untersuchung eines optischen systems |
| JP2007198896A (ja) * | 2006-01-26 | 2007-08-09 | Canon Inc | 計測方法 |
| EP1818658A1 (en) | 2006-02-08 | 2007-08-15 | Carl Zeiss SMT AG | Method for approximating the influence of an optical system on the state of polarisation of optical radiation |
-
2006
- 2006-01-26 JP JP2006017561A patent/JP2007198896A/ja not_active Withdrawn
-
2007
- 2007-01-25 EP EP07001652A patent/EP1813988A3/en not_active Withdrawn
- 2007-01-25 US US11/627,153 patent/US7468798B2/en not_active Expired - Fee Related
- 2007-01-26 TW TW096103023A patent/TW200741814A/zh unknown
- 2007-01-26 CN CNA2007100047309A patent/CN101008792A/zh active Pending
- 2007-01-26 KR KR1020070008207A patent/KR100873531B1/ko not_active Expired - Fee Related
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