JP2007123669A - 半導体装置の製造方法 - Google Patents
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 37
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 31
- 238000000034 method Methods 0.000 title claims abstract description 29
- 239000000758 substrate Substances 0.000 claims abstract description 65
- 230000003647 oxidation Effects 0.000 claims abstract description 63
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 63
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims abstract description 48
- 229920005591 polysilicon Polymers 0.000 claims abstract description 48
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract description 23
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 23
- 239000010937 tungsten Substances 0.000 claims abstract description 23
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 16
- 230000001590 oxidative effect Effects 0.000 claims abstract description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 5
- 239000001257 hydrogen Substances 0.000 claims abstract description 5
- 238000000059 patterning Methods 0.000 claims abstract description 5
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 20
- 229910052796 boron Inorganic materials 0.000 claims description 20
- 238000010438 heat treatment Methods 0.000 claims description 9
- 241000293849 Cordylanthus Species 0.000 abstract description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 21
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 21
- 229910052814 silicon oxide Inorganic materials 0.000 description 21
- 238000002474 experimental method Methods 0.000 description 18
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 12
- 229910052698 phosphorus Inorganic materials 0.000 description 12
- 239000011574 phosphorus Substances 0.000 description 12
- 229910052710 silicon Inorganic materials 0.000 description 12
- 239000010703 silicon Substances 0.000 description 12
- 238000005229 chemical vapour deposition Methods 0.000 description 7
- 229910021417 amorphous silicon Inorganic materials 0.000 description 6
- 238000011109 contamination Methods 0.000 description 5
- 238000002955 isolation Methods 0.000 description 5
- 239000002019 doping agent Substances 0.000 description 4
- 238000001312 dry etching Methods 0.000 description 3
- 230000003213 activating effect Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 239000003870 refractory metal Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/28008—Making conductor-insulator-semiconductor electrodes
- H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
- H01L21/28247—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon passivation or protection of the electrode, e.g. using re-oxidation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8238—Complementary field-effect transistors, e.g. CMOS
- H01L21/823828—Complementary field-effect transistors, e.g. CMOS with a particular manufacturing method of the gate conductors, e.g. particular materials, shapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8238—Complementary field-effect transistors, e.g. CMOS
- H01L21/823857—Complementary field-effect transistors, e.g. CMOS with a particular manufacturing method of the gate insulating layers, e.g. different gate insulating layer thicknesses, particular gate insulator materials or particular gate insulator implants
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/01—Manufacture or treatment
- H10B12/02—Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
- H10B12/05—Making the transistor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/28008—Making conductor-insulator-semiconductor electrodes
- H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
- H01L21/28026—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor
- H01L21/28035—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities
- H01L21/28044—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities the conductor comprising at least another non-silicon conductive layer
- H01L21/28061—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities the conductor comprising at least another non-silicon conductive layer the conductor comprising a metal or metal silicide formed by deposition, e.g. sputter deposition, i.e. without a silicidation reaction
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Electrodes Of Semiconductors (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Formation Of Insulating Films (AREA)
Abstract
【解決手段】半導体装置の製造方法は、半導体基板11の表面にゲート絶縁膜15aを形成する工程と、ゲート絶縁膜上に、ポリシリコン層16及びタングステン層17を順次に堆積する工程と、ポリシリコン層16及びタングステン層17をパターニングする工程と、水及び水素を含む酸化性雰囲気中でポリシリコン層16を酸化する熱酸化工程とをこの順に有する。熱酸化工程は、基板表面温度を850℃以上とし、水分濃度が7%以上で20%以下の雰囲気下で行う。
【選択図】図3
Description
半導体基板の表面にゲート絶縁膜を形成する工程と、
前記ゲート絶縁膜上に、順次に配設されたポリシリコン層及びタングステン層を形成する工程と、
前記ポリシリコン層及びタングステン層をパターニングする工程と、
水及び水素を含む酸化性雰囲気中で前記ポリシリコン層を酸化する熱酸化工程と
をこの順に有し、
前記熱酸化工程は、基板表面温度を850℃以上とし、水分濃度が7%以上で20%以下の雰囲気下で行うことを特徴とする。
10B:NMOS領域
11:シリコン基板
12:素子分離領域
13:n型ウェル領域
14:p型ウェル領域
15:ゲート絶縁膜
15a:酸化シリコン膜
16:ポリシリコン層
16a:p型ポリシリコン層
16b:n型ポリシリコン層
17:タングステン層
18:窒化シリコン層
19:(PMOSの)ゲート電極
20:(NMOSの)ゲート電極
21:側壁酸化膜
22:バーズピーク酸化層
23:p型低濃度ソース・ドレイン領域
24:n型低濃度ソース・ドレイン領域
25:サイドウォール
26:p型高濃度ソース・ドレイン領域
27:n型高濃度ソース・ドレイン領域
Claims (6)
- 順次に形成されたポリシリコン層及びタングステン層を有するポリメタル構造のゲート電極を備える半導体装置の製造方法において、
半導体基板の表面にゲート絶縁膜を形成する工程と、
前記ゲート絶縁膜上に、順次に配設されたポリシリコン層及びタングステン層を形成する工程と、
前記ポリシリコン層及びタングステン層をパターニングする工程と、
水及び水素を含む酸化性雰囲気中で前記ポリシリコン層を酸化する熱酸化工程と
をこの順に有し、
前記熱酸化工程は、基板表面温度を850℃以上とし、水分濃度が7%以上で20%以下の雰囲気下で行うことを特徴とする半導体装置の製造方法。 - 前記パターニング工程に先立って、前記ポリシリコン層にホウ素をドープする工程を更に有し、
前記基板表面温度を1050℃以下とする、請求項1に記載の半導体装置の製造方法。 - 前記熱酸化工程は、基板表面温度を室温から所定の基板表面温度に昇温する昇温工程と、前記所定の基板表面温度を維持する維持工程と、前記所定の基板表面温度から室温に降温する降温工程とを含み、
前記昇温工程の温度変化率が、50℃/秒以上である、請求項1又は2に記載の半導体装置の製造方法。 - 前記昇温工程では、ランプアニーラを用いて加熱する、請求項3に記載の半導体装置の製造方法。
- 前記熱酸化工程では、前記基板表面温度を950℃以上とし、前記水分濃度を9%以上とする、請求項1〜4の何れか一に記載の半導体装置の製造方法。
- 前記熱酸化工程では、前記基板表面温度を1000℃以上とし、前記水分濃度を8%以上とする、請求項1〜4の何れか一に記載の半導体装置の製造方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005315975A JP2007123669A (ja) | 2005-10-31 | 2005-10-31 | 半導体装置の製造方法 |
US11/586,493 US20070099364A1 (en) | 2005-10-31 | 2006-10-26 | Method for manufacturing a semiconductor device having a polymetal gate electrode |
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JP2005315975A JP2007123669A (ja) | 2005-10-31 | 2005-10-31 | 半導体装置の製造方法 |
Publications (1)
Publication Number | Publication Date |
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JP2007123669A true JP2007123669A (ja) | 2007-05-17 |
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JP2005315975A Pending JP2007123669A (ja) | 2005-10-31 | 2005-10-31 | 半導体装置の製造方法 |
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US (1) | US20070099364A1 (ja) |
JP (1) | JP2007123669A (ja) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003532290A (ja) * | 2000-04-27 | 2003-10-28 | アプライド マテリアルズ インコーポレイテッド | シリコン/金属複合膜堆積物を選択的に酸化するための方法及び装置 |
JP2004526327A (ja) * | 2001-04-26 | 2004-08-26 | インフィネオン テクノロジーズ アクチエンゲゼルシャフト | タングステン−シリコンゲートの選択的側壁酸化中における酸化タングステンの蒸着を最小化するための方法 |
JP2005229130A (ja) * | 2001-03-12 | 2005-08-25 | Renesas Technology Corp | 半導体集積回路装置の製造方法 |
Family Cites Families (2)
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US6291868B1 (en) * | 1998-02-26 | 2001-09-18 | Micron Technology, Inc. | Forming a conductive structure in a semiconductor device |
US7235497B2 (en) * | 2003-10-17 | 2007-06-26 | Micron Technology, Inc. | Selective oxidation methods and transistor fabrication methods |
-
2005
- 2005-10-31 JP JP2005315975A patent/JP2007123669A/ja active Pending
-
2006
- 2006-10-26 US US11/586,493 patent/US20070099364A1/en not_active Abandoned
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003532290A (ja) * | 2000-04-27 | 2003-10-28 | アプライド マテリアルズ インコーポレイテッド | シリコン/金属複合膜堆積物を選択的に酸化するための方法及び装置 |
JP2005229130A (ja) * | 2001-03-12 | 2005-08-25 | Renesas Technology Corp | 半導体集積回路装置の製造方法 |
JP2004526327A (ja) * | 2001-04-26 | 2004-08-26 | インフィネオン テクノロジーズ アクチエンゲゼルシャフト | タングステン−シリコンゲートの選択的側壁酸化中における酸化タングステンの蒸着を最小化するための方法 |
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