JP2007109916A5 - - Google Patents
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- Publication number
- JP2007109916A5 JP2007109916A5 JP2005299666A JP2005299666A JP2007109916A5 JP 2007109916 A5 JP2007109916 A5 JP 2007109916A5 JP 2005299666 A JP2005299666 A JP 2005299666A JP 2005299666 A JP2005299666 A JP 2005299666A JP 2007109916 A5 JP2007109916 A5 JP 2007109916A5
- Authority
- JP
- Japan
- Prior art keywords
- aluminum alloy
- alloy film
- forming
- etching
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229910000838 Al alloy Inorganic materials 0.000 claims 9
- 238000005530 etching Methods 0.000 claims 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims 3
- 238000004519 manufacturing process Methods 0.000 claims 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims 1
- 238000000137 annealing Methods 0.000 claims 1
- 238000004380 ashing Methods 0.000 claims 1
- 229910052796 boron Inorganic materials 0.000 claims 1
- 229910001882 dioxygen Inorganic materials 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 239000001384 succinic acid Substances 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005299666A JP2007109916A (ja) | 2005-10-14 | 2005-10-14 | 素子の製造方法 |
| CN200680037806.1A CN101283443A (zh) | 2005-10-14 | 2006-10-13 | 元件的制造方法 |
| KR1020087009478A KR20080063339A (ko) | 2005-10-14 | 2006-10-13 | 소자의 제조 방법 |
| PCT/JP2006/320450 WO2007043645A1 (ja) | 2005-10-14 | 2006-10-13 | 素子の製造方法 |
| TW095137661A TWI371082B (en) | 2005-10-14 | 2006-10-13 | Method for manufacturing elemental device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005299666A JP2007109916A (ja) | 2005-10-14 | 2005-10-14 | 素子の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007109916A JP2007109916A (ja) | 2007-04-26 |
| JP2007109916A5 true JP2007109916A5 (enExample) | 2008-05-08 |
Family
ID=37942866
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005299666A Withdrawn JP2007109916A (ja) | 2005-10-14 | 2005-10-14 | 素子の製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP2007109916A (enExample) |
| KR (1) | KR20080063339A (enExample) |
| CN (1) | CN101283443A (enExample) |
| TW (1) | TWI371082B (enExample) |
| WO (1) | WO2007043645A1 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102034832A (zh) * | 2009-09-28 | 2011-04-27 | 株式会社神户制钢所 | 薄膜晶体管基板及其制造方法以及显示装置 |
| JP2011091352A (ja) * | 2009-09-28 | 2011-05-06 | Kobe Steel Ltd | 薄膜トランジスタ基板およびその製造方法並びに表示装置 |
| CN110993694B (zh) * | 2019-10-22 | 2023-08-25 | 清华大学 | 自氧化方式制备亚10nm沟道的二维薄膜场效应晶体管 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05102151A (ja) * | 1991-10-07 | 1993-04-23 | Fujitsu Ltd | 半導体装置の製造方法 |
| JPH0618912A (ja) * | 1992-07-03 | 1994-01-28 | Fujitsu Ltd | 液晶表示装置及びその製造方法 |
| JP2944336B2 (ja) * | 1992-11-02 | 1999-09-06 | シャープ株式会社 | 配線構造 |
| JPH07169966A (ja) * | 1993-12-16 | 1995-07-04 | Sharp Corp | 電子部品及びその製造方法 |
| JP4663829B2 (ja) * | 1998-03-31 | 2011-04-06 | 三菱電機株式会社 | 薄膜トランジスタおよび該薄膜トランジスタを用いた液晶表示装置 |
| JP2001023990A (ja) * | 1999-07-07 | 2001-01-26 | Mitsubishi Electric Corp | 半導体装置およびその製造方法 |
| JP2003273109A (ja) * | 2002-03-14 | 2003-09-26 | Advanced Display Inc | Ａｌ配線用薄膜及びその製造方法並びにこれを用いた液晶表示装置 |
| JP3940385B2 (ja) * | 2002-12-19 | 2007-07-04 | 株式会社神戸製鋼所 | 表示デバイスおよびその製法 |
| JP2005062802A (ja) * | 2003-07-28 | 2005-03-10 | Advanced Display Inc | 薄膜トランジスタアレイ基板の製法 |
-
2005
- 2005-10-14 JP JP2005299666A patent/JP2007109916A/ja not_active Withdrawn
-
2006
- 2006-10-13 KR KR1020087009478A patent/KR20080063339A/ko not_active Ceased
- 2006-10-13 WO PCT/JP2006/320450 patent/WO2007043645A1/ja not_active Ceased
- 2006-10-13 TW TW095137661A patent/TWI371082B/zh not_active IP Right Cessation
- 2006-10-13 CN CN200680037806.1A patent/CN101283443A/zh active Pending
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